JPH04162544A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPH04162544A JPH04162544A JP28970390A JP28970390A JPH04162544A JP H04162544 A JPH04162544 A JP H04162544A JP 28970390 A JP28970390 A JP 28970390A JP 28970390 A JP28970390 A JP 28970390A JP H04162544 A JPH04162544 A JP H04162544A
- Authority
- JP
- Japan
- Prior art keywords
- probe
- bump
- semiconductor chip
- bumps
- peripheral wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 28
- 239000000523 sample Substances 0.000 claims abstract description 38
- 238000005259 measurement Methods 0.000 claims abstract description 13
- 230000002093 peripheral effect Effects 0.000 claims abstract description 11
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 5
- 239000010931 gold Substances 0.000 abstract description 5
- 229910052737 gold Inorganic materials 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 2
- 238000006073 displacement reaction Methods 0.000 abstract 2
- 235000012431 wafers Nutrition 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 201000007114 MHC class I deficiency Diseases 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 235000008429 bread Nutrition 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a semiconductor device.
半導体装置のウェーハ状態でチップの電気測定を行う際
、バンプ電極に接触するプローブ・カードの探針合わせ
は、通常プローバにて水平方向のアライメントをした後
、プローブ・カードの回転方向0点を目視ないしはCR
Tモニタ画面でチエツクし合わせる。When performing electrical measurements on chips in the wafer state of semiconductor devices, the probes of the probe card that come into contact with the bump electrodes are usually aligned in the horizontal direction using a prober, and then the zero point in the rotational direction of the probe card is visually checked. or CR
Check and match on the T-monitor screen.
0点合わせはチップサイズが小さく、パッド数も多くな
い場合にはプローブ・カードの目視が一般的で、チップ
のパッドとカードの針先の位置を顕微鏡で見ながら行わ
れるが、数100ピンのパッドを有ししかもパッドサイ
ズも小さくピッチも狭いチップの場合には、ダミーウェ
ーハを用いて針跡をつけ、予めインプットしである針先
座標と針跡とをプローバ側で自動的に合わせ込むように
モニタ画面を用いる。When the chip size is small and the number of pads is not large, zero point alignment is generally done by visually checking the probe card, and is done by observing the positions of the chip pads and the card needle tip using a microscope. If the chip has a pad, the pad size is small, and the pitch is narrow, a dummy wafer is used to make needle marks, and the prober side automatically matches the needle tip coordinates input in advance with the needle marks. The monitor screen is used for
この従来半導体装置は、半導体チップ上のパッド数が少
ない場合にはパッドサイズ及びピッチに余裕があるので
目視やモニタ画面のどちらによる場合でも全く問題ない
が、500ビンを超えしかも金バンプ電極を有するTA
BLSIではバンプサイズとピッチともかなり小さいの
で、モニタ画面を用いる場合でもチップ上のバンプ中心
に探針を当ることが困難である。This conventional semiconductor device has more than 500 bins and has gold bump electrodes, although there is no problem with visual inspection or a monitor screen because there is plenty of pad size and pitch when the number of pads on a semiconductor chip is small. T.A.
In BLSI, both the bump size and pitch are quite small, so even when using a monitor screen, it is difficult to hit the center of the bump on the chip with a probe.
第4図(a>、(b)に示すように探針7がノくツブ電
極6の中心部10に当る場合は正常であるが、第5図(
a)、(b)に示すように探針7がバンプ電極6の縁端
に当たると針跡10aをつけ、バンプ形状のクズレを生
じさせることがあり、電気的測定時には導通していて良
品になっても、後工程の外観チエツクで不良になってし
まうという問題があった。If the probe 7 hits the center part 10 of the knob electrode 6 as shown in FIGS. 4(a) and (b), it is normal;
As shown in a) and (b), when the probe 7 hits the edge of the bump electrode 6, it leaves a needle mark 10a, which may cause the bump shape to become distorted. However, there was a problem in that the appearance check in the post-process resulted in defects.
さらに測定前は十分針合わせができていても、ウェーハ
を連続して測定しているうちに、カードがズしてきてし
まい、気づかないうちにバンプ電極6を傷つけていると
いう不具合もあった。Furthermore, even if the needles were properly aligned before measurement, the card would become misaligned during continuous measurement of wafers, causing damage to the bump electrodes 6 without being noticed.
本発明の半導体装置は、半導体チップの電気特性を測定
するために前記半導体チップの表面にプローブ・カード
のプローブと接触するバンプ電極を有する半導体装置に
おいて、内部回路と接続されていない探針用バンプと、
該探針用バンプの周辺をとり囲みかつ測定用バンプに接
続されている周辺配線層を前記半導体チップの表面に有
して構成されている。The semiconductor device of the present invention is a semiconductor device having a bump electrode on the surface of the semiconductor chip that contacts a probe of a probe card in order to measure the electrical characteristics of the semiconductor chip. and,
A peripheral wiring layer surrounding the probe bump and connected to the measurement bump is provided on the surface of the semiconductor chip.
次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の第1の実施例の半導体チップの平面図
である。FIG. 1 is a plan view of a semiconductor chip according to a first embodiment of the present invention.
半導体チップ1の隅2ケ所に内部回路と接続されていな
い金の探針用バンプ2があり、その周辺に例えば約10
μの間隔をあけて同じ高さ、同じ材質の金の周辺配線層
3を有する。There are gold probe bumps 2 at two corners of the semiconductor chip 1 that are not connected to the internal circuit, and around these bumps there are approximately 10
The peripheral wiring layers 3 are made of gold and are made of the same material and have the same height and are spaced apart by μ.
周辺の配線層3は、探針用バンプ2の近傍にあるGND
電位の測定用バンプ4に接続されている。The peripheral wiring layer 3 is connected to the GND near the probe bump 2.
It is connected to a potential measurement bump 4.
第2図(a)、(b)は第1図の半導体装置の探針ずれ
チエツクの動作を説明するための模式図及びA−A線断
面模式図である。FIGS. 2(a) and 2(b) are a schematic diagram and a schematic cross-sectional view taken along the line A--A for explaining the probe misalignment check operation of the semiconductor device of FIG. 1.
チップ特性測定中、探針用バンプ2に立てられ探針7に
は直流電圧が印加されており、流れる電流工を計測して
いる。During the measurement of chip characteristics, a direct current voltage is applied to the probe 7 placed on the probe bump 2, and the flowing current is measured.
もし探針7がズして周辺配線層3と接触したり、探針用
バンプ2の縁端をいためて周辺配線層3と接触したり、
探針用バンプ2と測定用ノ(ノブ間に短絡させてしまう
と、電流工が流れるため、電流計9で異常と判断させれ
ばチ・ンプ特性測定を中断させることができる。If the probe 7 slips and comes into contact with the peripheral wiring layer 3, or if the edge of the probe bump 2 is damaged and comes into contact with the peripheral wiring layer 3,
If there is a short circuit between the probe bump 2 and the measuring knob, a current will flow, so if the ammeter 9 determines that there is an abnormality, the chip characteristic measurement can be interrupted.
なお、探針用バンプ2の大きさは、ずれの検出感度を上
げる為に、他のバンプ電極よりも例えば約20μ(各辺
)小さくしである。The size of the probe bump 2 is, for example, about 20 μ (on each side) smaller than the other bump electrodes in order to increase the detection sensitivity of deviation.
又、この探針用バンプ2はずれチエツク用のみに用いら
れ、リードボンディングは行わない。Further, this probe bump 2 is used only for checking misalignment and is not used for lead bonding.
第3図は本発明の第2の実施例の平面図であり、探針用
バッド2をVcc最高電位の測定用ノくンブ5のすぐ隣
りに配置したものである。FIG. 3 is a plan view of a second embodiment of the present invention, in which a probe pad 2 is placed immediately adjacent to a knob 5 for measuring the highest potential of Vcc.
以上説明したように本発明は、チップ内に探針ずれ測定
パターン層を設け、テスタで電気的にズレの有無をチエ
ツクしているので、ずれが発生した時点でアラームを出
力でき、しかも探針ずれによるパンブクズレの発生も外
観チエツクをすることなく検知できる効果がある。As explained above, the present invention provides a probe misalignment measurement pattern layer in the chip and uses a tester to electrically check for misalignment, so an alarm can be output when misalignment occurs. There is an effect that the occurrence of bread shift due to misalignment can be detected without checking the appearance.
第1図は本発明の第1の実施例の平面図、第2図(a)
、(b)は第1図の半導体装置の探針ずれチエツクの動
作を説明するための模式図及びA−A線断面模式図、第
3図は本発明の第2の実施例の平面図、第4図(a)、
(b)は従来の半導体装置の一例の探針ずれなしの状態
のバンプの平面模式図及びA−A線断面模式図、第5図
(a)。
(1))は従来の半導体装置の一例の探針ずれ状態のバ
ンプの平面図及びA−A線断面模式図である。
1・・・半導体チップ、2・・・探針用バンプ、3・・
・周辺配線層、4.5・・・測定用バンプ、6・・・バ
ンプ、7・・・探針、8・・・DC電源、9・・・電流
計。Fig. 1 is a plan view of the first embodiment of the present invention, Fig. 2(a)
, (b) is a schematic diagram for explaining the operation of the probe misalignment check of the semiconductor device in FIG. 1, and a schematic cross-sectional view taken along the line A-A, and FIG. Figure 4(a),
5(b) is a schematic plan view and a schematic cross-sectional view taken along the line A-A of a bump in an example of a conventional semiconductor device in a state where there is no tip deviation, and FIG. 5(a). (1)) is a plan view and a schematic cross-sectional view taken along the line A-A of a bump in a probe misalignment state in an example of a conventional semiconductor device. 1... Semiconductor chip, 2... Bump for probe, 3...
- Peripheral wiring layer, 4.5... Measurement bump, 6... Bump, 7... Probe, 8... DC power supply, 9... Ammeter.
Claims (1)
チップの表面にプローブ・カードのプローブと接触する
バンプ電極を有する半導体装置において、内部回路と接
続されていない探針用バンプと、該探針用バンプの周辺
をとり囲みかつ測定用バンプに接続されている周辺配線
層を前記半導体チップの表面に有することを特徴とする
半導体装置。In a semiconductor device having a bump electrode that contacts a probe of a probe card on the surface of the semiconductor chip in order to measure the electrical characteristics of the semiconductor chip, a probe bump that is not connected to an internal circuit; A semiconductor device comprising a peripheral wiring layer on the surface of the semiconductor chip that surrounds the periphery of the semiconductor chip and is connected to the measurement bump.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28970390A JPH04162544A (en) | 1990-10-25 | 1990-10-25 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28970390A JPH04162544A (en) | 1990-10-25 | 1990-10-25 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04162544A true JPH04162544A (en) | 1992-06-08 |
Family
ID=17746660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28970390A Pending JPH04162544A (en) | 1990-10-25 | 1990-10-25 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04162544A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11714123B2 (en) | 2020-09-02 | 2023-08-01 | United Semiconductor Japan Co., Ltd. | Probe position monitoring structure and method of monitoring position of probe |
-
1990
- 1990-10-25 JP JP28970390A patent/JPH04162544A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11714123B2 (en) | 2020-09-02 | 2023-08-01 | United Semiconductor Japan Co., Ltd. | Probe position monitoring structure and method of monitoring position of probe |
US11994556B2 (en) | 2020-09-02 | 2024-05-28 | United Semiconductor Japan Co., Ltd. | Probe position monitoring structure and method of monitoring position of probe |
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