JPH0425273Y2 - - Google Patents
Info
- Publication number
- JPH0425273Y2 JPH0425273Y2 JP1986197207U JP19720786U JPH0425273Y2 JP H0425273 Y2 JPH0425273 Y2 JP H0425273Y2 JP 1986197207 U JP1986197207 U JP 1986197207U JP 19720786 U JP19720786 U JP 19720786U JP H0425273 Y2 JPH0425273 Y2 JP H0425273Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- liquid
- ultrasonic
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004140 cleaning Methods 0.000 claims description 185
- 239000007788 liquid Substances 0.000 claims description 121
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 23
- 230000004888 barrier function Effects 0.000 claims description 16
- 230000000694 effects Effects 0.000 description 14
- 230000008929 regeneration Effects 0.000 description 14
- 238000011069 regeneration method Methods 0.000 description 14
- 238000009835 boiling Methods 0.000 description 13
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 7
- 239000012530 fluid Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 238000007872 degassing Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- 239000006200 vaporizer Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005273 aeration Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- -1 deposits Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000013020 steam cleaning Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Degasification And Air Bubble Elimination (AREA)
Description
【考案の詳細な説明】
［産業上の利用分野］
本考案は、被洗浄物に付着した油等の汚れを除
去するための超音波洗浄装置に関するものであ
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an ultrasonic cleaning device for removing dirt such as oil adhering to an object to be cleaned.
［従来の技術］
従来より、被洗浄物に付着した油等の汚れを除
去するのに、超音波を利用した洗浄方法およびそ
の装置が広く用いられている。[Prior Art] Conventionally, cleaning methods and apparatuses using ultrasonic waves have been widely used to remove dirt such as oil adhering to objects to be cleaned.
この場合、溶液中にキヤビテーシヨン（空洞現
象）を生ぜしめて被洗浄物を洗浄すると、単なる
定在液状態や共振状態下での洗浄に比べて、洗浄
効果を向上できることが知られている。そこで、
洗浄液に振動子で超音波を発射させてキヤビテー
シヨンを発生させ、洗浄する方法が従来より実施
されている。 In this case, it is known that if the object to be cleaned is cleaned by creating cavitation in the solution, the cleaning effect can be improved compared to cleaning in a simple standing liquid state or under a resonance state. Therefore,
Conventionally, a cleaning method has been implemented in which cavitation is generated by emitting ultrasonic waves in a cleaning liquid using a vibrator.
しかしながら、この洗浄方法では、洗浄液中に
気体が混入されていると、超音波を発生させた場
合に洗浄液内の気体が泡状になつて液面上に上昇
し、キヤビテーシヨンが発生しても、上記泡によ
つて被洗浄物への衝突経路が阻害され、十分な洗
浄効果が得られない。よつて、この洗浄方法で
は、脱気された洗浄液を使用することが重要であ
り、この脱気された洗浄液を使用した方法も従来
より採用されている。 However, in this cleaning method, if gas is mixed in the cleaning liquid, when ultrasonic waves are generated, the gas in the cleaning liquid becomes bubbles and rises above the liquid surface, causing cavitation. The bubbles obstruct the path of collision with the object to be cleaned, making it impossible to obtain a sufficient cleaning effect. Therefore, in this cleaning method, it is important to use a degassed cleaning liquid, and methods using this deaerated cleaning liquid have also been employed in the past.
しかし、これでも洗浄槽内において、洗浄液が
空気に触れた状態にあると、その空気が洗浄液中
に溶解し、洗浄液の十分な脱気状態が保持できな
い。 However, even in this case, if the cleaning liquid is exposed to air in the cleaning tank, the air will dissolve in the cleaning liquid, and the cleaning liquid will not be able to maintain a sufficient deaerated state.
そこで、従来では、例えば実開昭50−81064号
公報およびおよび特開昭53−39661号公報等で見
ることができるように、洗浄液の上面に蒸気層を
作り、この蒸気層で洗浄槽内における洗浄液と空
気との間を遮断するようにした構造の超音波洗浄
装置も提案されている。すなわち、この実開昭50
−81064号公報およびおよび特開昭53−39661号公
報等に開示される超音波洗浄装置では、洗浄液を
沸騰させ、この沸騰によつて作られた蒸気で空気
遮断層を形成するようにしている。 Therefore, conventionally, as can be seen in, for example, Japanese Utility Model Application Publication No. 50-81064 and Japanese Patent Application Publication No. 53-39661, a vapor layer is created on the upper surface of the cleaning liquid, and this vapor layer is used to clean the inside of the cleaning tank. An ultrasonic cleaning device has also been proposed that has a structure that blocks the cleaning liquid from the air. In other words, this actual development in 1977
In the ultrasonic cleaning apparatus disclosed in Japanese Patent Application Laid-open No. 81064 and Japanese Patent Application Laid-Open No. 53-39661, the cleaning liquid is boiled, and the vapor produced by the boiling forms an air barrier layer. .
［考案が解決しようとする課題］
上述したように、従来の超音波洗浄装置は、洗
浄液を沸騰させ、この沸騰によつて作られた蒸気
で空気遮断層を形成するようにしている。したが
つて、洗浄槽の洗浄液は必ず沸騰させる必要があ
るので、洗浄液を使用するときの温度が限定され
る。[Problems to be Solved by the Invention] As described above, the conventional ultrasonic cleaning apparatus boils the cleaning liquid and forms an air barrier layer with the steam produced by the boiling. Therefore, since the cleaning liquid in the cleaning tank must be boiled, the temperature at which the cleaning liquid can be used is limited.
しかしながら、洗浄液においてのキヤビテーシ
ヨンが発生し易い温度は沸点以下であることが多
く、また沸騰させた場合にはキヤビテーシヨンの
発生を抑えてしまい、洗浄効果に限界をきたし、
十分な洗浄効果が得られない場合が生ずる問題点
があつた。 However, the temperature at which cavitation tends to occur in cleaning liquids is often below the boiling point, and when boiling, cavitation is suppressed, limiting the cleaning effect.
There was a problem that a sufficient cleaning effect could not be obtained in some cases.
本考案は、上記問題点に鑑みてなされたもので
あり、その目的はキヤビテーシヨンの発生が良好
に得られ、優れた洗浄効果を発揮できるようにし
た超音波洗浄装置を提供することにある。 The present invention was devised in view of the above-mentioned problems, and its purpose is to provide an ultrasonic cleaning device that can satisfactorily generate cavitation and exhibit excellent cleaning effects.
［課題を解決するための手段］
上記目的を達成するため本考案は、実施例に対
応する添付図面に使用した符号を用いて説明する
と、被洗浄物を浸漬させて洗浄するための脱気さ
れた洗浄液が入れられる少なくとも一つ以上の洗
浄槽１，２と、前記洗浄槽１，２内の前記洗浄液
に超音波を放射する超音波振動子４と、前記超音
波振動子４を作動する発振器とより成る超音波洗
浄装置において、前記洗浄槽１，２内の前記洗浄
液の液面上に、この液面の上方より空気より重い
高密度の洗浄液の蒸気を放射し、前記洗浄液への
気体の混入を防止するための空気遮断層を形成す
るための手段を設けたものである。[Means for Solving the Problems] In order to achieve the above object, the present invention is explained using the reference numerals used in the attached drawings corresponding to the embodiments. at least one cleaning tank 1, 2 into which a cleaning liquid is placed; an ultrasonic vibrator 4 that emits ultrasonic waves to the cleaning liquid in the cleaning tanks 1, 2; and an oscillator that operates the ultrasonic vibrator 4. In an ultrasonic cleaning device, vapor of a high-density cleaning liquid that is heavier than air is emitted from above the liquid level of the cleaning liquid in the cleaning tanks 1 and 2, and gas is introduced into the cleaning liquid. A means is provided for forming an air barrier layer to prevent contamination.
［作用］
この構成によれば、洗浄槽１，２内の前記洗浄
液の液面上には、空気遮断層が液面の上方より放
射する空気より重い高密度の洗浄液の蒸気によつ
て形成され、この空気遮断層によつて洗浄槽１，
２内においての洗浄液への気体の混入を確実に防
止し、脱気状態を保持することができる。[Function] According to this configuration, an air barrier layer is formed on the surface of the cleaning liquid in the cleaning tanks 1 and 2 by the vapor of the high-density cleaning liquid that is heavier than air and radiates from above the liquid surface. , by this air barrier layer, the cleaning tank 1,
It is possible to reliably prevent gas from being mixed into the cleaning liquid in the cleaning solution 2 and maintain a deaerated state.
また、洗浄槽内で洗浄液を沸騰させ、この沸騰
による蒸気で空気遮断層を形成していた従来の超
音波洗浄装置の場合では、温度を沸点に保つ必要
が有つたが、この構成の場合では別の手段によつ
て洗浄槽１，２内の前記洗浄液の液面上に、この
液面の上方より空気より重い高密度の洗浄液の蒸
気を放射し、前記洗浄液への気体の混入を防止す
るための空気遮断層を形成しているので、洗浄液
を沸騰させる必要もない。よつて、洗浄液の温度
を常にキヤビテーシヨンが発生し易い温度に設定
し、洗浄効果が最大限に得られる状態で使用する
ことができる。 In addition, in the case of conventional ultrasonic cleaning equipment in which the cleaning liquid is boiled in the cleaning tank and the steam generated by this boiling forms an air barrier layer, it is necessary to maintain the temperature at the boiling point, but with this configuration, it is necessary to maintain the temperature at the boiling point. By another means, vapor of a high-density cleaning liquid, which is heavier than air, is emitted from above the liquid level of the cleaning liquid in the cleaning tanks 1 and 2 to prevent gas from being mixed into the cleaning liquid. There is no need to boil the cleaning liquid. Therefore, the temperature of the cleaning liquid can always be set at a temperature at which cavitation is likely to occur, and the cleaning liquid can be used in a state where the maximum cleaning effect can be obtained.
［実施例］
以下、本考案の実施例について図面を用いて詳
細に説明する。[Example] Hereinafter, an example of the present invention will be described in detail using the drawings.
第１図は本考案に係る超音波洗浄装置の一実施
例を示す概略構成配置図である。 FIG. 1 is a schematic layout diagram showing an embodiment of an ultrasonic cleaning apparatus according to the present invention.
第１図において、この超音波洗浄装置では、３
つの洗浄槽１，２，３で、多段形の洗浄槽を構成
した例を示している。 In Fig. 1, this ultrasonic cleaning device has 3
An example is shown in which a multi-stage cleaning tank is configured by three cleaning tanks 1, 2, and 3.
このうち、洗浄槽１，２内の底部には、図示せ
ぬ発振器によつて駆動される圧電型の超音波振動
子４がそれぞれ配設されているとともに、上部に
は洗浄槽１，２内で洗浄液の液面上に空気遮断層
を形成するための超音波気化装置５０が配設され
ている。 Among these, a piezoelectric ultrasonic transducer 4 driven by an oscillator (not shown) is disposed at the bottom of each of the cleaning tanks 1 and 2, and a piezoelectric ultrasonic transducer 4 that is driven by an oscillator (not shown) is installed at the top of each of the cleaning tanks 1 and 2. An ultrasonic vaporizer 50 is provided to form an air barrier layer on the surface of the cleaning liquid.
これに対して、洗浄槽３の底部には、ヒーター
５が配管されており、この洗浄槽３は蒸気洗浄槽
として使用される状態になつている。 On the other hand, a heater 5 is piped to the bottom of the cleaning tank 3, so that the cleaning tank 3 is used as a steam cleaning tank.
さらに、各洗浄槽１，２，３の上部には、冷却
管６が周囲に配設された蒸気凝縮部７が、これら
各洗浄槽１，２，３を共通に覆つた状態で設けら
れている。 Further, a steam condensing section 7 around which a cooling pipe 6 is disposed is provided above each cleaning tank 1, 2, 3 so as to commonly cover each cleaning tank 1, 2, 3. There is.
また、洗浄槽１の前部には、オーバーフロー受
け入れ槽８が連設されている。このオーバーフロ
ー槽８は再生回収管９を介して、ヒーター１０を
内蔵させる再生槽１１と連なつてなつており、さ
らに再生槽１１からは他の再生管１２を介して洗
浄槽２の上部に連なつている。 Further, an overflow receiving tank 8 is connected to the front part of the cleaning tank 1. This overflow tank 8 is connected to a regeneration tank 11 containing a heater 10 via a regeneration recovery pipe 9, and the regeneration tank 11 is connected to the upper part of the cleaning tank 2 via another regeneration pipe 12. It's summery.
一方、洗浄槽１，２の外側において、その各底
部には、濾過管１５、ポンプ１６、フイルター１
７、冷却器５５および脱気装置２０ａ，２０ｂが
配設されており、これら濾過管１５、ポンプ１
６、フイルター１７、冷却器５５を介して、各洗
浄槽１，２の底部と上部とがそれぞれ連通された
状態になつている。 On the other hand, on the outside of the cleaning tanks 1 and 2, a filtration tube 15, a pump 16, a filter 1
7, a cooler 55 and deaerators 20a and 20b are installed, and these filter tubes 15 and pump 1
6. The bottom and top of each cleaning tank 1, 2 are in communication with each other via a filter 17 and a cooler 55.
このうち、上記脱気装置２０ａ，２０ｂは、第
２図に示すような構造で形成されている。 Of these, the deaerators 20a and 20b are formed with a structure as shown in FIG.
この脱気装置２０ａ，２０ｂの構造について第
２図を用いてさらに説明すると、まず脱気装置２
０ａ，２０ｂは密閉ケース２１を備え、この密閉
ケース２１の一方側には洗浄液の流入路２２が形
成されているとともに、他方側には洗浄液の流出
路２３が形成されされている。また、流入路２２
と流出路２３の間の洗浄液流路２４内には複数の
バツフル板２５が配設され、このバツフル板２５
で洗浄液通路２４内を洗浄液が千鳥状に流れる状
態にしている。加え、洗浄液流路２４の上部に
は、水等の非溶解性流体２６を洗浄液とは分離し
た状態で層状にして配設している。さらに、洗浄
液の流路２２の近傍の洗浄液流路２４と洗浄液の
流出路２３の近傍の洗浄液流路２４の各々の位置
には、それぞれ熱媒体循環管２７，２８を配し、
密閉ケース２１の底部には任意の発振器に連結す
る脱気用超音波振動子２９を取り付けた構造とな
つている。 The structure of the deaerators 20a and 20b will be further explained using FIG.
0a and 20b are provided with a closed case 21, and one side of this closed case 21 is formed with a cleaning liquid inflow path 22, and the other side is formed with a cleaning liquid outflow path 23. In addition, the inflow path 22
A plurality of baffle plates 25 are arranged in the cleaning liquid flow path 24 between the flow path 23 and the outflow path 23.
The cleaning liquid flows in the cleaning liquid passage 24 in a staggered manner. In addition, a non-dissolving fluid 26 such as water is arranged in a layered manner above the cleaning liquid flow path 24, separated from the cleaning liquid. Further, heating medium circulation pipes 27 and 28 are arranged at respective positions of the cleaning liquid passage 24 near the cleaning liquid passage 22 and the cleaning liquid passage 24 near the cleaning liquid outflow passage 23,
A degassing ultrasonic vibrator 29 connected to an arbitrary oscillator is attached to the bottom of the sealed case 21.
次に、この構造による脱気装置２０ａ，２０ｂ
の動作を説明すると、まず洗浄液は超音波振動し
２９の振動下において矢示３３から３４、すなわ
ち流入路２２から流出路２３へ向かつて洗浄液流
路２４内を流れる。また、洗浄液が洗浄流路２４
内を流れるときに、この洗浄液は熱媒体循環管２
７，２８により加熱される。同時に、超音波振動
子２９の作動で洗浄液中に溶解する気体が気泡と
なり、この気泡が矢示３０に示すように洗浄液中
を上昇する。さらに、この気泡は非溶解性流体２
６の層を透過して矢示３５に示すように密閉ケー
ス２１の最上部３７に達し、この最上部３７に達
した気泡は矢示３６に示すように最上部３７に設
けられた排気口３１から外部に排出されることに
なる。また、気泡が非溶解性流体２６の層を透過
して気泡分離が行われる箇所においては、洗浄液
の液面３２上に、この非溶解性流体２６の層が形
成されているので、洗浄液は密閉ケース２１の最
上部に残存する空気と遮断された状態のまま脱気
される。 Next, deaerators 20a and 20b with this structure
To explain the operation, first, the cleaning liquid is ultrasonically vibrated and flows in the cleaning liquid flow path 24 from arrows 33 to 34, that is, from the inflow path 22 to the outflow path 23 under the vibration 29. In addition, the cleaning liquid flows into the cleaning channel 24.
When flowing through the heat medium circulation pipe 2, this cleaning liquid flows through the heat medium circulation pipe 2.
7, 28. At the same time, gas dissolved in the cleaning liquid becomes bubbles due to the operation of the ultrasonic transducer 29, and these bubbles rise in the cleaning liquid as shown by an arrow 30. Furthermore, this bubble is a non-dissolved fluid 2
The air bubbles pass through the layer 6 and reach the top 37 of the sealed case 21 as shown by the arrow 35, and the air bubbles that reach the top 37 are discharged through the exhaust port 31 provided at the top 37 as shown by the arrow 36. will be discharged to the outside. In addition, at locations where bubbles pass through the layer of non-dissolving fluid 26 and bubble separation is performed, a layer of non-dissolving fluid 26 is formed on the liquid level 32 of the cleaning fluid, so the cleaning fluid is sealed tightly. The air is removed while being cut off from the air remaining at the top of the case 21.
次に、上記超音波気化装置５０は、第３図に示
すように、任意の発振器に接続する圧電型振動子
５２を内蔵させる本体５２を備えている。この本
体５２の一方側には洗浄槽１または２の濾過管１
５より供給される洗浄液の流入口５３が形成され
ているとともに、他方側には洗浄液の流出口５４
が形成されている。そして、各洗浄槽１，２の濾
過管１５における洗浄液の循環系路に冷却器５５
を配設し、脱気されて冷却された洗浄液の一部を
流入口５３より本体５２内に送り、この送られた
洗浄液に上記振動子を作動させて超音波を発射さ
せ、これによつて本体５２内を急減圧させて本体
５２内の洗浄液を蒸発させ、これを流出口５４よ
り放出するものである。 Next, as shown in FIG. 3, the ultrasonic vaporization device 50 includes a main body 52 that houses a piezoelectric vibrator 52 that is connected to an arbitrary oscillator. On one side of this main body 52 is a filtration tube 1 of the cleaning tank 1 or 2.
5 is formed with an inlet 53 for the cleaning liquid supplied from 5, and an outlet 54 for the cleaning liquid is formed on the other side.
is formed. A cooler 55 is installed in the cleaning liquid circulation path in the filtration tube 15 of each cleaning tank 1, 2.
A part of the degassed and cooled cleaning liquid is sent into the main body 52 from the inlet 53, and the sent cleaning liquid is activated to emit ultrasonic waves by activating the above-mentioned vibrator. The interior of the main body 52 is rapidly reduced in pressure to evaporate the cleaning liquid within the main body 52 and discharged from the outlet 54.
したがつて、ここでは各洗浄槽１，２の液面上
には、矢示５７で示すように、空気よりも冷たく
重い高密度の洗浄液の蒸気が放射され、液面上に
この洗浄液の蒸気の層、すなわち空気遮断層が常
時形成されることになる。これによつて、各洗浄
槽１，２の洗浄液面への空気の混入、溶解を防止
できるようになつている。 Therefore, as shown by arrow 57, high-density cleaning liquid vapor that is cooler and heavier than air is radiated onto the liquid surface of each cleaning tank 1 and 2, and the vapor of this cleaning liquid is radiated onto the liquid surface. layer, that is, an air barrier layer is constantly formed. This makes it possible to prevent air from entering or dissolving into the cleaning liquid surface of each cleaning tank 1, 2.
次に、このように構成された超音波洗浄装置に
おける全体の動作について説明する。 Next, the overall operation of the ultrasonic cleaning apparatus configured as described above will be explained.
この多段式超音波洗浄槽として構成された部分
では、各洗浄槽１，２，３内に既に脱気された洗
浄液が入れられる。 In this portion configured as a multi-stage ultrasonic cleaning tank, cleaning liquid that has already been degassed is placed in each of the cleaning tanks 1, 2, and 3.
そして、被洗浄物（以下、「ワーク」と言う）
を洗浄する場合、まず洗浄槽１に図示せぬ手段を
介してワークを投入し、そこで超音波振動子４を
作動させて洗浄する。 And the object to be cleaned (hereinafter referred to as "work")
When cleaning a workpiece, a workpiece is first put into the cleaning tank 1 via means not shown, and then the ultrasonic vibrator 4 is activated to clean it.
その後、再び取り出し、この取り出したワーク
を洗浄槽２の洗浄液中に投入する。ここで２段目
の超音波洗浄を行い、再びワークを取り出す。 Thereafter, the workpiece is taken out again, and the workpiece is put into the cleaning liquid in the cleaning tank 2. Here, a second stage of ultrasonic cleaning is performed and the workpiece is taken out again.
次いで、３段目の蒸気洗浄槽３に投入し、そこ
で蒸気洗浄する。 Next, it is put into the third stage steam cleaning tank 3 and steam cleaned there.
なお、このとき各洗浄槽１，２内の洗浄液は、
濾過管１５を介してポンプ１６により循環され、
その途中ではフイルター１７により洗浄液中の異
物（ゴミ、付着物、油）等を除去する状態になつ
ている。 In addition, at this time, the cleaning liquid in each cleaning tank 1, 2 is
It is circulated by a pump 16 through a filtration tube 15,
During this process, a filter 17 removes foreign substances (dust, deposits, oil) from the cleaning liquid.
また、洗浄槽１でオーバーフローした洗浄液は
オーバーフロー受入れ槽８に入り、さらに再生管
９を介して再生槽１１に導入される。そして、こ
の再生槽１１内において、洗浄槽２内の洗浄液だ
けが洗浄槽１内の洗浄液と分離され、この分離後
の洗浄液のみが洗浄槽２に回収される。 Further, the cleaning liquid overflowing from the cleaning tank 1 enters the overflow receiving tank 8 and is further introduced into the regeneration tank 11 via the regeneration pipe 9. In this regeneration tank 11, only the cleaning liquid in the cleaning tank 2 is separated from the cleaning liquid in the cleaning tank 1, and only the cleaning liquid after this separation is collected into the cleaning tank 2.
この各洗浄液の分離は、洗浄槽１内の洗浄液と
洗浄槽２内の洗浄液との沸点が異なることを利用
して、ヒーター１０により加温して沸点分離を行
つているもので、この沸点分離技術自体は従来よ
り広く知られているものである。すなわち、再生
槽１１では、この再生槽１１内の洗浄液がヒータ
ー１０により加温されると、矢示１８に示すとお
り蒸発し、その後冷却される。 This separation of each cleaning liquid takes advantage of the fact that the cleaning liquids in cleaning tank 1 and cleaning tank 2 have different boiling points, and is heated by heater 10 to perform boiling point separation. The technology itself has been widely known. That is, in the regeneration tank 11, when the cleaning liquid in the regeneration tank 11 is heated by the heater 10, it evaporates as shown by the arrow 18, and is then cooled.
また、この再生槽１１内で冷却されて凝縮され
た再生洗浄液は、上記脱気装置２０ａ，２０ｂと
同じ構造の第３の脱気装置、すなわち再生槽１１
と洗浄槽２との間の再生管１２の途中に設けられ
た脱気装置２０ｃへ送られる。そして、この脱気
装置２０ｃで脱気され、再生管１２を介して再び
洗浄槽２へ戻される。 Further, the regenerated cleaning liquid cooled and condensed in the regeneration tank 11 is transferred to a third deaerator having the same structure as the deaerators 20a and 20b, that is, the regeneration tank 11.
It is sent to a deaerator 20c provided in the middle of the regeneration pipe 12 between the cleaning tank 2 and the cleaning tank 2. Then, it is degassed by this deaerator 20c and returned to the cleaning tank 2 via the regeneration pipe 12.
一方、脱気装置２０ｃで脱気された気体は、矢
示１９に示すように、洗浄槽１，２，３，の上部
に配されている冷却凝縮部７に送られる。そし
て、脱気された気体と共に蒸発した洗浄液を凝縮
して再度洗浄槽１あるいは２に戻すために、矢示
１３に示すように再び先の第３の脱気装置２０ｃ
に返される。 On the other hand, the gas degassed by the deaerator 20c is sent to the cooling condensing section 7 disposed above the cleaning tanks 1, 2, and 3, as shown by an arrow 19. Then, in order to condense the cleaning liquid that evaporated together with the degassed gas and return it to the cleaning tank 1 or 2 again, the third deaerator 20c is operated again as shown by the arrow 13.
will be returned to.
また、この第３の脱気装置２０ｃに返された洗
浄液は、この第３の脱気装置２０ｃ内で再び脱気
され、再生管１２を介して洗浄槽２へ戻される。 Further, the cleaning liquid returned to the third deaerator 20c is degassed again within the third deaerator 20c, and is returned to the cleaning tank 2 via the regeneration pipe 12.
加えて、超音波気化装置５０からは、常に各洗
浄槽１，２の液面上に、矢示５７で示すように、
空気より冷たく重い高密度の洗浄液の蒸気が放射
されている。そして、この蒸気により液面上にこ
の洗浄液の蒸気の層、すなわち空気遮断層が常時
形成され、各洗浄槽１，２の洗浄液面への空気の
混入、溶解を防止している。 In addition, from the ultrasonic vaporization device 50, as shown by an arrow 57,
Dense cleaning fluid vapor that is cooler and heavier than air is emitted. A layer of vapor of the cleaning liquid, that is, an air barrier layer, is constantly formed on the liquid surface by this vapor, and prevents air from entering or dissolving into the cleaning liquid surface of each cleaning tank 1, 2.
したがつて、この実施例による超音波洗浄装置
によれば、洗浄槽内で洗浄液を沸騰させ、この沸
騰による蒸気で空気遮断層を形成していた従来の
超音波洗浄装置の場合では、温度を沸点に保つ必
要が有つたが、この実施例による構成の場合では
別の手段、すなわち超音波気化装置５０によつて
洗浄槽１，２内の前記洗浄液の液面上に、この液
面の上方より空気より重い高密度の洗浄液の蒸気
を放射し、前記洗浄液への気体の混入を防止する
ための空気遮断層を形成しているので、洗浄液を
沸騰させる必要もない。よつて、一度脱気した洗
浄液の脱気状態を保持できるとともに、洗浄液の
温度を常にキヤビテーシヨンが発生し易い温度に
設定し、洗浄効果が最大限に得られる状態で使用
することができる。 Therefore, according to the ultrasonic cleaning apparatus according to this embodiment, the temperature is lowered than in the case of the conventional ultrasonic cleaning apparatus, which boils the cleaning liquid in the cleaning tank and forms an air barrier layer with the steam generated by the boiling. However, in the case of the configuration according to this embodiment, the liquid level of the cleaning liquid in the cleaning tanks 1 and 2 is heated above the liquid level using another means, that is, the ultrasonic vaporizer 50. There is no need to boil the cleaning liquid because the vapor of the high-density cleaning liquid, which is heavier than air, is emitted to form an air barrier layer to prevent gas from being mixed into the cleaning liquid. Therefore, it is possible to maintain the deaerated state of the cleaning liquid once degassed, and the temperature of the cleaning liquid can always be set at a temperature at which cavitation is likely to occur, so that the cleaning liquid can be used in a state where the maximum cleaning effect can be obtained.
なお、本出願人の実験によれば、上記洗浄液と
してはフロン113が望ましく、このフロン113の洗
浄液は液面で空気と接触していると、その脱気速
度より空気のフロン113洗浄液への溶解速度の方
がはるかに速く、通常気泡の溶解度が飽和状態に
あるので空気遮断手段を適用しないと本考案は理
想的に実施する条件が整わないところであるが、
上記条件によればこれが確保されることが同じく
実験によつて確認されている。 According to the applicant's experiments, Freon 113 is preferable as the above-mentioned cleaning liquid, and when this Freon 113 cleaning liquid comes into contact with air at the liquid level, the dissolution of air into the Freon 113 cleaning liquid increases due to the degassing rate. Since the speed is much faster and the solubility of bubbles is usually saturated, the present invention cannot ideally be carried out unless an air blocking means is applied.
It has also been confirmed through experiments that this is ensured under the above conditions.
さらには、フロン113以外にも洗浄液の種類と
しては以下に列挙するものが可能であると考えら
れる。すなわち、フロン113、フロン112、イソプ
ロピルアルコール（IPA）エタノール、塩化メチ
レン、トリクレン、パークロルエチレン、111ト
リクロールエタン、およびそれらの共沸物、そし
て水等でも良いものである。 Furthermore, in addition to Freon 113, the following types of cleaning liquids are considered possible. That is, Freon 113, Freon 112, isopropyl alcohol (IPA) ethanol, methylene chloride, trichlorethylene, perchlorethylene, 111 trichloroethane, azeotropes thereof, water, and the like may be used.
また、本出願人は、上記多種の洗浄液の中から
フロン113を用いて、いくつかの実験を行つてみ
た。この実験は、脱気しない状態下で１週間のア
ルミ箔のエロージヨンテストを実施したものであ
るが、従来の方法ではアルミ箔の表面には１週間
経過してもほとんど変化が認められなかつた。こ
れに対して、本考案を適用し、空気遮断下でフロ
ン113洗浄液を脱気し、同様にアルミ箔のエロー
ジヨンテストを行つたところ、実験開始後わずか
30秒程でアルミ箔の表面がボロボロに成ると言う
結果を得ることができた。すなわち、従来技術に
おける超音波洗浄装置による実験では、洗浄槽の
洗浄液面に振動子の作動に伴い無数の気泡が上昇
し、一見いかにもキヤビテーシヨン発生が良好な
状態であるように認められるが、その実は洗浄液
中の残存気体、気泡によるエアレーシヨン効果が
キヤビテーシヨン効果と誤つて認められているに
過ぎないものである。よつて、エアレーシヨン効
果はキヤビテーシヨン効果と異なり、超音波によ
る高圧に圧縮された気泡の破壊時の高圧エネルギ
ーをもつて洗浄物の汚れを取り除くものでなく、
キヤビテーシヨン効果の強い洗浄力に比して極め
て弱いものであるためであると言つた認識が得ら
れた。 The applicant also conducted several experiments using Freon 113 from among the various cleaning solutions mentioned above. In this experiment, an erosion test was conducted on aluminum foil for one week without degassing, but with the conventional method, almost no change was observed on the surface of the aluminum foil even after one week had passed. . On the other hand, when we applied the present invention and deaerated the Freon 113 cleaning solution under air exclusion and conducted a similar erosion test on aluminum foil, we found that after the start of the experiment, there was a slight
The results showed that the surface of the aluminum foil became crumbly in about 30 seconds. In other words, in experiments using conventional ultrasonic cleaning equipment, countless bubbles rise to the surface of the cleaning liquid in the cleaning tank as the vibrator operates, and at first glance it appears that cavitation is in good condition, but the truth is that The aeration effect due to residual gas and bubbles in the cleaning liquid is simply mistakenly recognized as the cavitation effect. Therefore, the aeration effect differs from the cavitation effect in that it does not use the high-pressure energy generated when air bubbles compressed under high pressure are destroyed by ultrasonic waves to remove dirt from the washed object.
It was recognized that this is because the cleaning power is extremely weak compared to the strong cavitation effect.
なお、本考案に係る超音波洗浄装置では、上記
実施例により説明したが、勿論この実施例の構造
に限定されるものではなく、脱気装置２０ａ，２
０ｂ，２０ｃ等は例えば第４図に一変形例として
示すような構造にしても差し支えないものであ
る。 Although the ultrasonic cleaning device according to the present invention has been explained using the above embodiment, it is of course not limited to the structure of this embodiment, and the structure of the deaerators 20a, 2
0b, 20c, etc. may have a structure as shown as a modified example in FIG. 4, for example.
すなわち、第４図に示す脱気装置２０ａ，２０
ｂ，２０ｃの構造を示すものである。 That is, the deaerators 20a, 20 shown in FIG.
b, shows the structure of 20c.
第４図の脱気装置２０ａ，２０ｂ，２０ｃの構
造は、第２図に示した実施例の脱気装置の場合と
同様に、密閉ケース４０を備え、この密閉ケース
４０における洗浄液の流入口４１と流出口４２の
間にはテフロン等の気液分離膜より成る細管の束
４３が連結されている。さらに、密閉ケース４０
の内部４４は周知の真空ポンプにより常時真空に
保されている。 The structure of the deaerators 20a, 20b, and 20c in FIG. 4 is similar to that of the deaerator in the embodiment shown in FIG. A bundle 43 of thin tubes made of a gas-liquid separation membrane such as Teflon is connected between the outlet 42 and the outlet 42 . Furthermore, sealed case 40
The interior 44 of is kept under vacuum at all times by a well-known vacuum pump.
そして、この脱気装置では、洗浄液が流入口４
１より導入されて密閉ケース４０内を矢示４５に
示すように流れる。また、これが矢示４６に示す
ように流出口４２より流出される課程において、
細管の束４３の外周における減圧によつて洗浄液
に溶解せる気泡が矢示４５に示すように気体のみ
通す分離膜より矢示４７に示すように外部へ吸引
され、排気口４８より外部に排出されて、気泡が
除去された洗浄液のみが回収されることになる。 In this deaerator, the cleaning liquid flows through the inlet 4.
1 and flows inside the closed case 40 as shown by an arrow 45. Also, in the process of flowing out from the outlet 42 as shown by the arrow 46,
Air bubbles dissolved in the cleaning liquid due to the reduced pressure around the outer periphery of the bundle of thin tubes 43 are drawn to the outside as shown by the arrow 47 through the separation membrane that allows only gas to pass through, as shown by the arrow 45, and are discharged to the outside from the exhaust port 48. As a result, only the cleaning liquid from which air bubbles have been removed is recovered.
［考案の効果］
以上説明したとおり、本考案に係る超音波洗浄
装置によれば、洗浄槽１，２内の前記洗浄液の液
面上に形成する空気遮断層は、液面の上方より放
射される空気より重い高密度の洗浄液の蒸気によ
つて形成され、この空気遮断層によつて洗浄槽
１，２内においての洗浄液への気体の混入を確実
に防止し、脱気状態を保持することができる。[Effects of the invention] As explained above, according to the ultrasonic cleaning device according to the invention, the air barrier layer formed on the surface of the cleaning liquid in the cleaning tanks 1 and 2 is capable of absorbing radiation from above the liquid surface. This air barrier layer reliably prevents the mixing of gas into the cleaning liquid in the cleaning tanks 1 and 2 and maintains a degassed state. I can do it.
また、洗浄槽内で洗浄液を沸騰させ、この沸騰
による蒸気で空気遮断層を形成していた従来の超
音波洗浄装置の場合では、温度を沸点に保つ必要
が有つたが、この構成の場合では別の手段によつ
て洗浄槽１，２内の前記洗浄液の液面上に、この
液面の上方より空気より重い高密度の洗浄液の蒸
気を放射し、前記洗浄液への気体の混入を防止す
るための空気遮断層を形成しているので、洗浄液
を沸騰させる必要もない。よつて、洗浄液の温度
を常にキヤビテーシヨンが発生し易い温度に設定
し、洗浄効果が最大限に得られる状態で使用する
ことができる。 In addition, in the case of conventional ultrasonic cleaning equipment in which the cleaning liquid is boiled in the cleaning tank and the steam generated by this boiling forms an air barrier layer, it is necessary to maintain the temperature at the boiling point, but with this configuration, it is necessary to maintain the temperature at the boiling point. By another means, vapor of a high-density cleaning liquid, which is heavier than air, is emitted from above the liquid level of the cleaning liquid in the cleaning tanks 1 and 2 to prevent gas from being mixed into the cleaning liquid. There is no need to boil the cleaning liquid. Therefore, the temperature of the cleaning liquid can always be set at a temperature at which cavitation is likely to occur, and the cleaning liquid can be used in a state where the maximum cleaning effect can be obtained.
第１図は本考案を適用した超音波洗浄装置の概
略構成配置図、第２図は同上超音波洗浄装置に適
用される脱気装置の一例を示す断面図、第３図は
同上超音波洗浄装置に適用される空気遮断用の蒸
気を作るための液体気化装置の一例を示す断面
図、第４図は同上超音波洗浄装置に適用される脱
気装置の変形例を示す断面図である。
１……洗浄槽、２……洗浄槽、３……洗浄槽、
４……洗浄用超音波振動子、２０ａ……脱気槽、
２０ｂ……脱気槽、２０ｃ……脱気装置、５０…
…超音波気化装置（空気遮断層を形成する手段）。
Fig. 1 is a schematic configuration diagram of an ultrasonic cleaning device to which the present invention is applied, Fig. 2 is a sectional view showing an example of a degassing device applied to the ultrasonic cleaning device as above, and Fig. 3 is an ultrasonic cleaning device as above. FIG. 4 is a cross-sectional view showing an example of a liquid vaporization device for producing air-blocking vapor applied to the device, and FIG. 4 is a cross-sectional view showing a modified example of the deaerator applied to the ultrasonic cleaning device. 1...Cleaning tank, 2...Cleaning tank, 3...Cleaning tank,
4... Ultrasonic vibrator for cleaning, 20a... Deaeration tank,
20b...deaeration tank, 20c...deaeration device, 50...
...Ultrasonic vaporizer (means for forming an air barrier layer).
Claims (1)
た洗浄液が入れられる少なくとも一つ以上の洗浄
槽１，２と、前記洗浄槽１，２内の前記洗浄液に
超音波を放射する超音波振動子４と、前記超音波
振動子４を作動する発振器とより成る超音波洗浄
装置において、 前記洗浄槽１，２内の前記洗浄液の液面上に、
この液面の上方より空気より重い高密度の洗浄液
の蒸気を放射し、前記洗浄液への気体の混入を防
止するための空気遮断層を形成するための手段を
設けたことを特徴とする超音波洗浄装置。[Claims for Utility Model Registration] At least one or more cleaning tanks 1 and 2 into which deaerated cleaning liquid is placed for immersing and cleaning objects to be cleaned, and the cleaning liquid in the cleaning tanks 1 and 2. In an ultrasonic cleaning device comprising an ultrasonic vibrator 4 that emits ultrasonic waves and an oscillator that operates the ultrasonic vibrator 4, on the surface of the cleaning liquid in the cleaning tanks 1 and 2,
Ultrasonic waves characterized by being provided with means for emitting high-density cleaning liquid vapor that is heavier than air from above the liquid level and forming an air barrier layer for preventing gas from being mixed into the cleaning liquid. cleaning equipment.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986197207U JPH0425273Y2 (en) | 1986-12-22 | 1986-12-22 | |
| US07/130,552 US4907611A (en) | 1986-12-22 | 1987-12-09 | Ultrasonic washing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986197207U JPH0425273Y2 (en) | 1986-12-22 | 1986-12-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63103786U JPS63103786U (en) | 1988-07-05 |
| JPH0425273Y2 true JPH0425273Y2 (en) | 1992-06-16 |
Family
ID=31156721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986197207U Expired JPH0425273Y2 (en) | 1986-12-22 | 1986-12-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0425273Y2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2512342Y2 (en) * | 1990-05-11 | 1996-10-02 | 佳英 柴野 | Ultrasonic cleaning and deburring equipment |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5339661A (en) * | 1976-09-22 | 1978-04-11 | Westinghouse Electric Corp | Supersonic wave purifier |
| JPS55121806A (en) * | 1979-03-13 | 1980-09-19 | Jeol Ltd | Deaerator |
| JPS6082107A (en) * | 1983-10-11 | 1985-05-10 | Science & Tech Agency | Centrifugal gas-liquid separator using porous membrane tube |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5333419Y2 (en) * | 1973-11-26 | 1978-08-17 |
-
1986
- 1986-12-22 JP JP1986197207U patent/JPH0425273Y2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5339661A (en) * | 1976-09-22 | 1978-04-11 | Westinghouse Electric Corp | Supersonic wave purifier |
| JPS55121806A (en) * | 1979-03-13 | 1980-09-19 | Jeol Ltd | Deaerator |
| JPS6082107A (en) * | 1983-10-11 | 1985-05-10 | Science & Tech Agency | Centrifugal gas-liquid separator using porous membrane tube |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63103786U (en) | 1988-07-05 |
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