JPH04154634A - Mold for optical element formation and its production - Google Patents

Abstract

PURPOSE:To improve bonding properties, hardness, mold-releasability and endurance by forming a specific film through an intermediate layer consisting of Si or B on a formed face of mold for optical element formation. CONSTITUTION:A mold preform 6 for optical element formation fabricated in a prescribed form and having a formed face subjected to mirror polishing is installed in a vacuum tank 8 and the inside of the tank 8 is evacuated, and then an intermediate layer substance 15 is evaporated from an electronic gun 13 to deposit the intermediate layer consisting of Si or B and having 100Angstrom to 10mum thickness on the formed face of the mold preform 6. A carbon- containing gas (e.g. methane) is introduced from a gas introducing inlet 9 and ionized, and then voltage is applied to an ion beam drawing grid 12 to draw out the ion beam and the formed face of mold preform 6 is irradiated with the ion beam to form one kind of film selected from diamond film, diamond-like carbon film, hydrogenated amorphous carbon film and rigid carbon film. In the next, the mold preform 20 is installed in a heat treating furnace 16, the furnace 16 is evacuated from a discharge system 18, and then an inert gas is introduced from a gas introducing system 17 and heated to a temperature or above using a heater 19 to carry out heat treatment.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a mold used for manufacturing optical elements made of glass such as lenses and prisms by press molding of glass materials, and a manufacturing method thereof. It is.

[Prior Art] The technology of manufacturing lenses by press-molding glass materials without requiring a polishing process eliminates the complicated processes required in conventional lens manufacturing, making it possible to manufacture lenses simply and at low cost. In recent years, it has come to be used to manufacture not only lenses but also prisms and other optical elements made of glass.

Properties required of the mold material used for press molding of such glass optical elements include excellent hardness, heat resistance, mold releasability, mirror workability, and the like. In the past, many proposals have been made for this type of mold material, including metals, ceramics, and materials coated with these materials. r martensitic steel was published in JP-A-52-456
13 contains SiC and 5LsN4, published in JP-A-60-246.
230 is a material in which cemented carbide is coated with precious metals, and also in JP-A-61-183134 and JP-A-61-281.
030. JP-A-1-301864 discloses a material coated with a diamond thin film or a diamond-like carbon film.
JP-A-64-83529 proposes a material coated with a hard carbon film.

[Problems to be Solved by the Invention] However, 13Cr martensitic steel is easily oxidized and has the disadvantage that Fe diffuses into the glass at high temperatures, causing the glass to become colored.Also, SiC and 5isN4 are generally oxidized. Although it is said to be difficult, oxidation still occurs at high temperatures and a Sing film is formed on the surface, causing fusion with the glass.
Moreover, materials coated with precious metals have the disadvantage of being extremely hard to form molds due to their high hardness, and although they are less likely to cause fusion, they are extremely soft and have the disadvantage of being easily scratched and easily deformed.

In addition, diamond thin film, diamond-like carbon film (hereinafter referred to as DLC film), hydrogenated amorphous carbon film (hereinafter referred to as a
A mold using a hard carbon film (called -C:H film) has good releasability between the mold and the glass (it does not cause glass fusion, but as the molding operation is repeated several hundred times or more, the film may partially break down). The target may peel off and sufficient molding performance may not be obtained in the molded product.

Possible causes of film peeling are as follows.

(2) All of the above-mentioned films have very large compressive stress, and peeling, cracking, etc. occur as a result of stress release during the thermal cycle of rapid heating and rapid cooling during the molding process. Similarly, peeling, cracking, etc. occur due to the difference in thermal expansion coefficient between the mold base material and the film and thermal stress caused by thermal cycles.

(2) Depending on the mold base material, the film may not be formed partially or the film thickness may be thin depending on the surface condition. For example, WC-
In sintered bodies of Co, SiC, 5tsN4, etc., missing grains and sintering bores are unavoidable, and holes of several micrometers in size are present on the formed and polished surface. When a film is formed on such a surface, the film may not be formed over these holes, or the film may be extremely thin. Therefore, the adhesion and mechanical strength of these portions are significantly reduced, which becomes a starting point for peeling and cracking.

(2) Alloy formation occurs between the sintering aid in the sintered body, typified by IC-Go, and the film due to diffusion. In such portions, glass may fuse during molding or react with components contained in the glass to produce precipitates, resulting in deterioration of durability.

As described above, a mold for molding an optical element with excellent moldability, durability, and economic efficiency has not yet been realized.

Therefore, on the mold base material, diamond film, DLC film, a-
C: Either a H film or a hard carbon film is formed, with excellent adhesion and hardness, and mold releasability and durability that does not cause glass melting or reaction precipitates of contained ingredients during glass molding. An object of the present invention is to provide a mold for molding an optical element with excellent properties and a method for manufacturing the same.

[Means for Solving the Problems] That is, the present invention provides: (1) An optical element molding mold used for press molding an optical element made of glass, in which an intermediate layer made of Si or B is provided on at least the molding surface of the mold base material. A mold for molding an optical element, characterized in that the mold is coated with one type of film selected from a diamond film, a diamond-like carbon film, a hydrogenated amorphous carbon film, and a hard carbon film; In the method for manufacturing a mold for molding an optical element used for press molding, the method comprises forming an intermediate layer of Si or B on the molding surface with a small amount of the mold base material;
Next, one type of film selected from a diamond film, a diamond-like carbon film, a hydrogenated amorphous carbon film, and a hard carbon film is formed on the intermediate layer, and then heat treatment is performed at a temperature higher than the molding temperature. The present invention is a method for manufacturing a mold, and (1) a mold for molding an optical element obtained by the method for manufacturing the mold for molding an optical element.

The present invention will be explained in detail below.

The mold base material used in the present invention is l#c, SiC.

Tic, TaC, BN, 5iJ4. TiN, T
aN, ^IN, 5ift.

Al*Oi, ZrOi, W, Dina, Mo, Cermet, Sialon, Mullite, Carbon composite (C/C), Carbon fiber (CF), I
Selected from C-Co alloy, etc.

Vacuum deposition, sputtering, ion blating, ion beam sputtering, etc. (7) PVD on the molding surface of these mold base materials
Law, thermal CVD, bladder? CVD (PCVD) etc.
An intermediate layer made of SL or B is formed by method D.

The thickness of the intermediate layer is preferably about 100 μl to 10 μl. The lower limit of the film thickness is the minimum thickness that can easily prevent the diffusion of mold base material components into the carbon film, and the upper limit is the minimum thickness that can easily prevent the internal stress of the film (
This is the maximum film thickness that can be relaxed.

Next, a diamond film, a DLC film, an a-C:H film, and a hard carbon film are formed.

Diamond (thin) films can be produced by DL using microwave plasma CVD, thermal filament CVD, plasma jet, electron cyclotron resonance plasma CVD, etc.
C film, a-C:H film and hard carbon film are plasma CV
It is formed by the D method, ion beam sputtering method, ion beam evaporation method, plasma sputtering method, etc. Gases used to form the film include carbon-containing hydrocarbons such as methane, ethane, propane, ethylene, benzene, and acetylene; halogenated hydrocarbons such as methylene chloride, carbon tetrachloride, chloroform, and trichloroethane; and methyl alcohol. , alcohols such as ethyl alcohol, (CHx)
Ketones such as xco, (CsHs)*CO; CO,
, CHx, and these gases with N2. Hz
, 02. N20. Examples include those mixed with a gas such as Ar.

In addition, the intermediate layer, diamond film, DLC film, a-C:H
It is preferable to form films and hard carbon films continuously in the same equipment in order to prevent contamination of impurities and the formation of oxide films. It does not have to be a membrane.

The role of the intermediate layer in the present invention is as follows.

■Mold base material and diamond film, DLC film, a-C:H film,
It alleviates the internal stress of the hard carbon film, as well as the thermal stress due to differences in thermal expansion coefficients.

(2) At the interfaces between the mold base material and the intermediate layer, the intermediate layer and the diamond film, the DLC film, the a-C:H film, and the hard carbon film, they mutually diffuse to form a stable diffusion layer and improve adhesion.

■The intermediate layer acts as a barrier layer to prevent the diffusion of mold base material components into the diamond film, DLC film, a-C:)l film, and hard carbon film.

■Improve the surface condition of the mold base material.

In addition, by heat-treating the diamond film, DLC film, a-C:H film, and hard carbon film after forming them, the mold base material and the intermediate layer, the intermediate layer and the diamond film, the DLC film, the a-C:
It promotes the diffusion state at the interface between the H film and the hard carbon film and improves their mutual adhesion. Furthermore, for films that contain hydrogen, such as DLC films and a-C:H films, internal stress can be reduced by heat treatment at a temperature higher than the forming temperature to remove hydrogen from the film. At the same time, by reducing dangling bonds in the film, it is effective to prevent glass fusion and the generation of reaction precipitates of glass components.

Note that the lower limit of the heat treatment temperature is the molding temperature, and if it is lower than this, reaction precipitates of glass components will occur. Although there is no upper limit, it is preferably 1,000° C. or lower; exceeding this temperature tends to cause graphite crystallization, deterioration due to oxidation, and deterioration of the mechanical strength of the film.

Although the atmosphere for heat treatment depends on the temperature, He,
Inert gas such as Ne, Ar, Kr, Xe, N,
, H.

It is preferable to use a gas atmosphere, a mixture of two or more of these gases, or a reduced pressure. The oxygen partial pressure in the atmosphere is preferably I x 10-"Torr or less*
When I x 10-'' Torr is exceeded, the film is likely to be oxidized.

[Example] A specific example of the present invention will be described below with reference to one drawing.

Figures 1 and 2 show a mold for molding an optical element according to the present invention.
2 shows two embodiments.

Figure 1 shows the state of the press-molded surface of the optical element, and Figure 2 shows the state of the optical element after molding. In Figure 1, 1 is the mold base material;
2 and 5 are a-C:H films and intermediate layers formed on the molding surface in contact with the glass material of the mold base material; 3 is a glass material;
4 in FIG. 2 is an optical element. By press-molding a glass material 3 placed between molds as shown in FIG. 1, an optical element 4 such as a lens is molded as shown in FIG. 2.

Next, the optical element molding mold of the present invention will be explained in detail.

As the mold base material, IC-Co, SiC, 5iJ4. W,
Cermet and C/C were processed into a predetermined shape, and the molded surface was polished to a mirror finish. At this time, the surface roughness of the fly 7209 was set to Rmax+0.02 μrn.

Next, Ion Beam Vapor De was used to form the intermediate layer and the aC:H film.
(position) A schematic diagram of the film forming apparatus is shown in FIG.

In the figure, 6 is a mold base material, 7 is an ion beam device, 8 is a vacuum chamber,
9 is a gas inlet, 10 is an ionization chamber, 11 is an exhaust system, 12
13 is an ion beam extraction grid, 13 is an electron gun, 14 is a crystal resonator type film thickness monitor, and 15 is an intermediate layer material.

The mold base material 6 can be heated by a heater (not shown).

The mold base material is installed in the apparatus shown in FIG.
Evacuate to O-'Torr and use electron gun 13 to reduce purity to 9.
9.999% Si was vacuum deposited. At this time, the substrate temperature was 300°C, and the zero-order film was formed to a film thickness of 2,000 mm.
From gas inlet 9 CH4: Gas 20 SCCM, H,
Gas 40 SCCM was introduced into the ionization chamber 10 and ionized. The gas pressure at this time was 7 x 10-'Torr.

A voltage of 500V is applied to the ion beam extraction grid 12 to extract the ion beam, and the mold base material is irradiated with a-C.
:H film was formed by 6,000 people. At this time, the mold base material is 30
Heated to 0°C.

Next, this mold was placed in a heat treatment furnace and heat treated.

FIG. 4 shows a schematic diagram of the heat treatment furnace used. In the figure, 16 is a vacuum chamber, 17 is a gas introduction system, 18 is an exhaust system, 19 is a heater,
20 is a mold for molding. After installing the mold in the heat treatment furnace, the vacuum chamber is heated to I
Then, nitrogen gas was introduced through the gas introduction system 17 to bring the inside of the vacuum chamber to 1.2 atmospheres. Heating was performed using a heater 19, and the mold was heat-treated at 600° C. for 30 minutes.

Next, an example in which a glass lens was press-molded using the mold for molding an optical element according to the present invention will be shown.

In Fig. 5, 51 is the vacuum chamber body, 52 is its lid, 53 is an upper mold for molding optical elements, 54 is a lower mold, 55 is an upper mold holder for holding down the upper mold, and 56 is a mold for use. , 57 is a mold holder, 58 is a heater, 59 is a lifting rod that lifts up the lower mold, 60 is an air cylinder that operates the lifting rod, 61 is an oil rotary pump, 62, 63, 64 are valves, 6
5 is an inert gas inflow pipe, 66 is a valve, 67 is a leak vibrator, 68 is a valve, 69 is a temperature sensor, 70 is a water cooling pipe, and 71 is a stand that supports the vacuum chamber.

The process of manufacturing the lens will be described next.

Flint optical glass (SF14) is adjusted to a predetermined amount, and the spherical glass material is placed in the cavity of the mold, and this is installed in the apparatus.

After placing the mold containing the glass material in the apparatus, the lid 52 of the vacuum chamber 51 is closed, water is run through the water-cooled vibrator 70, and current is passed through the heater 58. At this time, the nitrogen gas valves 66 and 68 are closed. Exhaust system valves 62, 63, and 64 are also closed. Note that the oil rotary pump 61 is constantly rotating.

The valve 62 is opened to begin exhaustion, and when the temperature drops below 10-'' Torr, the valve 62 is closed, and the valve 66 is opened to introduce nitrogen gas from the cylinder into the vacuum chamber. When the temperature reaches a predetermined temperature, the air cylinder 60 is activated. 200kg/cta
1 minute at a pressure of ℃ or below, close the valve 66, open the leak valve 63, and introduce air into the vacuum chamber 51. Then, open the lid 52, remove the upper mold presser, and take the molded product under pressure.

As described above, the lens 4 shown in FIG. 2 was molded using the flint optical glass 5F14 (softening point 5p=586° C., glass transition point Tg=485° C.).

FIG. 6 shows the molding conditions at this time, that is, a time-temperature relationship diagram.

Table 1 shows the molds used for molding. Sample No. 7.8 is a comparative example.

Table 1 Table 2 shows the results of 500 moldings using the mold.

After molding 500 times for the molds shown in Table No. 1 to 6, the molding surface was observed using an optical microscope and a scanning electron microscope (SEM). No film peeling or PB precipitation was observed, and no deterioration of the molding surface was observed. There wasn't. Similarly, there were no problems with the molded product in terms of surface roughness, transmittance, shape accuracy, etc. On the other hand, in the case of type No. 7.8, partial peeling exceeding several 10 μm and film peeling ranging from several 100 μm to several ma+ were observed.

As is clear from the above results, the mold material according to the present invention has excellent mold releasability from glass and has excellent durability without causing surface deterioration such as peeling even after repeated molding.

B of 99.999% purity was placed on the same mold base material as in Example 1.
A mold was produced under the same conditions and method as in Example 1, except that 2,500 molds were formed by vacuum evaporation.

Using this mold, a molding test similar to that in Example 1 was conducted,
The same results as in Example 1 were obtained. In particular, no film peeling or cracks were observed on the mold base material.

Sintered SiC, Sialon, and W processed into a desired shape were used as the base material for the 11-piece mold. Polycrystalline Si was formed as an intermediate layer by LPCVD as shown in FIG.

First, one reaction tank (vacuum tank) 81 is connected to the exhaust system 82.
After exhausting to 10-' Torr, SiH diluted to 0.1% with He was introduced from the gas supply system 83 to 1 Torr.
r, and the mold base material 84 was heated to 600° C. by the heater 85 to form 1.5 μl.

Next, after cooling these mold base materials, the particle size is 10 to 15 μm.
The mold surface was scratched by placing it in an alcohol solution in which diamond abrasive grains of m were dispersed, and by ultrasonic vibration. After thoroughly cleaning this, the microwave plasma CV shown in FIG.
The mold base material was installed in the D device.

First, the reaction tank 86 is heated to 1×10−'To by the exhaust system 87.
After exhausting to rr, CH,:Isc is supplied from the gas supply system 88.
cM, )12: It was introduced into the reaction tank at a flow rate of 200 SCCM, and the pressure inside the reaction tank was set to 70 Torr. next,
2. Using a 45 GHz microwave oscillator 89, the microwave power was set to 600 W and the polycrystalline diamond film was
μ-ho was formed. At this time, the mold base material 90 was heated to 800°C. Since the surface roughness of this film was Rwax = 0.3 μm, it was mirror-polished to a surface roughness Rwax = 0.02 μl using a Scaife plate used for polishing natural diamonds.

Next, a molding test similar to that in Example 1 was conducted using these molds, and the same results as in Example 1 were obtained.

Next, glass molding was performed using a molding apparatus shown in FIG.

In FIG. 9, 102 is a molding device, 104 is a replacement chamber for taking in, 106 is a molding chamber, 108 is a deposition chamber, and 110 is a replacement chamber for taking out. 112, 11
4, 116 is a gate valve, 118 is a rail, and 120 is a pallet that is conveyed in the direction of arrow A on the rail. 124, 138, 140, 150 are cylinders, and 126, 152 are valves.

128 is a heater arranged along the rail 118 in the molding chamber 106.

Inside the molding chamber 106, a heating zone 106-1, a press zone 106-2, and a slow cooling zone 106-3 are arranged in order along the pallet transport direction. Breath zone 106-2
An upper mold member 130 for molding is fixed to the lower end of the rod 134 of the cylinder 138, and a lower mold member 13 for molding is fixed to the upper end of the rod 136 of the cylinder 140.
2 is fixed. These upper mold member 130 and lower mold member 132 are mold members according to the present invention.

Inside the vapor deposition chamber 108, a container 142 containing a vapor deposition substance 146 and a heater 144 for heating the container are arranged.

Flint optical glass (SF14. Softening point 5p=586
C, glass transition point Tg=485° C.) and was roughly processed into a predetermined shape and size to obtain a blank for molding.

A glass blank is placed on a pallet 120 and placed at position 120-1 in the intake/displacement chamber 104, and the pallet at that position is pushed in the direction A by the rod 122 of the cylinder 124, passing over the gate valve 112 and placed at position 120-1 in the molding chamber 106.
120-2...
- Conveyed sequentially to position -120-8. During this time, the glass blank is heated to the heater 128 in the heating zone 106-1.
It is gradually heated to a temperature above the softening point at the position 120-4, and then conveyed to the breath zone 106-2, where the cylinders 138 and 140 are operated and the upper mold member 130 and the lower mold member 132 1 at a pressure of kg/cm”
After pressing for a minute, the pressing force was released and the glass was cooled to below the glass transition point, and then the cylinders 138 and 140 were operated to release the upper mold member 130 and the lower mold member 132 from the glass molded product. During the pressing, the pallet was used as a molding copper mold member. After that, slow cooling zone 1
In 06-3, the glass molded product was gradually cooled. Note that the molding chamber 106 was filled with inert gas.

The pallet that has reached the position 120-8 in the molding chamber 106 is then transported beyond the gate valve 114 to the position 120-9 in the deposition chamber 108.
Although vacuum evaporation is performed here, this evaporation was not performed in this example. Then, in the next conveyance, it is taken out beyond the gate valve 116 and placed in the 120-10
was transported to the location. Then, during the next conveyance, the cylinder 150 was operated and the glass molded product was taken out of the molding apparatus 102 by the rod 148.

As a result of 3,000 times of molding using the above pressing process, the surface roughness of the molding surface after molding in all molds was Rmax≦0°03μl11 (Rwax≦before molding)
0.03 μm), and the surface roughness of the molded optical element is R
Wax≦0.03 μm, which was good, and the releasability between the molded optical element and the mold member was also good.

In particular, no defects such as film peeling or cracks were observed when the molding surface of the mold was observed using an optical microscope or a scanning electron microscope (SEM).

Traho JLL Using the same mold base material as in Example 2, B with a purity of 99.999% was formed as an intermediate layer using the sputtering apparatus shown in FIG. That is, the vacuum chamber 160 is
After exhausting the air by the exhaust system 163, Ar gas is introduced from the gas supply system 162, and a high frequency voltage of 13.56 MHz is applied by the RF11i source 164 at 3X10-'' Torr to sputter the B target 161 onto the mold base material 165. B1
11 was formed by 5,000 people. At this time, the mold base material is 250
It was heated to 0.degree. C. and 1 kW of RF power was applied.

Next, the target was continuously replaced with a 99.99% graphite target (not shown), and the mold base material was heated to 300°C.
Ar gas was introduced, the RF power was turned on at 5 x 10-" Torr, and the target was sputtered at an RF power density of 3 W/Cm" to form a hard carbon film on top of the intermediate layer B.
Formed a person.

Using this mold, a molding test similar to that in Example 1 was conducted,
The same results as in Example 1 were obtained.

1. The mold base material used in Example 1 was installed in the ECR/plasma CVD apparatus shown in FIG. Next, after the cavity resonator (vacuum chamber) 166 is evacuated to I x 10-' Torr, the gas pressure is set to 0. Adjusted to ITorr. A 2.45 GHz microwave of 700 W was input from the microwave waveguide 169 through the microwave introduction window 168 . At this time,
An electromagnet 167 is installed outside the cavity resonator 166, and a magnet of 2,000 Gauss is installed at the position of the microwave introduction window 168.
A divergent magnetic field of 875 Gauss was created at the exit of the cavity resonator to form ECR plasma. At this time, the mold base material 172 installed on the substrate holder 171 is
It was heated to 0° C. to form a 7,000 layer Si layer.

Next, stop the gas supply and return the vacuum chamber to 1×10-”To
After exhausting to rr and controlling the heating temperature of the mold base material to 300°C, CH,: 20 SCCM is supplied from the gas supply system 170.
, the gas pressure was 8 x 10-'Torr, the magnetic field strength at the mold base material was 550 Gauss, the input microwave power was 300 W, and a negative bias of -500 V was applied to the mold base material by a bias power source (not shown). Thickness s, ooo
A human DLC film was formed. This mold was heat treated under the same conditions and method as in Example 1.

Using this mold, a molding test similar to that in Example 3 was conducted,
The same results as in Example 3 were obtained.

[Effects of the Invention] As explained above, according to the mold for molding an optical element of the present invention, diamond film, DLC film, a-C : By forming either H film or hard carbon film, adhesion strength,
It is possible to obtain a mold for molding an optical element which has excellent hardness, does not cause fusion of glass or reaction precipitates of contained components during glass molding, and has excellent mold releasability and durability. Moreover, by heat-treating the mold, the molding performance can be further improved.

[Brief explanation of the drawing]

1 and 2 are cross-sectional views showing an example of the mold for molding an optical element according to the present invention, with FIG. 1 showing the state before molding, and FIG. 2 showing the state after molding. Figures 3.7, 8.10 and 11 are schematic cross-sectional views showing the film forming apparatus used in the embodiments of the present invention, and Figure 3 is an IVD apparatus,
Figure 7 shows the LPGVDPCVD equipment as a microwave plasma CVD equipment, Figure 10 shows the sputtering equipment, and Figure 11 shows the EC.
This is an R-PCVD device. FIG. 4 shows a heat treatment apparatus used in an embodiment of the present invention. 5 and 9 are sectional views showing a lens molding apparatus using the mold for molding an optical element according to the present invention; FIG. 5 is a discontinuous molding type, and FIG. 9 is a continuous molding type. FIG. 6 is a time-temperature relationship diagram during lens molding. DESCRIPTION OF SYMBOLS 1... Mold base material, 3... Glass material, 5... Intermediate layer, 7... Ion beam device, 9... Gas inlet, 11... Exhaust system, 12... Ion Beam bow 13...electron gun, 15...intermediate layer material, 17...gas introduction system, 19...heater, 51...vacuum chamber body, 53...upper mold, exit grid, 14 ... Film thickness monitor 16 ... Vacuum chamber, 18 ... Exhaust system, 20 ... Molding mold, 52 ... Lid, 54 ... Lower mold, 2 ... a-C:H Membrane, 4... Molded lens, 6... Mold base material, 8... Vacuum chamber, 10... Ionization chamber, 55... Upper mold holding, 56... Adjusting mold, 57...
... Mold holder - 58 ... Heater 59 ... Lifting rod, 60 ... Air cylinder, 61 ... Oil rotary pump, 62.63.64 ... Valve, 65 ... Inflow pipe, 66... valve, 67...
... Outflow pipe, 68 ... Valve, 69 ... Temperature sensor, 70 ... Water cooling pipe, 71 ... Stand supporting vacuum chamber, 81 ... Reaction tank, 82 ... Exhaust system, 83
...Gas supply system, 84...Mold base material, 85...
Heater, 86... Reaction tank, 87... Exhaust system, 88... Gas supply system, 89... Microwave oscillator, 90... Mold base material, 102... Molding device,
104... Intake replacement chamber, 106... Molding chamber, 108... Vapor deposition chamber, 1
DESCRIPTION OF SYMBOLS 10... Displacement chamber for extraction, 112... Gate valve, 114... Gate valve, 116... Gate valve, 18... Rail, 120... Pallet,
2215. Rod, 124...Cylinder. 26...Valve, 128...Heater, 30
...Upper mold, 132...Lower mold, 34...
Rod, 136... Rod, 38... Cylinder, 140... Cylinder, 42... Container, 144... Heater, 46... Vapor deposition substance, 148... Rod. 50...Cylinder, 152...Valve, 60
...Vacuum chamber, 61...Sputter target, 62...Gas supply system, 163...Exhaust system, 64
...RF power supply, 165...Mold base material, 66...
・Cavity resonator, 167... External electromagnet, 68...
-Microwave introduction window, 69...Microwave waveguide, 70...Gas supply system, 17 72...Mold base material. 1...Substrate holder representative Patent attorney Minoru Yamashita Simple diagram Figure 3 Figure 4 Figure 4 Pressure 8MP, ti (zuY) Figure 8

Claims (3)

[Claims] 1. In an optical element molding die used for press molding an optical element made of glass, a diamond film, a diamond-like carbon film, or a hydrogenated amorphous carbon film is coated on at least the molding surface of the mold base material with an intermediate layer made of Si or B interposed therebetween. and a hard carbon film. 2. In a method for manufacturing an optical element molding die used for press molding an optical element made of glass, an intermediate layer made of Si or B is formed on at least the molding surface of the mold base material, and then a diamond film or a diamond film is formed on the intermediate layer. 1. A method for manufacturing a mold for molding an optical element, which comprises forming a film selected from a carbon film, a hydrogenated amorphous carbon film, and a hard carbon film, and then heat-treating the film at a temperature higher than the molding temperature. 3. A mold for molding an optical element obtained by the method for manufacturing a mold for molding an optical element according to claim 2.