JPH04175760A - Manufacture of organic photoreceptor with surface protective layer - Google Patents

Abstract

PURPOSE:To obtain an organic photoreceptor prevented with the surface peeling, the rise of residual potential and the occurrence of black stripes by cleaning and roughening the surface of a photosensitive layer before forming a vacuum thin film on the surface of the organic photosensitive layer as a surface protective layer. CONSTITUTION:For the cleaning method of a photosensitive layer, the dipping method, shower method, and steam cleaning method may be applied, the dipping method is preferable, and it is sufficient to dip the photosensitive layer in a hexane solvent at 20 deg.C for about 60 sec in this cleaning method, for example. A mechanical rubbing means pressing and rubbing a fabric or a brush is used for the surface roughening method, and many buffs may be used for the buff rubbing treatment. A vacuum thin film is formed on the surface of the organic photosensitive layer as a surface protective layer after the cleaning process and the roughening treatment are completed. Such problems as the defective toner cleaning, the rise of residual potential due to repeated use, and the occurrence of black stripes caused by it are prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing an organic photoreceptor having a vacuum thin film as a surface protective layer.

BACKGROUND OF THE INVENTION In recent years, electrophotographic photoreceptors in which an organic photoconductive material is blended with an adhesive resin have come into wide use.

This type of photoreceptor has the advantage that it has no hygienic problems and is superior in processability and industrial productivity compared to photoreceptors using selenium, cadmium sulfide, or the like.

However, these organic photoreceptors lack hardness and are easily scratched and scratched by friction with transfer paper, cleaning members, developers, etc. during repeated use.

In order to solve this problem, there is a technique of providing a surface protective layer on the surface of the organic photosensitive layer.

A vacuum thin film of a continuous compound has been proposed as one type of such surface protective layer.

It is also possible to form a vacuum thin film with high hardness, and an organic photoreceptor that has such a vacuum thin film as a surface protective layer of an organic photosensitive layer is similar to an organic photoreceptor that does not have a surface protective layer. In comparison, it has excellent durability and has sufficient film strength for long-term use at room temperature and humidity, but its moisture resistance after long-term use is not sufficient, and when used repeatedly,
Problems arise in that the residual potential increases and black streak-like image noise occurs.

On the other hand, ideally, it is desirable to form a surface protective layer on the surface of the organic photosensitive layer immediately after forming the organic photosensitive layer, but in reality, due to the simplification of the manufacturing process and equipment problems, It is common to manufacture a large quantity of a material with only a layer formed thereon at one time (17), and then to subject it to a step of forming a surface protective layer such as an amorphous carbon film.

During that time, the organic photosensitive layer is stored for several days to several months (
This storage period is often referred to as the ``introductory period J''.

After formation, the surface of the organic photosensitive layer becomes oxidized by oxygen in the atmosphere over time. If a vacuum thin film, such as an amorphous carbon film, is provided on the surface of the organic photosensitive layer on which such an oxide film has been formed, the adhesion between the oxide film surface and the vacuum thin film will be poor. Peeling of the surface protective layer will occur.

According to the experience of the inventors, this phenomenon is already likely to occur in organic photosensitive layers that have been coated for several days.

Problems to be Solved by the Invention The present invention has been made in view of the above circumstances, and uses organic photosensitive materials! The above-mentioned problem is attempted to be solved by cleaning and roughening the surface of the photosensitive layer before forming a vacuum thin film on the surface as a surface protective layer.

That is, an object of the present invention is to provide a method for manufacturing an organic photoreceptor without surface peeling, increase in residual potential, and generation of black streaks.

Means for Solving the Problems The present invention is characterized in that after a step of cleaning an organic photosensitive layer and a step of roughening the surface of the organic photosensitive layer, a vacuum thin film is formed as a surface protective layer. The present invention relates to a method for manufacturing an organic photoreceptor.

The method for manufacturing a photoreceptor of the present invention first includes a step of cleaning an organic photosensitive layer and a step of roughening the surface.

The photosensitive layer is a well-known organic photosensitive layer provided on a conductive substrate, and the internal structure of the photosensitive layer is similar to that of the conductive substrate.
Second, there is a photosensitive layer with a single-layer structure in which a photoconductive material and a charge transporting material are blended as a binder, and a functionally separated type in which a charge generation layer and a charge transporting layer are sequentially formed on a conductive support. The photosensitive layer may have a photosensitive layer structure, or a functionally separated structure in which a charge transport layer and a charge generation layer are sequentially formed on a conductive support.

However, as for the charge generation layer, 7talo/arne vapor M
There are also films that are made of only the charge-generating substance itself without using a binder resin, but even if it is composed of such a V charge-generating layer, a resin-dispersed type! The present invention is effective as long as the cargo transport layer is destroyed.

In addition, when a surface protective layer is provided, a resin layer is first provided on the top of the photosensitive layer so that the photosensitive layer under the protective layer does not deteriorate due to the impact of electrons or ions in plasma, heat, etc. have been proposed (for example, in Japanese Patent Application Laid-Open No. 2001-01)
-133063, etc.), in the case of a photoreceptor with such a structure, regardless of whether the photosensitive layer is inorganic or organic, applying the present invention can improve durability, increase residual potential, decrease sensitivity (black Muscle development) is improved.

Cleaning of the organic photosensitive layer is not particularly limited as long as it has the effect of removing the oxide film on the surface of the photosensitive layer. Specifically, solvents that can be used for cleaning organic photosensitive layers include:
For example, n-/\ Katasan, Nclohexane, Ben-
Saturated hydrocarbons such as tan, heptane, octane, ligroin, petroleum needle, benzine, inhexane, western hexane, 1-hensen, methanol,
Hydrocarbons such as ethanol, propatool, phytyl alcohol, allyl alcohol, and benzyl alcohol, 1-flucols, androaromatic hydrocarbons such as toluene, xylene, hemimelithene, pseudocumene, and tetralin, acetone, ethyl methyl ketone, nclohexanone, and methyl Examples include ketones such as vinyl ketone, and polymers such as ethyl needle and methyl ether. Preferred are hexane and inhexane.

The Sakura halogen atom solvent can also be used, and has 1 to 6 carbon atoms.
It is a hydrocarbon alcohol in which the hydrogen atom bonded to the carbon atom is replaced with a fluorine atom, and all isomers are applicable.

Examples of such fluorine-containing alcohols include fluorinated methanol, fluorinated ethanol, fluorinated propane, fluorinated butanol, fluorinated pentanol, fluorinated xanol, and fluorinated butanediol. Preferred fluorine-containing alcohols include 5-fluorinated proptool, 3-fluorinated propanol, and the most preferred is 5-fluorinated proptool (including all isomers).

In addition, 1,1. ll-lichloro-1,2,2-trifluoroethane, etc. are also applicable.

As a method for cleaning the photosensitive layer, a dipping method, a wet cleaning method, a steam cleaning method, etc. may be applied, and the cleaning conditions are as follows.
Type of photoreceptor (monodisperse, functionally separated type), type of constituent resin,
It may be selected and set as appropriate depending on the type of solvent used.

A dipping method is preferred, and in this cleaning method, for example, it is sufficient to immerse the photosensitive layer in a hexane solvent at 20° C. for about 60 seconds. In order to increase the cleaning effect, ultrasonic vibration may be applied or the solvent may be (purified) circulated.

The surface of the photoconductor cleaned in this way is coated with, for example, plasma? The surface protective layer (vacuum thin film) can be formed with good adhesion by a variety of methods such as CVD, photo-CVD, thermal CVD, sputtering, vapor deposition, and ion-blating.

The method of surface roughening is not particularly limited, but
For example, natural fibers (animal hair such as wool, deer hair, rabbit hair, cotton,
linen, etc.), chemical fibers (rayon, acetate, nylon,
Polypropylene, acrylic, polyester, Teflon, etc.), glass fibers, stainless steel Iil fibers, etc. are intertwined three-dimensionally under the effects of moisture, heat, and pressure to form a sheet of felt, or cloth or plan made of these fibers. Mechanical polishing means (puff polishing, plan polishing, etc.) that involves pressure contact and sliding can be used.

When such a mechanical polishing means is used, an abrasive (particles made of resin or inorganic material) may or may not be present together with water, a surfactant, cutting oil, etc.

When using an abrasive, felt, cloth, or brush in which abrasive particles are embedded or bonded may be used.

Surface roughness is determined by the type, size, thickness or density of fibers,
Alternatively, when abrasive particles are used, it can be controlled by the type, size, thickness, or density of the abrasive particles, as well as the pressing force and sliding force of the abrasive machine.

For example, use a tool H felt disc-shaped puff (diameter 20 cm).
), when roughening the surface of a resin-dispersed photoreceptor drum with a diameter of 80 mm and a length of 330 mm by puff polishing, pure liquid discharge: 112/min drum rotation speed + 100 to 240 rpmL11 puff rotation speed: 50 to 850 rpm/〈7 sending
: 0, 3~1 crn/sec puff center deviation~4.
A surface roughness suitable for the present invention can be obtained under polishing conditions of 5 to 6 cm and a puff load of 2.5 to 15 kg. Of course, the above conditions are illustrative, and do not limit the conditions for achieving the surface roughness of the present invention.

When buffing is performed, a plurality of puffs may be used as shown in FIG. 1 or 2.

Buffing may be performed with the drum set in the non-aqueous state as shown in FIG. Further, as shown in FIG. 4, the polishing process may be performed with the puff applied to one side.

Still another method that can be used is a sandblasting method in which abrasive particles are bombarded onto the surface of the photosensitive layer. Furthermore, the surface of the photosensitive layer can be finely roughened by forming the organic photosensitive layer by applying a coating liquid to which powder particles such as silica have been added in advance.

The degree of surface roughening is 0 expressed in maximum height (Rt).
．． 05//I11~0.4pm, preferably 0.08~
It is 0.24 μm, and the average distance between the rough peaks (
S11), 100 μm or less, preferably 80 μm or less
The surface is roughened to a surface roughness of μm or less.

The maximum height is less than 0.05 μm and the average spacing is 10
If it is larger than 0 μm, a decrease in sensitivity, image noise such as black streaks, and poor adhesion of the surface protective layer will occur. Maximum height is 0.4μm
If the average interval is larger than 100 μm, further problems such as film defects and toner filming will occur.

When a surface protective layer of a vacuum thin film is formed on the surface of a photosensitive layer that has been subjected to the roughening treatment according to the present invention, the vacuum thin film contains film stress, and countless glue sticks enter the thin film in the film thickness direction. . As a result, photosensitive I! It is believed that the 1 surface is made up of countless spots in the form of islands, which prevents the lateral flow of charges and the increase in residual potential, thereby eliminating the problem of black streaks.

In addition, in the present invention, the maximum height (Rt) and average peak spacing (Sm) refer to those described in JIS BO6011982, and as the reference length in that JIS,
17V using 2.5mm.

The order of the cleaning process and the surface roughening process may be the order of cleaning - ■ - step → roughening process, or the order of roughening process - cleaning process. The preferred order is washing process - This is a surface roughening process.

When the surface roughening process is performed after the cleaning process, the oxide film on the surface of the photosensitive layer is removed by the cleaning process. During the subsequent surface roughening treatment 1'', no more oxide film is formed.

Therefore, the adhesion of the vacuum thin film on the surface protective layer to the photosensitive layer is ensured. The shape of the surface of the photosensitive layer 1-1 is not affected by the cleaning treatment and is determined by the subsequent roughening treatment, making it easy to control the surface shape of the photosensitive layer.

The surface roughening treatment is performed as soon as possible after the cleaning treatment is completed. Otherwise, an oxide film will form on the surface again and the cleaning treatment will be ineffective.

On the other hand, if the cleaning process is performed in the reverse order to the above, that is, after the surface roughening process, the oxide film on the surface of the photosensitive layer is removed by the subsequent cleaning process, so that the vacuum thin film does not come in contact with the photosensitive layer. Ii'1fU, the problem with defects is that the surface tends to become rough because the two surfaces are smoothed in the subsequent cleaning process (although the surface is roughened). This is because the surface area of the photosensitive layer increases compared to the surface roughening treatment, and the amount of photosensitive layer components dissolved by the cleaning treatment.
Compared to the case where the surface was not roughened, it increased significantly, and we believe that this is due to the surface roughening. Therefore, with this processing order, it is difficult to control the surface roughness, and it becomes difficult to wipe and leave residue during toner cleaning.

After the cleaning process and surface roughening treatment are completed, a vacuum thin film is formed on the surface of the organic photosensitive layer to serve as a surface protective layer. Such a surface protective layer may be made of amorphous hydrocarbons formed by plasma polymerization, or A1201, Bi2O3, Ce2.
O3, Cr, 03, In) OH1Mg0, Sin,
5iC12, 5n02, Ta2O3, T10, TiO2
, ZrO2, Y2O1 and other metal oxides, S I 384
, metal nitrides such as Ta2N, NlgF, , LiF, N
Metal fluorides such as dF, LaF, C, F2, CeF, metal carbides such as 5iC1'r i C:, Z
Examples include a metal compound film formed using a so-called vacuum thin film forming technique such as a vapor deposition method, a sputtering method, or an ion-blating method using a metal compound such as a metal sulfide such as nS, CdS, or PbS.

The thickness of the surface protective layer is 0.6 when it is formed on a mirror-like surface without minute irregularities. O1~・5μm
, preferably 0.04 to 1μ0.

When the film thickness is at this level, the unevenness on the surface of the photosensitive layer appears almost unchanged on the surface protective layer.

When the thickness is greater than 5 μm, cracks that are considered to be caused by internal stress are not formed in the formed vacuum thin film, and the above-mentioned problem remains unsolved. If the film thickness is less than 0.01 μm, the printing durability will be 1. It becomes easy to wear or peel off when

The present invention will be explained below using examples.

Preparation of organic photosensitive layer (a) (Negative N111 functional separation type) 13 parts by weight of bisazo pigment chlorodiane blue (CDB), polynisder resin (manufactured by Toyobo Co., Ltd.: v-200 parts by weight,
Disperse 121-0 using a dog grinder for 13 hours. This dispersion was applied by dipping onto a cylindrical aluminum substrate with a diameter of 80 + nm and a length of 330 mm, and dried to reduce the film thickness. 0,3
μm! A load generation layer was formed.

Separately, 1,4-dij-dilylaminobenzaldehyde 7
1 part by weight of phenylhydrazone (DEH) 1 part by weight of polycarbonate (manufactured by Yojin Kasei Co., Ltd., -1300)]・Rahydrofuran (THF) 6111
The solution was applied to the charge germination layer and dried to form a charge transport layer having a thickness of 15 μm after drying, thereby obtaining an organic photosensitive layer (a).

9-connected jade light-" p light 1 (Kikin Niri 17-shank 1-> special σ
25ti parts of type copper phthalocyanine (manufactured by Toyo Ingi'Ii), acrylic melamine thermosetting resin (A manufactured by Inu Nippon Ink Co., Ltd.)
A mixture of 50 parts by weight of a mixture of 405 and supervesocamine J820, 25 parts by weight of 4-diethylaminobenzaldehyde-diphenylhydrazone, and 500 parts by weight of an organic solvent (a mixture of 12 parts by weight of Kin 12 and 3 parts by weight of butanol) was mixed with a ball mill for 10 minutes. Grinding and dispersing for hours. This dispersion was applied by dipping onto a cylindrical aluminum substrate with a diameter of 80 mm and a length of 330 mm, and dried and baked (15
0° C. for 1 hour) to obtain an organic photosensitive layer (b) with a thickness of 15 μm.

Example 1 (Cleaning of photosensitive layer (abbreviated as XWl)) The organic photosensitive layer (a) was stored at 20° C. in an environment of 65% for 30 days. Cleaning was carried out using the cleaning apparatus shown in FIG.

In FIG. 5, (1) is a photosensitive drum (1) with a photosensitive layer (a) provided on a base, and a means (3) having a hydraulic vertical mechanism.
It is attached to a vertically movable shaft (2). (
4) is a cleaning tank, which has an internal volume of 30 (vertical) x 30 (horizontal) x 50 (height to the liquid level) c, and the interior is filled with a cleaning solvent (5). The solvent (5) is passed through the distillation circulator (
6) is used cyclically.

For cleaning, first, the photosensitive drum (1) is
) to gradually lower the photosensitive drum (
1) was carried out by completely immersing it.

At this time, an ultrasonic oscillator (
7), ultrasonic cleaning was performed as appropriate.

The amount of solvent used for actual cleaning was approximately 50Q, including the distillation circulator (6) and piping. The liquid temperature was set at 20° C. using a temperature controller (not shown). The output of the ultrasonic oscillator used appropriately was 500W.

In the above cleaning process, n-hexane was used as the solvent, the immersion operation was 30 seconds, the immersion time was 10 seconds, and the pulling operation was 3.
0 seconds, drum surface cleaning time difference 60 seconds (minimum 10 seconds, maximum 7 seconds)
0 seconds).

The dipping operation, dipping time, lifting operation, and drum surface cleaning time difference are described below.

- Immersion operation: The time from when the bottom end of the photosensitive drum touches the liquid surface until the top end is immersed in the liquid surface while lowering the shaft at a constant speed.

In other words, in the case of a drum with a length of 330 mm, a dipping operation of 30 seconds means that the shaft is lowered at 330/30-11 mm/sec.

・Immersion time: The time the entire photosensitive drum is immersed under the liquid surface.

・This is the opposite of lifting and dipping operations, and is the time from when the top end of the photosensitive drum comes out above the liquid surface until the bottom end comes out during pulling up.

In addition, the difference in immersion time in the liquid between the bottom end of the drum and the top end of the drum,
The shortest and longest times were measured as shown below, and the drum surface cleaning time difference was determined.

- Minimum time the top of the Ni drum is immersed below the liquid level. That is, it is equal to the immersion time.

・The maximum time the bottom end of the NiDrum is submerged below the liquid level. That is, ten dipping operations are equivalent to ten dipping times and ten lifting operations.

(Abbreviated as surface roughening treatment XRI) The surface of the organic photosensitive layer (a) washed above was finely polished using a buffing machine shown in FIG.

Fixing the organic photosensitive layer by chucking (301),
Buff (density 0,
03 g/cli"X buff diameter: 20 cm
As shown in FIG. 7, this is the distance between the longitudinal center line of the photoreceptor (304) and the center point of the disc-shaped buff (303).

Next, the photosensitive layer (3'04) was rotated for 300 r in the direction of arrow (d).
pm (this rotation is called work rotation), and while rotating the disc-shaped puff (303) in the direction of arrow (C) at 50 orpm, a load of 6 pm is applied to the disc-shaped puff (303) from the direction of arrow (a). Applying 6 kg (this load is called a buffing load), the disc-shaped puff (303) is placed on the photosensitive layer (304).
was pressed. At this time, the buff line load on the photosensitive layer (304) was 0.3 kg/c+n. In this state, the buff (303) moves in the direction of arrow (b) at a feed rate of ICl
The reciprocating motion was repeated three times at l1/SeC. At the same time, pure liquid was discharged at a rate of 1M from the liquid discharge nozzle (302) toward the contact surface between the photosensitive layer (304) and the disc-shaped puff (303).

The surface of the organic photosensitive layer (a) had a roughness of 0.086 μm expressed in maximum height (Rt).

In addition, Rz was measured according to J15-BO601-1982. As a measuring device, a surface roughness meter Surfcom 550A (trade name) manufactured by Tokyo Seimitsu Co., Ltd. was used.

Next, a plasma amorphous hydrocarbon film (hereinafter abbreviated as PAC) was formed on the surface of the organic photosensitive layer as described below.

(Preparation of PAC) In the glow discharge decomposition apparatus shown in FIG.
8), hydrogen gas is released from the first tank (701,),
Butadiene gas was flowed into the first and second flow rate controllers (713 and 714) from the second tank (702) under an output pressure of 1.0 kg/cm.Then, the scale of each flow rate controller was adjusted. Adjust the hydrogen gas flow rate to 300
The flow rate of butadiene gas was set to 39 seconds and flowed into the reaction chamber (733) from the main pipe (732) via an intermediate mixer (731). After each flow rate stabilizes, the pressure inside the reaction chamber (733) decreases to 0.
The pressure regulating valve (745) was adjusted to 5 Torr. On the other hand, as the substrate (752), use the above-mentioned organic photosensitive layer (a), heat it in advance to 50'C, and with the gas flow rate and pressure stable, use the connection selection switch (744) in advance. Connect the low frequency source (741
) and applied 180W a to the power application electrode (736).
Approximately 1 by applying a power of t L at a frequency of 100 KHz.
A plasma polymerization reaction was performed for 80 seconds, and the substrate (752)
Amorphous carbon P (PAC film) having a thickness of 1200 mm was formed thereon as a surface protective layer. After the film formation was completed, power application was stopped, the control valve was closed, and the inside of the reaction chamber (733) was sufficiently evacuated, and then the vacuum was broken and the photoreceptor according to the present invention was taken out.

(Evaluation) The photoreceptor obtained as described above was evaluated for adhesiveness, decrease in sensitivity, and unwiped residue.

The adhesion of the surface protective layer to the organic photoreceptor was evaluated by conducting a JIS 5400 standard substrate test, and ranking was performed as follows.

Evaluation of Sensitivity Decrease The prototype photoreceptor was mounted on an actual machine, the exposure amount was adjusted, and a halftone image with an image density of 0.50 was obtained.

Thereafter, 10,000 copies of A4 paper were made, a halftone image was obtained with the same exposure amount, the image density was determined, and the difference from the initial image density of 0.50 was determined.

For example, if the image density after copying is 0.55,
The difference of 0.05 was defined as the decrease in sensitivity.

The surface potential setting of the actual machine was 400 [V], and the development bias setting was 1.50 (V).

In the list of Examples, the quality of sensitivity reduction was shown based on the following evaluation criteria.

The image density was measured using a thermometer Sakura Dentometer DA65 (trade name) manufactured by Konica.

Unwiped Evaluation Unwiped residue refers to toner that is not transferred to the copy paper and remains on the photoreceptor after copying an original with a B/W ratio of 6%, and is not removed even with toner cleaner, so in the next copying process,
This refers to development in which defective images such as unevenness and black spots are formed on copied images due to the influence of toner remaining on the photoreceptor. The surface of the photoreceptor and the copied image were visually observed and ranked as follows.

X: When copying an original with a B/W ratio of 6% and obtaining a defective image due to unwiping on the copied image. △: Immediately after the photoconductor surface passes the cleaner, the portion of the photoconductor surface corresponding to the deep copy When toner is left behind, but it does not appear on the copied image.

○: When no wiped residue is observed on either the cobby image or the photoreceptor surface.

The above results are summarized in Table 1.

Example 2 A photoreceptor was produced and evaluated in the same manner as in Example 1, except that the surface roughening treatment was performed as described below. The results are shown in Table 1.

(Surface roughening treatment) (abbreviated as R2) Cylindrical brush with a diameter of 5 cm (IOX brush material is 6.
As shown in FIG.
cylindrical brush 200 rpva, photosensitive layer 50
Rotate for 5 minutes at rpm.

The surface of the organic photosensitive layer (a) has a 10-point average roughness (Rz)
The roughness was expressed as 0.9 μm.

Example 3 A photoreceptor was produced and evaluated in the same manner as in Example 1, except that the surface roughening treatment was performed as described below. The results are shown in Table 1.

(Surface roughening treatment) (abbreviated as R3) Using the sandblasting method, approximately 0.7μ as an abrasive
SiC particles with a diameter of m were bombarded onto the organic photosensitive layer (a) to roughen the surface.

Thereafter, a cloth was lightly pressed against the photosensitive layer in pure water, and ultrasonic cleaning was performed while rotating the photosensitive layer to remove SiC particles remaining or attached to the surface of the photosensitive layer, and the photosensitive layer was dried.

Example 4 The photosensitive layer was washed in the same manner as in the cleaning process of Example 1, except that instead of the solvent n-hexane used in the cleaning process of the photosensitive layer in Example 1, a fluorinated propatool represented by the following structural formula was used. The layer was washed (this washing step is abbreviated as W2 in Table 1) to produce a photoreceptor. Evaluation was also performed in the same manner as in Example 1.

Example 5 A photoreceptor was prepared and evaluated in the same manner as in Example 1, except that the photoreceptor layer cleaning treatment was performed as described below.

The results are shown in Table 1.

(Photosensitive layer cleaning effect) (abbreviated as W3) The cleaning process used in this example will be explained using FIGS. 10 to 12. In Figures 1O to 12, (101
) is the cleaning tank, (102) is the boiling solvent, (103) is the heat source, (104) is the solvent vapor layer, (105) is the cooling water, (1
06) is the condensate receiving gutter, (107) is the condenser, (108)
is cooling water, (109) is air/steam interface, (110)
is a photoreceptor. Although not shown, there is a cleaning tank (101
) may be provided with a lid.

7o7 as a solvent using the cleaning device having the above configuration.
113 (CCLFCC (lFz; 1.1.2-trichloro-1,2,2-trifluoroethane) was used, a cold photosensitive layer (110) was placed in the solvent vapor phase (1 (14), and the photosensitive layer and vapor The vapor was condensed and liquefied on the surface of the photosensitive layer due to the temperature difference between
Figure 1). The temperature of the photosensitive layer rose, and when the vapor no longer liquefied on the surface of the photosensitive layer and an equilibrium state of adsorption and desorption of vapor was maintained, the photosensitive member was pulled up (Figure 12).

Example 6 A photoreceptor was produced and evaluated in the same manner as in Example 1, except that silicon oxide@ (abbreviated as SiC film) was formed as a surface protective layer by vacuum evaporation as described below. Table 1 shows the results.
Shown inside.

(Formation of SiC film) Using a vapor deposition apparatus using a common vacuum heating method, the following conditions: Vapor deposition source: SiO substrate m degrees 250°C Baud 11° + 1200°C Degree of vacuum: 8 X l O-'Torr Vapor deposition time
= 5 minutes film thickness: A thin film of Si○ was formed by 1300 people.

Example 7 As a surface protective layer, an aluminum oxide film (A (abbreviated as bOJA)) was formed by sputtering as described below.
A photoreceptor was produced and evaluated in the same manner as in Example 1, except that a photoreceptor was formed.

(A, +2203 film formation) Using a commonly used sputtering device, under the following conditions.

Target: AQtOs Substrate temperature: 50°C Discharge interval ・50mmC Rough side vacuum between target and substrate: 2XIO-7orr Discharge gas Ar Discharge power 22-0K Radiation wave number: 13.56MHz Discharge time, 12 minutes membrane processing : 1800 people! ] A photoreceptor was prepared and evaluated in the same manner as in Example 1, except that the organic photoreceptor (b) was used. The results are shown in Table 11.

Three Shishi Example If: Mu ◇ In 1, the order in which the surface of the photosensitive layer was cleaned and the surface was roughened was changed to 1, and the reverse order was carried out, that is, after the surface of the photosensitive layer was roughened and the surface was roughened. A photoreceptor was prepared (7) and evaluated in the same manner as in Example 1, except that the order of surface cleaning was changed. The results are shown in Table 1.

Comparative Example 1 A photoreceptor was produced and evaluated in the same manner as in Example 1, except that the surface roughening treatment was not performed. The results are shown in Table I+=.

Comparative Example 2 A photoreceptor was produced and evaluated in the same manner as in Example 1, except that the photoreceptor layer was not cleaned and the surface roughening treatment was not performed.

The results are shown in Table 1.

Actual TiggI□ In Example 1, pure water was mixed with 2.5 g/12 fffM agent (manufactured by Fujimi Abrasives Industry Co., Ltd.; WA#6000).
A photoreceptor was prepared and evaluated in the same manner as in Example 1, except that the abrasive solution was replaced with a fractionated abrasive solution.

Effects of the Invention When an organic photoreceptor having a vacuum thin film as a surface protective layer on its surface is manufactured according to the present invention, there are no problems of poor toner cleaning, increase in residual potential due to repeated use, and the occurrence of black streaks.

[Brief explanation of drawings]

FIGS. 1 to 4 are diagrams schematically showing various aspects of buffing. FIG. 5 is a diagram showing an example of a schematic configuration of a photosensitive layer cleaning device. FIG. 6 is a diagram showing an example of a schematic configuration of a buffing device used in Examples. FIG. 7 is a diagram for explaining buff misalignment. FIG. 8 is a diagram showing a schematic configuration example of a glow discharge decomposition device. FIG. 9 is a diagram schematically showing one aspect of brush polishing. FIGS. 10 to 12 are diagrams for explaining the steam cleaning method. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 - Figure 9 Figure 10 Figure 11 Figure 1 Negative continuation @ Inventor Shuji Iino @ Inventor Isukiyo Osawa @ Inventor Fumiko Maekawa Osaka Prefecture 2 Azuchi-cho, Chuo-ku, Osaka City] 3-13 Nagiwa Osaka Tagawa Building Minolta Camera Co., Ltd. 2-Azuchi-cho, Chuo-ku, Osaka, Osaka Prefecture 3-13 Nagi Osaka International Building Minolta Camera Co., Ltd. Osaka City, Osaka Prefecture 2-3-13 Azuchi-cho, Chuo-ku, Osaka International Building, Minolta Camera Co., Ltd.

Claims (1)

[Claims] 1. A method for manufacturing an organic photoreceptor, which comprises forming a vacuum thin film as a surface protective layer after a step of cleaning the organic photoreceptor layer and a step of roughening the surface of the organic photoreceptor layer. .