JPH0424797B2 - - Google Patents
Info
- Publication number
- JPH0424797B2 JPH0424797B2 JP56169409A JP16940981A JPH0424797B2 JP H0424797 B2 JPH0424797 B2 JP H0424797B2 JP 56169409 A JP56169409 A JP 56169409A JP 16940981 A JP16940981 A JP 16940981A JP H0424797 B2 JPH0424797 B2 JP H0424797B2
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- memory cell
- drain
- random access
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000015654 memory Effects 0.000 claims description 50
- 239000003990 capacitor Substances 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 28
- 239000004065 semiconductor Substances 0.000 claims description 23
- 230000005669 field effect Effects 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 43
- 238000003860 storage Methods 0.000 description 13
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 8
- 239000002019 doping agent Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010893 electron trap Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/403—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
- G11C11/404—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Memories (AREA)
- Dram (AREA)
- Non-Volatile Memory (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/200,997 US4423490A (en) | 1980-10-27 | 1980-10-27 | JFET Dynamic memory |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57123593A JPS57123593A (en) | 1982-08-02 |
| JPH0424797B2 true JPH0424797B2 (enExample) | 1992-04-28 |
Family
ID=22744053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56169409A Granted JPS57123593A (en) | 1980-10-27 | 1981-10-22 | Jfet dynamic memory |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4423490A (enExample) |
| EP (1) | EP0050772A3 (enExample) |
| JP (1) | JPS57123593A (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4542481A (en) * | 1983-01-31 | 1985-09-17 | International Business Machines Corporation | One-device random access memory cell having enhanced capacitance |
| JPH04218959A (ja) * | 1990-10-18 | 1992-08-10 | Mitsubishi Electric Corp | 半導体装置およびその制御方法 |
| JPH04188869A (ja) * | 1990-11-22 | 1992-07-07 | Mitsubishi Electric Corp | 接合型電界効果トランジスタとキャパシタとを含む半導体記憶装置およびその製造方法 |
| KR940002835B1 (ko) * | 1991-04-17 | 1994-04-04 | 재단법인 한국전자통신연구소 | 접합전계형 다이내믹 램을 제조하는 방법 및 그 다이내믹 램의 구조 |
| JPH0637269A (ja) * | 1992-07-17 | 1994-02-10 | Mitsubishi Electric Corp | 接合型電界効果トランジスタ、その接合型電界効果トランジスタを含む半導体記憶装置およびそれらの製造方法 |
| JP3922653B2 (ja) * | 1993-03-17 | 2007-05-30 | ゲイトフィールド・コーポレイション | ランダムアクセスメモリ(ram)ベースのコンフィギュラブルアレイ |
| US7670888B2 (en) * | 2007-04-11 | 2010-03-02 | Texas Instruments Incorporated | Low noise JFET |
| US7692220B2 (en) | 2007-05-01 | 2010-04-06 | Suvolta, Inc. | Semiconductor device storage cell structure, method of operation, and method of manufacture |
| US8035139B2 (en) | 2007-09-02 | 2011-10-11 | Suvolta, Inc. | Dynamic random access memory having junction field effect transistor cell access device |
| US8278691B2 (en) | 2008-12-11 | 2012-10-02 | Micron Technology, Inc. | Low power memory device with JFET device structures |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3387286A (en) * | 1967-07-14 | 1968-06-04 | Ibm | Field-effect transistor memory |
| JPS5142903B1 (enExample) * | 1970-02-12 | 1976-11-18 | ||
| US3740731A (en) * | 1971-08-02 | 1973-06-19 | Texas Instruments Inc | One transistor dynamic memory cell |
| US3986180A (en) * | 1975-09-22 | 1976-10-12 | International Business Machines Corporation | Depletion mode field effect transistor memory system |
| NL7700879A (nl) * | 1977-01-28 | 1978-08-01 | Philips Nv | Halfgeleiderinrichting. |
| CA1118892A (en) * | 1977-12-27 | 1982-02-23 | John R. Edwards | Semiconductor device utilizing memory cells with sidewall charge storage regions |
| US4319342A (en) * | 1979-12-26 | 1982-03-09 | International Business Machines Corporation | One device field effect transistor (FET) AC stable random access memory (RAM) array |
-
1980
- 1980-10-27 US US06/200,997 patent/US4423490A/en not_active Expired - Lifetime
-
1981
- 1981-10-10 EP EP81108170A patent/EP0050772A3/en not_active Ceased
- 1981-10-22 JP JP56169409A patent/JPS57123593A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| US4423490A (en) | 1983-12-27 |
| JPS57123593A (en) | 1982-08-02 |
| EP0050772A3 (en) | 1984-04-25 |
| EP0050772A2 (en) | 1982-05-05 |
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