JPH04159764A - Manufacture of electronic component mounting board - Google Patents

Manufacture of electronic component mounting board

Info

Publication number
JPH04159764A
JPH04159764A JP2286573A JP28657390A JPH04159764A JP H04159764 A JPH04159764 A JP H04159764A JP 2286573 A JP2286573 A JP 2286573A JP 28657390 A JP28657390 A JP 28657390A JP H04159764 A JPH04159764 A JP H04159764A
Authority
JP
Japan
Prior art keywords
layer
base material
mask
material layer
metal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2286573A
Other languages
Japanese (ja)
Other versions
JP2913069B2 (en
Inventor
Takeshi Takeyama
武山 武
Masahiro Mori
政博 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP2286573A priority Critical patent/JP2913069B2/en
Publication of JPH04159764A publication Critical patent/JPH04159764A/en
Application granted granted Critical
Publication of JP2913069B2 publication Critical patent/JP2913069B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15173Fan-out arrangement of the internal vias in a single layer of the multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19105Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/202Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using self-supporting metal foil pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/403Edge contacts; Windows or holes in the substrate having plural connections on the walls thereof

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To form a metal exposed part widely, surely, and in a short time, to eliminate generation of fine dusts and to enhance reliability by integrating a metal layer with a base material layer, and exposing a predetermined part of the metal layer through a specific step. CONSTITUTION:After a mask 16 is disposed between a metal layer 11 of a part to be exposed and a base material layer 12, the layer 12 is integrated with the layer 11. Then, the layer 11 is irradiated with a laser light from the layer 12 side to the layer 12 on the layer 11 disposed on the periphery of the mask 16, and the layer 12 at the periphery of the mask 16 is cut. Then, the layer 12 on the mask 16 is peeled together with the mask 16, and at least the cut port of the layer 12 and the layer 11 near it are polished by jet scrub polishing. Thus, it can be conducted in a relatively wide area surely and in a short time, no fine dust is generated, and reliability is enhanced.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、金属層に対して基材層を一体化して構成され
る電子部品搭載用基板の製造方法に関するもので、特に
レーザー加工を利用して金属層の所定部分を基材層から
露出させるようにした電子部品搭載用基板の製造方法の
改良に関するものである。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a method for manufacturing a substrate for mounting electronic components, which is constructed by integrating a base material layer with a metal layer, and in particular, relates to a method for manufacturing a substrate for mounting electronic components, which uses laser processing. The present invention relates to an improvement in a method of manufacturing a substrate for mounting electronic components in which a predetermined portion of a metal layer is exposed from a base material layer.

(従来の技術) 近年の高密度化された電子部品は、そのままでは各種電
子機器を構成することができないから、これを基板に実
装してから使用しなければならない。そのために、従来
より種々の形式の電子部品搭載用基板が開発され提案さ
れている。
(Prior Art) Recent high-density electronic components cannot be used as they are to construct various electronic devices, so they must be mounted on a board before use. To this end, various types of electronic component mounting boards have been developed and proposed.

例えば、電子部品と、これを外部に接続するためのリー
ド等の端子とを、基板において接続する形式の電子部品
搭載用基板は、導体層、リードあるいは伝熱層等とする
ための金属層に対して、樹脂等により形成されて絶縁性
の優れた基材層を一体化し、この基材層の表面あるいは
内部に導体回路等を形成することにより、電子部品を実
装する基板として構成されるものである。
For example, an electronic component mounting board that connects an electronic component and a terminal such as a lead for connecting it to the outside on the board has a metal layer that serves as a conductor layer, lead, or heat transfer layer. On the other hand, it is constructed as a board on which electronic components are mounted by integrating a base material layer made of resin etc. with excellent insulating properties and forming a conductor circuit etc. on the surface or inside of this base material layer. It is.

そして、この種の電子部品搭載用基板に対しては、第7
図に示したように、電子部品(20)を搭載するための
凹部(13)や電子部品(20)から発生した熱を放散
させる放熱部(18)を形成する等の目的で基材層(1
2)から金属層(11)を露出させることが一般的に行
なわれている。
For this type of electronic component mounting board, the seventh
As shown in the figure, the base material layer ( 1
2) It is common practice to expose the metal layer (11).

このような基材層(12)から金属層(11)を露出し
た電子部品搭載用凹部(13)や放熱部(18)を形成
するのは、電子部品(20)を通電した際に発生する熱
を直接熱伝導性の高い金属層(11)に伝え、さらにこ
の熱を放熱部(18)から大気中に放散させることによ
り、電子部品(20)の放熱性を高めるためや、あるい
は電子部品(20)を搭載したときの電子部品搭載用基
板全体の厚さを薄くするため等の理由によるものである
The formation of such electronic component mounting recesses (13) and heat dissipation portions (18) in which the metal layer (11) is exposed from the base material layer (12) occurs when the electronic component (20) is energized. By transmitting heat directly to the highly thermally conductive metal layer (11) and further dissipating this heat into the atmosphere from the heat dissipation part (18), it is possible to improve the heat dissipation of the electronic component (20), or to improve the heat dissipation of the electronic component (20). This is for reasons such as reducing the thickness of the entire electronic component mounting board when mounting the electronic component (20).

そして、このような電子部品搭載用基板を製造する方法
には種々な方法があり、中でも本出願人が先の出願(特
願平1−113425号)において提案した「電子部品
搭載用基板の製造方法」が効果的である。
There are various methods for manufacturing such a substrate for mounting electronic components, and among them, ``manufacturing of a substrate for mounting electronic components'' proposed by the present applicant in a previous application (Japanese Patent Application No. 1-113425). ``Method'' is effective.

この製造方法は、その特許請求の範囲からすると、 [金属層に対して基材層を一体化して、この基材層から
前記金属層の所定の部分を次の各工程を経て露出させる
ことにより構成される電子部品搭載用基板の製造方法。
From the scope of the claims, this manufacturing method is defined as: [By integrating a base material layer with a metal layer and exposing a predetermined portion of the metal layer from the base material layer through the following steps. A method of manufacturing a board for mounting electronic components comprising:

(1)露出部となるべき部分の金属層と基材層との間に
マスクを配置してから、前記金属層に対して前記基材層
を一体化する工程; (2)前記マスクの周囲に位置する、金属層上の−3= 基材層に対してこの基材層側から前記金属層側にレーザ
ー光を照射して、前記マスクの周囲の基材層を切断する
工程; (3)前記マスク」二の基材層をこのマスクとともに剥
離する工程」である。
(1) A step of arranging a mask between the metal layer and the base material layer in a portion that is to become an exposed portion, and then integrating the base material layer with the metal layer; (2) Surroundings of the mask A step of cutting the base material layer around the mask by irradiating a laser beam from the base layer side to the metal layer side with respect to the -3= base material layer located on the metal layer; (3 ) A step of peeling off the second base material layer together with the mask.

つまり、この従来の製造方法は、マスクを介して金属層
と基材層とを一体化し、次にレーザー光により前記マス
クの周囲の基材層を切断し、最後に前記マスク上の基材
層をこのマスクとともに剥離することによって、部分的
に金属層が露出した電子部品搭載用基板を製造するので
ある。
In other words, this conventional manufacturing method integrates a metal layer and a base material layer through a mask, then cuts the base material layer around the mask using a laser beam, and finally cuts the base material layer on the mask. By peeling off the mask together with the mask, an electronic component mounting board with a partially exposed metal layer is manufactured.

(発明が解決しようとする課題) しかしながら、従来の製造方法にあっては、レーザー光
によって基材層を切断する際に、レーザー光の熱による
変質物が切断された基材層の切口やその周辺、或いはそ
の切口の近傍の金属層に付着し、クリーンでなければな
らない電子部品搭載用基板から微塵が発生するという問
題が残されていた。
(Problem to be Solved by the Invention) However, in the conventional manufacturing method, when the base material layer is cut with a laser beam, altered substances due to the heat of the laser light are left on the cut surface of the cut base material layer and There remained the problem that fine dust was generated from the electronic component mounting board, which must be clean, by adhering to the metal layer around the periphery or near the cut edge thereof.

また、従来の製造方法により電子部品搭載用基板の外形
加工を行いアウターリードとなる金属層を露出させるよ
うな場合にあっても、前述の変質物がこのアウターリー
ドに付着し、この付着物によってアウターリード間の絶
縁抵抗を低下させることとなって、電子部品搭載用基板
の信頼性を低下させるといった問題も残されていた。
In addition, even when the external shape of a board for mounting electronic components is processed using conventional manufacturing methods to expose the metal layer that will become the outer lead, the above-mentioned degenerate substances will adhere to the outer lead, and this deposit will cause damage to the outer lead. There also remains the problem that the insulation resistance between the outer leads is reduced, reducing the reliability of the electronic component mounting board.

本発明は以上のような実状に鑑みてな返′れたものであ
り、その目的とするところは、レーザー光による切削加
工が部分的であっても、電子部品搭載用基板における金
属露出部の形成を比較的広い面積にわたって確実かつ短
時間内に行なうことができると共に、微塵が発生せづ、
かつ信頼性の高い電子部品搭載用基板を容易に製造でき
る方法を提供することにある。
The present invention was developed in view of the above-mentioned circumstances, and its purpose is to eliminate exposed metal parts of electronic component mounting boards even if only a partial cutting process is performed using a laser beam. Formation can be performed reliably and within a short time over a relatively wide area, and no fine dust is generated.
Another object of the present invention is to provide a method for easily manufacturing a highly reliable electronic component mounting board.

(課題を解決するための手段) 以上の課題を解決するために本発明が採った手段は、実
施例において使用する符号を付して説明すると、 「金属層(11)に対して基材層(12)を一体化して
、この基材層(12)から前記金属層(11)の所定の
部分を次の各工程を経て露出させることにより構成され
る電子部品搭載用基板(10)の製造方法。
(Means for Solving the Problems) The means taken by the present invention to solve the above problems are explained using the reference numerals used in the examples. (12) is integrated, and a predetermined portion of the metal layer (11) is exposed from the base material layer (12) through the following steps. Method.

(イ)露出部(IIA)となるべき部分の金属層(11
)と基材層(12)との間にマスク(16)を配置して
から、前記金属層(11)に対して前記基材層(12)
を一体化する工程; (ロ)前記マスク(16)の周囲に位置する金属層(1
1)lの基材層(12)に対して、この基材層(12)
側から前記金属層(11)側にレーザー光を照射し、前
記マスク(16)の周囲の基材層(12)を切断する工
程; (ハ)前記マスク(16)上の基材層(12)をこのマ
スク(16)とともに剥離する工程; (ニ)少なくとも切断された前記基材層(12)の切口
及びその近傍の金属層(11)をジェットスクラブ研磨
により研磨する工程」である。
(a) Metal layer (11) in the part that should become the exposed part (IIA)
) and the base material layer (12), and then the mask (16) is placed between the metal layer (11) and the base material layer (12).
(b) a step of integrating the metal layer (1) located around the mask (16);
1) For the base material layer (12) of l, this base material layer (12)
A step of cutting the base material layer (12) around the mask (16) by irradiating the metal layer (11) side with a laser beam from the side; (c) cutting the base material layer (12) on the mask (16); ) together with this mask (16); and (d) a step of polishing at least the cut end of the base layer (12) and the metal layer (11) in the vicinity thereof by jet scrub polishing.

すなわち、本発明の方法においては、まず第6図の(a
)に示したように、露出部(IIA)となるべき部分の
金属層(11)と基材層(12)の一体化を阻止するた
め、これらの間にマスク(16)を配置してから、その
他の部分の金属層(11)と基材層(12)を−体化す
る。
That is, in the method of the present invention, first, (a
), in order to prevent the metal layer (11) and the base material layer (12) from being integrated in the portion that should become the exposed portion (IIA), a mask (16) is placed between them. , the other portions of the metal layer (11) and the base material layer (12) are integrated.

このマスク(16)としては、金属層(11)と基材層
(12)を一体化する工程等、この電子部品搭載用基板
(10)を製造する一連の工程で熱や圧力等の衝撃が加
えられても変形することなく、最終的に何らかの方法で
金属層(11)から剥離できるものであれば何でもよく
、例えば比較的耐熱性の高い樹脂フィルムや、金属箔等
が挙げられる。
This mask (16) is used in a series of processes for manufacturing this electronic component mounting board (10), such as the process of integrating the metal layer (11) and the base material layer (12), due to shocks such as heat and pressure. Any material may be used as long as it does not deform even when added and can be finally peeled off from the metal layer (11) by some method, such as a relatively heat-resistant resin film, metal foil, etc.

また、金属層(11)と基材層(12)を一体化するこ
とは、完全硬化する前の熱硬化型樹脂を金属層(11)
と密着させながら、適当な温度と時間を加えて、金属層
(11)と基材層(12)を接着させることにより行な
う。この一体化方法としては、金属層(11)にプリプ
レグ(12b)を重ねて、プレス等で熱圧着させること
により、このプリプレグ(12b)を基材層(I2)と
して形成する方法、金属層(11)と基材層(12)の
間に半硬化状態の接着シート(12a)を配置して、プ
レス等で熱圧着させることにより、基材層(12)とす
る方法、金属層(11)をはさみ込んだ金型に熱硬化性
樹脂を注入して熱硬化させてこれを基材層(12)とす
る、所謂射出成型の方法等が挙げられる。
In addition, integrating the metal layer (11) and the base material layer (12) means that the thermosetting resin before being completely cured is transferred to the metal layer (11).
This is done by adhering the metal layer (11) and the base material layer (12) by applying an appropriate temperature and time while bringing them into close contact with each other. This integration method includes a method of stacking the prepreg (12b) on the metal layer (11) and bonding the prepreg (12b) with heat using a press or the like to form the prepreg (12b) as the base material layer (I2); A method of forming a base material layer (12) by placing a semi-cured adhesive sheet (12a) between the base material layer (11) and the base material layer (12) and bonding the adhesive sheet under heat using a press or the like; a metal layer (11); Examples include a so-called injection molding method, in which a thermosetting resin is injected into a mold in which the resin is sandwiched, and the thermosetting resin is thermosetted to form the base layer (12).

次に、以上のような基材層(12)に対して第6図の(
b)に示したように、基材層(12)の外側からマスク
(16)の外周に位置する、金属層(11)上の基材層
(12)に対して、レーザー光を照射するのである。
Next, for the base material layer (12) as described above, (
As shown in b), the laser beam is irradiated from the outside of the base layer (12) to the base layer (12) on the metal layer (11) located on the outer periphery of the mask (16). be.

ここで用いられるレーザー光は、基材層(12)の切断
を良好に行なうとともに、金属層(11)に傷をっけな
いようにする必要があるため、金属に対しての反射率の
高い波長のものが望ましい。その点発振波長が10.6
μmである炭酸ガスレーザーを用いると、金属層(11
)を全く傷つけることなく基材層(12)を切断できる
The laser beam used here needs to cut the base material layer (12) well and avoid scratching the metal layer (11), so the laser beam has a high reflectance on metal. wavelength is preferable. The oscillation wavelength at that point is 10.6
When using a carbon dioxide laser with a diameter of μm, a metal layer (11
) can be cut without damaging the base material layer (12) at all.

このように、レーザー光によって、マスク(16)の外
周に位置する、金属層(11)上の基材層(12)を切
断することによって、第6図の(b)に示すように、マ
スク(16)の外周に、マスク(16)上の基材層(1
2)と他の基材層(12)とを確実に分離する溝が形成
されるのである。
In this way, by cutting the base material layer (12) on the metal layer (11) located on the outer periphery of the mask (16) with laser light, the mask can be cut as shown in FIG. 6(b). (16) on the outer periphery of the base material layer (16).
2) and the other base material layer (12) are formed.

このようなマスク(16)上の外周に位置する溝が形成
されれば、マスク(16)上に位置する基材層(12)
は、他の基材層(12)と完全に分離されており、しか
も前述したようにマスク(16)と金属層(11)とは
接着されていないため、マスク(16)は容易に剥離で
きる状態となっているのである。
If such a groove located on the outer periphery of the mask (16) is formed, the base material layer (12) located on the mask (16)
is completely separated from the other base material layer (12), and as mentioned above, the mask (16) and the metal layer (11) are not bonded, so the mask (16) can be easily peeled off. It has become a state.

次に、基材層(12)をマスク(16)とともに金属層
(11)から剥離すれば、第6図の(c)に示したよう
に、金属露出部(IIA)が完成される。
Next, when the base material layer (12) and the mask (16) are peeled off from the metal layer (11), the metal exposed portion (IIA) is completed as shown in FIG. 6(c).

最後に、第6図の(d)に示したように、切断された基
材層(12)の切口と、この切口の近傍の金属層(11
)をジェットスクラブ研磨により研磨すれば、金属露出
部(IIA)を有する電子部品搭載用基板(10)が形
成されるのである。
Finally, as shown in FIG. 6(d), the cut end of the base material layer (12) and the metal layer (11
) is polished by jet scrub polishing, an electronic component mounting substrate (10) having an exposed metal portion (IIA) is formed.

ここで、ジェットスクラブ研磨とは、酸化珪素等の粒子
を水に20%程の濃度で攪拌し、これをノズルより所定
圧力で被研磨物に噴射して、当該被研磨物を研磨する方
法であって、超音波洗浄や高圧水等による研磨に比較し
て、レーザー光の熱による変質物を除去するのに効果的
である。
Here, jet scrub polishing is a method of stirring particles such as silicon oxide in water at a concentration of about 20%, and jetting the particles at a predetermined pressure from a nozzle onto the object to be polished, thereby polishing the object. Therefore, compared to ultrasonic cleaning or polishing using high-pressure water, it is more effective in removing substances altered by the heat of laser light.

なお、ジェットスクラブ研磨を行なう箇所は、基材層(
12)の切口と、この切口の近傍の金属層(11)のみ
ならず、基材層(12)の全体に対して行っても良い。
Note that the areas where jet scrub polishing is performed are based on the base material layer (
The treatment may be performed not only on the cut section 12) and the metal layer (11) in the vicinity of this cut section, but also on the entire base material layer (12).

(発明の作用) このような方法で電子部品搭載用基板(lO)の金属露
出部(IIA)を形成すると、次のような作用がある。
(Actions of the Invention) When the metal exposed portion (IIA) of the electronic component mounting board (IO) is formed by such a method, the following effects occur.

金属露出部(IIA)となるべき部分において、マスク
(16)によって基材層(12)と金属層(11)との
−体化を阻止する。すなわち、例えば基材層(12)と
金属層(11)とを接着させる接着シート(12a)と
して、熱圧着時の樹脂の流れ性が高いものを採用しても
、マスク(16)の介在によって金属露出部(IIA)
の表面に接着シート(12a)の樹脂の流出を防止する
ことが可能なため、耐熱性、耐湿性、耐薬品性などの性
能が優れた接着シー1(12a)が採用できる。
A mask (16) prevents the base material layer (12) and the metal layer (11) from forming a body in a portion to become the metal exposed portion (IIA). That is, even if the adhesive sheet (12a) for bonding the base material layer (12) and the metal layer (11) is one that has high resin flowability during thermocompression bonding, the mask (16) may interfere with the adhesive sheet (12a). Exposed metal part (IIA)
Since it is possible to prevent the resin of the adhesive sheet (12a) from flowing out onto the surface of the adhesive sheet (12a), the adhesive sheet 1 (12a) having excellent properties such as heat resistance, moisture resistance, and chemical resistance can be adopted.

また、特に発振波長が10.6μmである炭酸ガスレー
ザーを採用すれば、金属に対して反射率の高いレーザー
光が得られ、しかも樹脂やガラスクロス等に関しては良
好な切断ができる。このため、基材層(12)側から金
属層(11)側へ、レーザー光を照射すれば、金属層(
11)を傷つけることなく、基材層(12)のみが選択
的に切断されるのである。
Furthermore, if a carbon dioxide laser having an oscillation wavelength of 10.6 μm is used, a laser beam with a high reflectance for metals can be obtained, and resins, glass cloth, etc. can be cut well. Therefore, if laser light is irradiated from the base material layer (12) side to the metal layer (11) side, the metal layer (
Only the base material layer (12) is selectively cut without damaging the base material layer (11).

従って、基材層(12)の厚さが多少変動するような場
合でも、レーザー光による切断は、必ず金属層表面まで
で止められるため、切断の深さ制御が簡単にしかも正確
に行なわれるのである。
Therefore, even if the thickness of the base material layer (12) varies slightly, the cutting by the laser beam will always stop at the surface of the metal layer, so the cutting depth can be easily and accurately controlled. be.

さらに、このレーザー光による加工はマスク(16)の
外周に位置する金属層(11)J:の基材層(12)に
対して行なえばよく、マスク(16)上の基材層(12
)に対しては同等作業をする必要がないため、この加工
作業は非常に短時間内に完了するものである。
Further, this laser beam processing may be performed on the base material layer (12) of the metal layer (11) J: located on the outer periphery of the mask (16).
), this processing work can be completed within a very short time because there is no need to perform the same work on the other parts.

また、このレーザー光による加工は非接触加工であるか
ら、加工作業における工具の損傷を全く無視することが
できるため安定した加工が行なえるのである。
Furthermore, since machining using laser light is non-contact machining, damage to tools during machining work can be completely ignored, and stable machining can be performed.

さらにまた、最終工程において、切断された基材層(1
2)の切口及びその近傍の金属層(11)は、ジェット
スクラブ研磨によって研磨されるため、これらの部分に
付着したレーザー光の熱による変質物を簡単に除去でき
、よって、微塵等が発生せず、信頼性の高い電子部品搭
載用基板(10)を得ることが可能となるのである。
Furthermore, in the final step, the cut base material layer (1
Since the cut section 2) and the metal layer (11) in the vicinity thereof are polished by jet scrub polishing, it is possible to easily remove the altered substances attached to these parts due to the heat of the laser beam, thereby preventing the generation of fine dust. First, it becomes possible to obtain a highly reliable electronic component mounting board (10).

(実施例) 次に、本発明に係る製造方法を図面に示した実施例に従
って詳細に説明する。
(Example) Next, a manufacturing method according to the present invention will be described in detail according to an example shown in the drawings.

実」1例」、 第1図、第2図、及び第3図の(a)〜(d)には、本
発明の実施例1が示しである。
EXAMPLE 1 Example 1 of the present invention is shown in FIGS. 1, 2, and 3 (a) to (d).

第1図及び第2図に示したものは、複数のアウターリー
ド(17a)の内側に内部接続部(IIC)を−体的に
形成し、この内部接続部(IIc)の両側に基材層(1
2)を一体的に設けることにより、基材層(12)から
各アウターリード(17a)を突出させるとともに、基
材の少なくともいずれか一方に形成した導体回路(14
)とアウターリード(17a)とを電気的に接続した電
子部品搭載用基板(10)である。
In the case shown in FIGS. 1 and 2, an internal connection part (IIC) is physically formed inside a plurality of outer leads (17a), and a base material layer is formed on both sides of this internal connection part (IIc). (1
2) allows each outer lead (17a) to protrude from the base material layer (12), and the conductor circuit (14) formed on at least one of the base materials.
) and an outer lead (17a) are electrically connected to each other and an electronic component mounting board (10).

この電子部品搭載用基板(10)は、電子部品(20)
とアウターリード(17a)との電気的接続を、基材層
(12)J−の導体回路(14)を介して行なう形式の
ものであり、特に金属層(11)としてアウターリード
(17a)と内部接続部(IIC)とを一体向に形成し
たものを採用している。従って、この電子部品搭載用基
板(10)においては、金属層(11)を構成している
内部接続部(lIC)の両側に基材層(12)が一体向
に設けてあり、アウターリード(17a)はこの基材層
(12)から外方に突出しているのである。そして、こ
の電子部品搭載用基板(lO)は、基材層(12)J−
の導体回路(14)と、アウターリード(17a)とを
、内部接続部(IIC)を通して設けたスルーホール(
15)により、電気的に接続しであることを特徴とする
ものである。
This electronic component mounting board (10) includes an electronic component (20)
The electrical connection between the outer lead (17a) and the outer lead (17a) is made through the conductor circuit (14) of the base layer (12) J-. The inner connecting portion (IIC) is formed integrally with the inner connecting portion (IIC). Therefore, in this electronic component mounting board (10), the base material layer (12) is integrally provided on both sides of the internal connection part (lIC) that constitutes the metal layer (11), and the outer lead ( 17a) protrudes outward from this base layer (12). Then, this electronic component mounting board (lO) has a base material layer (12) J-
The conductor circuit (14) and the outer lead (17a) are connected through a through hole (
15), it is characterized by being electrically connected.

この電子部品搭載用基板(10)の製造方法について第
3図を参照して以下に説明する。
A method of manufacturing this electronic component mounting board (10) will be described below with reference to FIG.

■先ず、リードフレーム材をエツチング加工して形成し
たリードフレーム(17) (これは金属層(11)に
該当するものである)のアウターリード(17a)とな
るべき部分の両面をおおうようにマスク(16)を配置
し、さらにその外側にプリプレグ、銅箔の順で重ね合わ
せていき、これらをプレスで熱圧着して、積層一体化さ
せる。これによって、第3図の(a)に示すように、ア
ウターリード(17a)となるべき部分において、マス
ク(16)によって基材層(12)との積層一体化が阻
止されていて、リードフレーム(17)が基材層(12
)に埋設された形状の基板が形成される。
■First, apply a mask to cover both sides of the part that will become the outer lead (17a) of the lead frame (17) (this corresponds to the metal layer (11)) formed by etching the lead frame material. (16) is placed, prepreg and copper foil are layered on the outside in this order, and these are thermocompressed using a press to form a laminated body. As a result, as shown in FIG. 3(a), in the portion that should become the outer lead (17a), the mask (16) prevents the lamination and integration with the base material layer (12), and the lead frame (17) is the base material layer (12
) is formed.

この実施例1では、リードフレーム材として厚さ0.2
5mmの銅合金板を使用し、プリプレグとしてガラスク
ロスにビスマレイミドトリアジン樹脂を含浸させて半硬
化状態にした、所謂ガラストリアジンプリプレグを使用
した。また、マスク(16)としては、厚さ50μmの
ポリフェニレンサルファイドフィルム、所謂PPSを使
用した。
In this Example 1, the lead frame material has a thickness of 0.2
A 5 mm copper alloy plate was used, and a so-called glass triazine prepreg, which was prepared by impregnating a glass cloth with a bismaleimide triazine resin and making it into a semi-hardened state, was used as the prepreg. Further, as the mask (16), a 50 μm thick polyphenylene sulfide film, so-called PPS, was used.

■次に、基材層(12)表面に形成する導体回路(14
)とアウターリード(17a)とを電気的に接続させる
ための、スルーホール(15)を、ドリルによる穴明で
形成し、その内壁に銅めっきを施す。
■Next, the conductor circuit (14) formed on the surface of the base material layer (12)
) and the outer lead (17a) are formed by drilling a through hole (15), and the inner wall thereof is plated with copper.

その後、エツチングによって基材層(12)表面に導体
回路(14)を形成すると、第3図の(b)に示すよう
な基板が形成される。
Thereafter, a conductive circuit (14) is formed on the surface of the base material layer (12) by etching, thereby forming a substrate as shown in FIG. 3(b).

■次いで、炭酸ガスレーザーを用いてマスク(16)の
外周に位置する金属層(11)上の基材層(12)を切
断することによって、マスク(16)の外周に、マスク
(16)上の基材層(12)と他の基材層(12)とを
確実に分離する溝を形成すると、マスク(16)とアウ
ターリード(17a)とは接着されていないため、アウ
ターリード(17a)上のマスク(16)及び基材層(
12)は他の部分と完全に分離された状態になる。
■ Next, by cutting the base material layer (12) on the metal layer (11) located on the outer periphery of the mask (16) using a carbon dioxide laser, the outer periphery of the mask (16) is cut. When a groove is formed to reliably separate the base layer (12) from the other base layer (12), the mask (16) and the outer lead (17a) are not bonded to each other, so the outer lead (17a) The upper mask (16) and the base material layer (
12) is completely separated from other parts.

裏面からも同様なレーザー加工を施せば、第3図の(c
)に示すような基板が形成される。
If similar laser processing is performed from the back side, it will become (c) in Figure 3.
) is formed.

■次いで、アウターリード(17a)上のマスク(16
)及び基材層(12)を剥離する。
■Next, the mask (16) on the outer lead (17a)
) and the base material layer (12) are peeled off.

■最後に、第3図の(d)に示すように、切断された基
材層(12)の切口(切断端面)及びその近傍の金属層
(11) (本実施例ではアウターリード(17a) 
)をジェットスクラブ研磨により研磨すれば、第2図に
示したような電子部品搭載用基板(10)が形成される
のである。
■Finally, as shown in FIG. 3(d), the cut end (cut end surface) of the cut base material layer (12) and the metal layer (11) in the vicinity thereof (in this example, the outer lead (17a))
) is polished by jet scrub polishing, an electronic component mounting board (10) as shown in FIG. 2 is formed.

なお、ここで使用したジェットスクラブ研磨は、粒径2
20番程0炭化珪素の粒子を水に20%程の濃度に攪拌
し、これをノズルにより2.0kg / cm ”の圧
力で吐出して行った。
Note that the jet scrub polishing used here has a particle size of 2.
Particles of No. 20 silicon carbide were stirred in water to a concentration of about 20%, and the particles were discharged through a nozzle at a pressure of 2.0 kg/cm 2 .

このような方法で形成された電子部品搭載用基板(10
)においては、レーザー光によってアウターリード(1
7a)に傷がつけられるようなことはないため、アウタ
ーリード(17a)の折り曲げ強度や引き抜き強度等の
物理的強度に係る性能が劣化されることはない。
Electronic component mounting substrates (10
), the outer lead (1
Since the outer lead (17a) is not damaged, the physical strength such as bending strength and pull-out strength of the outer lead (17a) is not deteriorated.

また、この方法により製造された電子部品搭載用基板(
10)のアウターリード(17a)間の絶縁抵抗は、ジ
ェットスクラブ研磨をしない状態のものと比較して1オ
ーダーの向上が確認された。
In addition, electronic component mounting substrates manufactured by this method (
It was confirmed that the insulation resistance between the outer leads (17a) of No. 10) was improved by one order of magnitude compared to that without jet scrub polishing.

及胤丘) 次に、本発明の実施例2を第4図及び第5図に従って説
明する。第4図に示す電子部品搭載用基板(10)は電
子部品(20)を搭載するための四部(13)や、電子
部品(20)から発生した熱を大気中へ放散させるため
の放熱部(18)を有するものであり、その製造方法に
ついて第5図を参照して以下に説明する。
Next, a second embodiment of the present invention will be described with reference to FIGS. 4 and 5. The electronic component mounting board (10) shown in FIG. 18), and its manufacturing method will be described below with reference to FIG.

■先ず、厚さ1.Ommのアルミニウム板(IIB)の
金属露出部(IIA)となるべき部分にマスク(16)
を配置し、その外側に接着シート(12a)と基材層(
12)を重ね、プレスで熱圧着して、アルミニウム板(
IIB)と基材層(12)を積層一体化させ、第5図の
(a)に示すような基板が形成される。
■First, thickness 1. Mask (16) on the part that should be the exposed metal part (IIA) of the Omm aluminum plate (IIB)
is placed, and an adhesive sheet (12a) and a base material layer (
12) and heat-compression bonded with a press to form an aluminum plate (
IIB) and the base material layer (12) are laminated and integrated to form a substrate as shown in FIG. 5(a).

ここでは、マスク(16)として厚さ25μmのアルミ
ニウム箔を使用し、接着シート(12a)としてエポキ
シ樹脂を主成分とした半硬化状態のフィルムを使用した
。また、基材層(12)としては、ガラスエポキシプリ
プレグを完全に硬化させたものを使用した。
Here, an aluminum foil with a thickness of 25 μm was used as the mask (16), and a semi-cured film containing epoxy resin as a main component was used as the adhesive sheet (12a). Further, as the base material layer (12), a completely cured glass epoxy prepreg was used.

■次に、炭酸ガスレーザーを用いて、マスク(16)の
外周に位置する、金属層(11)上の基材層(12)を
切断して、第5図の(b)に示すような基板が形成され
る。
■Next, the base material layer (12) on the metal layer (11) located on the outer periphery of the mask (16) is cut using a carbon dioxide laser to form a shape as shown in FIG. 5(b). A substrate is formed.

■次いで、金属露出部(IIA)上のマスク(16)及
び基材層(12)を剥離する。
(2) Next, the mask (16) and base material layer (12) on the exposed metal portion (IIA) are peeled off.

■最後に、実施例1と同様に、第5図の(d)に示すよ
うに、切断された基材層(12)の切口及びその近傍の
金属層(11) (金属露出部(IIA) )をジェッ
トスクラブ研磨により研磨すれば、金属層(11)が露
出した電子部品搭載用の凹部(13)や放熱部(18)
が形成される。
■Finally, as in Example 1, as shown in FIG. 5(d), the metal layer (11) (metal exposed portion (IIA) ) by jet scrub polishing, the metal layer (11) is exposed in the recess (13) for mounting electronic components and the heat dissipation part (18).
is formed.

むろん、この放熱部(18)は電子部品搭載用基板(l
O)の両面に形成することができ、その場合より高い放
熱性を得ることができる。
Of course, this heat dissipation part (18) is a board for mounting electronic components (l
It can be formed on both sides of O), and in that case, higher heat dissipation properties can be obtained.

(発明の効果) 以」二詳述した通り、本発明においては、上記実施例に
て例示した如く、 「金属層に対して基材層を一体化して、この基材層から
前記金属層の所定の部分を次の各工程を経て露出させる
ことにより構成される電子部品搭載用基板の製造方法。
(Effects of the Invention) As described in detail below, in the present invention, as exemplified in the above embodiment, a base material layer is integrated with a metal layer, and the metal layer is formed from this base material layer. A method of manufacturing a board for mounting electronic components, which is constructed by exposing a predetermined portion through the following steps.

(イ)露出部となるべき部分の金属層と基材層との間に
マスクを配置してから、前記金属層に対して前記基材層
を一体化する工程; (ロ)前記マスクの周囲に位置する金属層上の基材層に
対して、この基材層側から前記金属層側にレーザー光を
照射し、前記マスクの周囲の基材層を切断する工程; (ハ)前記マスク上の基材層をこのマスクとともに剥離
する工程; (ニ)少なくとも切断された前記基材層の切口及びその
近傍の金属層をジェットスクラブ研磨により研磨する工
程」である。
(B) A step of arranging a mask between the metal layer and the base layer in the portion that should become the exposed portion, and then integrating the base layer with the metal layer; (B) Surroundings of the mask A step of cutting the base material layer around the mask by irradiating a laser beam from the base layer side to the metal layer side with respect to the base material layer on the metal layer located on the mask; (d) a step of polishing at least the cut end of the base layer and the metal layer in the vicinity thereof by jet scrub polishing.

従って、この発明によれば、レーザー光による切削加工
が部分的であっても、電子部品搭載用基板における金属
露出部の形成を金属層を傷つけることなく、比較的広い
面積にわたって確実かつ短時間に行なうことができると
共に、微塵が発生せず、信頼性の高い電子部品搭載用基
板を容易に製造することができるのである。
Therefore, according to the present invention, even if the laser beam cutting process is only partial, the exposed metal portions on the electronic component mounting board can be formed reliably and in a short time over a relatively wide area without damaging the metal layer. In addition, it is possible to easily manufacture a highly reliable electronic component mounting board without generating fine dust.

すなわち、本発明に係る製造方法によれば、電子部品搭
載用基板を構成している金属露出部の形成を確実かつ短
時間内に行なうことができるだけでなく、レーザー光に
よる非接触加工であるから、加工作業における工具の損
傷を全く無視できる。
That is, according to the manufacturing method according to the present invention, not only can the exposed metal parts constituting the electronic component mounting board be formed reliably and within a short time, but also because the process is a non-contact process using laser light. , tool damage during machining operations can be completely ignored.

また、金属露出部となるべき部分にマスクを配置するた
め、金属層と基材層を一体化する時に、金属露出部とな
るべき部分の表面に樹脂が付着することはないから、例
えば熱圧着時の流れ性が比較的高い接着シートを採用す
ることができる。
In addition, since the mask is placed on the part that should be the exposed metal part, when the metal layer and the base material layer are integrated, the resin will not adhere to the surface of the part that should be the exposed metal part, so for example, thermocompression bonding An adhesive sheet that has relatively high time resistance can be used.

従って、耐熱性、耐薬品性、耐湿性等の性能が高い接着
シートを用いることができ、結果的には信頼性の高い電
子部品搭載用基板を得ることができる。
Therefore, an adhesive sheet with high performance such as heat resistance, chemical resistance, moisture resistance, etc. can be used, and as a result, a highly reliable electronic component mounting board can be obtained.

さらに、金属に比べて樹脂に対する切断能力が非常に優
れているというレーザー光特性により、基材層が完全に
切断されていても、金属層には傷をつけることがないた
め、切断の深さ制御が確実に行なえるとともに、金属層
の物理的強度に係る性能も劣化させることはない。
Furthermore, due to the laser beam's ability to cut resin much better than metal, even if the base material layer is completely cut, the metal layer will not be damaged. Control can be performed reliably, and the performance related to the physical strength of the metal layer does not deteriorate.

加えて、切断された基材層の切口及びその近傍の金属層
は、ジェットスクラブ研磨によって研磨されるため、こ
れらの部分に付着したレーザー光の熱による変質物を簡
単に除去でき、よって、微塵等が発生せず、信頼性の高
い電子部品搭載用基板を得ることができる。
In addition, since the cut ends of the cut base material layer and the metal layer in the vicinity are polished by jet scrub polishing, it is possible to easily remove the altered substances that adhere to these parts due to the heat of the laser beam, thereby removing fine particles. etc., and a highly reliable electronic component mounting board can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る製造方法によって形成した電子部
品搭載用基板の部分拡大平面図、第2図は第1図の]I
−n線に沿ってみた断面図、第3図の(a)〜(d)の
それぞれは第1図及び第2図に示した電子部品搭載用基
板の製造途中経過を示す部分拡大断面図、第4図は本発
明に係る製造方法によって形成した別の電子部品搭載用
基板の斜視図、第5図の(a)〜(d)のそれぞれは第
4図に示した電子部品搭載用基板の製造途中経過を示す
部分拡大断面図、第6図の(a)〜(d)のそれぞれは
本発明に係る製造方法によって形成したさらに別の電子
部品搭載用基板の製造途中経過を示す部分拡大断面図、
第7図は電子部品搭載用基板の一例を示す断面図である
。 符  号  の  説  明 10・・・電子部品搭載用基板、11・・金属層、11
A・・・金属露出部、lIC・・・内部接続部、12・
・・基材層、12a・・・接着シート、12b・・・プ
リプレグ、13・・凹部、14・・・導体回路、15・
・スルーホール、16・・マスク、17・・・リードフ
レーム、17a・・・アウターリード、18・・・放熱
部、20・・電子部品。 以上
FIG. 1 is a partially enlarged plan view of an electronic component mounting board formed by the manufacturing method according to the present invention, and FIG. 2 is a partial enlarged plan view of FIG.
- A cross-sectional view taken along line n, each of (a) to (d) in FIG. FIG. 4 is a perspective view of another electronic component mounting board formed by the manufacturing method according to the present invention, and each of (a) to (d) in FIG. 5 shows the electronic component mounting board shown in FIG. Each of FIGS. 6(a) to 6(d) is a partially enlarged cross-sectional view showing the progress during manufacturing of yet another electronic component mounting board formed by the manufacturing method according to the present invention. figure,
FIG. 7 is a sectional view showing an example of an electronic component mounting board. Explanation of symbols 10...Substrate for mounting electronic components, 11...Metal layer, 11
A...Metal exposed part, IC...internal connection part, 12.
... Base material layer, 12a ... Adhesive sheet, 12b ... Prepreg, 13 ... Recessed part, 14 ... Conductor circuit, 15.
-Through hole, 16...Mask, 17...Lead frame, 17a...Outer lead, 18...Heat radiation part, 20...Electronic component. that's all

Claims (1)

【特許請求の範囲】 金属層に対して基材層を一体化して、この基材層から前
記金属層の所定の部分を次の各工程を経て露出させるこ
とにより構成される電子部品搭載用基板の製造方法。 (イ)露出部となるべき部分の金属層と基材層との間に
マスクを配置してから、前記金属層に対して前記基材層
を一体化する工程; (ロ)前記マスクの周囲に位置する金属層上の基材層に
対して、この基材層側から前記金属層側にレーザー光を
照射し、前記マスクの周囲の基材層を切断する工程; (ハ)前記マスク上の基材層をこのマスクとともに剥離
する工程; (ニ)少なくとも切断された前記基材層の切口及びその
近傍の金属層をジェットスクラブ研磨により研磨する工
程。
[Claims] A substrate for mounting electronic components, which is constructed by integrating a base material layer with a metal layer, and exposing a predetermined portion of the metal layer from the base material layer through the following steps: manufacturing method. (B) A step of arranging a mask between the metal layer and the base layer in the portion that should become the exposed portion, and then integrating the base layer with the metal layer; (B) Surroundings of the mask A step of cutting the base material layer around the mask by irradiating a laser beam from the base layer side to the metal layer side with respect to the base material layer on the metal layer located on the mask; a step of peeling off the base material layer along with the mask; (d) a step of polishing at least the cut end of the base material layer and the metal layer in the vicinity thereof by jet scrub polishing.
JP2286573A 1990-10-23 1990-10-23 Manufacturing method of electronic component mounting board Expired - Lifetime JP2913069B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2286573A JP2913069B2 (en) 1990-10-23 1990-10-23 Manufacturing method of electronic component mounting board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2286573A JP2913069B2 (en) 1990-10-23 1990-10-23 Manufacturing method of electronic component mounting board

Publications (2)

Publication Number Publication Date
JPH04159764A true JPH04159764A (en) 1992-06-02
JP2913069B2 JP2913069B2 (en) 1999-06-28

Family

ID=17706165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2286573A Expired - Lifetime JP2913069B2 (en) 1990-10-23 1990-10-23 Manufacturing method of electronic component mounting board

Country Status (1)

Country Link
JP (1) JP2913069B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5483100A (en) * 1992-06-02 1996-01-09 Amkor Electronics, Inc. Integrated circuit package with via interconnections formed in a substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5483100A (en) * 1992-06-02 1996-01-09 Amkor Electronics, Inc. Integrated circuit package with via interconnections formed in a substrate

Also Published As

Publication number Publication date
JP2913069B2 (en) 1999-06-28

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