JPH042182B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a photographic film set device for mounting a photographic film on a photo tool to be used for exposing a photoresist used for etching resist, plating resist, solder resist, etc. It is related to.

[Technical background of the invention and its problems]

For example, as shown in Japanese Unexamined Patent Publication No. 164595/1983, a printed circuit board manufacturing method using liquid photoresist involves coating a substrate with a uniform thickness of photoresist, and then applying a very small amount of photoresist onto the photoresist. A photographic film having a circuit pattern is placed off-contact through a uniform gap, and then the photographic film is exposed to parallel light beams to expose the photoresist, and the photoresist is cured according to the circuit pattern of the photographic film. In some methods, the uncured photoresist is removed, the exposed metal is removed by etching, and finally the cured photoresist is removed.

In such a printed circuit board manufacturing method, the problem is how to make the equipment for each process easy to use. For example, the above-mentioned photographic film is suctioned and held in a flat shape by the underside of the phototool so as to face the photoresist, but the work of attaching the photographic film to the underside of the phototool is done manually and requires precision. , it is necessary for the operator to attach the photographic film to the photo tool in a state that is most convenient for the operator to work with.

[Purpose of the invention]

SUMMARY OF THE INVENTION An object of the present invention is to enable the photo tool to be easily turned over to a position that facilitates the mounting operation when a photographic film is to be mounted on the underside of the photo tool.

[Summary of the invention]

The photographic film set device in the photoresist processing apparatus of the present invention places a photographic film on a photoresist provided on a substrate, and exposes the photoresist through the photographic film, thereby transferring the photoresist into a pattern of the photographic film. In a photoresist processing device that hardens according to the conditions, rails are provided in the front and back directions on both the left and right sides when viewed from the side where the photographic film is mounted, and the rear part of the link is rotatable via a horizontal axis at the rear part of both rails. The left and right sides of the relatively front side of the photo tool for holding photographic film are rotatably attached via a horizontal shaft between the front parts of the links on both sides, and the relatively rear side of the photo tool is rotatably attached to the A roller that rolls on the rail is attached to the left and right sides of the side part, and a stopper that locks the roller is provided on the relatively front side of the rail, and the front part of the photo tool is pulled. When raised, this photo tool rises while rotating around the front horizontal axis that rises due to the rotation of the link, and at the same time the roller moves on the rail, and when this roller is below the front horizontal axis, When the front part of the photo tool is tilted backward, the roller is locked by the stopper with the lower surface of the photo tool inverted diagonally upward so as to face the operator.

[Embodiments of the invention]

The present invention will be described below with reference to embodiments shown in the drawings.

FIG. 1 shows a part of a liquid photoresist processing apparatus, in which a transfer machine (not shown) supplies one substrate from a large number of stacked substrates 1 onto a conveyor 2, and a static eliminator 3 removes static electricity. After removing dust, this substrate is transferred to roller coater 4.
The liquid photoresist 7 supplied between the rollers 5 and 6 is applied over the entire surface of the substrate to a uniform thickness. The liquid photoresist 7 is an ultraviolet curable liquid resin composition (also called UV ink), and has the property of being cured by being exposed to ultraviolet light. Next, this substrate is sent to an exposure device 10 via a conveyor 9 having an ultraviolet protection cover 8.

This exposure device 10 includes a pre-exposure device 11, an ultraviolet irradiation device 12, and a photographic film set device 13.
, a surface plate 14 on the lower side thereof, and a conveyor 15 that is movable up and down.
on the liquid photoresist applied to the top surface of the
A photographic film (negative film) having a circuit pattern is placed in off-contact with an extremely small uniform gap of about 0.2 to 0.5 mm across the entire surface, and then parallel ultraviolet rays are applied to this photographic film to form the liquid photo film. The resist is exposed to light, and the liquid photoresist is hardened in accordance with the circuit pattern of the photographic film.

The board onto which the circuit pattern has been transferred in this manner is transferred to a conveyor 18 having an ultraviolet protection cover 17.
After that, the photoresist is sent to a water washing process to remove uncured liquid photoresist, and then sent to a UV curing oven through a drying process, where it is additionally cured by post-exposure, and then sent to an etching process.
The exposed metal is removed by etching and finally the hardened photoresist is removed.

As shown in FIGS. 1 and 2, the photographic film setting device 13 includes vertical motion bearings 22 mounted on vertical motion guides 21 fixed at four locations on the left, right, front, and rear.
The U-shaped outer frame 23 is attached vertically movably through the outer frame 23, and the left and right chains 24, whose inner ends are connected to the center of the left and right parts of the outer frame 23, are wound around the left and right upper sprockets 25. chain 24
A balance weight 26 is provided at the outer end of the sprocket 25, and the left and right sprockets 25 are moved in opposite directions by a motor 27 with a brake and an interlocking rod 28 through engagement with the left and right worm reducers 29 and gears 30, 31. As a result, the inner ends of the left and right chains 24 are simultaneously moved up and down, and the outer frame 23 is moved up and down.

Next, as shown in FIGS. 3 and 4, a slide unit 34 is provided in the front-rear direction inside the left and right portions of the outer frame 23 when viewed from the side where the photographic film is mounted. This slide unit 34 has a slide rail slidably fitted to a guide rail fixed to the outer frame 23, and drawer rails 35 in the front and back direction are attached to the slide rails on both the left and right sides.
A rear part of a link 37 is rotatably attached to the rear part of the drawer rails 35 on both sides via a horizontal shaft 36, and a photo film for holding photographic film is connected between the front parts of the links 37 on both sides via a horizontal shaft 38. The left and right side surfaces of the relatively front side of the photo tool 39 are rotatably attached, and rollers 40 rolling on the rails 35 are rotatably attached to the left and right side surfaces of the relatively rear side of the photo tool 39. The roller 4 is placed on the relatively front side of the rail 35.
A stopper 41 for locking the 0 is provided. Note that rollers 42 supported by the rails 35 are also pivotally attached to the left and right side surfaces of the relatively front portion of the photo tool 39, but these do not need to be rollers.

The photo tool 39 projects into an inversion frame 45 that is moved up and down integrally with the outer frame 23 and inverted around the front transverse axis 38, and at a plurality of stable support positions on the lower surface of the inversion frame 45. A glass frame 48 is fitted to a provided locking pin 46 via an L-shaped plate 47 so as to be vertically movable, and a large number of locking claws 50 are positioned on this glass frame 48 by two positioning pins 49. Glass plate 5 provided integrally with
It is composed of a plurality of members such as 1. As shown in FIG. 5, the glass plate 51 attracts a photographic film (negative film) 52 on its lower surface.

The glass frame 48 is provided with a micrometer head 55 as a height fine adjustment body at each of its plurality of stable support positions, as shown in FIG.
The lower end of the movable shaft portion 56 of each micrometer head 55 is brought into contact with the upper surface of the surface plate 14 on which the substrate 1 is positioned and supported.

Therefore, even if the reversing frame 45 slightly overruns the position where it should descend and stop due to the difficulty in controlling the motor 27, the plurality of micrometer heads 55
comes into contact with the lower surface of the surface plate 14 as a stopper, and the entire glass plate 51 can be positioned at a predetermined height on the surface plate. A slight gap 58 of about 0.2 to 0.5 mm between the photoresist 57 and the liquid photoresist 57 can be kept constant and evenly spaced over the entire surface.

Furthermore, as shown in FIG. 5, a slight gap 61 is provided in the horizontal direction at the fitting portion between the locking pin 46 of the reversing frame 45 and the L-shaped plate 47 of the glass frame 48. As shown in the figure, two pins 63 as horizontal positioning portions are protrudingly provided on the lower surface of the glass frame 48 to fit into hole grooves 62 as two positioning portions of the surface plate 14. Then, by fitting the tapered pin tip of the pin 63 of the glass frame 48 into the hole groove 62 of the surface plate 14,
The horizontal positioning of the glass frame 48 with respect to the surface plate 14 can be accurately performed. Furthermore, as the vertical conveyor 15 shown in FIG. 1 descends, the substrate 1 is accurately positioned with respect to the surface plate 14 by fitting into two positioning pins 64 on the surface plate shown in FIG. Therefore, the horizontal positioning of the glass frame 48, the glass plate 51, and the photographic film 52 on the lower surface of the glass plate with respect to the substrate 1 can be accurately performed.

As shown in FIG. 6, the glass plate 51 is provided with an endless groove 65 on its lower surface.
A vacuum pump is connected to a suction hole 66 formed in a part of 5 through a tube (not shown). Then, the photographic film 52 is held in close contact with the glass plate 51 by the vacuum suction effect of the groove 65.

Next, when loading the photographic film 52 onto the glass plate 51, as shown in FIG. The photo tool 39 is pulled out from the outer frame 23 by the action of the slide unit 34, and the photo tool 39 is pulled out from the outer frame 23 by the action of the slide unit 34.
When the photo tool 3 is pulled up, the link 37 is rotated upward around the rear horizontal axis 36, and the photo tool 3 is rotated upward around the front horizontal axis 38, which is raised by the rotation of the link 37.
9 is raised while rotating. At the same time, the rear roller 40 is moved forward on the rail 35. When the roller 40 is below the front horizontal shaft 38, the handle 67 is tilted backward, and the lower surface of the photo tool 39, that is, the lower surface of the glass plate 51, is slightly lower than the operator, as shown in FIG. The roller 40 is turned diagonally upward so as to face the user, and in this state the roller 40 is stopped by a stopper 41. In this way, the glass plate 51 is inverted to the most suitable position for the operator to attach the photographic film 52 to the lower surface of the glass plate 51. Moreover, the operator can do this by pulling up the glass plate 51 while pulling the handle 67, and moving it slightly backward. It is easy to press and has good workability.

Since the micrometer head 55 is used as a height fine adjustment member for the glass frame 48, there is an advantage that the gap between the film 52 and the liquid photoresist 57 can be adjusted and changed very easily.

Finally, although the above embodiments have been described with respect to the etching resist method, the photographic film setting apparatus of the present invention can be similarly utilized in the plating resist method or the solder resist method.

For example, in the Metsuki resist method, a liquid photoresist is applied to a substrate, a photographic film is placed on top of the liquid photoresist using this device, and the liquid photoresist is exposed to parallel light through the photographic film, so that the liquid photoresist does not harden. The liquid photoresist is removed, the exposed metal surface of the portion from which the liquid photoresist has been removed is metal plated, the cured liquid photoresist is then removed, and the exposed metal of the portion from which the cured resist has been removed is removed.

Furthermore, in the solder resist method, a liquid photoresist is applied to a substrate, a photographic film is placed on top of the liquid photoresist using this device, and the liquid photoresist is exposed to parallel light through the photographic film, so that the liquid photoresist does not harden. The liquid photoresist is removed and solder is applied to the exposed metal surface where the resist is removed.

〔Effect of the invention〕

According to the present invention, longitudinal rails are provided on both the left and right sides when viewed from the side on which the photographic film is mounted, and the rear part of the link is rotatably attached to the rear part of the rails on both sides via a horizontal shaft. The relatively front left and right sides of a photo tool for holding photographic film are rotatably attached via a horizontal shaft between the front parts of the links on both sides, and the right and left sides of the relatively rear side of the photo tool are rotatably attached to A roller rolling on the rail is pivoted, and a stopper for locking the roller is provided on the relatively front side of the rail, so when the front part of the photo tool is pulled up, the photo tool will be attached to the link. It rises while rotating around the front horizontal axis that rises by rotation, and at the same time the roller moves on the rail, and when this roller is below the front horizontal axis, tilt the front of the photo tool backwards. , the roller is locked by the stopper with the bottom surface of the photo tool turned diagonally upwards to face the operator, and the photo tool is placed in the most suitable position for loading photographic film onto the bottom surface of the photo tool. You can easily perform a series of operations to reverse the tool.

[Brief explanation of drawings]

The figures relate to the photographic filmset apparatus of the present invention, in which FIG. 1 is a front view showing a part of the liquid photoresist processing system, and FIG.
A line sectional view, Figure 3 is a - line sectional view of Figure 2,
Figure 4 is a sectional view taken along the - line in Figure 3, and Figure 5 is a cross-sectional view of Figure 4.
FIG. 6 is an enlarged sectional view of a part of the figure and a perspective view of the glass plate. 1... Board, 35... Rail, 36... Rear horizontal axis,
37... Link, 38... Front horizontal axis, 39... Photo tool, 40... Roller, 41... Stopper, 52...
Photographic film, 57...Photoresist.

Claims (1)

[Claims] 1. A photoresist in which a photographic film is placed on a photoresist provided on a substrate, and the photoresist is cured according to the pattern of the photographic film by exposing the photoresist through the photographic film. In the processing device, front and rear rails are provided on both the left and right sides when viewed from the side where the photographic film is mounted, and the rear part of the link is rotatably attached to the rear part of the rails on both sides via a horizontal shaft. The left and right sides of the relatively front side of a photo tool for holding photographic film are rotatably attached via a horizontal shaft between the front parts of the links, and the 1. A photographic film set device for a photoresist processing apparatus, characterized in that a roller rolling on a rail is mounted on a shaft, and a stopper for locking the roller is provided at a relatively front side of the rail. 2. A photographic filmset device in a photoresist processing apparatus according to claim 1, wherein the rails on both the left and right sides are provided so as to be able to be pulled out forward.