JP2992645B2 - Method for producing electroformed product having through-hole - Google Patents

Method for producing electroformed product having through-hole

Info

Publication number
JP2992645B2
JP2992645B2 JP2314959A JP31495990A JP2992645B2 JP 2992645 B2 JP2992645 B2 JP 2992645B2 JP 2314959 A JP2314959 A JP 2314959A JP 31495990 A JP31495990 A JP 31495990A JP 2992645 B2 JP2992645 B2 JP 2992645B2
Authority
JP
Japan
Prior art keywords
hole
photoresist
electroformed
photoresist film
electroformed product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2314959A
Other languages
Japanese (ja)
Other versions
JPH04183892A (en
Inventor
博士 嶋津
宏史 中川
和彦 井上
良弘 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyushu Hitachi Maxell Ltd
Original Assignee
Kyushu Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyushu Hitachi Maxell Ltd filed Critical Kyushu Hitachi Maxell Ltd
Priority to JP2314959A priority Critical patent/JP2992645B2/en
Publication of JPH04183892A publication Critical patent/JPH04183892A/en
Application granted granted Critical
Publication of JP2992645B2 publication Critical patent/JP2992645B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、透孔を有する電鋳製品の製造方法に関す
る。
Description: TECHNICAL FIELD The present invention relates to a method for producing an electroformed product having a through hole.

〔従来の技術〕[Conventional technology]

この種の電鋳製品としては、例えば、各種メッシュ
(精密スクリーン印刷用メッシュなど)、電気かみそり
の刃、各種ノズルなどが挙げられる。
Examples of this type of electroformed product include various meshes (such as meshes for precision screen printing), electric razor blades, and various nozzles.

これらの電鋳製品、特に比較的厚手の透孔を有する電
鋳製品の製造に際しては、多くの場合、例えば、第5図
(a)ないし(d)にその製造過程の工程図を示すよう
に、まず、第5図(a)に示すように電鋳母型3の表面
にネガ型のフォトレジスト4を複数層に重ね合わせ、そ
のフォトレジスト4の上に、電鋳製品の透孔に相当する
パターン(網目模様)をもつフィルム5を密着させて焼
き付け、現像処理して、第5図(b)に示すようにフォ
トレジスト膜6を形成する。ついで、第5図(c)に示
すように電鋳母型3のフォトレジスト膜6で覆われてい
ない表面に金属7を電着させ、しかるのち、第5図
(d)に示すようにその電着金属7を電鋳母型3から剥
離し、フォトレジスト膜6を除去することにより、断面
逆台形の透孔2を有する電鋳製品を得る。
In the production of these electroformed products, particularly electroformed products having relatively thick through-holes, in many cases, for example, as shown in FIGS. First, as shown in FIG. 5 (a), a negative type photoresist 4 is superimposed on a plurality of layers on the surface of the electroformed mother die 3, and on the photoresist 4, a hole corresponding to a through hole of an electroformed product is formed. A film 5 having a desired pattern (network pattern) is closely adhered, baked, and developed to form a photoresist film 6 as shown in FIG. 5 (b). Next, as shown in FIG. 5 (c), metal 7 is electrodeposited on the surface of the electroformed mold 3 not covered with the photoresist film 6, and thereafter, as shown in FIG. 5 (d). By removing the electrodeposited metal 7 from the electroformed mold 3 and removing the photoresist film 6, an electroformed product having the through-hole 2 having an inverted trapezoidal cross section is obtained.

比較的厚手の電鋳製品(例えば150〜200μ)を得るた
めには電鋳母型3の表面にフォトレジスト膜6を複数層
に重ね合わせるが、こうした場合は、露光部(電鋳製品
の透孔に相当する部分)の断面形状がフォトレジスト膜
6の下層部で細くなる逆台形になる傾向がある。この逆
台形化の原因は、フォトレジスト膜6を2層、3層と重
ねることにより、指数関数的に光線(紫外線)の吸収が
行われ、この結果電鋳母型3の位置にはほとんど光線が
達しないことが原因であると考えられる。このような逆
台形の傾向は光線透過率の小さいフォトレジストのみを
使用するほど顕著になることを知見した。
In order to obtain a relatively thick electroformed product (for example, 150 to 200 μm), a plurality of photoresist films 6 are superposed on the surface of the electroformed mold 3. The cross-sectional shape of the portion (corresponding to the hole) tends to be an inverted trapezoid in which the lower portion of the photoresist film 6 becomes thinner. The cause of this inverted trapezoidal shape is that, when the photoresist film 6 is overlaid with two or three layers, light rays (ultraviolet rays) are absorbed exponentially. Is not reached. It has been found that such an inverted trapezoidal tendency becomes more remarkable as a photoresist having a lower light transmittance is used alone.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

本発明は、こうした知見に基づき、フォトレジスト膜
の逆台形化の傾向を巧みに利用し、そうした断面逆台形
の透孔を必要とする電鋳製品、例えばノズル電鋳製品を
得ようとするのである。
Based on such knowledge, the present invention skillfully utilizes the tendency of the photoresist film to be inverted trapezoid, and seeks to obtain an electroformed product that requires such a cross-section inverted trapezoidal through-hole, for example, a nozzle electroformed product. is there.

しかし、上記した厚手のフォトレジスト膜6ではその
下層部に達する光線(紫外線)量が少なくなり、表面硬
化が先行して下層部が未硬化膜になり易いことから、フ
ォトレジスト膜6の下層部が電鋳母型3から剥離して欠
損を生じやすい。そのため、上記したフォトレジスト膜
6では一定した断面逆台形の透孔2をもつ電鋳製品が得
ることが難しい。また、断面逆台形のみでは、ノズル、
特にインクジェットプリンター用ノズルのように噴射対
象物に対してインクを一様で平行に精度よく噴出させる
必要のある物には適しない。
However, in the thick photoresist film 6 described above, the amount of light (ultraviolet rays) reaching the lower layer portion is small, and the lower layer portion tends to become an uncured film due to the surface hardening. Are easily peeled from the electroformed mold 3 to cause defects. Therefore, it is difficult to obtain an electroformed product having the through-hole 2 having a constant inverted trapezoidal cross section with the photoresist film 6 described above. In addition, the nozzle,
In particular, it is not suitable for an object such as a nozzle for an ink jet printer which needs to jet ink uniformly and parallel to an ejection target with high accuracy.

そこで本発明は、透孔2の断面形状としてその上部が
逆台形部2aで、かつその下部の出口側に細い垂直部2bを
有して、例えばノズル、特にインクジェットプリンター
用ノズルに最適となる電鋳製品の製造方法を提供しよう
とするものである。
In view of this, the present invention has an inverted trapezoidal portion 2a at the upper part and a thin vertical part 2b at the outlet side at the lower part of the cross-sectional shape of the through-hole 2, so that it is optimal for a nozzle, particularly a nozzle for an inkjet printer. An object of the present invention is to provide a method for manufacturing a cast product.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、第1図(a)ないし(b)に例示するよう
に、電鋳母型3の表面に、電鋳製品の透孔に相当するパ
ターン(模様)をもつネガ型のフォトレジスト膜6を形
成し、該電鋳母型6のフォトレジスト膜6で覆われてい
ない表面に金属7を電着させたのち、その電着金属7を
電鋳母型3から剥離して、透孔2を有する電鋳製品を得
る製造方法において、 上記フォトレジスト膜6を、光線透過率の大きいフォ
トレジストと光線透過率の小さいフォトレジストの複数
層で形成し、電鋳母型3の表面に接する側の下層部に光
線透過率の大きいフォトレジスト4aを使用したものであ
る。
As shown in FIGS. 1 (a) and 1 (b), the present invention provides a negative type photoresist film having a pattern (pattern) corresponding to a through hole of an electroformed product on the surface of an electroformed mold 3. 6 is formed, and a metal 7 is electrodeposited on the surface of the electroforming mold 6 that is not covered with the photoresist film 6, and the electrodeposited metal 7 is peeled off from the electroforming mold 3 to form a through hole. In the manufacturing method for obtaining an electroformed product having a shape 2, the photoresist film 6 is formed of a plurality of layers of a photoresist having a large light transmittance and a photoresist having a small light transmittance, and is in contact with the surface of the electroformed mold 3. A photoresist 4a having a high light transmittance is used in the lower layer on the side.

〔作用〕[Action]

電鋳母型3の表面に接する下層部に光線透過率の高い
フォトレジスト4aを使用したので、光線はフォトレジス
ト膜6の下層部にまで充分に達し、フォトレジスト4aの
電鋳母型3との接触面も充分に硬化させることができ、
フォトレジスト膜6の下層部が電鋳母型3から剥離して
欠損するようなことが少なくなる。
Since the photoresist 4a having a high light transmittance is used in the lower layer portion in contact with the surface of the electroformed mold 3, the light beam sufficiently reaches the lower layer portion of the photoresist film 6, and the light is transmitted to the electroformed mold 3 of the photoresist 4a. The contact surface of can be cured sufficiently,
It is less likely that the lower layer portion of the photoresist film 6 is peeled off from the electroforming mold 3 and is damaged.

また、そのように下層部に光線透過率の高いフォトレ
ジスト膜4aを使用することにより、光線はそのフォトレ
ジスト4a内をほぼ垂直に透過するため、逆台形部6aの下
部に細い垂直部6bを有するフォトレジスト膜6を得るこ
とができる。したがって、このフォトレジスト膜6を用
いて電鋳すると、断面形状が逆台形部2aの下部に細い垂
直部2bを有する形の透孔2を有する電鋳製品を得ること
ができ、その細い垂直部2bではインクなどの流体を一様
に平行に噴出させことができる。
In addition, by using a photoresist film 4a having a high light transmittance in the lower layer portion, the light beam is transmitted almost vertically in the photoresist 4a, so that a thin vertical portion 6b is formed below the inverted trapezoidal portion 6a. Thus, a photoresist film 6 can be obtained. Therefore, when electroforming using this photoresist film 6, it is possible to obtain an electroformed product having the through-hole 2 having a cross section having a narrow vertical portion 2b below the inverted trapezoidal portion 2a. In 2b, a fluid such as ink can be jetted uniformly and parallel.

〔発明の効果〕〔The invention's effect〕

本発明によれば、透孔を有する電鋳製品の透孔2の断
面形状として逆台形部2aの下部に細い垂直部2bをもつ形
のものを得ることができるため、ノズル、特にインクジ
ェットプリンター用ノズルのように噴射対象物に対して
インクなどを一様で平行に噴出させる必要のある物、ま
たはこれに類する物に適した電鋳製品も簡易に製造する
ことができて有利である。
According to the present invention, since the cross-sectional shape of the through hole 2 of the electroformed product having the through hole can be obtained in a shape having a thin vertical portion 2b below the inverted trapezoidal portion 2a, a nozzle, particularly for an ink jet printer Advantageously, an electroformed product suitable for an object such as a nozzle, which needs to eject ink or the like uniformly and parallel to an ejection target, or a similar product, can be easily manufactured.

〔実施例〕〔Example〕

本発明に係る電鋳製品の製造方法一実施例を第1図
(a)ないし(f)、第2図、第3図および第4図に基
づき説明する。
One embodiment of a method for manufacturing an electroformed product according to the present invention will be described with reference to FIGS. 1 (a) to 1 (f), FIGS. 2, 3 and 4.

第2図はその電鋳製品の一例であるインクジェットプ
リンター用ノズルを示しており、四角形の薄い平板状の
ノズル本体1(100μ厚)に多数の透孔2を形成してい
る。その透孔2の断面形状は、第3図に示すようにその
上部に逆台形部2aを、下部(出口側)に細い垂直部2bを
連通形成した形を有している。
FIG. 2 shows a nozzle for an ink jet printer, which is an example of the electroformed product, in which a large number of through holes 2 are formed in a nozzle body 1 (100 μ thick) having a thin rectangular plate shape. As shown in FIG. 3, the cross-sectional shape of the through-hole 2 has a shape in which an inverted trapezoidal portion 2a is formed in the upper portion and a thin vertical portion 2b is formed in the lower portion (outlet side).

このような断面形状の透孔2を有する電鋳製品は次の
ような工程を経て製造される。
An electroformed product having the through-hole 2 having such a cross-sectional shape is manufactured through the following steps.

まず、第1図(a)に示すようにステンレス鋼製の電
鋳母型3の表面にネガ型のフィルム状のフォトレジスト
4を複数層(図示例では4層4a・4b・4c・4d)重ね合わ
せて、例えば200μの厚膜を形成する。この場合、4層
のうち、電鋳母型3の表面に接する側のフォトレジスト
4a(50μ厚)は、他の3層のフォトレジスト4b・4c・4d
の光線透過率よりも大きいものを使用する。
First, as shown in FIG. 1 (a), a plurality of negative-type film-shaped photoresists 4 (four layers 4a, 4b, 4c, 4d in the illustrated example) are formed on the surface of a stainless steel electroformed mold 3. By superimposing, for example, a 200 μm thick film is formed. In this case, of the four layers, the photoresist on the side in contact with the surface of the electroformed mold 3
4a (50μ thickness) is the other three layers of photoresist 4b, 4c, 4d
Used is larger than the light transmittance of

第4図に三種のフォトレジストの紫外線透過特性(膜
厚50μl層・断面図Aは4層重ね合わせた時)を示して
いるが、その中で、光線透過率の大きいフォトレジスト
4aとしては、例えば、日本合成化学工業(株)製の商品
名;日合ALPHO−321Y50を、光線透過率の小さいフォト
レジスト膜4b・4c・4dとしては、例えば、同社製の商品
名;日合ALPHO−1150MY、または日合ALPHO−111Y50を選
ぶ。因みに、第4図中、波長365nmは紫外線ランプの紫
外線波長のピークで、この波長の光が最も多く発せられ
ている。したがって、フォトレジストのこの365nmに硬
化波長のピークをもってきているものが多い。
FIG. 4 shows the ultraviolet transmission characteristics of the three types of photoresists (thickness: 50 μl, cross-section A: when four layers are superimposed).
As 4a, for example, a trade name of Nippon Gohsei Chemical Co., Ltd .; Nichigo ALPHO-321Y50, and as the photoresist films 4b, 4c, 4d with low light transmittance, for example, the trade names of Nippon Gohsei Chemical Co., Ltd .; Select ALPHO-1150MY or Nippon ALPHO-111Y50. Incidentally, in FIG. 4, the wavelength 365 nm is the peak of the ultraviolet wavelength of the ultraviolet lamp, and the light of this wavelength is emitted most. Therefore, many photoresists have a curing wavelength peak at 365 nm.

次いで、第1図(b)に示すようにフォトレジスト4
の上に電鋳製品の透孔に相当するパターン(模様)をも
つフィルム5を密着させ、第1図(c)に示すように紫
外線ランプを照射して焼き付け、現像、乾燥の各処理を
行う。このとき光線透過率の小さいフォトレジスト4d・
4c層により光線が徐々に吸収され、4b層あたりから逆台
形化が著しくなって、第1図(d)に示すようなフォト
レジスト膜6を形成する。このフォトレジスト膜6は、
光線透過率の小さいフォトレジスト4b・4c・4dの上層部
では断面逆台形部6aを、光線透過率の大きいフォトレジ
スト4aの下層部では断面垂直部6bをもつ形となる。次い
で、電鋳母型3を電着槽に移し、ニッケル、あるいはニ
ッケル−コバルト合金で電鋳を行って、第1図(e)に
示すように電鋳母型3のフォトレジスト膜6で覆われて
いない表面に金属7をフォトレジスト膜6の略2層目の
高さ(100μ)にまで電着する。
Next, as shown in FIG.
A film 5 having a pattern (pattern) corresponding to the through hole of the electroformed product is brought into close contact with the film, and as shown in FIG. 1C, irradiation with an ultraviolet lamp, baking, development, and drying are performed. . At this time, the photoresist 4d
The light rays are gradually absorbed by the 4c layer, and the inverted trapezoid becomes remarkable from around the 4b layer to form a photoresist film 6 as shown in FIG. 1 (d). This photoresist film 6
The photoresist 4b, 4c, 4d having a low light transmittance has an inverted trapezoidal section 6a in the upper layer, and the photoresist 4a having a high light transmittance has a vertical section 6b in the lower layer. Next, the electroformed mold 3 is transferred to an electrodeposition bath, electroformed with nickel or a nickel-cobalt alloy, and covered with a photoresist film 6 of the electroformed mold 3 as shown in FIG. Metal 7 is electrodeposited on the uncoated surface to a height (100 μ) of the second layer of the photoresist film 6.

電鋳後、その電着金属7をフォトレジスト膜6共に電
鋳母型3から剥離し、フォトレジスト膜6を除去するこ
とにより、第1図(f)に示すような断面形状が逆台形
部2aと細い垂直部2bからなる透孔2を有する電鋳製品9
を得る。
After the electroforming, the electrodeposited metal 7 and the photoresist film 6 are peeled off from the electroforming matrix 3 and the photoresist film 6 is removed, so that the cross-sectional shape as shown in FIG. Electroformed product 9 having through-hole 2 consisting of 2a and narrow vertical portion 2b
Get.

〔別実施例〕(Another embodiment)

上記実施例では、電鋳母型3の表面に形成するフォト
レジスト4として、フィルム状のレジストを用いている
が、これに代えて液体状のフォトレジストを複数層に順
次塗布乾燥して厚肉のフォトレジスト膜6を形成するこ
ともできる。
In the above embodiment, a film-like resist is used as the photoresist 4 formed on the surface of the electroformed mold 3. Instead, a liquid photoresist is sequentially applied to a plurality of layers and dried to form a thick photoresist. May be formed.

【図面の簡単な説明】[Brief description of the drawings]

第1図(a)ないし(f)、第2図、第3図および第4
図は本発明に係る電鋳製品の製造方法の一実施例を示し
ており、 第1図(a)ないし(f)は製造過程の工程説明図、 第2図は電鋳製品の斜視図、 第3図は第2図に示す電鋳製品の透孔部の拡大断面図、 第4図は各種フォトレジストの紫外線透過特性を示す図
である。 第5図(a)ないし(d)は従来例の電鋳製品の製造過
程の工程説明図である。 2……透孔、 3……電鋳母型、 4……フォトレジスト、 6……フォトレジスト膜、 7……電着金属、 9……電鋳製品。
FIGS. 1 (a) to 1 (f), FIGS. 2, 3 and 4
FIG. 1 shows an embodiment of a method of manufacturing an electroformed product according to the present invention, wherein FIGS. 1 (a) to 1 (f) are process explanatory views of a manufacturing process, FIG. 2 is a perspective view of an electroformed product, FIG. 3 is an enlarged cross-sectional view of a through-hole portion of the electroformed product shown in FIG. 2, and FIG. 4 is a view showing ultraviolet transmission characteristics of various photoresists. FIGS. 5 (a) to 5 (d) are process explanatory diagrams of a process of manufacturing a conventional electroformed product. 2 ... through-hole, 3 ... electroforming matrix, 4 ... photoresist, 6 ... photoresist film, 7 ... electrodeposited metal, 9 ... electroformed product.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小林 良弘 福岡県田川郡方城町大字伊方4680番地 九州日立マクセル株式会社内 (56)参考文献 特開 昭64−62491(JP,A) (58)調査した分野(Int.Cl.6,DB名) C25D 1/00 - 3/66 C25D 5/00 - 7/12 ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yoshihiro Kobayashi 4680 Ikata, Fukuoka-machi, Fukuoka Prefecture Inside Kyushu Hitachi Maxell Co., Ltd. (56) References JP-A-64-62491 (JP, A) (58) Surveyed field (Int.Cl. 6 , DB name) C25D 1/00-3/66 C25D 5/00-7/12

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】電鋳母型(3)の表面に、電鋳製品の透孔
に相当するパターンをもつネガ型のフォトレジスト膜
(6)を形成し、該電鋳母型(3)のフォトレジスト膜
(6)で覆われていない表面に金属(7)を電着させた
のち、その電着金属(7)を電鋳母型(3)から剥離し
て、逆台形状の透孔(2)を有する電鋳製品を得る製造
方法において、 上記フォトレジスト膜(6)が光線透過率の大きいフォ
トレジストと光線透過率の小さいフォトレジストの複数
層からなり、電鋳母型(3)の表面に接する側の下層部
に光線透過率の大きい方のフォトレジスト(4a)を使用
することにより、フォトレジスト膜(6)の上層部で前
記透孔(2)の上部を逆台形状に、フォトレジスト膜
(6)の下層部で前記透孔(2)の上部に連通する下部
を垂直状にそれぞれ形成することを特徴とする、透孔を
有する電鋳製品の製造方法。
1. A negative type photoresist film (6) having a pattern corresponding to a hole of an electroformed product is formed on the surface of an electroformed mold (3). After the metal (7) is electrodeposited on the surface not covered with the photoresist film (6), the electrodeposited metal (7) is peeled off from the electroformed mold (3) to form an inverted trapezoidal through hole. The method for producing an electroformed product having (2), wherein the photoresist film (6) comprises a plurality of layers of a photoresist having a large light transmittance and a photoresist having a small light transmittance, and the electroforming matrix (3). By using the photoresist (4a) having the higher light transmittance in the lower layer on the side in contact with the surface of the film, the upper part of the through-hole (2) is formed in an inverted trapezoidal shape in the upper layer of the photoresist film (6). The lower part of the photoresist film (6), which communicates with the upper part of the through hole (2), is vertically Respectively and forming method of electroforming products having a through hole on.
JP2314959A 1990-11-19 1990-11-19 Method for producing electroformed product having through-hole Expired - Fee Related JP2992645B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2314959A JP2992645B2 (en) 1990-11-19 1990-11-19 Method for producing electroformed product having through-hole

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2314959A JP2992645B2 (en) 1990-11-19 1990-11-19 Method for producing electroformed product having through-hole

Publications (2)

Publication Number Publication Date
JPH04183892A JPH04183892A (en) 1992-06-30
JP2992645B2 true JP2992645B2 (en) 1999-12-20

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Publication number Priority date Publication date Assignee Title
US6235177B1 (en) * 1999-09-09 2001-05-22 Aerogen, Inc. Method for the construction of an aperture plate for dispensing liquid droplets
JP4527250B2 (en) * 2000-07-10 2010-08-18 九州日立マクセル株式会社 Nozzle body manufacturing method
JP2006016654A (en) * 2004-06-30 2006-01-19 Kuraray Co Ltd Method for producing through type metal structure
JP4768473B2 (en) * 2006-02-27 2011-09-07 富士フイルム株式会社 Method for manufacturing electroforming mold, liquid discharge head and image forming apparatus manufactured thereby
JP5470791B2 (en) * 2008-09-29 2014-04-16 オムロン株式会社 Electroforming method
EP3795361A1 (en) * 2010-12-28 2021-03-24 Stamford Devices Limited Photodefined aperture plate and method for producing the same
BR112014027624B1 (en) 2012-06-11 2021-01-19 Stamford Devices Ltd method of making an aerosol forming orifice plate blade, orifice plate, aerosol forming device and orifice plate blade
WO2015177311A1 (en) 2014-05-23 2015-11-26 Stamford Devices Limited A method for producing an aperture plate
CN104975310B (en) * 2015-06-12 2017-09-22 中国科学院宁波材料技术与工程研究所 A kind of processing method of nozzle and nozzle mold and nozzle and nozzle mold

Also Published As

Publication number Publication date
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