JPH03171141A - Manufacture of organic photosensitive body - Google Patents
Manufacture of organic photosensitive bodyInfo
- Publication number
- JPH03171141A JPH03171141A JP31296089A JP31296089A JPH03171141A JP H03171141 A JPH03171141 A JP H03171141A JP 31296089 A JP31296089 A JP 31296089A JP 31296089 A JP31296089 A JP 31296089A JP H03171141 A JPH03171141 A JP H03171141A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- photoreceptor
- solvent
- vapor
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000004140 cleaning Methods 0.000 claims abstract description 37
- 239000010410 layer Substances 0.000 claims abstract description 27
- 239000011241 protective layer Substances 0.000 claims abstract description 14
- 238000009835 boiling Methods 0.000 claims abstract description 8
- 239000007788 liquid Substances 0.000 claims abstract description 6
- 108091008695 photoreceptors Proteins 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 16
- 238000013020 steam cleaning Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000002904 solvent Substances 0.000 abstract description 29
- 238000001035 drying Methods 0.000 abstract description 12
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- 241000519995 Stachys sylvatica Species 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000003795 desorption Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 241000772415 Neovison vison Species 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910001506 inorganic fluoride Inorganic materials 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- -1 pyrazoline compound Chemical class 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、電子写真などに用いられる有機系感光体(O
PC)の改良に関する。Detailed Description of the Invention [Industrial Field of Application] The present invention relates to organic photoreceptors (O
PC) improvements.
[従来の技術]
電子写真などに用いられるOPCは、複写機内において
広く使用されている。このOPCは通常アルミニウムな
どの基材の上に、まず電荷発生材料を含む電荷発生層(
C G L)を設け、その上に電荷輸送材料を含む電荷
輸送層(CTL)設け、その上にアモルファスカーボン
(a−C)などの保護層を設けている。[Prior Art] OPC used in electrophotography and the like is widely used in copying machines. This OPC is usually made by first forming a charge generation layer containing a charge generation material on a base material such as aluminum.
A charge transport layer (CTL) containing a charge transport material is provided thereon, and a protective layer such as amorphous carbon (a-C) is provided thereon.
ところで、前記a−CオーバーコートはCTLとの接着
性が悪い。これは、OPCの表面が酸化しており、これ
がa−CとOPC (CTL)界面の結合を切る働きを
するからであると考えられる。By the way, the a-C overcoat has poor adhesion to CTL. This is thought to be because the surface of OPC is oxidized, which acts to break the bond between a-C and OPC (CTL) interface.
同時にa−C層が持つ、応力もそれを助長する。At the same time, the stress that the a-C layer has also promotes this.
このため、OPCの表面酸化層を除去するために、洗浄
をするのが有効である。Therefore, it is effective to perform cleaning to remove the surface oxidation layer of OPC.
従来は、フロン−113(化学式:CC12FCC/F
2)などを洗浄液に用いて浸漬法で洗浄を行っていた。Conventionally, Freon-113 (chemical formula: CC12FCC/F
2) etc. were used as a cleaning solution to perform cleaning using the immersion method.
[発明が解決しようとする課題]
しかしながら従来の溶剤に浸漬する洗浄方法では、感光
体中にハロゲン系溶剤が浸透し、そのハロゲン系溶剤が
感光体の特性劣化をひき起こすという課題があった。特
に光照射により、ハロゲン系溶剤が分解し、活性なハロ
ゲンを放出し、それが、OPCに悪影響を及ぼすものと
思われる。すなわち、フロン−113などのハロゲン系
溶剤で洗うと、OPCにこのフロンが浸透し、さらにオ
ーバーコートを形成するときのプラズマ放電光により、
溶剤の分解が起こる。そして、ち密なオーバーコートを
形成するため、浸透溶剤がますます大気中に放出されに
くくなる。[Problems to be Solved by the Invention] However, in the conventional cleaning method of immersing the photoreceptor in a solvent, there is a problem in that the halogen-based solvent penetrates into the photoreceptor, and the halogen-based solvent causes deterioration of the characteristics of the photoreceptor. In particular, light irradiation decomposes the halogen-based solvent and releases active halogen, which is thought to have an adverse effect on OPC. In other words, when washed with a halogen-based solvent such as Freon-113, the Freon penetrates into the OPC, and the plasma discharge light when forming the overcoat further damages the OPC.
Decomposition of the solvent occurs. In addition, since a dense overcoat is formed, it becomes more difficult for the penetrating solvent to be released into the atmosphere.
これら全ての影響により、接着性はよいが、特性の劣化
、とくに初期表面電位(Vo)の低下した感光体しか得
られないという課題があった。Due to all of these influences, there was a problem in that only a photoreceptor with good adhesiveness but with deteriorated characteristics, particularly a reduced initial surface potential (Vo), could be obtained.
また浸漬洗浄は下記のような課題も有していた。Immersion cleaning also had the following problems.
■ 乾燥ムラが出る。これは画像ノイズとなる。■ Uneven drying appears. This becomes image noise.
■ 洗浄液の汚れが付着しやすい。これも画像ノイズと
なる。■ Dirt from the cleaning solution tends to adhere. This also results in image noise.
■ 浸漬中、乾燥中に溶剤がOPC内部に浸透しやすい
。これは、初期表面電位(Vo)低下をひきおこす。■ Solvent easily penetrates into the inside of OPC during soaking and drying. This causes a decrease in the initial surface potential (Vo).
■ 溶剤中を通過する音波(超音波、振動)により、洗
浄ムラが発生しやすい。これも画像ノイズとなる。■ Sonic waves (ultrasonic waves, vibrations) passing through the solvent tend to cause uneven cleaning. This also results in image noise.
本発明は前記した従来技術の課題を解決するため、オー
バーコート層を形成する前に、有機溶液の蒸気洗浄を行
うことにより、初期表面電位(■0)低下を防止し、か
つ画像ノイズの発生を防止した有機感光体の製造方法を
提供する。In order to solve the problems of the prior art described above, the present invention performs steam cleaning with an organic solution before forming an overcoat layer to prevent a decrease in initial surface potential (■0) and to prevent image noise from occurring. Provided is a method for manufacturing an organic photoreceptor that prevents the above.
[課題を解決するための手段]
前記目的を達或するため、本発明は下記の構或からなる
。[Means for Solving the Problems] In order to achieve the above object, the present invention has the following structure.
すなわち本発明は、支持体の上に少なくとも電荷発生材
料と電荷輸送材料とを含んでなる有機感光層を形或し、
その上に表面保護層を形成した有機感光体の製造方法に
おいて、前記有機感光層を形成した後、該感光層を有す
る支持体を洗浄液の沸点以下の温度に保った状態で、洗
浄液の蒸気領域に存在させ、蒸気洗浄処理し、しかる後
表面保護層を形成することを特徴とする有機感光体の製
造方法である。That is, the present invention forms an organic photosensitive layer comprising at least a charge-generating material and a charge-transporting material on a support, or
In the method for producing an organic photoreceptor in which a surface protective layer is formed thereon, after forming the organic photoreceptor layer, the support having the photosensitive layer is kept at a temperature below the boiling point of the cleaning liquid, and the support is heated in the vapor region of the cleaning liquid. This is a method for producing an organic photoreceptor, characterized in that the organic photoreceptor is allowed to exist in the atmosphere, subjected to a steam cleaning treatment, and then a surface protective layer is formed.
本発明において好ましくは、前記蒸気洗浄処理を、下記
式[I]で示される条件下で行うことである。In the present invention, preferably, the steam cleaning treatment is performed under the conditions represented by the following formula [I].
k . x H (Tb−Ts)≦t≦k
x It (Tb−Ts) [ Iコman
maxただし、
t:蒸気洗浄処理時間(秒)
■I:単位表面積当たりの熱容1[J−K−’・Cm−
1]Tb:洗浄液の沸点[Kコ
TS:洗浄前の支持体の温度[ ’f< ]kmin、
k :比例定数であり、k , =1、mln
mA!
mInk =8(単位: J−1・cnr
−sec’) テある。k. x H (Tb-Ts)≦t≦k
x It (Tb-Ts) [ Iman
max However, t: Steam cleaning treatment time (seconds) ■I: Heat capacity per unit surface area 1 [J-K-'・Cm-
1] Tb: Boiling point of the cleaning solution [KTS: Temperature of the support before cleaning ['f<] kmin,
k: proportionality constant, k, = 1, mln
mA!
mInk = 8 (unit: J-1・cnr
-sec') There is.
max
[作用]
前記構成の本発明によれば、オーバーコート層を形或す
る前に、有機溶液の蒸気洗浄を行うことにより、初期表
面電位(Vo)低下を防止し、かつ画像ノイズの発生を
防止した有機感光体を得ることができる。max [Function] According to the present invention having the above configuration, by performing steam cleaning of an organic solution before forming an overcoat layer, a decrease in the initial surface potential (Vo) is prevented and the generation of image noise is prevented. It is possible to obtain an organic photoreceptor in which the photoreceptor is protected.
その理由は次のとおりである。The reason is as follows.
■ 洗浄溶剤を沸騰させ、溶剤を気化し、溶剤蒸気中に
例えば室温の被洗浄物(感光体)を入れると、感光体と
蒸気の温度差によって、蒸気は感光体表面で液化し、液
滴となって感光体を洗い流す。■ When the cleaning solvent is boiled and the solvent is vaporized, and the object to be cleaned (a photoreceptor) at room temperature is placed in the solvent vapor, the vapor liquefies on the surface of the photoreceptor due to the temperature difference between the photoreceptor and the steam, forming droplets. The photoreceptor is washed away.
感光体の温度が上昇してくると、感光体表面でもはや蒸
気は液化せず、蒸気の吸・脱着の平衡状態を保つように
なる。この状態で感光体を引きあげると、乾燥工程が不
要であるばかりでなく、心配される乾燥ムラも発生しな
い。As the temperature of the photoreceptor increases, vapor no longer liquefies on the surface of the photoreceptor, and an equilibrium state of adsorption and desorption of vapor is maintained. If the photoreceptor is pulled up in this state, not only is there no need for a drying step, but there is no worry about uneven drying.
■ この洗浄方法の別の利点は、蒸気には汚れが含まれ
ていないため、クリーンな洗浄が可能な点にある。■ Another advantage of this cleaning method is that the steam does not contain dirt, so it can be cleaned cleanly.
■ 浸漬洗浄の欠点がない。すなわち、溶剤の接触時間
が最小限に設定できるため、OPCへの溶剤浸透が少な
い。これにより特性劣化を少なくできる。■ No disadvantages of immersion cleaning. That is, since the contact time of the solvent can be set to a minimum, there is little penetration of the solvent into the OPC. This can reduce characteristic deterioration.
なお前記式[I]の範囲が好ましい理由は、OPC表面
の洗浄が十分に行え、かっOPC内部への溶剤浸透が少
ないからである。具体的には、感光体が溶剤を気化する
に足る温度に達したらすぐに洗浄を終えるのが最もよい
。The reason why the range of formula [I] is preferable is that the surface of the OPC can be sufficiently cleaned and there is little penetration of the solvent into the inside of the OPC. Specifically, it is best to finish cleaning as soon as the photoreceptor reaches a temperature sufficient to vaporize the solvent.
感光体の温度上昇は、感光体(基板)の熱容量と感光体
の表面積、洗浄前の感光体温度、溶剤の沸点で決定され
る。前記式[I]の上限と下限の理由は下記のとおりで
ある。The temperature rise of the photoreceptor is determined by the heat capacity of the photoreceptor (substrate), the surface area of the photoreceptor, the temperature of the photoreceptor before cleaning, and the boiling point of the solvent. The reasons for the upper and lower limits of the formula [I] are as follows.
(a)洗浄時間の上限を越えると、感光体温度が上昇す
るため、感光体周囲は完全に溶剤蒸気となる。(a) When the upper limit of the cleaning time is exceeded, the temperature of the photoreceptor increases and the area around the photoreceptor becomes completely solvent vapor.
溶剤蒸気はやはり、OPC内部に浸透しやすいため、特
性が劣化(Vo低下)する傾向になる。大きな画像ムラ
は発生しないが微小な白ヌケ(自斑点)が発生する傾向
になる。Since the solvent vapor easily permeates into the inside of the OPC, the characteristics tend to deteriorate (Vo decreases). Large image unevenness does not occur, but minute white spots (self-spots) tend to occur.
(b)洗浄時間の下限未満では、感光体温度が低すぎる
ため、感光体周囲に液滴がついたままである。(b) When the cleaning time is less than the lower limit, the temperature of the photoreceptor is too low, and droplets remain attached around the photoreceptor.
この状態で洗浄を終えるため、乾燥ムラが発生し易い。Since cleaning is finished in this state, uneven drying is likely to occur.
これは画像ノイズとなってあらわれ易い。This tends to appear as image noise.
[実施例]
以下実施例を用いて本発明をより具体的に説明する。な
お本発明は下記の実施例に限定されるものではない。[Example] The present invention will be described below in more detail using Examples. Note that the present invention is not limited to the following examples.
(1)光導電層の製法
■CGLの作製
ジスアゾ顔料としてクロロジアンプル−(CDB)1g
ポリエステル樹脂(東洋紡社製V−200 ) 1
gシクロヘキサノン 98g以上の
混合液をサンドグラインダーで13時間分散した。この
分散液を直径80mmの円筒状アルミニウム基板上にデ
ィッピング法を用いて乾燥後の膜厚が0.3μmとなる
ように塗布し、乾燥して電荷発生層(C G L)を形
成した。(1) Production method of photoconductive layer ■Preparation of CGL 1 g of chlorodiampule (CDB) as a disazo pigment Polyester resin (V-200 manufactured by Toyobo Co., Ltd.) 1
g Cyclohexanone 98 g or more of the mixed solution was dispersed with a sand grinder for 13 hours. This dispersion was applied onto a cylindrical aluminum substrate with a diameter of 80 mm using a dipping method so that the film thickness after drying would be 0.3 μm, and dried to form a charge generation layer (CGL).
■CTLの作製
下記構造式[I[]で示されるピラゾリン化合物5g
ポリカーボネイト(帝人化或社製K−1300) 1
0 gテトラヒドロフラン(THF) 50
g以上を溶解混合し、(CTL材重量)/(樹脂重量)
=1/2なる電荷輸送層(第1の層領域)を乾燥後膜厚
が15μmとなるようにCGL上に■ 表面保護層の例
■ 方法
プラズマ重合、スパッタリング、イオンプレーティング
、蒸着等によって得ることができる。■Preparation of CTL 5 g of a pyrazoline compound represented by the following structural formula [I] Polycarbonate (K-1300 manufactured by Teijin Kaoru Co., Ltd.) 1
0 g Tetrahydrofuran (THF) 50
Dissolve and mix more than
= 1/2 charge transport layer (first layer region) is placed on the CGL so that the film thickness after drying is 15 μm ■ Example of surface protective layer ■ Method Obtained by plasma polymerization, sputtering, ion plating, vapor deposition, etc. be able to.
■ 材料
無機酸化物、無機弗化物、無機窒化物、無機炭化物、非
品質炭化水素等、及びこれらに不純物を添加したもの、
及びこれらの組合わせ。■ Materials Inorganic oxides, inorganic fluorides, inorganic nitrides, inorganic carbides, non-quality hydrocarbons, etc., and impurities added to these,
and combinations thereof.
具体的には、Zr02、MgF2、Si3Na、AI2
03 、MgO,S i C,S iO2、a−C:
}{,a−Si:C:HX a−Si :O:H,a
−Si:N:H などが使用できる。Specifically, Zr02, MgF2, Si3Na, AI2
03, MgO, SiC, SiO2, a-C:
}{,a-Si:C:HX a-Si:O:H,a
-Si:N:H etc. can be used.
(3)実施例,比較例で用いた例 以下にa,bで示す。(3) Examples used in Examples and Comparative Examples They are indicated by a and b below.
a.表面保護層の形成方法(プラズマ重合=プラズマC
VDの場合)
次いで、常用のプラズマ重合装置を用いて、下記した条
件で有機プラズマ重合膜からなる表面保護層を形成した
。a. Formation method of surface protective layer (plasma polymerization = plasma C
In the case of VD) Next, a surface protective layer made of an organic plasma polymerized film was formed using a commonly used plasma polymerization apparatus under the conditions described below.
使用ガス:水素 300sccmブタジエン
lQsecm
四フッ化炭素 10secm
成膜条件:圧力 0.2Torr電源;低周波
電源
周波数 30KHz
電力 350W
基板温度 50℃
成膜時間 10分間
膜厚 1000A
b.表面保護層の形成方法(スパッタリング法の場合)
本発明の好ましい一実施態様に従えば、有機化合物から
なる光導電性層上にZr02、MgF2、Si3N4、
Si3N4:A1203、Si3N4 :MgOSS
i3 N4: S iCまたはSi3N4:SiO2等
からなる保護層を設けた電子写真感光体とするものであ
る。本発明の保護層の形或方法としては、スパッタリン
グ法及び真空蒸着法等が挙げられる。Gas used: hydrogen 300sccm butadiene
lQsecm Carbon tetrafluoride 10sec Film forming conditions: Pressure 0.2 Torr power supply; Low frequency power supply frequency 30 KHz Power 350 W Substrate temperature 50°C Film forming time 10 minutes Film thickness 1000 A b. Method for forming surface protective layer (sputtering method) According to a preferred embodiment of the present invention, Zr02, MgF2, Si3N4,
Si3N4: A1203, Si3N4: MgOSS
i3N4: An electrophotographic photoreceptor provided with a protective layer made of SiC or Si3N4:SiO2. Examples of the form and method of forming the protective layer of the present invention include sputtering method and vacuum evaporation method.
スパッタリング法による場合には前記化合物からなるタ
ーゲットを使用して、例えばArガス等のスパッター用
のガスを堆積層内に導入して、スパッタリングを行って
前記化合物からなる薄膜を形或すれば良い。Ar雰囲気
の圧力はグロー放電が維持できる範囲であればいずれで
も良く、一般に0. 0 1〜1. OTo r
r,安定した放電を得る為には0. 1〜1.OTo
rrであることが望ましい。In the case of sputtering, a target made of the above compound is used, a sputtering gas such as Ar gas is introduced into the deposited layer, and sputtering is performed to form a thin film made of the above compound. The pressure of the Ar atmosphere may be within any range as long as glow discharge can be maintained, and is generally 0. 0 1~1. OTo r
r, 0.0 to obtain stable discharge. 1-1. OTo
It is desirable that it be rr.
次に13.56MHzの高周波スパッタリング装置によ
り、雰囲気はアルゴン(Ar)ガスO.lTorrとし
、前記キャリア輸送層上に厚さ0.2μのS i3Na
: S io2 (95 : 5)の保護層を有する
感光体を作成した。Next, using a 13.56 MHz high frequency sputtering device, the atmosphere was changed to argon (Ar) gas O. 1Torr, and a 0.2μ thick Si3Na layer is placed on the carrier transport layer.
A photoreceptor having a protective layer of: S io2 (95:5) was prepared.
(4)評価法
評価機
ミノルタカメラ■製複写機EP490Zoメインチャー
ジャーにはスコロトロン型帯電器を使用6
電位測定
TREK社製表面電位計MODEL344を使用。測定
プローブをEP490Zの現像器位置にセットし、感光
体表面電位を計測。(4) Evaluation method Evaluation machine Copy machine EP490Zo manufactured by Minolta Camera ■ A Scorotron type charger is used as the main charger 6 Potential measurement A surface electrometer MODEL 344 manufactured by TREK is used. Set the measurement probe at the developing device position of EP490Z and measure the photoreceptor surface potential.
耐刷試験
EP490Zを用いて、室内環境にてB/W比6%のチ
ャートを用いて、A4紙横送りで耐刷試験を行なった。Printing durability test Using EP490Z, a printing durability test was conducted in an indoor environment using a chart with a B/W ratio of 6% and horizontally feeding A4 paper.
耐刷前の初期設定として、コロナ電圧−6. 0kV
となるように主帯電器の出力を設定した。As an initial setting before continuous printing, the corona voltage is -6. 0kV
The output of the main charger was set so that
接着性
住友スリーエム■製Scotch (登録商標)メンデ
ィングテープCAT.No.810−1−18(テープ
巾18肛)をオーバーコートした感光体の長平方向に、
かつ画像領域(長さ297mm)に、貼りつけた後、引
き剥がす。剥がした後テープの粘着面にオーバーコート
膜が付着してくる事がある。画像領域の全テープ面積(
18mmX297mm)l:対し、オーバーコート膜の
付着したテープの面積が占める割合によって接着性のラ
ンクを決定した。Adhesive Scotch (registered trademark) mending tape CAT. No. In the longitudinal direction of the photoconductor overcoated with 810-1-18 (tape width 18),
And after pasting it on the image area (length 297 mm), it is peeled off. After peeling off the tape, an overcoat film may adhere to the adhesive side of the tape. Total tape area of image area (
18 mm x 297 mm): On the other hand, the rank of adhesion was determined by the ratio of the area occupied by the tape to which the overcoat film was attached.
割合:1 %未満 ○
t %以上10%未満 △
10%以上 ×
(5)条件および結果
色々な「単位表面積あたりの熱容量」をもつ、感光体用
基板を用意した。実施例1〜5、比較例1〜5は同じ材
料(,AI )を用いたが、基板の厚みを変える事で「
単位表面積あたりの熱容量」を変えている。Ratio: Less than 1% ○ t % or more and less than 10% △ 10% or more × (5) Conditions and results Substrates for photoreceptors having various "heat capacities per unit surface area" were prepared. Examples 1 to 5 and Comparative Examples 1 to 5 used the same material (,AI), but by changing the thickness of the substrate,
The heat capacity per unit surface area is changed.
ここで「単位表面積あたりの熱容量」Hは次の式で表わ
される。Here, the "heat capacity per unit surface area" H is expressed by the following formula.
H[erg−K−1・Cm−2]=C[erg−K−l
・g−l]×D[g−Cm−3]×d[Cm]C:比熱
、D:密度、d:厚み
これらの基板上に光導電層を設けた。一週間の保管の後
洗浄を行ない、直後に表面保護(オーバーコート)層を
形成した。得られた感光体に対して、接着性、初期表面
電位(VO)、初期表面電位の感光体周内バラツキ、i
oooo枚耐刷後の表面電位(■0)をそれぞれ測定し
、評価を行なった。比較例8のみ洗浄工程を抜きにして
表面保護層を着膜した。この結果、接着性に難点があり
、使用できなかった。H[erg-K-1・Cm-2]=C[erg-K-l
-g-l]×D[g-Cm-3]×d[Cm] C: specific heat, D: density, d: thickness A photoconductive layer was provided on these substrates. After storage for one week, cleaning was performed, and a surface protection (overcoat) layer was immediately formed. For the obtained photoreceptor, adhesiveness, initial surface potential (VO), variation of initial surface potential within the circumference of the photoreceptor, i
The surface potential (■0) after oooo printing was measured and evaluated. Only in Comparative Example 8, a surface protective layer was deposited without the cleaning step. As a result, there was a problem with adhesion and it could not be used.
以上の結果を第1〜3表に示す。The above results are shown in Tables 1 to 3.
第1〜3表から明らかな通り、実施例1〜9は本発明の
範囲内のものであったので、良好な結果が得られた。As is clear from Tables 1 to 3, Examples 1 to 9 were within the scope of the present invention, and therefore good results were obtained.
これに対して比較例9は、浸漬法による洗浄方法を採用
したので、乾燥ムラに起因する画像ノイズの発生があり
、初期または10000枚耐刷後のいずれかで表面電位
が400V以下となり、画像濃度の低下が起こり、好ま
しくなかった。On the other hand, in Comparative Example 9, the immersion cleaning method was adopted, so image noise occurred due to uneven drying, and the surface potential became 400 V or less either at the initial stage or after printing 10,000 sheets, and the image A decrease in concentration occurred, which was undesirable.
また比較例4,6のように、洗浄時間が短い場合には、
接着性が劣る事、洗浄ムラに起因する画像ノイズが発生
する傾向となる。また初期表面電位の感光体周内バラツ
キも大きい。In addition, when the cleaning time is short as in Comparative Examples 4 and 6,
Poor adhesion and image noise due to uneven cleaning tend to occur. Furthermore, the initial surface potential varies widely within the circumference of the photoreceptor.
比較例1, 2, 3. 5. 7のように洗
浄時間が長い場合には、局所的な電荷注入によると思わ
れる微小白斑点ノイズの発生があり、初期または1oo
oo枚耐刷後のいずれかで表面電位が400V以下とな
り、画像濃度の低下が起こり易くなる。Comparative examples 1, 2, 3. 5. When the cleaning time is long as shown in item 7, minute white spot noise is generated, which is thought to be due to local charge injection.
At some point after printing 00 sheets, the surface potential becomes 400 V or less, and image density tends to decrease.
洗浄時間を適正とした実施例1〜7はいずれの特性にお
いても問題がなかった。Examples 1 to 7 in which the washing time was appropriate had no problems in any of the characteristics.
なお本発明の蒸気洗浄方法を理解しやすく説明するため
、その基本的プロセスを図面を用いて説明する。第1図
〜第3図は上記実施例で用いた本発明の蒸気洗浄方法の
基本的プロセスである。第1図〜第3図において、1は
洗浄槽、2は沸騰溶剤、3は熱源、4は溶剤蒸気層、5
は冷却水、6は凝縮液受樋、7は凝縮器、8は冷却水、
9は空気/蒸気境界面、10は感光体である。なお図示
してないが洗浄槽1の上部には蓋を設けても良い。In order to explain the steam cleaning method of the present invention in an easy-to-understand manner, the basic process will be explained using drawings. 1 to 3 show the basic process of the steam cleaning method of the present invention used in the above embodiments. In Figures 1 to 3, 1 is a cleaning tank, 2 is a boiling solvent, 3 is a heat source, 4 is a solvent vapor layer, 5
is cooling water, 6 is a condensate receiver, 7 is a condenser, 8 is cooling water,
9 is an air/steam interface, and 10 is a photoreceptor. Although not shown, a lid may be provided on the top of the cleaning tank 1.
前記構成からなる洗浄装置を用いて、溶剤蒸気層4に冷
たい感光体10を入れると、感光体と蒸気の温度差によ
って蒸気は感光体表面で凝縮・液化し、液滴となって感
光体を洗い流す(第1図)。When a cold photoreceptor 10 is placed in the solvent vapor layer 4 using the cleaning device configured as described above, the vapor condenses and liquefies on the surface of the photoreceptor due to the temperature difference between the photoreceptor and the vapor, forming droplets and cleaning the photoreceptor. Wash off (Figure 1).
感光体の温度が上昇してくると、感光体表面でもはや蒸
気は液化せず、蒸気の吸・脱着の平衡状態を保つように
なる(第2図)。この状態で感光体を引きあげると、乾
燥工程が不要であるばかりでなく、乾燥ムラも発生しな
い(第3図)。As the temperature of the photoreceptor increases, the vapor no longer liquefies on the surface of the photoreceptor, and an equilibrium state of adsorption and desorption of vapor is maintained (Figure 2). If the photoreceptor is pulled up in this state, not only is there no need for a drying step, but there is no uneven drying (FIG. 3).
[発明の効果]
以上説明した通り本発明は、オーバーコート層を形成す
る前に、有機溶液の蒸気洗浄を行うことにより、初期表
面電位(Vo)低下を防止し、かつ画像ノイズの発生を
防止した有機感光体を得ることができるという顕著な効
果を達成することができた。[Effects of the Invention] As explained above, the present invention prevents a decrease in the initial surface potential (Vo) and prevents the generation of image noise by performing steam cleaning of an organic solution before forming an overcoat layer. We were able to achieve the remarkable effect of being able to obtain a highly resistant organic photoreceptor.
第■図、第2図、および第3図は本発明の実施例で用い
た蒸気洗浄方法の基本的プロセスを示す。
1:洗浄槽 2:沸騰溶剤
3:熱源 4:溶剤蒸気層
5:冷却水 6:凝縮液受樋
7:凝縮器 8:冷却水
9:空気/蒸気境界面
10:感光体
9:空気/蒸気境界面
第1図
第3図
第2図Figures 1, 2, and 3 show the basic process of the steam cleaning method used in the embodiment of the present invention. 1: Cleaning tank 2: Boiling solvent 3: Heat source 4: Solvent vapor layer 5: Cooling water 6: Condensate receiving trough 7: Condenser 8: Cooling water 9: Air/steam interface 10: Photoreceptor 9: Air/steam Boundary surface Figure 1 Figure 3 Figure 2
Claims (1)
材料とを含んでなる有機感光層を形成し、その上に表面
保護層を形成した有機感光体の製造方法において、前記
有機感光層を形成した後、該感光層を有する支持体を洗
浄液の沸点以下の温度に保った状態で、洗浄液の蒸気領
域に存在させ、蒸気洗浄処理し、しかる後表面保護層を
形成することを特徴とする有機感光体の製造方法。 2 蒸気洗浄処理を、下記式[ I ]で示される条件下
で行う請求項1記載の有機感光体の製造方法。 k_m_i_n×H(Tb−Ts)≦t≦k_m_a_
x×H(Tb−Ts)[ I ]ただし、 t:蒸気洗浄処理時間(秒) H:単位表面積当たりの熱容量[J・K^−^1・cm
^−^1]Tb:洗浄液の沸点[K] Ts:洗浄前の支持体の温度[K] k_m_i_n、k_m_a_x:比例定数であり、k
_m_i_n=1、k_m_a_x=8(単位:J^−
^1・cm^2・sec)である。(1) A method for producing an organic photoreceptor, in which an organic photoreceptor layer comprising at least a charge-generating material and a charge-transporting material is formed on a support, and a surface protective layer is formed on the organic photoreceptor layer. After formation, the support having the photosensitive layer is placed in the vapor region of the cleaning liquid while being maintained at a temperature below the boiling point of the cleaning liquid, and subjected to steam cleaning treatment, after which a surface protective layer is formed. Method for manufacturing an organic photoreceptor. 2. The method for producing an organic photoreceptor according to claim 1, wherein the steam cleaning treatment is performed under conditions represented by the following formula [I]. k_m_i_n×H(Tb-Ts)≦t≦k_m_a_
x×H(Tb-Ts) [I] However, t: Steam cleaning treatment time (seconds) H: Heat capacity per unit surface area [J・K^-^1・cm
^-^1] Tb: boiling point of cleaning liquid [K] Ts: temperature of support before cleaning [K] k_m_i_n, k_m_a_x: proportional constant, k
_m_i_n=1, k_m_a_x=8 (unit: J^-
^1・cm^2・sec).
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31296089A JPH03171141A (en) | 1989-11-30 | 1989-11-30 | Manufacture of organic photosensitive body |
US08/004,675 US5330873A (en) | 1989-11-09 | 1993-01-14 | Production method of photosensitive member by eliminating outermost surface portion of photosensitive layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31296089A JPH03171141A (en) | 1989-11-30 | 1989-11-30 | Manufacture of organic photosensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03171141A true JPH03171141A (en) | 1991-07-24 |
Family
ID=18035557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31296089A Pending JPH03171141A (en) | 1989-11-09 | 1989-11-30 | Manufacture of organic photosensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03171141A (en) |
-
1989
- 1989-11-30 JP JP31296089A patent/JPH03171141A/en active Pending
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