JPH04218690A - Production of electroformed product having through-hole - Google Patents

Production of electroformed product having through-hole

Info

Publication number
JPH04218690A
JPH04218690A JP41139890A JP41139890A JPH04218690A JP H04218690 A JPH04218690 A JP H04218690A JP 41139890 A JP41139890 A JP 41139890A JP 41139890 A JP41139890 A JP 41139890A JP H04218690 A JPH04218690 A JP H04218690A
Authority
JP
Japan
Prior art keywords
photoresist film
electroformed product
photoresist
metal
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP41139890A
Other languages
Japanese (ja)
Other versions
JP2992647B2 (en
Inventor
Hiroshi Shimazu
博士 嶋津
Hiroshi Nakagawa
宏史 中川
Kazuhiko Inoue
和彦 井上
Yoshihiro Kobayashi
良弘 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyushu Hitachi Maxell Ltd
Maxell Ltd
Original Assignee
Kyushu Hitachi Maxell Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyushu Hitachi Maxell Ltd, Hitachi Maxell Ltd filed Critical Kyushu Hitachi Maxell Ltd
Priority to JP2411398A priority Critical patent/JP2992647B2/en
Publication of JPH04218690A publication Critical patent/JPH04218690A/en
Application granted granted Critical
Publication of JP2992647B2 publication Critical patent/JP2992647B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

PURPOSE:To obtain a electroformed product optimum for the nozzle for an ink jet printer and the shadow mask of a cathode-ray tube by etching the surface of an electrodeposited metal after electroforming while an electroforming photoresist is put on an elelctroforming matrix. CONSTITUTION:A photoresist film 6 having a pattern corresponding to the through-hole of an electroformed product is formed on the surface of an electrocasting matrix 3, then a metal 7 is elelctrodeposited on the surface of the matrix 3 not covered with the film 6, the surface of the elelctrodeposited metal 7 is etched while the film 6 is put on the matrix 3, the metal 7 is released from the matrix 3, and then the film 6 is removed to obtain an electroformed product having a through-hole 2 having a funneled inlet part 2a and a small- diameter tubular outlet part 2b.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、透孔を有する電鋳製品
の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing electroformed products having through holes.

【0002】0002

【従来の技術】この種の電鋳製品としては、例えば、精
密スクリーン印刷用メッシュなどの各種メッシュ、電気
かみそりの刃、あるいはそのほか各種ノズルなどが挙げ
られる。これら電鋳製品、特に比較的厚手(例えば15
0〜200μ)の透孔を有する電鋳製品の製造に際して
は、多くの場合、例えば、図5にその製造過程の工程図
を示すように、まず、図5の(A)に示すように電鋳母
型3の表面にネガ型のフォトレジスト4を複数層に重ね
合わせ、そのフォトレジスト4の上に、電鋳製品の透孔
に相当するパターン(網目模様)をもつフィルム5を密
着させて焼き付け、現像処理して、図5の(B)に示す
ようにフォトレジスト膜6を形成する。ついで、図5の
(C)に示すように電鋳母型3のフォトレジスト膜6で
覆われていない表面に金属7を電着させ、しかるのち、
図5の(D)に示すようにその電着金属7を電鋳母型3
から剥離し、フォトレジスト膜6を除去することにより
、透孔2を有する電鋳製品を得る。
2. Description of the Related Art Electroformed products of this type include, for example, various meshes such as precision screen printing meshes, electric razor blades, and various other nozzles. These electroformed products are especially relatively thick (e.g. 15
When manufacturing an electroformed product having a through hole of 0 to 200 μm, in many cases, for example, as shown in the process diagram of the manufacturing process, first, as shown in FIG. A plurality of layers of negative photoresist 4 are superimposed on the surface of the casting mold 3, and a film 5 having a pattern (mesh pattern) corresponding to the through holes of the electroformed product is adhered onto the photoresist 4. By baking and developing, a photoresist film 6 is formed as shown in FIG. 5(B). Next, as shown in FIG. 5C, a metal 7 is electrodeposited on the surface of the electroforming mold 3 that is not covered with the photoresist film 6, and then,
As shown in FIG.
By peeling it off and removing the photoresist film 6, an electroformed product having through holes 2 is obtained.

【0003】このようにして得られる透孔2の断面形状
は逆台形になる傾向がある。これは、フォトレジスト膜
6を2層、3層と重ねることにより、指数関数的に光線
(紫外線)の吸収が行われ、この結果電鋳母型3の位置
にはほとんど光線が達しないことが原因であると考えら
れる。このような逆台形化の傾向は光線透過率の小さい
フォトレジストを使用するほど顕著になる。
The cross-sectional shape of the through hole 2 thus obtained tends to be an inverted trapezoid. This is because by stacking the photoresist film 6 in two or three layers, light (ultraviolet light) is absorbed exponentially, and as a result, almost no light rays reach the position of the electroforming mold 3. This is thought to be the cause. This tendency of inverted trapezoid formation becomes more pronounced as a photoresist with lower light transmittance is used.

【0004】0004

【発明が解決しようとする課題】しかし、断面逆台形の
透孔2は、ノズルの中でも、例えば、インクジェットプ
リンター用ノズルのように噴射対象物に対してインクを
一様な流れで平行に精度よく噴出させる必要のある物に
は適しない。
[Problems to be Solved by the Invention] However, the through hole 2 having an inverted trapezoidal cross section is difficult to use in a nozzle, for example, in a nozzle for an inkjet printer, in which ink is ejected in a uniform flow parallel to the object with high accuracy. Not suitable for things that need to be squirted.

【0005】そこで本発明は、インクジェットプリンタ
ー用ノズルなどにも最適な断面形状の透孔を有する電鋳
製品を得ることのできる製造方法を提供しようとするも
のである。
[0005] Therefore, the present invention aims to provide a manufacturing method capable of producing an electroformed product having a through hole with a cross-sectional shape that is optimal for use in nozzles for inkjet printers and the like.

【0006】[0006]

【課題を解決するための手段】本発明は、図1に例示す
るように、電鋳母型3の表面に、電鋳製品の透孔に相当
するパターン(模様)をもつフォトレジスト膜6を形成
する工程と、電鋳母型3のフォトレジスト膜6で覆われ
ていない表面に金属7を電着させる工程と、電鋳母型3
にフォトレジスト膜6を付けた状態のままで電着金属7
の表面をエッチングする工程と、エッチング後、電着金
属7を電鋳母型3から剥離し、フォトレジスト膜6を除
去する工程を経て、断面形状が漏斗状誘込み部2aの細
径出口側に細い管路状出口部2bを連通する形に形成さ
れる透孔2を有する電鋳製品を得るものである。
[Means for Solving the Problems] As illustrated in FIG. 1, the present invention provides a photoresist film 6 having a pattern corresponding to the through holes of an electroformed product on the surface of an electroforming matrix 3. a step of electrodepositing metal 7 on the surface of the electroforming mother mold 3 that is not covered with the photoresist film 6;
Electrodeposited metal 7 with photoresist film 6 still attached to
After the etching, the electrodeposited metal 7 is peeled off from the electroforming mold 3 and the photoresist film 6 is removed. An electroformed product having a through hole 2 formed in a shape communicating with a narrow pipe-like outlet portion 2b is obtained.

【0007】[0007]

【作用】電鋳母型3のフォトレジスト膜6で覆われてい
ない表面に金属7を電着することにより、フォトレジス
ト膜6に対応する箇所に管路状出口部2bを形成するこ
とができる。このとき、その電着が、図1の(D)に示
すようにフォトレジスト膜6から離れた箇所では矢印m
で示すごとく直進的に行われるが、フォトレジスト膜6
の近傍箇所では直進的な電着のほかに矢印nで示すごと
くフォトレジスト膜6の表面を回り込むことによっても
電着されるため電着量が局部的に多くなり、高い電流密
度の肉盛り上がり部7a(樹枝状成長現象)が生じる。
[Operation] By electrodepositing the metal 7 on the surface of the electroforming matrix 3 that is not covered with the photoresist film 6, the conduit-shaped outlet portion 2b can be formed at the location corresponding to the photoresist film 6. . At this time, as shown in FIG.
Although the photoresist film 6 is carried out in a straight line as shown in
In the vicinity of , electrodeposition is performed not only in a straight line but also by going around the surface of the photoresist film 6 as shown by arrow n, so that the amount of electrodeposition increases locally, resulting in a thickened area with a high current density. 7a (dendritic growth phenomenon) occurs.

【0008】この電着金属7の表面の高電流密度部分は
次工程のエッチングにより集中的に腐食しやすく、この
結果エッチングにより管路状出口部2bよりも径大な漏
斗状誘込み部2aを該管路状出口部2bに連通状に形成
することができる。このエッチング時にはエッチング用
フォトレジストを敢えて必要としない。
The high current density portion on the surface of the electrodeposited metal 7 is likely to be intensively corroded by etching in the next step, and as a result, the funnel-shaped lead-in portion 2a, which has a larger diameter than the conduit-shaped outlet portion 2b, is formed by etching. It can be formed in communication with the pipe-like outlet portion 2b. During this etching, no etching photoresist is intentionally required.

【0009】[0009]

【発明の効果】本発明によれば、電鋳製品の透孔2の断
面形状として漏斗状誘込み部2aの細径出口側に管路状
出口部2bを連通する形のものを得ることができ、その
漏斗状誘込み部2aで誘い込まれるインクなどの流体は
管路状出口部2bの領域で一様な流れで噴出させること
ができるため、管路状出口部2aを有しない断面逆台形
の透孔を有する従来の電鋳製品に比べて、ノズル、特に
インクジェットプリンター用ノズルのように噴射対象物
に対してインクなどを一様で平行に精度よく噴出させる
必要のある物、またはこれに類する物、例えばブラウン
管シャドウマスクなどにも適した電鋳製品を簡易に製造
することができて有利である。
According to the present invention, it is possible to obtain a cross-sectional shape of the through hole 2 of an electroformed product such that the conduit-like outlet portion 2b communicates with the narrow-diameter outlet side of the funnel-like guiding portion 2a. The fluid such as ink that is drawn in by the funnel-shaped guiding part 2a can be ejected in a uniform flow in the region of the pipe-like outlet part 2b. Compared to conventional electroformed products that have trapezoidal holes, nozzles, especially nozzles for inkjet printers, which need to eject ink uniformly, parallelly, and with high accuracy to the object to be ejected, or It is advantageous that electroformed products suitable for similar products such as cathode ray tube shadow masks can be easily produced.

【0010】0010

【実施例】本発明に係る電鋳製品の製造方法一実施例を
図1ないし図3に基づき説明する。図2はその電鋳製品
の一例であるインクジェットプリンター用ノズルを示し
ており、四角形の薄い平板状のノズル本体1(80μ厚
)に多数の透孔2を形成している。その透孔2の断面形
状は、図3に示すように漏斗状誘込み部2aと、漏斗状
誘込み部2aの細径出口側に連通形成された細い管路状
出口部2bとからなる形を有している。
[Embodiment] An embodiment of the method for manufacturing an electroformed product according to the present invention will be described with reference to FIGS. 1 to 3. FIG. 2 shows an inkjet printer nozzle as an example of the electroformed product, in which a large number of through holes 2 are formed in a rectangular thin plate-shaped nozzle body 1 (80 μm thick). As shown in FIG. 3, the cross-sectional shape of the through hole 2 is composed of a funnel-shaped lead-in part 2a and a narrow conduit-like outlet part 2b formed in communication with the narrow diameter outlet side of the funnel-shaped lead-in part 2a. have.

【0011】このような断面形状の透孔2を有する電鋳
製品は次のような工程を経て製造される。まず、図1の
(A)に示すようにステンレス鋼製の電鋳母型3の表面
にネガ型のフィルム状のフォトレジスト4を複数層(図
示例では4層)重ね合わせて、例えば200μの均一な
厚膜を形成する。そのフォトレジスト4としては、光線
透過率の大きいもの、例えば、日本合成化学工業株式会
社製の商品名;日合ALPHO−321Y50を用いる
ことが好ましい。
An electroformed product having a through hole 2 having such a cross-sectional shape is manufactured through the following steps. First, as shown in FIG. 1A, a plurality of layers (four layers in the illustrated example) of negative film-like photoresist 4 are superimposed on the surface of a stainless steel electroforming master mold 3. Forms a uniform thick film. As the photoresist 4, it is preferable to use one having a high light transmittance, for example, Nippon Gosei Kagaku Kogyo Co., Ltd., trade name: Nippon ALPHO-321Y50.

【0012】次いで、図1の(B)に示すようにフォト
レジスト4の上に電鋳製品の透孔に相当するパターン(
模様)をもつフィルム5を密着させ、紫外線ランプを照
射して焼き付け、現像、乾燥の各処理を行って、図1の
(C)に示すようにフォトレジスト膜6(200μ厚)
を形成する。このフォトレジスト膜6は光線透過率の大
きいフォトレジスト4を使用しているので、フォトレジ
スト膜6はほぼ垂直に形成でき、また電鋳母型3の表面
との密着性に優れる。
Next, as shown in FIG. 1B, a pattern (corresponding to the through holes of the electroformed product) is formed on the photoresist 4.
A photoresist film 6 (200μ thick) is formed as shown in FIG.
form. Since this photoresist film 6 uses the photoresist 4 having a high light transmittance, the photoresist film 6 can be formed almost vertically and has excellent adhesion to the surface of the electroforming matrix 3.

【0013】次いで、電鋳母型3をスルファミン酸ニッ
ケル浴などの電鋳槽に移し、ニッケル、あるいはニッケ
ルーコバルト合金で電鋳を行って、図1の(D)に示す
ように電鋳母型3のフォトレジスト膜6で覆われていな
い表面に金属7をフォトレジスト膜6の厚み程度にまで
電着する。このとき電着金属7の表面上のフォトレジス
ト膜6の近傍では、矢印mで示す直進的な電着以外に、
矢印nで示すごとくフォトレジスト膜6の表面を回り込
むことによっても電着されるため、当該箇所で樹枝状成
長現象が生じて高電流密度の肉盛り上がり部7aが生じ
る。
Next, the electroformed mother mold 3 is transferred to an electroforming bath such as a nickel sulfamate bath, and electroformed with nickel or nickel-cobalt alloy to form an electroformed mother mold as shown in FIG. 1(D). Metal 7 is electrodeposited on the surface of mold 3 that is not covered with photoresist film 6 to about the thickness of photoresist film 6. At this time, in the vicinity of the photoresist film 6 on the surface of the electrodeposited metal 7, in addition to the straight electrodeposition shown by the arrow m,
Since it is also electrodeposited by going around the surface of the photoresist film 6 as shown by arrow n, a dendritic growth phenomenon occurs at this location, resulting in a thickened portion 7a with a high current density.

【0014】次いで、図1の(E)に示すように電着金
属7およびフォトレジスト膜6の表面を研磨して全体を
均一な厚み(150μ厚)にする。この研磨工程は省略
することもできる。
Next, as shown in FIG. 1E, the surfaces of the electrodeposited metal 7 and photoresist film 6 are polished to a uniform thickness (150 μm). This polishing step can also be omitted.

【0015】次いで、これ全体を塩化第2鉄などの腐食
液にて、浸漬あるいはスプレーエッチングを行い、図1
の(F)に示すように電着金属7の表面を化学的に腐食
させる。このとき電着金属7の表面のフォトレジスト膜
6に近傍の高電流密度部分では集中して局部的に腐食し
、漏斗状になる。エッチング深さや径はエッチング時間
で調節する。
Next, the entire structure was immersed or spray etched in a corrosive solution such as ferric chloride, and as shown in FIG.
As shown in (F), the surface of the electrodeposited metal 7 is chemically corroded. At this time, high current density areas near the photoresist film 6 on the surface of the electrodeposited metal 7 are concentrated and locally corroded, forming a funnel shape. The etching depth and diameter are adjusted by the etching time.

【0016】エッチング後、その電着金属7をフォトレ
ジスト膜6共に電鋳母型3から剥離し、水酸化ナトリウ
ム剥離浴などに浸漬してフォトレジスト膜6を除去する
ことにより、図1の(G)および図3に示すような断面
形状が漏斗状誘込み部2aと細い管路状出口部2bから
なる透孔2を有する電鋳製品9を得る。
After etching, the electrodeposited metal 7 and the photoresist film 6 are peeled off from the electroforming mold 3, and the photoresist film 6 is removed by immersing it in a sodium hydroxide stripping bath or the like. G) and an electroformed product 9 having a through hole 2 having a cross-sectional shape as shown in FIG.

【0017】上記実施例では、電鋳母型3の表面に形成
するフォトレジスト4として、フィルム状のレジストを
用いているが、これに代えて液体状のフォトレジストを
複数層に順次塗布乾燥して厚肉のフォトレジスト膜6を
形成することもできる。
In the above embodiment, a film resist is used as the photoresist 4 formed on the surface of the electroforming mother mold 3, but instead of this, multiple layers of liquid photoresist are sequentially applied and dried. A thick photoresist film 6 can also be formed.

【0018】図4は他の実施例を示す製造過程の工程説
明図である。この実施例では透孔2の断面形状が上記実
施例と異なり、管路状出口部2bが上記実施例では平行
に形成されているのに対し、この実施例では図4の(E
)に示すごとく先細状に形成されている点が異なる。こ
うした断面形状の透孔2は次のようにして製造される。 まず、電鋳母型3の表面に、光線透過率の小さいフォト
レジスト4、例えば日本合成化学工業株式会社製の商品
名;日合ALPHO−1150MY、または日合ALP
HO−111Y50を複数層重ね合わせる。次いで、上
記実施例の図1の(B)に示すと同様に最上層のフォト
レジスト4の上に電鋳製品の透孔に相当するパターンを
もつフィルム5を密着させ、紫外線照射で焼き付け、現
像の各処理を行って、図4の(A)に示すようなフォト
レジスト膜6を形成する。このフォトレジスト膜6は光
線透過率の小さいフォトレジスト4のみを使用するので
、光線が電鋳母型3の表面にまで達しにくくなり、この
結果フォトレジスト膜6の断面形状を逆台形に形成する
ことができる。このように断面逆台形状のフォトレジス
ト膜6を形成した後は、上記実施例の場合と同様に電鋳
母型3のフォトレジスト膜6で覆われていない表面に金
属7を電着させ(図4の(B))、次いで電着金属7お
よびフォトレジスト膜6の表面を研磨し(図4の(C)
)、次いで電着金属7の表面をエッチングし(図4の(
D))、最後に電着金属7を電鋳母型3から剥離し、フ
ォトレジスト膜6を除去する。かくして、図4の(E)
に示すように先細状の管路状出口部2bを漏斗状誘込み
部2aに連通形成する透孔2を有する電鋳製品9を得る
ことができる。
FIG. 4 is a process explanatory diagram of a manufacturing process showing another embodiment. In this embodiment, the cross-sectional shape of the through hole 2 is different from the above embodiment, and the pipe-like outlet portion 2b is formed in parallel in the above embodiment, whereas in this embodiment, the (E
) is different in that it is formed in a tapered shape. The through hole 2 having such a cross-sectional shape is manufactured as follows. First, a photoresist 4 with low light transmittance is applied to the surface of the electroforming matrix 3, such as Nippon Gohsei Chemical Industry Co., Ltd.'s product name: Nippon ALPHO-1150MY or Nippon ALP.
Layer multiple layers of HO-111Y50. Next, in the same manner as shown in FIG. 1B of the above embodiment, a film 5 having a pattern corresponding to the through holes of the electroformed product is closely adhered to the top layer of photoresist 4, baked with ultraviolet rays, and developed. A photoresist film 6 as shown in FIG. 4A is formed by performing the following processes. Since this photoresist film 6 uses only the photoresist 4 with low light transmittance, it becomes difficult for light rays to reach the surface of the electroforming mold 3, and as a result, the cross-sectional shape of the photoresist film 6 is formed into an inverted trapezoid. be able to. After forming the photoresist film 6 having an inverted trapezoidal cross section in this manner, metal 7 is electrodeposited on the surface of the electroforming mold 3 that is not covered with the photoresist film 6, as in the above embodiment. (B) in FIG. 4), and then the surfaces of the electrodeposited metal 7 and the photoresist film 6 are polished ((C) in FIG.
), and then the surface of the electrodeposited metal 7 is etched ((
D)) Finally, the electrodeposited metal 7 is peeled off from the electroforming mold 3 and the photoresist film 6 is removed. Thus, (E) in Figure 4
As shown in FIG. 2, it is possible to obtain an electroformed product 9 having a through hole 2 that communicates a tapered pipe-like outlet portion 2b with a funnel-like guiding portion 2a.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】製造過程の工程説明図である。FIG. 1 is an explanatory diagram of a manufacturing process.

【図2】電鋳製品の斜視図である。FIG. 2 is a perspective view of an electroformed product.

【図3】電鋳製品の透孔部の拡大断面図である。FIG. 3 is an enlarged sectional view of a through-hole portion of the electroformed product.

【図4】他の実施例を示す製造過程の工程説明図である
FIG. 4 is a process explanatory diagram of a manufacturing process showing another embodiment.

【図5】従来例の電鋳製品の製造過程の工程説明図であ
る。
FIG. 5 is a process explanatory diagram of a manufacturing process of a conventional electroformed product.

【符号の説明】[Explanation of symbols]

2  透孔 2a  漏斗状誘込み部 2b  管路状出口部 3  電鋳母型 4  フォトレジスト 6  フォトレジスト膜 7  電着金属 9  電鋳製品 2 Through hole 2a Funnel-shaped lead-in part 2b Pipe-like outlet part 3 Electroforming mother mold 4 Photoresist 6 Photoresist film 7 Electrodeposited metal 9 Electroformed products

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  電鋳母型3の表面に、電鋳製品の透孔
に相当するパターンをもつフォトレジスト膜6を形成す
る工程と、電鋳母型3のフォトレジスト膜6で覆われて
いない表面に金属7を電着させる工程と、電鋳母型3に
フォトレジスト膜6を付けた状態のままで電着金属7の
表面をエッチングする工程と、エッチング後、電着金属
7を電鋳母型3から剥離し、フォトレジスト膜6を除去
する工程とからなることを特徴とする、透孔を有する電
鋳製品の製造方法。
1. A step of forming a photoresist film 6 having a pattern corresponding to the through holes of the electroformed product on the surface of the electroforming mother mold 3, and a step of forming a photoresist film 6 on the surface of the electroforming mother mold 3, a step of electrodepositing the metal 7 on the surface where the electrodeposited metal 7 is not present, a step of etching the surface of the electrodeposited metal 7 with the photoresist film 6 still attached to the electroforming mold 3, and a step of electrodepositing the electrodeposited metal 7 after the etching. A method for producing an electroformed product having through-holes, the method comprising the steps of peeling off from a casting mold 3 and removing a photoresist film 6.
JP2411398A 1990-12-17 1990-12-17 Method for producing electroformed product having through-hole Expired - Fee Related JP2992647B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2411398A JP2992647B2 (en) 1990-12-17 1990-12-17 Method for producing electroformed product having through-hole

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2411398A JP2992647B2 (en) 1990-12-17 1990-12-17 Method for producing electroformed product having through-hole

Publications (2)

Publication Number Publication Date
JPH04218690A true JPH04218690A (en) 1992-08-10
JP2992647B2 JP2992647B2 (en) 1999-12-20

Family

ID=18520410

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2411398A Expired - Fee Related JP2992647B2 (en) 1990-12-17 1990-12-17 Method for producing electroformed product having through-hole

Country Status (1)

Country Link
JP (1) JP2992647B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001073808A1 (en) * 2000-03-28 2001-10-04 Jeong Sik Kim Shadow mask and method for manufacturing the same
JP2003508638A (en) * 1999-09-09 2003-03-04 エアロジェン,インコーポレイテッド Improved aperture plate and method for its construction and use
JP2006016654A (en) * 2004-06-30 2006-01-19 Kuraray Co Ltd Method for producing through type metal structure
JP2007247067A (en) * 2006-03-15 2007-09-27 Doniar Sa Manufacturing method of single-layered or multilayered metal structure in liga technique and structure obtained thereby

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003508638A (en) * 1999-09-09 2003-03-04 エアロジェン,インコーポレイテッド Improved aperture plate and method for its construction and use
WO2001073808A1 (en) * 2000-03-28 2001-10-04 Jeong Sik Kim Shadow mask and method for manufacturing the same
GB2370283A (en) * 2000-03-28 2002-06-26 Jeong Sik Kim Shadow mask and method for manufacturing the same
JP2006016654A (en) * 2004-06-30 2006-01-19 Kuraray Co Ltd Method for producing through type metal structure
JP2007247067A (en) * 2006-03-15 2007-09-27 Doniar Sa Manufacturing method of single-layered or multilayered metal structure in liga technique and structure obtained thereby
JP2014159645A (en) * 2006-03-15 2014-09-04 Rolex Sa Process for fabricating monolayer or multilayer metal structure in liga technology, and structure obtained by the process

Also Published As

Publication number Publication date
JP2992647B2 (en) 1999-12-20

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