JPH04245606A - Soft magnetic multilayered film - Google Patents

Abstract

PURPOSE:To increase saturation magnetic flux density, by alternately laminating first soft magnetic thin films and second soft magnetic tin films, which first films have a specified atomic percentage composition and relative intensity ratio higher than or equal to a specified value, and which second films contain one or more kinds out of Fe, Co and Ni. CONSTITUTION:A first soft magnetic thin film 41 has the atomic percentage composition expressed by a formula. In X-ray diffraction, the relative intensity ratio of Fe(110) peak to Fe(200) peak is larger than or equal to 1/3. A second soft magnetic thin film 43 contains one or more kinds selected out of Fe, Co and Ni. The first soft magnetic thin films 41 and the second magnetic thin films 43 are alternately laminated. Since the first soft magnetic thin film 41 is a Fe-Ni based film, the saturation magnetic flux density is very high, and the coercive force is low. By adding suitable amount of specified elements to Fe and N, a soft magnetic thin film of (100) orientation or intense orientation can be formed on any substrates.

Description

[Detailed description of the invention]

0001

[Industrial Application Field] The present invention provides a first soft magnetic thin film;
The present invention relates to a soft magnetic multilayer film in which second soft magnetic thin films are alternately laminated.

0002

2. Description of the Related Art A MIG type magnetic head is known which has a soft magnetic thin film such as Sendust, which has a higher saturation magnetic flux density Bs than the core, on the opposing surface of at least one gap between a first core and a second core made of ferrite. It is being In this magnetic head, strong magnetic flux can be applied to the magnetic recording medium from the soft magnetic thin film, so that effective recording can be performed on a medium having a high coercive force.

[0003]Furthermore, floating type thin film magnetic heads, which have various excellent characteristics such as being capable of high-density recording and high-speed data transfer, have been put into practical use. In order to generate high-density magnetic flux even in a thin-film magnetic head, a soft magnetic thin film such as permalloy or sendust having a high saturation magnetic flux density Bs is used for the upper and lower magnetic pole layers.

By the way, the saturation magnetic flux density Bs of such a soft magnetic thin film used in a magnetic head is at most 12,000
It is about G. For this reason, conventional magnetic heads have insufficient electromagnetic conversion characteristics such as overwrite characteristics, and particularly in the case of magnetic recording media having high coercive force, an even higher saturation magnetic flux density Bs is required.

[0005] Furthermore, Fe-based soft magnetic thin films with strong (100) orientation are known to have excellent soft magnetic properties because of their small crystal magnetic anisotropy. However, even if a Fe-based soft magnetic thin film is deposited by a general vapor phase method such as sputtering, the (100) orientation cannot be strengthened, and the (110)
Planar oriented or non-oriented thin films can be produced. Therefore, (100)
In order to form a film with strong orientation, it is necessary to use a substrate made of a specific material, such as ZnSe, or to form a film with (100) orientation or (
100) A single crystal substrate of GaAs or the like with strong orientation must be used.

[0006] In this way, a film with strong (100) orientation is
Since this can only be achieved under limited conditions, it is extremely difficult to make the soft magnetic thin film of a magnetic head have (100) orientation or strong (100) orientation.

By the way, when Fe is targeted, Ar and N
By sputtering in a mixed gas of 2 to 2, it is possible to obtain a Fe--N soft magnetic thin film with a saturation magnetic flux density Bs even higher than that of Sendust. This is because by mixing N, the crystal grains of Fe are made finer and the magnetic anisotropic dispersion is reduced.

For example, Japanese Patent Application Laid-open No. 15907/1983 discloses that Fe is the main component and Fe4N and/or Fe3
A soft magnetic thin film containing iron nitride consisting of N is disclosed. This soft magnetic thin film has a saturation magnetic flux density of 15
000G or more, has a low coercive force Hc, and has magnetic properties suitable for use in the magnetic head.

However, the Fe-N soft magnetic thin film has low heat resistance, and the crystal grain size increases at a temperature of about 350° C., resulting in a sudden increase in coercive force Hc.

[0010] Therefore, by heat treatment such as glass welding, 4
It is difficult to use it for MIG type magnetic heads and EDG type magnetic heads that are exposed to temperatures of about 50 to 700 degrees Celsius, as well as thin film magnetic heads that are exposed to temperatures of about 350 degrees Celsius or higher during film formation processes such as sputtering. It is. In addition,
This soft magnetic thin film cannot be made to have a strong (100) orientation simply by forming the film on a normal substrate using a vapor phase method such as sputtering.

[0011] Also, a soft magnetic multilayer film in which two types of soft magnetic thin films are alternately laminated is known, but as mentioned above, (1
It is difficult to form a soft magnetic thin film with a strong (00) orientation or (100) orientation, and it is difficult to form a soft magnetic thin film with a strong (100) orientation or (100) orientation, and a second soft magnetic thin film with a strong (100) orientation or (100) orientation. A soft magnetic multilayer film in which layers are alternately laminated has not yet been realized.

0012

SUMMARY OF THE INVENTION The main object of the present invention is to provide a soft magnetic multilayer film having a high saturation magnetic flux density Bs and excellent soft magnetic properties.

[0013]

[Means for Solving the Problems] Such objects are achieved by the present invention as described in (1) to (6) below.

(1) A first soft material having an atomic ratio composition represented by the following formula, and in which the relative intensity ratio of the Fe(200) peak to the Fe(110) peak is 1/3 or more in X-ray diffraction. A soft magnetic multilayer film characterized in that magnetic thin films and second soft magnetic thin films containing one or more selected from Fe, Co, and Ni are alternately laminated. Formula Fe100-x-y-z Mx Niy N
z (In the above formula, M is Mg, Ca, Ti, Zr, H
One or more selected from f, V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1≦x≦15, 0≦y
≦10, 0.1≦z≦15. )

(2) A first soft magnetic thin film having an atomic composition represented by the following formula and having Fe(200) plane orientation in electron beam diffraction, and one or more selected from Fe, Co, and Ni. 1. A soft magnetic multilayer film, characterized in that a second soft magnetic thin film containing: is alternately laminated. Formula Fe100-x-y-z Mx Niy N
z (In the above formula, M is Mg, Ca, Ti, Zr, H
One or more selected from f, V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1≦x≦15, 0≦y
≦10, 0.1≦z≦15. )

(3) A first soft magnetic thin film having an atomic composition represented by the following formula and a second soft magnetic thin film containing one or more selected from Fe, Co and Ni are alternately laminated. A soft magnetic multilayer film characterized by: Formula Fe100-x-y-z Mx Niy N
z (In the above formula, M is Mg, Ca, Ti, Zr, H
One or more selected from f, V, Nb, Ta, Cr, Mo, W, Mn and B, 8≦x≦14, 0≦y≦1
0, 2≦z≦4. )

(4) The soft magnetic material according to any one of (1) to (3) above, wherein the saturation magnetic flux density of the second soft magnetic thin film is higher than the saturation magnetic flux density of the first soft magnetic thin film. Multilayer film.

(5) The soft magnetic multilayer film according to any one of (1) to (4) above, wherein the second soft magnetic thin film has a thickness of 0.1 μm or less.

(6) In the above (1), a non-magnetic thin film is provided between the first soft magnetic thin film and the second soft magnetic thin film.
) to (5), the soft magnetic multilayer film according to any one of (5).

[0020]

[Operation] As shown in FIG. 1, the soft magnetic multilayer film of the present invention is constructed by alternately laminating a predetermined first soft magnetic thin film 41 and a second soft magnetic thin film 43.

In this case, since the first soft magnetic thin film 41 used in the present invention is Fe-N based, the saturation magnetic flux density Bs
is very high, and the coercive force Hc is low.

By adding appropriate amounts of predetermined elements to Fe and N, a soft magnetic thin film with (100) orientation or a strong degree of orientation can be formed on any substrate. Therefore, the soft magnetic properties are significantly improved.

In addition, this additive element forms a nitride that is more stable than Fe, so the saturation magnetic flux density Bs is about 1400.
Heat resistance and corrosion resistance are significantly improved at 0G or higher, especially at 16,000G or higher.

Here, if the temperature at which the coercive force rapidly changes due to heat treatment, for example, the heat treatment temperature at which the coercive force Hc becomes 20e, is defined as the heat-resistant temperature, then the heat-resistant temperature of the first soft magnetic thin film 41 used in the present invention is 500. ℃ or more, and sufficient heat resistance can be obtained even if the film is made thin and laminated.

Furthermore, for the second soft magnetic thin film 43, a film having a higher saturation magnetic flux density Bs than the first soft magnetic thin film 41 is used. In this case, even if the composition has a high Bs that does not exhibit sufficient soft magnetism in a single layer film, the growth of crystal grains in the film can be suppressed by making the film thin and laminating the film through the first soft magnetic thin film 41. and sufficient soft magnetism can be obtained.

Therefore, the first soft magnetic thin film 41 and the second
By alternately laminating the soft magnetic thin films 43 of
The saturation magnetic flux density Bs is selectively improved by the second soft magnetic thin film 43 while maintaining the soft magnetic properties of the soft magnetic thin film 41.

Therefore, the soft magnetic multilayer film of the present invention has excellent soft magnetic properties such as a high saturation magnetic flux density Bs, a low coercive force Hc, and a high magnetic permeability μ.

Therefore, the magnetic head using the soft magnetic multilayer film of the present invention has excellent overwrite characteristics and recording/recording characteristics.
It has high playback sensitivity and excellent electromagnetic conversion characteristics.

In addition, since the soft magnetic multilayer film of the present invention has excellent corrosion resistance and wear resistance, a highly reliable magnetic head can be realized.

[0030]

[Specific Structure] The specific structure of the present invention will be explained in detail below.

A preferred example of a soft magnetic multilayer film particularly suitable for a magnetic head of the present invention is shown in FIG.

The soft magnetic multilayer film 4 includes a first soft magnetic thin film 41
and a second soft magnetic thin film 43 are alternately laminated and formed on a base body 45.

The first soft magnetic thin film 41 has an atomic composition expressed by the following formula.

Formula Fe100-x-y-z Mx N
iy Nz In the above formula, M is Mg, Ca, Ti, Z
One or more types selected from r, Hf, V, Nb, Ta, Cr, Mo, W, Mn and B.

Elements other than these, such as Ru, lower the saturation magnetic flux density Bs and lower the soft magnetic properties.

Among these, Zr alone or V alone, especially Zr
Alone or 20% of Zr and/or V in M
It is preferable to combine this with elements other than Zr and V among the above.

[0037] Also, x is 0.1 to 15. In this case, the upper limit of x is preferably 14. If it is less than the above range, heat resistance will be insufficient. Therefore, the coercive force Hc tends to increase significantly due to heat treatment or the like. When the above range is exceeded, the saturation magnetic flux density Bs decreases. Therefore, when applied to a magnetic head, overwrite characteristics tend to deteriorate.

In order to obtain a soft magnetic thin film with a strong (100) orientation or degree of orientation, x should be 2.5 or more, particularly 3 or more, further 5 or more, more preferably 7 or more, and most preferably 8 or more. It is preferable that

When x is within the above range, the soft magnetic properties are significantly improved. Moreover, heat resistance is improved.

[0040] y is from 0 to 10, preferably from 0 to 5. By adding Ni, the magnetic permeability μ can be improved. However, if the above range is exceeded, the saturation magnetic flux density Bs
is on the decline. Note that when Ni is included as an essential component, the content y is preferably 1 to 10, more preferably 1 to 5.

[0041] z is 0.1 to 15.

[0042] Below the above range, grain refinement by N is insufficient and soft magnetic properties tend not to be obtained. If the above range is exceeded, nitrides of Fe, Ni, and M are produced in excess of the necessary amount, so that soft magnetic properties tend not to be obtained. In this case, the lower limit of z is preferably 1, especially 2, and the upper limit of z is 10, especially 5, even 4.
5, especially 4 is preferred. In such a range, the (100) orientation becomes even more preferable.

[0043] If necessary, in addition to nitrogen, oxygen may be contained in an amount of 5 at% or less based on the total amount.

The composition of the first soft magnetic thin film 41 constituting the present invention is, for example, Electron Pro
What is necessary is just to measure by the micro analysis (EPMA) method.

The thickness of the first soft magnetic thin film 41 may be appropriately selected depending on the application, but is usually 0.01 to 10 μm.
That's about it.

To form the first soft magnetic thin film 41 used in the present invention, various vapor phase methods such as evaporation, sputtering, ion plating, and CVD may be used. Among these, it is particularly preferable to form the film by sputtering, and for example, the film may be formed as follows. As the target, an alloy cast body, a sintered body, a multi-dimensional target, etc. are used. Then, sputtering is performed in an inert gas atmosphere such as Ar.

Furthermore, when performing reactive sputtering,
The composition of the target may be approximately the same as that of the target in which N is not included in the above formula.

[0048] Then, sputtering is performed using N2 in Ar.
It is carried out in an atmosphere containing 0.1 to 15% by volume, preferably 2 to 10% by volume. Outside the above range, soft magnetic properties tend not to be obtained.

[0049] There are no particular restrictions on the sputtering method, and there are no restrictions on the sputtering equipment to be used either, and a normal one may be used. Note that the operating pressure is usually 0.1 to 1.0
It may be about Pa. In this case, various conditions such as sputtering voltage and current are appropriately determined depending on the sputtering method and the like.

Next, the second soft magnetic thin film 43 constituting the present invention is not particularly limited as long as it is a soft magnetic thin film containing one or more selected from Fe, Co, and Ni. It is selected accordingly. In this case, in order to obtain a soft magnetic multilayer film 4 with a high saturation magnetic flux density, the second soft magnetic thin film 4
3, a film having a higher saturation magnetic flux density Bs than the first soft magnetic thin film 41 is used.

As such a soft magnetic thin film, for example, F
Examples include e-based, Fe-Co-based, Fe-Co-Ni-based alloy thin films, and the saturation magnetic flux density Bs is 19,000 to 24,000.
G, and soft magnetism can be obtained by making the layer thinner.

The thickness of the second soft magnetic thin film 43 is 0.1μ.
m or less, particularly preferably 0.005 to 0.1 μm. If it exceeds the above range, the crystal grains of the film will become larger during film formation or during heat treatment, and the soft magnetic properties will tend to deteriorate.

Furthermore, in order to obtain the soft magnetic multilayer film 4 with a high saturation magnetic flux density Bs, the film thickness d1 of the first soft magnetic thin film 41 must be
and the film thickness d2 of the second soft magnetic thin film 43, the ratio d1
/d2 is 10 or less, particularly 0.1 to 10, more preferably 0.
5 to 10 is preferred.

[0054] When the above range is exceeded, the second
The effect of the soft magnetic thin film 43 tends not to be fully expressed. In addition, if it is less than the above range, good soft magnetic properties cannot be obtained,
Heat resistance also tends to decrease.

To form the second soft magnetic thin film 43, various vapor phase methods such as evaporation, sputtering, ion plating, and CVD, particularly sputtering, may be used.

The number of laminated layers of the first soft magnetic thin film 41 and the second soft magnetic thin film 43 of the soft magnetic multilayer film 4 of the present invention is not particularly limited as long as each layer is one or more, and can be varied depending on the purpose, use, etc. However, from the viewpoint of workability, etc., the number of laminated layers of the first and second soft magnetic thin films 41 and 43 is as follows.
It is usually about 3 to 50 layers.

Further, there is no particular limit to the total thickness of the soft magnetic multilayer film 4, and it may be selected as appropriate depending on the purpose and use.
It is usually about 0.1 to 30 μm.

Note that the first and second soft magnetic thin films 41,
43 are usually laminated with the same film thickness from the viewpoint of workability, etc., but in some cases, the film thicknesses may be different from each other, and in this case, films with a plurality of thicknesses are laminated regularly. may have been done. When the film thicknesses are different, the ratio D1 /D2 of the total thickness D1 of the first soft magnetic thin film 41 to the total thickness D2 of the second soft magnetic thin film 43 should be 10 or less, especially 0. 1-10, more preferably 0.5-10.

Furthermore, it is preferable to provide a non-magnetic thin film (not shown) between the first soft magnetic thin film 41 and the second soft magnetic thin film 43. In this case, the nonmagnetic thin film may be formed between all the films, or may be formed only between necessary films as the case may be.

By interposing the nonmagnetic thin film, the magnetic permeability μ of the soft magnetic multilayer film 4 is improved, and the frequency characteristics of μ are also improved. Therefore, when the soft magnetic multilayer film 4 is applied to, for example, a magnetic head, electromagnetic conversion characteristics such as recording/reproducing output and frequency characteristics are improved.

[0061] There are no particular restrictions on the nonmagnetic thin film used;
Various non-magnetic thin films conventionally used in soft magnetic multilayer films, etc.
For example, a nonmagnetic thin film containing one or more selected from C, N, and O may be used. In this case, the metals, semimetals, or semiconductor elements of the nonmagnetic thin film include Mg, C
a, Y, Ti, Zr, Hf, V, Nb, Ta, Cr, M
One or more types selected from o, W, Mn, B, Al, Ga, and Si are suitable. and carbides, nitrides, oxides of one or more of these metals, metalloids, or semiconductors,
Or form a nonmagnetic thin film from a mixture of these. In this case, the carbides, nitrides, and oxides may have a stoichiometric composition or may be eccentric.

[0062] The thickness of the non-magnetic thin film may be appropriately selected depending on the application, but is usually 0.001 to 0.1 μm.
That's about it.

[0063] To form the nonmagnetic thin film, various vapor phase methods such as evaporation, sputtering, ion plating, and CVD may be used.

After the first soft magnetic thin film 41 and the second soft magnetic thin film 43 are alternately laminated, heat treatment is performed. By the heat treatment, the (100) orientation or degree of orientation of the first soft magnetic thin film 41 is strengthened, the soft magnetic properties are significantly improved, and the saturation magnetic flux density Bs is also improved.

Specifically, when looking at the X-ray diffraction chart of the first soft magnetic thin film 41, it is usually amorphous and has no peaks before heat treatment, but Fe(11
0) The relative intensity ratio of the Fe(200) peak to the peak is 1/3 or more, and by increasing the heat treatment temperature it increases to 2 or more, further 3 or more, and even to infinity in some cases, and the saturation magnetic flux density Bs It also improves.

In this case, a soft magnetic thin film with a strong (100) orientation can be obtained even if the film is formed on any substrate or film, such as a magnetic material such as ferrite, non-magnetic ceramics, or a polymer film. A soft magnetic multilayer film 4 having a first soft magnetic thin film 41 is realized.

This means that the first soft magnetic thin film 41
The (100) orientation of
This can be confirmed from the fact that the diffraction rings from the Fe (200) plane are discontinuous.

In the present invention, in the X-ray diffraction chart of the first soft magnetic thin film 41, Fe(110) peak is
200) The relative intensity ratio of the peak is 1/3 or more, and (
100) It is preferable that the orientation is increased compared to the non-oriented state, and in particular, this value is 1 or more, more preferably 2 or more, still more preferably 3 or more. In addition, 2θ (θ is the diffraction angle) of the Fe(110) peak in the X-ray diffraction chart is C
When uKα is used, the angle is about 44.7 degrees, and the 2θ of the Fe(200) peak is about 65 degrees.

The following conditions are particularly suitable for the heat treatment conditions. Heating rate: about 2 to 8 degrees Celsius/minute Holding temperature: about 200 to 700 degrees Celsius, especially 400 to 650 degrees Celsius
About ℃, even about 400-600℃ Holding time: 10
Cooling rate: about 2 to 8° C./minute for about 60 minutes Note that the atmosphere may be an inert gas such as Ar. By performing the heat treatment under the above conditions, a soft magnetic multilayer film with even better soft magnetic properties can be obtained.

The soft magnetic multilayer film of the present invention has, for example, the following characteristics. Coercive force Hc (50Hz): about 0.1 to 2 Oe, especially about 0.1 to 1 Oe Initial permeability μi (5MHz): about 1000 to 5000, especially about 2000 to 5000 Saturation magnetic flux density Bs: (DC): 18000G more than a certain degree,
In particular, the average crystal grain size D of the crystal grains of the first soft magnetic thin film 41 is about 20,000 G or more: 50
~about 500A, especially about 100-300A, even about 150-250A

Furthermore, by interposing a non-magnetic thin film, the initial magnetic permeability μi (5
MHz) is about 1000 to 6000, especially 2000 to
6000, and the frequency characteristics are also improved.

To measure the magnetic properties of the soft magnetic multilayer film 4, for example, if it is applied to a magnetic head, the film is formed on a non-magnetic substrate under the same conditions as when forming the magnetic head, and heat-treated under the same conditions. After that, proceed as follows.

Initial permeability μi: Measured using a figure-of-eight coil permeability measuring device at an applied magnetic field of 5 mOe Coercive force (Hc): Measured using a B-H tracer Saturation magnetic flux density (Bs): Using VSM, 10000 G Measured in the magnetic field of

The average crystal grain size D of the crystal grains may be determined by measuring the half width W50 of the Fe(200) peak of the X-ray diffraction line and using the Scherrer equation below. Formula D=0.9λ/W50 cosθ

0075
] In the above equation, λ is the wavelength of the X-ray used, and θ is the diffraction angle. Note that when CuKα is used as described above, the 2θ of the Fe(200) peak is about 65 degrees.

The soft magnetic multilayer film of the present invention is particularly applicable to various magnetic heads such as MIG (metal-in-gap) type magnetic heads and thin-film magnetic heads. and,
In addition to magnetic heads, it can be applied to various soft magnetic components such as thin film inductors.

Next, the case where the soft magnetic multilayer film 4 of the present invention is applied to a magnetic head will be described. A preferred embodiment of the MIG type magnetic head to which the present invention is applied is shown in FIGS. 2 and 3.

The magnetic head shown in FIG. 2 has a first core 1
and a second core 2 having a soft magnetic multilayer film 4 formed on the surface facing the gap part, both cores are joined via a gap 5 and are welded and integrated by a welding glass 3.

The magnetic head shown in FIG. 3 is of a type in which a soft magnetic multilayer film 4 is formed on the surfaces of both the first core 1 and the second core 2 facing the gap portion.

The cores 1 and 2 of the magnetic head are preferably made of ferrite. In this case, there is no particular restriction on the ferrite used, but Mn-Zn ferrite or N
It is preferable to use i-Zn ferrite depending on the purpose.

[0081] As Mn-Zn ferrite, Fe2
Preferably, it contains about 50 to 60 mol% of O3, about 8 to 25 mol% of ZnO, and the remainder is substantially MnO. Also,
Ni-Zn ferrite exhibits excellent properties especially in the high frequency range, and its preferred composition is Fe2
The content of O3 is about 30 to 60 mol%, NiO is about 15 to 50 mol%, and ZnO is about 5 to 40 mol%.

The DC saturation magnetic flux density Bs of the cores 1 and 2 is preferably 3,000 to 6,000G. If the saturation magnetic flux density is less than the above range, the overwrite characteristics will deteriorate, and with a composition having such a saturation magnetic flux density, the Curie temperature will decrease, resulting in a decrease in thermal stability. If it exceeds the above range, the magnetostriction will increase and the characteristics of the magnetic head will deteriorate or magnetization will occur more easily.

The initial magnetic permeability μi of cores 1 and 2 at direct current is 1
,000 or more, and the coercive force Hc is preferably 0.3 Oe or less.

[0084] Furthermore, the opposing surfaces of the gap portions of cores 1 and 2 are as follows:
It is preferable to smooth the surface by mirror polishing or the like so that a soft magnetic multilayer film 4, a base film, etc., which will be described later, can be easily formed.

The soft magnetic multilayer film 4 is provided to generate a high-density magnetic flux during recording and to perform effective recording on a magnetic recording medium having a high coercive force. As the soft magnetic multilayer film 4, the soft magnetic multilayer film of the present invention described above is used.

The saturation magnetic flux density Bs of the soft magnetic multilayer film 4 when the magnetic head is completed is 18,000 G or more, more preferably 1
It is preferably 9000G or more, particularly preferably 20000G or more. If it is less than the above range, overwrite characteristics will deteriorate, making it particularly difficult to record on a high coercive force magnetic recording medium.

Furthermore, the first soft magnetic thin film 41 of the soft magnetic multilayer film 4 has a strong (100) orientation. When the (100) orientation is strong, the soft magnetic properties of the soft magnetic multilayer film 4 are improved, and high recording/reproducing sensitivity can be obtained.

The average grain size of the crystal grains of the first soft magnetic thin film 41 of the soft magnetic multilayer film 4 is preferably 500 A or less, more preferably 300 A or less, particularly about 100 to 300 A. In the case of the above range, soft magnetic properties are improved and high recording/reproducing sensitivity can be obtained.

In this case, the soft magnetic property, that is, the coercive force Hc at 50 Hz of the soft magnetic multilayer film 4 when the magnetic head is completed is 2 Oe or less, more preferably 1 Oe.
Below, it is particularly preferably below 0.8 Oe. The initial magnetic permeability μi of the soft magnetic multilayer film 4 at 5 MHz is 1000 or more, more preferably 150
It is preferably 0 or more, particularly preferably 2000 or more. When the coercive force Hc exceeds the above range, or when the initial magnetic permeability μi is below the above range, recording/reproducing sensitivity tends to decrease.

The thickness of the soft magnetic multilayer film 4 is preferably 0.
It is 2 to 5 μm, more preferably 0.5 to 3 μm. If the film thickness is less than the above range, the volume of the soft magnetic multilayer film 4 as a whole becomes insufficient and is likely to be saturated, making it difficult to fully perform the function of the MIG type magnetic head.

By having such a soft magnetic multilayer film 4, the magnetic head of the present invention can perform effective recording on a magnetic recording medium having a coercive force of 800 Oe or more.

If the core 1, core 2, and soft magnetic multilayer film 4 have the magnetic properties as described above, high output and resolution can be obtained as a magnetic head. Furthermore, good overwrite characteristics of -35 dB or less can be obtained. Note that resolution means, for example, that the output of the 1f signal is V1f, 2f
When the signal output is V2f, (V2f/V1f)×
It is expressed as 100[%]. Further, the overwrite characteristic is, for example, the 1f signal output relative to the 2f signal output when the 2f signal is overwritten on the 1f signal.

[0093] Gap 5 is formed from a non-magnetic material. In particular, it is preferable to use adhesive glass for the gap 5 in order to increase the adhesive strength.
Glass shown in No. 506 is suitable. Further, the gap 5 may be formed only of adhesive glass, but
In order to increase the gap formation speed and gap strength, it is preferable to form two layers, a gap 51 and a gap 53, as shown in the figure. In this case, the gap 51 has SiO
It is preferable to use adhesive glass for the gap 53.

In the case of a magnetic head of the type in which welded glass 3, which will be described later, flows into both sides of the gap, the gap 5 may be formed only of silicon oxide. gap 5
Although there are no particular limitations on the method of forming, it is preferable to use a sputtering method. Gap length is usually 0.2-2.0μ
It is about m.

The MIG type magnetic head to which the present invention is applied is as follows:
As shown in FIGS. 2 and 3, a first core 1 and a second core 2 are integrally joined via a gap 5. As shown in FIG. The cores are usually joined together by thermocompression bonding using adhesive glass in the gap 53 and at the same time by pouring the welding glass 3. The working temperature Tw of the welding glass 3 used is 45
The temperature is preferably about 0 to 700°C, particularly about 460 to 650°C. Here, the working temperature Tw is, as is well known,
This is the temperature at which the viscosity of the glass becomes 104 poise.

In the present invention, since the above-mentioned soft magnetic multilayer film 4 having high heat resistance is used, even if such Tw glass is used for welding, the coercive force Hc is less than 2 Oe, especially 1 Oe.
Further, the value of 0.8 Oe or less is maintained. Although there are no particular limitations on the welded glass 3, it is preferable to use lead silicate glass. Among these, for example, the glasses shown below are suitable.

PbO: about 67.5 to 87.5% by weight B
2 O3: about 4.0 to 8.1% by weight SiO2: 7
．． Approximately 5-16.6% by weight Al2O3: 0.3-0
．． About 8% by weight ZnO: About 2.2 to 3.3% by weight Bi2 O3: About 0 to 0.1% by weight Na2 O, K
2 O, CaO, etc.: about 0 to 4% by weight Sb2 O3:
About 0 to 1% by weight When welding, the welding temperature is set around the working temperature Tw, and the usual method is used. In this case, the welding process may also serve as heat treatment of the soft magnetic multilayer film 4.

Further, in the present invention, as shown in FIG. 4, a low saturation magnetic flux density alloy thin film 6 having a lower saturation magnetic flux density Bs than the core is formed on the first core 1, and the above-mentioned soft film is formed on the second core 2. So-called EDG type MI with magnetic multilayer film 4 formed
It can be a G-type magnetic head. Further, the same effects as those of the above-mentioned MIG type magnetic head can be obtained. In this case, the low saturation magnetic flux density alloy thin film 6 may be, for example, a low saturation magnetic flux density amorphous thin film shown in Japanese Patent Application No. 63-311591, which provides excellent overwrite characteristics and high sensitivity. It will be done.

The magnetic head to which the present invention is applied is integrated with a slider as necessary and assembled into a head assembly. In addition, there are floppy heads that perform overwrite recording, such as so-called tunnel erase types such as laminate types and bulk types, or read/write types that do not have an erase head, floating type computer heads such as monolithic types and composite types, and rotary type heads for VTRs. It is used in various magnetic heads such as heads and R-DAT heads. In this way, overwrite recording using various known methods can be performed using the magnetic head to which the present invention is applied.

Next, a thin film magnetic head to which the present invention is applied will be explained.

FIG. 5 shows a floating type thin film magnetic head to which the soft magnetic multilayer film of the present invention is applied. The thin film magnetic head shown in FIG. 5 includes an insulating layer 81, a lower magnetic pole layer 91, a gap layer 10, an insulating layer 83, a coil layer 11, an insulating layer 85, an upper magnetic pole layer 95, and a protective layer 12 on a slider 7. have

The slider 7 of the magnetic head may be made of various conventionally known materials, such as ceramics, ferrite, etc. In this case, ceramics, especially ceramics whose main component is Al2O3-TiC, ceramics whose main component is ZrO2,
Ceramics containing SiC as a main component or ceramics containing AlN as a main component are suitable. Note that these may contain Mg, Y, ZrO2, TiO2, etc. as additives. Conditions such as the shape and size of the slider 7 may be any known ones and are appropriately selected depending on the application.

An insulating layer 81 is formed on the slider 7. As the material of the insulating layer 81, any conventionally known material can be used. For example, when forming a thin film by sputtering, SiO2, glass, Al2O3, etc. can be used.
etc. can be used. The film thickness and pattern of the insulating layer 81 may be any known ones. For example, the film thickness is 5.
The thickness should be approximately 40 μm.

[0104] The magnetic pole usually has a lower magnetic pole layer 9 as shown in the figure.
1 and is provided as the upper magnetic pole layer 95. In the present invention,
The lower magnetic pole layer 91 and the upper magnetic pole layer 95 each include:
The soft magnetic multilayer film of the present invention is used as in the case of the MIG type magnetic head and the EDG type MIG type magnetic head described above. Therefore, a magnetic head with excellent overwrite characteristics and high recording/reproducing sensitivity can be obtained. Note that film formation, heat treatment, etc. may be performed in the same manner as described above.

The patterns, film thicknesses, etc. of the lower and upper magnetic pole layers 91 and 95 may be of any known type. For example, the thickness of the lower magnetic pole layer 91 may be approximately 1 to 5 μm, and the thickness of the upper magnetic pole layer 95 may be approximately 1 to 5 μm. A gap layer 10 is formed between the lower magnetic pole layer 91 and the upper magnetic pole layer 95.

[0106] The gap layer 10 contains Al2O3, S
Various known materials such as iO2 may be used. Further, the pattern, film thickness, etc. of the gap layer 10 may be any known ones. For example, the film thickness of the gap 10 is 0.2~
The thickness may be approximately 1.0 μm.

[0107] There is no particular restriction on the material of the coil layer 11;
Commonly used metals such as Al and Cu may be used. There are no restrictions on the coil winding pattern or winding density.
Any known material may be selected and used as appropriate. For example, the winding pattern may be a spiral type as shown in the figure, a laminated type, a zigzag type, or the like. Further, the coil layer 11 may be formed by various vapor deposition methods such as sputtering, plating, or the like.

In the illustrated example, the coil layer 11 is of a so-called spiral type, and the lower and upper magnetic pole layers 9 are connected in a spiral manner.
1 and 95, and insulating layers 83 and 85 are provided between the coil layer 11 and the lower and upper magnetic pole layers 91 and 95.

Any conventionally known material can be used for the insulating layers 83 and 85. For example, when forming a thin film by sputtering, SiO2, glass, Al
l2 O3 etc. can be used.

[0110] Furthermore, a protective layer 12 is provided on the upper magnetic pole layer 95. Any conventionally known material can be used as the material for the protective layer 12, and for example, Al2 O3 or the like can be used. In this case, any conventionally known pattern and film thickness of the protective layer 12 can be used, and for example, the film thickness may be about 10 to 50 μm. In addition, in the present invention, various resin coat layers and the like may be further laminated.

The manufacturing process of such a thin film magnetic head is as follows:
Usually, this is done by fabricating a thin film and forming a pattern. As described above, the thin film of each layer may be formed using a conventionally known technique such as a vapor deposition method such as a vacuum evaporation method, a sputtering method, or a plating method.

[0112] Pattern formation of each layer of the thin film magnetic head is as follows:
This can be done by selective etching or selective deposition, which are conventionally known techniques.

Etching can be performed by wet etching or dry etching.

The thin film magnetic head to which the present invention is applied is used in combination with a conventionally known assembly such as an arm.

Furthermore, various types of overwrite recording can be performed using the thin film magnetic head to which the present invention is applied. In this case, the coercive force Hc is 800 Oe
Recording and reproduction can be effectively performed on the above magnetic recording medium.

Furthermore, in the present invention, a soft magnetic multilayer film is formed in a pattern between nonmagnetic substrates, or a pair of core halves each having a soft magnetic multilayer film formed between nonmagnetic substrates are butted against each other. A magnetic circuit may be formed using a soft magnetic multilayer film to form a magnetic head.

[0117]

[Examples] Hereinafter, the present invention will be explained in more detail by giving specific examples of the present invention.

Example 1 As shown in FIG. 1, five layers each of a first soft magnetic thin film 41 and a second soft magnetic thin film 43 described below were alternately laminated on a nonmagnetic substrate 45 by sputtering. After that,
After heat treatment at 600°C for 60 minutes, soft magnetic multilayer film sample No. 1 was produced.

[0119] First soft magnetic thin film Fe87Zr10N3 (at%) Film thickness: 0.05 μm Saturation magnetic flux density Bs: 17000G (after heat treatment) Second soft magnetic thin film Fe60Co40 (at%) Film thickness: 0.05 μm Saturation magnetic flux density Bs: 23500G (after heat treatment)

012
0] Obtained sample No. Saturation magnetic flux density Bs at direct current of 1, coercive force Hc at frequency 50Hz and frequency 5
The initial magnetic permeability μi at MHz is shown below.

Note that EPMA was used for compositional analysis, VSM was used for Bs measurement, B-H tracer was used for Hc measurement, and a figure-8 coil permeability meter (applied magnetic field: 5 mOe) was used for μi measurement. Bs: 20200G Hc: 0.4 Oe μi (5MHz): 3000 For comparison, when we measured the characteristics of a single layer film consisting only of the first soft magnetic thin film with a film thickness of 0.5 μm, Bs: 1
7000G, Hc: 0.5 Oe, μi (5MHz
): 3000, and the effect of multiple layers is clear.

[0122] Also, sample No. FIG. 6 shows an X-ray diffraction chart of the first soft magnetic thin film of No. 1 after heat treatment. Looking at this chart, the relative intensity ratio of the Fe(200) peak to the Fe(110) peak is 3.1,
Sample No. The first soft magnetic thin film of 1 is (100)
It can be confirmed that the orientation is strong. Moreover, (100) orientation was also recognized from the electron beam diffraction pattern.

[0123] Furthermore, when heat treated at 700°C for 60 minutes, Hc was less than 1 Oe. Furthermore, sample no. No. 1 also had good corrosion resistance and wear resistance.

Example 2 Sample No. 1 was the same as Example 1 except that a ZrN film with a thickness of 0.01 μm was formed between the first soft magnetic film and the second soft magnetic thin film by sputtering. 2 was produced, and the following results were obtained. Bs: 20200G Hc: 0.3 Oe μi (5MHz): 4500

[0125] Also, sample No. The frequency characteristics of μi of sample No. 2 are as follows. 1, and sample no. No. 2 also had good corrosion resistance.

[0126] Also, sample No. F for the Fe(110) peak after heat treatment of the first soft magnetic thin film alone in No. 2
The relative intensity ratio of the e(200) peak was 3.1, and the (100) orientation was also recognized from the electron beam diffraction pattern.

[0127] Furthermore, when heat treated at 700°C for 60 minutes, Hc was less than 1 Oe.

Example 3 First soft magnetic thin film with a film thickness of 0.1 μm and a film thickness of 0.05 μm
Sample No. m was the same as Example 1 except that one layer of the second soft magnetic thin film was laminated. 3 was produced, and the following results were obtained. Bs: 19200G Hc: 0.4 Oe μi (5MHz): 3500

[0129] Also, sample No. F for the Fe(110) peak after heat treatment of the first soft magnetic thin film alone in No. 3
The relative intensity ratio of the e(200) peak was 3.1, and the (100) orientation was also recognized from the electron beam diffraction pattern.

[0130] Furthermore, when heat treated at 700°C for 60 minutes, Hc was less than 1 Oe.

[0131] Furthermore, sample No. No. 3 also had good corrosion resistance.

Comparative Example 1 Sample No. 1 of Example 1. Except that the first soft magnetic thin film of No. 1 was replaced with the following film. Comparative sample No. 1 similar to No. 1. 4 was prepared.

First soft magnetic thin film Fe75Zr7 N18 (at%) Film thickness 0.05 μm Bs: 16000G (after heat treatment) Sample No. The characteristics of No. 4 are shown below. Bs: 19700G Hc: 0.5 Oe μi (5MHz): 2000 Sample No. The relative intensity ratio of the Fe(200) peak to the Fe(110) peak after the heat treatment of the first soft magnetic thin film No. 4 alone was 0. From these results, Fe(
100) Orientation results are obvious.

Example 4 In the same manner as in Example 1, soft magnetic multilayer film sample No. 1 was prepared by laminating 5 layers each of the first soft magnetic thin film and the second soft magnetic thin film alternately. 5 to 12 were produced.

[0135] The first soft magnetic thin film is Fe97-xy-
At w Mx Niy N3 Ow (at%),
As shown in Table 1, M, x, y, and w were changed, and the second soft magnetic thin film was sample No. Same as 1.

[0136] Obtained sample No. The properties of samples 5 to 12 are as shown in Table 1.

[0137]

[Table 1]

[0138] Sample No. F for the Fe(110) peak after heat treatment of the first soft magnetic thin film 5 to 12 alone
The relative intensity ratio of the e(200) peak was about 1 to 10, and the (100) orientation was also recognized from the electron beam diffraction pattern.

[0139] Furthermore, when heat treated at 700°C for 60 minutes, Hc was less than 1 Oe. Furthermore, sample no. Nos. 5 to 12 also had good corrosion resistance.

[0140] Furthermore, sample No. For each of Nos. 5 to 12, when a TaC film was formed between the first soft magnetic thin film and the second soft magnetic thin film, improvements in μi and frequency characteristics of μi were observed. The film is made of ZrN, BN, Si3N, SiO2, ZrO2
, Al2O3, SiC, B4C, TiC, ZrC
It was equivalent even if it was changed to .

[0141] In addition, samples with different M in the compositional formula, samples with different thicknesses of the first soft magnetic thin film, samples with different compositions and thin films of the second soft magnetic thin film, and samples with different numbers of laminated layers. The same results were obtained.

From the above results, the results of the present invention are clear.

Example 5 When MIG type magnetic heads and thin film magnetic heads were manufactured using each of the soft magnetic multilayer films of Examples 1 to 4, good overwrite characteristics and high reproduction output were obtained. .

[0144] From this result, the effect of the present invention is clear.

[0145]

[Effects of the Invention] The soft magnetic multilayer film of the present invention has a high saturation magnetic flux density Bs. And, because it has high heat resistance and especially strong (100) orientation, it has a low coercive force Hc and a high magnetic permeability μ.
Has excellent soft magnetic properties. Therefore, when the soft magnetic multilayer film of the present invention is applied to a magnetic head, overwriting characteristics, recording/reproducing sensitivity, etc. are high, and excellent electromagnetic conversion characteristics can be obtained. Further, since the soft magnetic multilayer film of the present invention has excellent corrosion resistance and wear resistance, a highly reliable magnetic head can be realized.

[Brief explanation of the drawing]

FIG. 1 is a cross-sectional view showing one example of a soft magnetic multilayer film of the present invention.

FIG. 2 is a partial cross-sectional view showing an example of an MIG magnetic head to which the present invention is applied.

FIG. 3 is a partial cross-sectional view showing an example of an MIG magnetic head to which the present invention is applied.

FIG. 4 is a partial sectional view showing an example of an EDG-type MIG-type magnetic head to which the present invention is applied.

FIG. 5 is a partial cross-sectional view showing an example of a thin film magnetic head to which the present invention is applied.

FIG. 6: X of the first soft magnetic thin film of the soft magnetic multilayer film of the present invention
It is a graph showing a line diffraction chart.

[Explanation of symbols]

1 First core 2 Second core 3 Welded glass 4 Soft magnetic multilayer film 41 First soft magnetic thin film 42 Second soft magnetic thin film 45 Base 5, 51, 53 Gap 6 Low saturation magnetic flux density alloy thin film 7 Slider 81, 83, 85 Insulating layer 91 Lower magnetic pole layer 95 Top pole layer 10 Gap layer 11 Coil layer 12 Protective layer

Claims (6)

[Claims] Claim 1: It has an atomic ratio composition represented by the following formula, and in X-ray diffraction, Fe(110) peak is
200) A first soft magnetic thin film whose peak relative intensity ratio is 1/3 or more and a second soft magnetic thin film containing one or more selected from Fe, Co and Ni are alternately laminated. Characteristic soft magnetic multilayer film. Formula Fe100-x-y-z Mx Niy N
z (In the above formula, M is Mg, Ca, Ti, Zr, H
One or more selected from f, V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1≦x≦15, 0≦y
≦10, 0.1≦z≦15. ) 2. A first soft magnetic thin film having an atomic ratio composition represented by the following formula and having Fe(200) plane orientation in electron beam diffraction, and one or more selected from Fe, Co, and Ni. 1. A soft magnetic multilayer film, characterized in that second soft magnetic thin films containing the same are alternately laminated. Formula Fe100-x-y-z Mx Niy N
z (In the above formula, M is Mg, Ca, Ti, Zr, H
One or more selected from f, V, Nb, Ta, Cr, Mo, W, Mn and B, 0.1≦x≦15, 0≦y
≦10, 0.1≦z≦15. ) 3. A first soft magnetic thin film having an atomic ratio represented by the following formula and a second soft magnetic thin film containing one or more selected from Fe, Co, and Ni are alternately laminated. A soft magnetic multilayer film characterized by: Formula Fe100-x-y-z Mx Niy N
z (In the above formula, M is Mg, Ca, Ti, Zr, H
One or more selected from f, V, Nb, Ta, Cr, Mo, W, Mn and B, 8≦x≦14, 0≦y≦1
0, 2≦z≦4. ) 4. The soft magnetic multilayer film according to claim 1, wherein the saturation magnetic flux density of the second soft magnetic thin film is higher than the saturation magnetic flux density of the first soft magnetic thin film. 5. The second soft magnetic thin film has a thickness of 0.1.
The soft magnetic multilayer film according to any one of claims 1 to 4, which has a diameter of μm or less. 6. The soft magnetic multilayer film according to claim 1, further comprising a nonmagnetic thin film between the first soft magnetic thin film and the second soft magnetic thin film.