JPH041514B2 - - Google Patents
Info
- Publication number
- JPH041514B2 JPH041514B2 JP57110264A JP11026482A JPH041514B2 JP H041514 B2 JPH041514 B2 JP H041514B2 JP 57110264 A JP57110264 A JP 57110264A JP 11026482 A JP11026482 A JP 11026482A JP H041514 B2 JPH041514 B2 JP H041514B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- layer
- laser
- refractive index
- conductivity type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 67
- 239000012535 impurity Substances 0.000 claims description 11
- 230000003287 optical effect Effects 0.000 description 28
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 20
- 239000000758 substrate Substances 0.000 description 17
- 238000009792 diffusion process Methods 0.000 description 9
- 230000007423 decrease Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 238000005468 ion implantation Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000969 carrier Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06203—Transistor-type lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/50—Transmitters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Signal Processing (AREA)
- Geometry (AREA)
- Lasers (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57110264A JPS59987A (ja) | 1982-06-26 | 1982-06-26 | 半導体レ−ザ |
GB08224295A GB2111743B (en) | 1981-08-25 | 1982-08-24 | Semiconductor laser |
US06/411,080 US4534033A (en) | 1981-08-25 | 1982-08-24 | Three terminal semiconductor laser |
FR8214583A FR2512286B1 (fr) | 1981-08-25 | 1982-08-25 | Laser a semi-conducteur |
DE19823231579 DE3231579A1 (de) | 1981-08-25 | 1982-08-25 | Halbleiterlaser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57110264A JPS59987A (ja) | 1982-06-26 | 1982-06-26 | 半導体レ−ザ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59987A JPS59987A (ja) | 1984-01-06 |
JPH041514B2 true JPH041514B2 (fr) | 1992-01-13 |
Family
ID=14531277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57110264A Granted JPS59987A (ja) | 1981-08-25 | 1982-06-26 | 半導体レ−ザ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59987A (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60201687A (ja) * | 1984-03-27 | 1985-10-12 | Sony Corp | 半導体レ−ザ− |
JPS6215871A (ja) * | 1985-07-15 | 1987-01-24 | Agency Of Ind Science & Technol | 半導体レ−ザ装置 |
KR940005454B1 (ko) * | 1991-04-03 | 1994-06-18 | 삼성전자 주식회사 | 화합물반도체장치 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56152289A (en) * | 1980-04-25 | 1981-11-25 | Univ Osaka | Stripe type semiconductor laser with gate electrode |
JPS5710992A (en) * | 1980-06-24 | 1982-01-20 | Sumitomo Electric Ind Ltd | Semiconductor device and manufacture therefor |
-
1982
- 1982-06-26 JP JP57110264A patent/JPS59987A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56152289A (en) * | 1980-04-25 | 1981-11-25 | Univ Osaka | Stripe type semiconductor laser with gate electrode |
JPS5710992A (en) * | 1980-06-24 | 1982-01-20 | Sumitomo Electric Ind Ltd | Semiconductor device and manufacture therefor |
Also Published As
Publication number | Publication date |
---|---|
JPS59987A (ja) | 1984-01-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4328469A (en) | High output power injection lasers | |
US4371966A (en) | Heterostructure lasers with combination active strip and passive waveguide strip | |
US6928223B2 (en) | Stab-coupled optical waveguide laser and amplifier | |
US4534033A (en) | Three terminal semiconductor laser | |
US7756179B2 (en) | Semiconductor laser apparatus | |
US7602828B2 (en) | Semiconductor laser diode with narrow lateral beam divergence | |
EP0390167A2 (fr) | Laser à semi-conducteur muni de couches multiples pour l'émission de lumière de longueurs d'ondes différentes et méthode de commande | |
US4430741A (en) | Semiconductor laser device | |
US4803691A (en) | Lateral superradiance suppressing diode laser bar | |
EP0486128B1 (fr) | Dispositif optique à semiconducteur et méthode de fabrication | |
JPH05235470A (ja) | レーザダイオード | |
KR19990072352A (ko) | 자기발진형반도체레이저 | |
US6560266B2 (en) | Distributed feedback semiconductor laser | |
JPH041514B2 (fr) | ||
EP0284684B1 (fr) | Laser à semi-conducteur avec canal inverse et substrat plan | |
EP0621665B1 (fr) | Diode laser à hétérostructure plane enterrée à double canale à faible courant de fuite | |
Botez | Single-mode AlGaAs diode lasers | |
US5136601A (en) | Semiconductor laser | |
JPWO2002021578A1 (ja) | 半導体レーザ素子 | |
CN111937260B (zh) | 半导体激光器及其制造方法 | |
JPH10209553A (ja) | 半導体レーザ素子 | |
EP0491152B1 (fr) | Dispositifs laser à semi-conducteur avec plusieurs couches émettrices de lumière à bandes interdites différentes et méthodes pour les commander | |
JP3084264B2 (ja) | 半導体レーザ素子 | |
JPH0251269B2 (fr) | ||
JPS621277B2 (fr) |