JPH0425692B2 - - Google Patents

Info

Publication number
JPH0425692B2
JPH0425692B2 JP6595283A JP6595283A JPH0425692B2 JP H0425692 B2 JPH0425692 B2 JP H0425692B2 JP 6595283 A JP6595283 A JP 6595283A JP 6595283 A JP6595283 A JP 6595283A JP H0425692 B2 JPH0425692 B2 JP H0425692B2
Authority
JP
Japan
Prior art keywords
film
ray
membrane
graphic
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP6595283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59191332A (ja
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP58065952A priority Critical patent/JPS59191332A/ja
Publication of JPS59191332A publication Critical patent/JPS59191332A/ja
Publication of JPH0425692B2 publication Critical patent/JPH0425692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58065952A 1983-04-14 1983-04-14 Ｘ線マスク Granted JPS59191332A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065952A JPS59191332A (ja) 1983-04-14 1983-04-14 Ｘ線マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065952A JPS59191332A (ja) 1983-04-14 1983-04-14 Ｘ線マスク

Publications (2)

Publication Number Publication Date
JPS59191332A JPS59191332A (ja) 1984-10-30
JPH0425692B2 true JPH0425692B2 (OSRAM) 1992-05-01

Family

ID=13301825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065952A Granted JPS59191332A (ja) 1983-04-14 1983-04-14 Ｘ線マスク

Country Status (1)

Country Link
JP (1) JPS59191332A (OSRAM)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0746681B2 (ja) * 1986-10-28 1995-05-17 富士通株式会社 Ｘ線ステッパー用マスクの製造方法
DE3703582C1 (de) * 1987-02-06 1988-04-07 Heidenhain Gmbh Dr Johannes Bestrahlungsmaske zur lithographischen Erzeugung von Mustern

Also Published As

Publication number Publication date
JPS59191332A (ja) 1984-10-30

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