JPH04162722A - Cleaning device - Google Patents
Cleaning deviceInfo
- Publication number
- JPH04162722A JPH04162722A JP28901890A JP28901890A JPH04162722A JP H04162722 A JPH04162722 A JP H04162722A JP 28901890 A JP28901890 A JP 28901890A JP 28901890 A JP28901890 A JP 28901890A JP H04162722 A JPH04162722 A JP H04162722A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- particles
- cleanser
- pump
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims description 22
- 239000002245 particle Substances 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 10
- 238000005406 washing Methods 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims description 11
- 239000004065 semiconductor Substances 0.000 abstract description 10
- 239000000758 substrate Substances 0.000 abstract description 6
- 230000002411 adverse Effects 0.000 abstract description 4
- 238000001179 sorption measurement Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 3
- 239000013522 chelant Substances 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000428 dust Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は洗浄装置に関し、特に半導体装置の製造工程に
於いて用いられる洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device, and particularly to a cleaning device used in the manufacturing process of semiconductor devices.
従来の半導体基板の洗浄に用いられる洗浄装！は、第２
図に示すように、フィルタ５を介してポンプ３により水
洗槽１０を構成する外槽２内の洗浄液を循環させ、内槽
１内で発泡、振動させて内槽１内に浸漬させた半導体基
板表面に付着したごみや異物を除去するように構成され
ていた。Cleaning equipment used for conventional cleaning of semiconductor substrates! is the second
As shown in the figure, the cleaning liquid in the outer tank 2 constituting the washing tank 10 is circulated by the pump 3 through the filter 5, and the semiconductor substrate is immersed in the inner tank 1 by foaming and vibrating in the inner tank 1. It was designed to remove dirt and foreign matter attached to the surface.
しかしながら、この従来の洗浄装置では、洗浄液内に存
在する金属荷電粒子が半導体基板表面に吸着、侵入して
残り、半導体基板に形成される素子特性に悪影響を与え
るという問題点があった。However, this conventional cleaning apparatus has a problem in that charged metal particles present in the cleaning liquid are adsorbed onto the surface of the semiconductor substrate, remain there, and adversely affect the characteristics of elements formed on the semiconductor substrate.
本発明の洗浄装置は、外槽と内槽からなる水洗槽と、前
記外槽の洗浄液をフィルタを介して前記内槽に循環させ
るポンプとを有する洗浄装置において、前記洗浄液の循
環経路に金属荷電粒子を捕獲するためのトラップを設け
たものである。The cleaning device of the present invention includes a cleaning tank including an outer tank and an inner tank, and a pump that circulates the cleaning liquid in the outer tank to the inner tank through a filter. It is equipped with a trap to capture particles.
次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第１図は本発明の一実施例の断面図である。FIG. 1 is a sectional view of an embodiment of the present invention.
第１図において水洗層１０は、内槽１と外槽２とから構
成され、外槽２内の洗浄液はポンプ３により金属荷電粒
子トラップ４とフィルタ５を介して内槽１の底部に送ら
れるように構成されているＪ
このように構成された実施例によれば、洗浄液の入った
内槽１よりオーバーフローした洗浄液は、外槽２よりポ
ンプ３により循環し、キレート樹脂を内部にもつ金属荷
電粒子トラップ４にて、洗浄液内の金属荷電粒子のみが
選択的に除去され、更にフィルタ５にてごみや異物か除
去されて内槽の底部へ還流される。従って従来の洗浄装
置の場合に比べ、金属荷電粒子を極めて少くすることが
できる。In FIG. 1, the washing layer 10 is composed of an inner tank 1 and an outer tank 2, and the cleaning liquid in the outer tank 2 is sent to the bottom of the inner tank 1 by a pump 3 via a metal charged particle trap 4 and a filter 5. J According to the embodiment configured as described above, the cleaning liquid overflowing from the inner tank 1 containing the cleaning liquid is circulated by the pump 3 from the outer tank 2, and the cleaning liquid is circulated through the pump 3 to remove the charged metal having the chelate resin inside. A particle trap 4 selectively removes only the metal charged particles in the cleaning liquid, and a filter 5 removes dust and foreign matter, which are then returned to the bottom of the inner tank. Therefore, the amount of charged metal particles can be significantly reduced compared to conventional cleaning devices.
以上説明したように本発明は、洗浄液の循環経路の中途
に、キレート樹脂系の金属荷電粒子トラップを取り付け
ることにより、金属荷電粒子のみを選択的に除去できる
ので、半導体基板表面に金属荷電粒子が付着し半導体装
置の電気的特性に悪影響が及ぶのを防ぐことができると
いう効果がある。As explained above, the present invention can selectively remove only metal charged particles by installing a chelate resin-based metal charged particle trap in the middle of the cleaning liquid circulation path, so that metal charged particles can be removed from the surface of the semiconductor substrate. This has the effect of preventing adhesion and adverse effects on the electrical characteristics of the semiconductor device.
第１図は本発明の一実施例の断面図、第２図は従来例の
断面図である。
１・・・内槽、２・・・外槽、３・・・ポンプ、４・・
・金属荷電粒子トラップ、５・・・フィルタ、１０・・
・水洗槽。FIG. 1 is a sectional view of one embodiment of the present invention, and FIG. 2 is a sectional view of a conventional example. 1...Inner tank, 2...Outer tank, 3...Pump, 4...
・Metal charged particle trap, 5...filter, 10...
・Washing tank.
Claims (1)
ィルタを介して前記内槽に循環させるポンプとを有する
洗浄装置において、前記洗浄液の循環経路に金属荷電粒
子を捕獲するためのトラップを設けたことを特徴とする
洗浄装置。A trap for capturing metal charged particles in a circulation path of the cleaning liquid in a cleaning device having a washing tank consisting of an outer tank and an inner tank, and a pump that circulates the cleaning liquid in the outer tank to the inner tank via a filter. A cleaning device characterized by being provided with.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28901890A JPH04162722A (en) | 1990-10-26 | 1990-10-26 | Cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28901890A JPH04162722A (en) | 1990-10-26 | 1990-10-26 | Cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04162722A true JPH04162722A (en) | 1992-06-08 |
Family
ID=17737766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28901890A Pending JPH04162722A (en) | 1990-10-26 | 1990-10-26 | Cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04162722A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06254255A (en) * | 1993-03-08 | 1994-09-13 | Zetsutaa Kogyo Kk | Flush-type cigarette butt collecting device |
| JP2008199669A (en) * | 1997-03-21 | 2008-08-28 | Canal Plus | Transmission and reception of television programs and other data |
-
1990
- 1990-10-26 JP JP28901890A patent/JPH04162722A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06254255A (en) * | 1993-03-08 | 1994-09-13 | Zetsutaa Kogyo Kk | Flush-type cigarette butt collecting device |
| JP2008199669A (en) * | 1997-03-21 | 2008-08-28 | Canal Plus | Transmission and reception of television programs and other data |
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