JPH04253765A - Resin composition and substrate for optical recording medium - Google Patents
Resin composition and substrate for optical recording mediumInfo
- Publication number
- JPH04253765A JPH04253765A JP3033414A JP3341491A JPH04253765A JP H04253765 A JPH04253765 A JP H04253765A JP 3033414 A JP3033414 A JP 3033414A JP 3341491 A JP3341491 A JP 3341491A JP H04253765 A JPH04253765 A JP H04253765A
- Authority
- JP
- Japan
- Prior art keywords
- pentaerythritol
- substrate
- optical recording
- recording medium
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 46
- 230000003287 optical effect Effects 0.000 title claims abstract description 41
- 239000011342 resin composition Substances 0.000 title claims abstract description 19
- OCKWAZCWKSMKNC-UHFFFAOYSA-N [3-octadecanoyloxy-2,2-bis(octadecanoyloxymethyl)propyl] octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(COC(=O)CCCCCCCCCCCCCCCCC)(COC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC OCKWAZCWKSMKNC-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229920005668 polycarbonate resin Polymers 0.000 claims abstract description 19
- 239000004431 polycarbonate resin Substances 0.000 claims abstract description 19
- 150000002148 esters Chemical class 0.000 claims abstract description 18
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 claims abstract description 15
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 claims abstract description 14
- SMLXTTLNOGQHHB-UHFFFAOYSA-N [3-docosanoyloxy-2,2-bis(docosanoyloxymethyl)propyl] docosanoate Chemical compound CCCCCCCCCCCCCCCCCCCCCC(=O)OCC(COC(=O)CCCCCCCCCCCCCCCCCCCCC)(COC(=O)CCCCCCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCCCCCC SMLXTTLNOGQHHB-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000003118 aryl group Chemical group 0.000 claims abstract description 9
- 150000004671 saturated fatty acids Chemical class 0.000 claims description 13
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 235000003441 saturated fatty acids Nutrition 0.000 claims description 4
- 235000014113 dietary fatty acids Nutrition 0.000 abstract description 8
- 239000000194 fatty acid Substances 0.000 abstract description 8
- 229930195729 fatty acid Natural products 0.000 abstract description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 6
- 150000004665 fatty acids Chemical class 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 4
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 abstract description 3
- 238000000465 moulding Methods 0.000 abstract description 3
- 229920006395 saturated elastomer Polymers 0.000 abstract 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 238000011156 evaluation Methods 0.000 description 21
- 239000010408 film Substances 0.000 description 16
- 230000007062 hydrolysis Effects 0.000 description 13
- 238000006460 hydrolysis reaction Methods 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 11
- 238000005260 corrosion Methods 0.000 description 11
- 239000006082 mold release agent Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- FWCDLNRNBHJDQB-UHFFFAOYSA-N [2-(hydroxymethyl)-3-octadecanoyloxy-2-(octadecanoyloxymethyl)propyl] octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(CO)(COC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC FWCDLNRNBHJDQB-UHFFFAOYSA-N 0.000 description 4
- VBICKXHEKHSIBG-UHFFFAOYSA-N beta-monoglyceryl stearate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 239000004831 Hot glue Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- -1 fatty acid esters Chemical class 0.000 description 3
- 238000001746 injection moulding Methods 0.000 description 3
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 3
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- PCUSEPQECKJFFS-UHFFFAOYSA-N [3-tetradecanoyloxy-2,2-bis(tetradecanoyloxymethyl)propyl] tetradecanoate Chemical compound CCCCCCCCCCCCCC(=O)OCC(COC(=O)CCCCCCCCCCCCC)(COC(=O)CCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCC PCUSEPQECKJFFS-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 241000519995 Stachys sylvatica Species 0.000 description 1
- CRVNZTHYCIKYPV-UHFFFAOYSA-N [3-hexadecanoyloxy-2,2-bis(hexadecanoyloxymethyl)propyl] hexadecanoate Chemical compound CCCCCCCCCCCCCCCC(=O)OCC(COC(=O)CCCCCCCCCCCCCCC)(COC(=O)CCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCC CRVNZTHYCIKYPV-UHFFFAOYSA-N 0.000 description 1
- CFRNDJFRRKMHTL-UHFFFAOYSA-N [3-octanoyloxy-2,2-bis(octanoyloxymethyl)propyl] octanoate Chemical compound CCCCCCCC(=O)OCC(COC(=O)CCCCCCC)(COC(=O)CCCCCCC)COC(=O)CCCCCCC CFRNDJFRRKMHTL-UHFFFAOYSA-N 0.000 description 1
- TXNGWKJPSNDSIK-UHFFFAOYSA-N [3-tetracosanoyloxy-2,2-bis(tetracosanoyloxymethyl)propyl] tetracosanoate Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(=O)OCC(COC(=O)CCCCCCCCCCCCCCCCCCCCCCC)(COC(=O)CCCCCCCCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCCCCCCCC TXNGWKJPSNDSIK-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 229940105132 myristate Drugs 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- XRBCRPZXSCBRTK-UHFFFAOYSA-N phosphonous acid Chemical compound OPO XRBCRPZXSCBRTK-UHFFFAOYSA-N 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- TUNFSRHWOTWDNC-UHFFFAOYSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、光学用材料として有用
な樹脂組成物、およびその樹脂組成物からなる光記録媒
体用基板に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition useful as an optical material, and a substrate for an optical recording medium comprising the resin composition.
【0002】0002
【従来の技術】最近、ポリカーボネート樹脂は、その透
明性、耐熱性、寸法安定性などの特徴を生かして、レン
ズ,光情報ディスク用基板材料等として広く用いられる
ようになり、それに伴って、熱安定性、耐加水分解性や
離型性の改良が重要な問題となって来た。[Prior Art] Recently, polycarbonate resin has come to be widely used as a substrate material for lenses, optical information disks, etc., taking advantage of its characteristics such as transparency, heat resistance, and dimensional stability. Improvements in stability, hydrolysis resistance and mold release properties have become important issues.
【0003】従来、ポリカーボネート樹脂の安定剤とし
ては、実用上、有機ホスファイトが主流であるが、この
有機ホスファイトの加水分解物はポリカーボネート樹脂
自体の分解を促進することが良く知られている。また、
ポリカーボネート樹脂が加水分解すると、その分解物は
微細な白点として成形品中に析出し、光線の通過を妨げ
る。Conventionally, organic phosphites have been the main stabilizers for polycarbonate resins in practice, but it is well known that hydrolysates of these organic phosphites accelerate the decomposition of the polycarbonate resin itself. Also,
When polycarbonate resin is hydrolyzed, the decomposed products precipitate into the molded product as fine white spots, blocking the passage of light rays.
【0004】有機ホスファイト以外として提案されてい
るホスホナイト系の化合物も同様の加水分解性を有して
いる。また、有機ホスフィンや有機ホスフィンオキシド
は耐熱安定性の向上が不充分であるという欠点を有して
おり、成形品を加熱すると著しく黄変するという結果と
なって現れる。[0004] Phosphonite-based compounds that have been proposed other than organic phosphites also have similar hydrolyzability. Furthermore, organic phosphines and organic phosphine oxides have the disadvantage of insufficient improvement in heat resistance stability, which results in marked yellowing of molded articles when heated.
【0005】一方、光学成形品の内、特に光ディスク,
レンズ等は射出成形によって製造されるが、金型から離
型する際に、離型抵抗が大きいと成形品のソリや、光学
的歪みの原因となるため、離型剤の使用が必要である。
特に、光ディスクではスタンパーの1μm以下の凹凸を
正確に転写する必要があり、これは離型剤の性能に負う
ところが大きい。On the other hand, among optical molded products, especially optical discs,
Lenses and other products are manufactured by injection molding, but when releasing from a mold, a large release resistance can cause warping of the molded product and optical distortion, so it is necessary to use a mold release agent. . In particular, in the case of optical discs, it is necessary to accurately transfer the irregularities of 1 μm or less on the stamper, and this is largely dependent on the performance of the mold release agent.
【0006】従来、ポリカーボネート樹脂の離型剤とし
てはパラフィン,シリコーンオイル,脂肪酸,脂肪酸エ
ステル,脂肪酸部分エステル(特に、脂肪酸モノグリセ
リド)などが知られている。これらの中で少量の使用で
優れた離型性を有するものは脂肪酸および脂肪酸モノグ
リセリドであるが、これらの離型剤を添加したポリカー
ボネイト樹脂を高温多湿下(80℃/90%RH)に放
置すると、ポリカーボネート樹脂の加水分解を促進する
が、離型性の点から、例えば0.04重量%程度の添加
が必要とされている。Conventionally, paraffin, silicone oil, fatty acids, fatty acid esters, fatty acid partial esters (particularly fatty acid monoglycerides), and the like have been known as mold release agents for polycarbonate resins. Among these, fatty acids and fatty acid monoglycerides have excellent mold release properties when used in small amounts, but when polycarbonate resins containing these mold release agents are left in high temperature and high humidity conditions (80°C/90% RH), , promotes the hydrolysis of polycarbonate resin, but from the viewpoint of mold releasability, it is necessary to add, for example, about 0.04% by weight.
【0007】また、特公昭55−24468号公報およ
び特公昭61−41939号公報に示されているように
、多価アルコールと高級飽和脂肪酸とのフルエステルを
離型剤として用いることによって、脂肪酸部分エステル
を用いたときに見られるような高温多湿下におけるポリ
カーボネート樹脂の加水分解の促進性を避けようとする
試みがなされている。しかしながら、このような方法に
よってもポリカーボネート樹脂の加水分解に対する対策
が充分にとれているとはいいがたい現状である。Furthermore, as shown in Japanese Patent Publication No. 55-24468 and Japanese Patent Publication No. 61-41939, by using a full ester of a polyhydric alcohol and a higher saturated fatty acid as a mold release agent, fatty acid moieties can be Attempts have been made to avoid the accelerated hydrolysis of polycarbonate resins under high temperature and humidity conditions, which occurs when esters are used. However, at present, it cannot be said that even such methods provide sufficient measures against the hydrolysis of polycarbonate resins.
【0008】[0008]
【発明が解決しようとする課題】本発明は、この様な従
来技術の問題点を解決するためになされたものであり、
成形性、特に基板成形時の離型性に優れ、かつ高温高湿
下における記録膜の腐蝕性が小さく及び耐加水分解性に
優れた光記録媒体用基板を得ることができる光学成形材
料用ポリカーボネート樹脂組成物およびその樹脂組成物
からなる光記録媒体用基板を提供することを目的とする
ものである。[Problems to be Solved by the Invention] The present invention has been made in order to solve the problems of the prior art.
A polycarbonate for optical molding materials that can provide substrates for optical recording media that have excellent moldability, especially mold release properties during substrate molding, have low corrosion resistance of recording films under high temperature and high humidity conditions, and have excellent hydrolysis resistance. The object of the present invention is to provide a resin composition and a substrate for an optical recording medium made of the resin composition.
【0009】[0009]
【課題を解決するための手段】即ち、本発明は、芳香族
ポリカーボネイト樹脂に、ペンタエリスリトールと炭素
数12〜22の高級飽和脂肪酸とのフルエステルおよび
亜リン酸を含有させてなることを特徴とする樹脂組成物
、および該樹脂組成物からなる光記録媒体用基板である
。[Means for Solving the Problems] That is, the present invention is characterized in that an aromatic polycarbonate resin contains a full ester of pentaerythritol and a higher saturated fatty acid having 12 to 22 carbon atoms and phosphorous acid. and a substrate for an optical recording medium comprising the resin composition.
【0010】以下、本発明を詳細に説明する。本発明の
樹脂組成物は、芳香族ポリカーボネイト樹脂に、ペンタ
エリスリトールと特定の炭素数12〜22の高級飽和脂
肪酸とのフルエステルおよび亜リン酸を含有させてなる
ものである。The present invention will be explained in detail below. The resin composition of the present invention is made by containing an aromatic polycarbonate resin, a full ester of pentaerythritol and a specific higher saturated fatty acid having 12 to 22 carbon atoms, and phosphorous acid.
【0011】芳香族ポリカーボネイト樹脂としては、特
に制限することはなく広範囲のものを用いることができ
るが、例えば2,2−ビス(4−ヒドロキシフェニル)
プロパンとホスゲンとの反応によって得られるもの等が
挙げられる。[0011] The aromatic polycarbonate resin is not particularly limited and a wide range of resins can be used. For example, 2,2-bis(4-hydroxyphenyl)
Examples include those obtained by the reaction of propane and phosgene.
【0012】また、ペンタエリスリトールと高級飽和脂
肪酸とのフルエステルとしては、炭素数12〜22、好
ましくは炭素数14〜22の高級飽和脂肪酸とペンタエ
リスリトールとのフルエステルが用いられ、例えばペン
タエリスリトールテトラミリステート、ペンタエリスリ
トールテトラパルミテートなど、特に好ましくはペンタ
エリスリトールテトラステアレートおよびペンタエリス
リトールテトラベヘネートが用いられる。また、上記の
フルエステルは1種または2種以上を用いることができ
る。高級飽和脂肪酸の炭素数が12〜22の範囲外の脂
肪酸を用いたペンタエリスリトールとのエステルでは、
離型性、高温高湿下における記録膜の腐蝕性が小さく、
および耐加水分解性を同時に満足することができないた
めに好ましくない。Further, as the full ester of pentaerythritol and a higher saturated fatty acid, a full ester of a higher saturated fatty acid having 12 to 22 carbon atoms, preferably 14 to 22 carbon atoms, and pentaerythritol is used, such as pentaerythritol tetra. Myristate, pentaerythritol tetrapalmitate, etc., particularly preferably pentaerythritol tetrastearate and pentaerythritol tetrabehenate are used. Moreover, one type or two or more types of the above-mentioned full esters can be used. In esters with pentaerythritol using higher saturated fatty acids with a carbon number outside the range of 12 to 22,
Mold releasability, low corrosion of recording film under high temperature and high humidity,
and hydrolysis resistance cannot be satisfied at the same time, which is undesirable.
【0013】本発明の樹脂組成物中に含有される上記ペ
タエリスリトールと高級飽和脂肪酸とのフルエステルの
含有量としては、好ましくは0.01〜0.3wt%、
特に好ましくは0.05〜0.2wt%が望ましい。
0.01wt%未満では離型性が悪化し、0.3wt%
以上では高温,高湿下における記録膜の腐蝕性、耐加水
分解性が悪くなり、好ましくない。The content of the full ester of petaerythritol and higher saturated fatty acid contained in the resin composition of the present invention is preferably 0.01 to 0.3 wt%,
Particularly preferably 0.05 to 0.2 wt%. If it is less than 0.01 wt%, the mold releasability will deteriorate, and if it is less than 0.3 wt%
Above this level, the corrosion resistance and hydrolysis resistance of the recording film at high temperatures and high humidity deteriorate, which is not preferable.
【0014】また、本発明の樹脂組成物中に含有される
亜リン酸の含有量としては、0.0005〜0.01w
t%、特に好ましくは0.001〜0.005wt%が
望ましい。0.0005wt%未満では耐加水分解性が
悪くなり、0.3wt%以上では高温,高湿下における
記録膜の腐蝕性が悪くなり、好ましくない。[0014] Furthermore, the content of phosphorous acid contained in the resin composition of the present invention is 0.0005 to 0.01w.
t%, particularly preferably 0.001 to 0.005 wt%. If it is less than 0.0005 wt%, the hydrolysis resistance will be poor, and if it is more than 0.3 wt%, the corrosion resistance of the recording film at high temperature and high humidity will be poor, which is not preferable.
【0015】次に、上記の樹脂組成物を用いて光記録媒
体用基板を作製する方法は、通常の方法により行なうこ
とができ、例えば射出成型法、押し出し成型法等により
作製することができる。Next, a substrate for an optical recording medium can be manufactured using the above resin composition by a conventional method, for example, by injection molding, extrusion molding, or the like.
【0016】[0016]
【作用】本発明の樹脂組成物は、芳香族ポリカーボネイ
ト樹脂に、ペンタエリスリトールと特定の炭素数12〜
22の高級飽和脂肪酸とのフルエステルおよび亜リン酸
を含有しているので、光記録媒体用基板を作製する際の
離型性に優れ成型性が良好であり、また高温高湿下にお
いて光記録媒体用基板に形成された記録膜の腐蝕性が小
さく、および光記録媒体用基板の耐加水分解性を同時に
満足することができる。[Function] The resin composition of the present invention comprises an aromatic polycarbonate resin, pentaerythritol and a specific carbon number of 12 to
Contains full ester of 22 higher saturated fatty acids and phosphorous acid, so it has excellent mold releasability and good moldability when producing substrates for optical recording media, and is also suitable for optical recording under high temperature and high humidity conditions. The corrosion resistance of the recording film formed on the medium substrate is low, and the hydrolysis resistance of the optical recording medium substrate can be satisfied at the same time.
【0017】[0017]
【実施例】以下に実施例を挙げて本発明を具体的に説明
する。
実施例1
芳香族ポリカーボネート(PC)として、2,2−ビス
(4−ヒドロキシフェニル)プロパンとホスゲンとを反
応させて調製した2,2−ビス(4−ヒドロキシフェニ
ル)プロパンのホモポリマー(粘度平均分子量:180
00)に、ペンタエリスリトールテトラステアレート(
PTS)0.10wt%および亜リン酸0.003wt
%を含有させた樹脂組成物を通常の射出成形機を用いて
成形し、厚さ1.2mmの光記録媒体用基板を得た。
得られた基板に、SiN/GdFeCo/TbFeCo
/SiNの層構成となるように順次積層し光磁気膜を成
膜した。それぞれの膜厚は900Å/300Å/500
Å/600Åであった。[Examples] The present invention will be specifically explained below with reference to Examples. Example 1 A homopolymer of 2,2-bis(4-hydroxyphenyl)propane prepared by reacting 2,2-bis(4-hydroxyphenyl)propane with phosgene (viscosity average Molecular weight: 180
00), pentaerythritol tetrastearate (
PTS) 0.10wt% and phosphorous acid 0.003wt
% was molded using an ordinary injection molding machine to obtain a substrate for an optical recording medium having a thickness of 1.2 mm. The obtained substrate was coated with SiN/GdFeCo/TbFeCo
/SiN layers were sequentially stacked to form a magneto-optical film. Each film thickness is 900 Å/300 Å/500
It was Å/600 Å.
【0018】その上に、ホットメルト接着剤(HM)を
用いて厚さ1.2mmのポリカーボネート製の基板を接
着して下記の層構成からなる光記録媒体を得た。作成し
た基板の離型性、記録膜への悪影響および加水分解特性
の評価結果を表1に示す。PC/SiN/GdFeCo
/TbFeCo/SiN/HM/PCA polycarbonate substrate having a thickness of 1.2 mm was adhered thereon using a hot melt adhesive (HM) to obtain an optical recording medium having the following layer structure. Table 1 shows the evaluation results of the mold release properties, adverse effects on the recording film, and hydrolysis properties of the prepared substrates. PC/SiN/GdFeCo
/TbFeCo/SiN/HM/PC
【0019】実施例2
ペンタエリスリトールテトラステアレート(PTS)0
.10wt%のかわりにペンタエリスリトールテトラベ
ヘネート(PTB)0.10wt%を用いた以外は実施
例1と同様に基板を作成し、光記録媒体を得た。その評
価結果を表1に示す。Example 2 Pentaerythritol tetrastearate (PTS) 0
.. A substrate was prepared in the same manner as in Example 1, except that 0.10 wt% of pentaerythritol tetrabehenate (PTB) was used instead of 10 wt%, and an optical recording medium was obtained. The evaluation results are shown in Table 1.
【0020】実施例3,4および5
ペンタエリスリトールテトラステアレート(PTS)の
含有量を0.03wt%、0.05wt%、0.15w
t%にした以外は実施例1と同様に基板を作成し、光記
録媒体を得た。その評価結果を表1に示す。Examples 3, 4 and 5 The content of pentaerythritol tetrastearate (PTS) was 0.03wt%, 0.05wt%, 0.15w
A substrate was prepared in the same manner as in Example 1 except that the amount was changed to t%, and an optical recording medium was obtained. The evaluation results are shown in Table 1.
【0021】実施例6,7および8
亜リン酸の含有量を0.001wt%、0.005wt
%、0.007wt%にした以外は実施例1と同様に基
板を作成し、光記録媒体を得た。その評価結果を表1に
示す。Examples 6, 7 and 8 The content of phosphorous acid was 0.001 wt%, 0.005 wt%
% and 0.007wt%, a substrate was prepared in the same manner as in Example 1, and an optical recording medium was obtained. The evaluation results are shown in Table 1.
【0022】実施例9
ペンタエリスリトールテトラステアレート(PTS)0
.10wt%をペンタエリスリトールテトラミリステー
ト(PTM)0.10wt%にした以外は実施例1と同
様に基板を作成し、光記録媒体を得た。その評価結果を
表1に示す。Example 9 Pentaerythritol tetrastearate (PTS) 0
.. A substrate was prepared in the same manner as in Example 1, except that 0.10 wt % of pentaerythritol tetramyristate (PTM) was used instead of 10 wt %, and an optical recording medium was obtained. The evaluation results are shown in Table 1.
【0023】実施例10,11および12ペンタエリス
リトールテトラベヘネート(PTB)の含有量を0.0
3wt%、0.05wt%、0.15wt%とした以外
は実施例2と同様に基板を作成し、光記録媒体を得た。
その評価結果を表1に示す。Examples 10, 11 and 12 The content of pentaerythritol tetrabehenate (PTB) was 0.0.
A substrate was prepared in the same manner as in Example 2 except that the concentrations were 3wt%, 0.05wt%, and 0.15wt%, and an optical recording medium was obtained. The evaluation results are shown in Table 1.
【0024】実施例13,14および15亜リン酸の含
有量を0.001wt%、0.005wt%、0.00
7wt%にした以外は実施例2と同様に基板を作成し、
光記録媒体を得た。その評価結果を表1に示す。Examples 13, 14 and 15 The content of phosphorous acid was 0.001 wt%, 0.005 wt%, 0.00
A substrate was created in the same manner as in Example 2 except that the content was 7wt%,
An optical recording medium was obtained. The evaluation results are shown in Table 1.
【0025】比較例1
亜リン酸を含有していないこと以外は実施例1と同様に
基板を作成し、光記録媒体を得た。その評価結果を表2
に示す。Comparative Example 1 A substrate was prepared in the same manner as in Example 1 except that it did not contain phosphorous acid, and an optical recording medium was obtained. Table 2 shows the evaluation results.
Shown below.
【0026】比較例2
ペンタエリスリトールテトラステアレート(PTS)を
含有していないこと以外は実施例1と同様に基板を作成
し、光記録媒体を得た。その評価結果を表2に示す。Comparative Example 2 A substrate was prepared in the same manner as in Example 1 except that pentaerythritol tetrastearate (PTS) was not contained, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0027】比較例3
ペンタエリスリトールテトラステアレート(PTS)の
含有量を0.3wt%としたこと以外は実施例1と同様
に基板を作成し、光記録媒体を得た。その評価結果を表
2に示す。Comparative Example 3 A substrate was prepared in the same manner as in Example 1, except that the content of pentaerythritol tetrastearate (PTS) was 0.3 wt%, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0028】比較例4
亜リン酸の含有量が0.01wt%であること以外は実
施例1と同様に基板を作成し、光記録媒体を得た。その
評価結果を表2に示す。Comparative Example 4 A substrate was prepared in the same manner as in Example 1 except that the content of phosphorous acid was 0.01 wt%, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0029】比較例5
ペンタエリスリトールテトラステアレート(PTS)0
.10wt%のかわりにステアリン酸モノグリセリド(
SMG)0.05wt%を用いた以外は実施例1と同様
に基板を作成し、光記録媒体を得た。その評価結果を表
2に示す。Comparative Example 5 Pentaerythritol tetrastearate (PTS) 0
.. Stearic acid monoglyceride (instead of 10wt%)
A substrate was prepared in the same manner as in Example 1, except that 0.05 wt% of SMG) was used, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0030】比較例6
ペンタエリスリトールテトラステアレート(PTS)0
.10wt%のかわりにペンタエリスリトールテトラス
テアレート(PTS)0.05wt%とステアリン酸モ
ノグリセリド(SMG)0.01wt%を用いた以外は
実施例1と同様に基板を作成し、光記録媒体を得た。
その評価結果を表2に示す。Comparative Example 6 Pentaerythritol tetrastearate (PTS) 0
.. A substrate was prepared in the same manner as in Example 1, except that 0.05 wt% of pentaerythritol tetrastearate (PTS) and 0.01 wt% of stearic acid monoglyceride (SMG) were used instead of 10 wt%, and an optical recording medium was obtained. . The evaluation results are shown in Table 2.
【0031】比較例7
亜リン酸0.003wt%のかわりに有機ホスファイト
0.003wt%を用いた以外は実施例1と同様に基板
を作成し、光記録媒体を得た。その評価結果を表2に示
す。Comparative Example 7 A substrate was prepared in the same manner as in Example 1 except that 0.003 wt % of organic phosphite was used instead of 0.003 wt % of phosphorous acid, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0032】比較例8
ペンタエリスリトールテトラベヘネート(PTB)の含
有量を0.3wt%とした以外は実施例1と同様に基板
を作成し、光記録媒体を得た。その評価結果を表2に示
す。Comparative Example 8 A substrate was prepared in the same manner as in Example 1, except that the content of pentaerythritol tetrabehenate (PTB) was 0.3 wt%, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0033】比較例9
ペンタエリスリトールテトラステアレート(PTS)0
.10wt%のかわりにペンタエリスリトールテトラオ
クタネート(PTO)を用いる以外は実施例1と同様に
基板を作成し、光記録媒体を得た。その評価結果を表2
に示す。Comparative Example 9 Pentaerythritol tetrastearate (PTS) 0
.. A substrate was prepared in the same manner as in Example 1, except that pentaerythritol tetraoctanate (PTO) was used instead of 10 wt%, and an optical recording medium was obtained. Table 2 shows the evaluation results.
Shown below.
【0034】比較例10
ペンタエリスリトールテトラステアレート(PTS)0
.10wt%のかわりにペンタエリスリトールテトラリ
グノセレート(Pentaerythritoltet
ralignocerate ,PTL)を用いる以外
は実施例1と同様に基板を作成し、光記録媒体を得た。
その評価結果を表2に示す。Comparative Example 10 Pentaerythritol tetrastearate (PTS) 0
.. Pentaerythritol tetralignocerate (Pentaerythritoltet) instead of 10wt%
A substrate was prepared in the same manner as in Example 1 except that Ralignocerate (PTL) was used, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0035】比較例11ペンタエリスリトールテトラス
テアレート(PTS)0.10wt%のかわりにペンタ
エリスリトールトリステアレート(PTriS)0.1
0wt%を用いる以外は実施例1と同様に基板を作成し
、光記録媒体を得た。その評価結果を表2に示す。Comparative Example 11 Pentaerythritol tristearate (PTriS) 0.1 instead of 0.10 wt% pentaerythritol tetrastearate (PTS)
A substrate was prepared in the same manner as in Example 1 except that 0 wt% was used, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0036】比較例12
ペンタエリスリトールテトラステアレート(PTS)0
.10wt%のかわりに、ペンタエリスリトールテトラ
ステアレート(PTS)0.05wt%とペンタエリス
リトールトリステアレート(PTriS)0.05wt
%を用いる以外は実施例1と同様に基板を作成し、光記
録媒体を得た。その評価結果を表2に示す。Comparative Example 12 Pentaerythritol tetrastearate (PTS) 0
.. Instead of 10wt%, 0.05wt% of pentaerythritol tetrastearate (PTS) and 0.05wt of pentaerythritol tristearate (PTriS).
A substrate was prepared in the same manner as in Example 1 except that % was used, and an optical recording medium was obtained. The evaluation results are shown in Table 2.
【0037】試験方法
離型性:成形基板の目視による離型不良の大小および離
型抵抗で評価した。
◎:離型抵抗260Kg以下、離型不良が確認できない
(目視、顕微鏡)
○:離型抵抗260Kg〜290Kg、離型不良が確認
できない(目視、顕微鏡)
△:離型抵抗290Kg〜350Kg、顕微鏡で離型不
良が確認できる
×:離型抵抗350Kg以上、目視で離型不良が確認で
きるTest method: Mold releasability: Evaluation was made based on the magnitude of mold release defects visually observed on the molded substrate and the mold release resistance. ◎: Mold release resistance 260Kg or less, mold release failure cannot be confirmed (visually, microscope) ○: Mold release resistance 260Kg to 290Kg, mold release failure cannot be confirmed (visually, microscope) △: Mold release resistance 290Kg to 350Kg, under microscope Poor mold release can be confirmed ×: Mold release resistance is 350 kg or more, mold release defects can be visually confirmed.
【0038】記録膜への影響:成形基板に光磁気記録膜
を成膜後、高温高湿(70℃,90%RH)雰囲気中に
1000時間放置後の記録膜の腐蝕の大小で評価した。
◎:記録膜の腐蝕10μm以上なし
○:記録膜の腐蝕10μm〜100μmが数個程度あり
△:記録膜の腐蝕10μm〜100μmが数十個あり×
:記録膜の腐蝕100μm以上が数個以上ありEffect on recording film: After a magneto-optical recording film was formed on a molded substrate, it was left in a high temperature, high humidity (70° C., 90% RH) atmosphere for 1000 hours, and the corrosion of the recording film was evaluated based on the degree of corrosion. ◎: There is no corrosion of 10 μm or more on the recording film. ○: There are several pieces of corrosion of 10 μm to 100 μm on the recording film. △: There are several dozen pieces of corrosion of 10 μm to 100 μm on the recording film. ×
: Recording film has corrosion of 100 μm or more in several pieces.
【003
9】耐加水分解性:成形基板に光磁気記録膜を成膜後、
高温高湿(70℃,90%RH)雰囲気中に1000時
間放置後の成形基板の加水分解部分の大小で評価した。
◎:成形基板の加水分解部分10μm以上なし○:成形
基板の加水分解部分10μm〜100μmが数個程度あ
り
△:成形基板の加水分解部分10μm〜100μmが数
十個あり
×:成形基板の加水分解部分100μm以上が数個以上
あり003
9] Hydrolysis resistance: After forming a magneto-optical recording film on a molded substrate,
Evaluation was made based on the size of the hydrolyzed portion of the molded substrate after being left in a high temperature, high humidity (70° C., 90% RH) atmosphere for 1000 hours. ◎: No hydrolyzed portions of 10 μm or more on the molded substrate ○: Several hydrolyzed portions of 10 μm to 100 μm on the molded substrate △: Several dozen hydrolyzed portions of 10 μm to 100 μm on the molded substrate ×: Hydrolysis of the molded substrate There are several parts with a diameter of 100 μm or more.
【0040】[0040]
【表1】[Table 1]
【0041】[0041]
【表2】[Table 2]
【0042】[0042]
【発明の効果】以上説明したように、本発明によれば、
芳香族ポリカーボネイト樹脂に、ペンタエリスリトール
と炭素数12〜22の高級飽和脂肪酸とのフルエステル
および亜リン酸を含有させてなる樹脂組成物を用いるこ
とによって、基板成形時の離型性に優れ、かつ高温高湿
下における記録膜の腐蝕性が小さく及び耐加水分解性に
優れた光記録媒体用基板を得ることができる。本発明の
樹脂組成物は光学材料として有用である。[Effects of the Invention] As explained above, according to the present invention,
By using a resin composition in which an aromatic polycarbonate resin contains a full ester of pentaerythritol and a higher saturated fatty acid having 12 to 22 carbon atoms and phosphorous acid, it has excellent mold releasability during substrate molding, and It is possible to obtain a substrate for an optical recording medium whose recording film is less corrosive under high temperature and high humidity conditions and has excellent hydrolysis resistance. The resin composition of the present invention is useful as an optical material.
Claims (5)
タエリスリトールと炭素数12〜22の高級飽和脂肪酸
とのフルエステルおよび亜リン酸を含有させてなること
を特徴とする樹脂組成物。1. A resin composition comprising an aromatic polycarbonate resin containing a full ester of pentaerythritol and a higher saturated fatty acid having 12 to 22 carbon atoms and phosphorous acid.
2〜22の高級飽和脂肪酸のフルエステルの含有量が0
.01〜0.3wt%である請求項1記載の樹脂組成物
。[Claim 2] The pentaerythritol and carbon number 1
The content of full esters of higher saturated fatty acids of 2 to 22 is 0.
.. The resin composition according to claim 1, wherein the amount is 01 to 0.3 wt%.
〜0.01wt%である請求項1記載の樹脂組成物。Claim 3: The content of the phosphorous acid is 0.0005.
The resin composition according to claim 1, wherein the amount is 0.01 wt%.
2〜22の高級飽和脂肪酸とのフルエステルがペンタエ
リスリトールテトラステアレートまたはペンタエリスリ
トールテトラベヘネートである請求項1記載の樹脂組成
物。4. The pentaerythritol and carbon number 1
2. The resin composition according to claim 1, wherein the full ester with 2 to 22 higher saturated fatty acids is pentaerythritol tetrastearate or pentaerythritol tetrabehenate.
タエリスリトールと炭素数12〜22の高級飽和脂肪酸
とのフルエステルおよび亜リン酸を含有させてなる樹脂
組成物からなることを特徴とする光記録媒体用基板。5. An optical recording medium comprising a resin composition comprising an aromatic polycarbonate resin containing a full ester of pentaerythritol and a higher saturated fatty acid having 12 to 22 carbon atoms and phosphorous acid. substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3033414A JPH04253765A (en) | 1991-02-04 | 1991-02-04 | Resin composition and substrate for optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3033414A JPH04253765A (en) | 1991-02-04 | 1991-02-04 | Resin composition and substrate for optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04253765A true JPH04253765A (en) | 1992-09-09 |
Family
ID=12385922
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3033414A Pending JPH04253765A (en) | 1991-02-04 | 1991-02-04 | Resin composition and substrate for optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04253765A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5608027A (en) * | 1994-05-19 | 1997-03-04 | General Electric Company | Complex stabilizer composition to improve the melt stability and color stability of polycarbonates |
JP2002528619A (en) * | 1998-11-03 | 2002-09-03 | ゼネラル・エレクトリック・カンパニイ | Polycarbonate sheet with improved flame retardancy |
US7241825B2 (en) | 2002-05-08 | 2007-07-10 | Teijin Chemicals, Ltd. | Polycarbonate resin composition, pellets thereof and molded article thereof |
WO2007102529A1 (en) * | 2006-03-07 | 2007-09-13 | Idemitsu Kosan Co., Ltd. | Molding material for blu-ray disc substrate and molding material for hd digital versatile disc substrate |
-
1991
- 1991-02-04 JP JP3033414A patent/JPH04253765A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5608027A (en) * | 1994-05-19 | 1997-03-04 | General Electric Company | Complex stabilizer composition to improve the melt stability and color stability of polycarbonates |
JP2002528619A (en) * | 1998-11-03 | 2002-09-03 | ゼネラル・エレクトリック・カンパニイ | Polycarbonate sheet with improved flame retardancy |
US7241825B2 (en) | 2002-05-08 | 2007-07-10 | Teijin Chemicals, Ltd. | Polycarbonate resin composition, pellets thereof and molded article thereof |
WO2007102529A1 (en) * | 2006-03-07 | 2007-09-13 | Idemitsu Kosan Co., Ltd. | Molding material for blu-ray disc substrate and molding material for hd digital versatile disc substrate |
JP2007242126A (en) * | 2006-03-07 | 2007-09-20 | Idemitsu Kosan Co Ltd | Molding material for blue-ray disk substrate and molding material for hd-digital versatile disk substrate |
JP4499049B2 (en) * | 2006-03-07 | 2010-07-07 | 出光興産株式会社 | Molding material for Blu-ray disc substrate and molding material for HD digital versatile disc substrate |
US8133564B2 (en) | 2006-03-07 | 2012-03-13 | Idemitsu Kosan Co., Ltd. | Molding material for blu-ray disc substrate and molding material for HD digital versatile disc substrate |
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