JPH04139972A - Image pickup device - Google Patents

Image pickup device

Info

Publication number
JPH04139972A
JPH04139972A JP2262394A JP26239490A JPH04139972A JP H04139972 A JPH04139972 A JP H04139972A JP 2262394 A JP2262394 A JP 2262394A JP 26239490 A JP26239490 A JP 26239490A JP H04139972 A JPH04139972 A JP H04139972A
Authority
JP
Japan
Prior art keywords
layer member
recording layer
recording
voltage
cml
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2262394A
Other languages
Japanese (ja)
Inventor
Ryoyu Takanashi
高梨 稜雄
Shintaro Nakagaki
中垣 新太郎
Tsutae Asakura
浅倉 伝
Masato Furuya
正人 古屋
Takehisa Koyama
剛久 小山
Yuji Uchiyama
裕治 内山
Hiroyuki Bonide
盆出 博幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP2262394A priority Critical patent/JPH04139972A/en
Publication of JPH04139972A publication Critical patent/JPH04139972A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent a voltage across a recording layer member from being fluctuated together with lapse of a voltage application time at recording by making a ratio of the sum of equivalent resistance sets to the sum of equivalent capacitance sets of a photosensitive layer member and a recording member nearly equal to a ratio of the equivalent resistance of the recording layer member to the equivalent capacitance of the photosensitive layer. CONSTITUTION:A ratio of an equivalent resistance Rm of a recording layer member CML to an equivalent capacitance Cc of a photosensitive layer member PCL is selected to be equal to a ratio of the equivalent resistance sum Rc+Rm to the equivalent capacitance sum Cc+Cm of the photosensitive layer member PCL and the recording layer member CML. Thus, it is prevented that the voltage V across the recording layer member CML is fluctuated uselessly together with lapse of voltage application time at recording. Thus, an optical modulation member or the like whose operating point has a threshold level is used as the recording layer member and image pickup with high quality having an excellent contrast is attained.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、感光体層部材及び記録層部キイにより電磁放
射線情報を記録する撮像装置に係り、撮像状態に応して
光学的なシャッタの開放時間や電気的なシャッタ時間を
任意に可変設定した場合でも良好なコントラストを有す
る高品位な撮像がなしうるようにした撮像装置に関する
ものである。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an imaging device that records electromagnetic radiation information using a photoreceptor layer member and a recording layer key, and the present invention relates to an imaging device that records electromagnetic radiation information using a photoreceptor layer member and a recording layer key. The present invention relates to an imaging device capable of capturing high-quality images with good contrast even when the open time and electrical shutter time are arbitrarily set variably.

(従来の技術) 感光体層部材及び記録層部材により電磁放射線情報を記
録する装置及び方法については、本出願人がすでに発明
、出願したものとして、特願平l−2916130号明
細書記載の「記録媒体及び記録、再生方式」 (平成元
年11月9日出願)、特願平229938号明細書記載
の「電磁放射線情報の記録方法」 (平成2年2月12
日出願)、特願平2−74390号明細書記載の「電磁
放射線情報の記録方法及び撮像装置」 (平成2年3月
23日出願)などがある。
(Prior Art) A device and method for recording electromagnetic radiation information using a photoreceptor layer member and a recording layer member is disclosed in Japanese Patent Application No. 1-2916130 as an invention and application filed by the present applicant. "Recording Medium and Recording and Reproduction Method" (filed on November 9, 1989), "Method for Recording Electromagnetic Radiation Information" described in Japanese Patent Application No. 229938 (February 12, 1990)
``Method for Recording Electromagnetic Radiation Information and Imaging Apparatus'' (filed on March 23, 1990) described in Japanese Patent Application No. 2-74390 (filed on March 23, 1990).

これは、第5図に示すように、第1の電極Ellと第2
の電極Et2との間に配置させた感光体層部材PCL及
び記録層部材CMLにおける前記の第1、第2の電極E
 11.  E 12間に所定の電圧を供給するように
構成すると共に、感光体層部材PCLに記録の対象とさ
れる電磁放射線束(被写体0がらレンズTLを介して入
射した光)を入射させて、前記した記録層部材CMLに
記録の対象にされている電磁放射線情報を記録させる場
合に、記録の対象にされている電磁放射線束の感光体層
部材PCLへの露光量は光学的なシャッタPSによって
設定し得るように構成し、さらに、第1.第2の電極E
 11.  E t2間に所定の変化態様を示す電圧を
印加するようにスイッチSW、電源Eからなる電気的な
ンヤッタなどを設けたものである。
As shown in FIG.
The first and second electrodes E in the photoreceptor layer member PCL and the recording layer member CML disposed between the electrode Et2 of
11. E 12 is configured to supply a predetermined voltage between the two, and the electromagnetic radiation flux to be recorded (light incident from the subject 0 via the lens TL) is made incident on the photoreceptor layer member PCL. When recording electromagnetic radiation information targeted for recording on the recorded recording layer member CML, the amount of exposure of the electromagnetic radiation flux targeted for recording to the photoreceptor layer member PCL is set by an optical shutter PS. 1. Second electrode E
11. An electric switch consisting of a switch SW and a power source E is provided so as to apply a voltage showing a predetermined change mode between E and t2.

上記のようにhsI成された撮像装置では、後に詳述す
るように光(電磁放射線)の入射の有無により、感光体
層部材PCLの抵抗率が変化しく光の入射した部位では
、キャリアが発生して見掛は上の抵抗値が小さくなり、
すなわち、暗抵抗率から明抵抗率となる)、この結果、
記録層部材CML両端の電圧としてこの暗抵抗率による
電圧変化と明抵抗率による電圧変化との差分がコントラ
スト電圧の変化として記録される。
In the above-described hsI imaging device, the resistivity of the photoreceptor layer member PCL changes depending on the presence or absence of light (electromagnetic radiation) incidence, as will be detailed later, and carriers are generated at the site where light is incident. The apparent upper resistance value becomes smaller,
In other words, the dark resistivity becomes the bright resistivity), and as a result,
As the voltage across the recording layer member CML, the difference between the voltage change due to the dark resistivity and the voltage change due to the bright resistivity is recorded as a change in contrast voltage.

このような感光体層部材PCL (光導電層)に被写体
像を!jえ、記録層部材CML (記録層)に対応した
情報を記録する撮像装置においては、被写体の明るさや
使用目的に応してシャッタ時間を種々の値に設定する必
要がある。例えば、低照度の被写体を長時間シャッタで
撮像し、必要なコントラストを得たり、動きのある被写
体をシャッタ開放で撮像し、被写体の運動の軌跡を記録
する等の使い方がある。
A subject image can be captured on such a photoreceptor layer member PCL (photoconductive layer)! Furthermore, in an imaging device that records information corresponding to the recording layer member CML (recording layer), it is necessary to set the shutter time to various values depending on the brightness of the subject and the purpose of use. For example, it can be used to capture an image of a subject in low illumination for a long time with a shutter to obtain the necessary contrast, or to capture a moving subject with an open shutter to record the trajectory of the subject's movement.

(発明が解決しようとする課題) ところが、このような撮像装置において、第6図(A)
及び(B)に示すように、記録層部$4’ CML(記
録層)上のコントラスト電位(明部電位と暗部電位の差
)は電圧印加時間に対応して変化する。コントラスト電
位が最大値となる電圧印加時間は光導電層のインピーダ
ンス(等価容量及び抵抗)に依存する。光導電層の明抵
抗率が大きい場合、記録層上に生じるコントラスト電位
を最大とするためには長期間の電圧印加が必要となる(
同図[A] )。
(Problem to be Solved by the Invention) However, in such an imaging device, as shown in FIG.
As shown in FIG. 2 and (B), the contrast potential (difference between bright area potential and dark area potential) on the recording layer portion $4' CML (recording layer) changes in accordance with the voltage application time. The voltage application time at which the contrast potential reaches its maximum value depends on the impedance (equivalent capacitance and resistance) of the photoconductive layer. When the bright resistivity of the photoconductive layer is large, long-term voltage application is required to maximize the contrast potential generated on the recording layer (
Same figure [A]).

さらに、記録層部+10ML(記録層)のインピーダン
スと感光体層部材PCL (光導電層)のインピーダン
スとの関係により、記録層部材CML(記録層)にかか
る電圧の時間依存性に差が生じる。特に、記録層に高分
子液晶複合膜等、しきい値を有する光変調材を用いた場
合(第4図参照)、暗電位が電圧印加時間によって変化
することになり、動作点が電圧印加時間(すなわち、シ
ャッタ時間)に応して変動するという問題点がある。
Further, due to the relationship between the impedance of the recording layer portion +10ML (recording layer) and the impedance of the photoreceptor layer member PCL (photoconductive layer), a difference occurs in the time dependence of the voltage applied to the recording layer member CML (recording layer). In particular, when a light modulating material with a threshold value such as a polymer liquid crystal composite film is used in the recording layer (see Figure 4), the dark potential changes depending on the voltage application time, and the operating point changes depending on the voltage application time. There is a problem in that it varies depending on the shutter time (that is, the shutter time).

(課題を解決するだめの手段) 本発明は、上記課題を解決するために、第1の電極と第
2の電極との間に配置させた感光体層部材及び記録層部
材に対して、前記電極間に所定の電圧を供給するととも
に、前記感光体層部材に記録の対象とされる電磁放射線
束を入射させて、前記記録層部材に記録の対象にされて
いる電磁放射線情報を記録さぜる撮像装置において、前
記感光体層部材及び記録層部材との等価抵抗の和と等価
容量との和とからなる比と、記録層部材の等価抵抗と感
光体層部材の等価容量とからなる比とが略等しくなるよ
うにした撮像装置を提供するものである。
(Means for Solving the Problems) In order to solve the above problems, the present invention provides a photoreceptor layer member and a recording layer member disposed between the first electrode and the second electrode. While supplying a predetermined voltage between the electrodes, an electromagnetic radiation flux to be recorded is made to enter the photoreceptor layer member to record electromagnetic radiation information to be recorded on the recording layer member. In the imaging device, a ratio consisting of the sum of the equivalent resistance and the sum of the equivalent capacitance of the photoconductor layer member and the recording layer member, and a ratio consisting of the equivalent resistance of the recording layer member and the equivalent capacitance of the photoconductor layer member. An object of the present invention is to provide an imaging device in which the values are substantially equal.

(作用) 上記のような撮像装置においては、記録層部材の両端電
圧が、記録時の電圧印加時間の経過とともに変動するこ
とがない。
(Function) In the above-described imaging device, the voltage across the recording layer member does not vary with the passage of voltage application time during recording.

(実施例) 本発明になる撮像装置の一実施例を以下、図面とともに
詳細に説明する。
(Embodiment) An embodiment of the imaging device according to the present invention will be described in detail below with reference to the drawings.

最初に、撮像装置に構成について第2図(A)及び(B
)を参照して詳述する。同図(A)及び(B)において
、Oは被写体、TLは撮像レンズ、PSは光学的なシャ
ッタ、Ettは透明電極、Et2は電極、PCLは光導
電体による感光体層部材、CMLは記録層部材、SWは
スイッチ、Eは電源(電圧V)であり、またCTL (
L)は前記した光学的なシャッタPSの開閉動作の制御
に使用される開閉制御信号、CTL (V)は電気的な
シャッタの開閉制御信号、すなわち撮像装置に対する動
作電圧の供給、遮断動作を行なうスイッチSWの切換制
御信号である。同図に例示されている撮像装置において
、透明電極Ellと電極Et2との間にはスイッチSW
を介して電源Eを接続して前記した透明電極Etlと電
極Et2との間に所定の電界が発生されるようになされ
ている。
First, let us explain the configuration of the imaging device in Figures 2 (A) and (B).
) for details. In the same figures (A) and (B), O is the object, TL is the imaging lens, PS is the optical shutter, Ett is the transparent electrode, Et2 is the electrode, PCL is the photoconductor layer member made of a photoconductor, and CML is the recording material. In the layer members, SW is a switch, E is a power supply (voltage V), and CTL (
L) is an opening/closing control signal used to control the opening/closing operation of the optical shutter PS described above, and CTL (V) is an opening/closing control signal of the electric shutter, that is, supplies and cuts off an operating voltage to the imaging device. This is a switching control signal for switch SW. In the imaging device illustrated in the figure, a switch SW is provided between the transparent electrode Ell and the electrode Et2.
A power source E is connected through the electrode Et1 to generate a predetermined electric field between the transparent electrode Etl and the electrode Et2.

また、前記した感光体層部材PCLとしては、それの一
方の端面に高精細度の光学像が!jえられた場合に、適
当な強度の電界の印加の下において、他方の端面に対し
て高精細度の電荷像を発生させることかできるような特
性を白−する光導電体祠享−)(例えば、無機材である
アモルファス・シリコン、有機祠であるジアゾ顔料)を
用いたものを使用できる。
Moreover, the above-mentioned photoreceptor layer member PCL has a high-definition optical image on one end surface! A photoconductor having such characteristics that, when obtained, a high-definition charge image can be generated on the other end surface under the application of an electric field of appropriate strength. (For example, those using amorphous silicon, which is an inorganic material, and diazo pigment, which is an organic pigment) can be used.

前記した記録層部材CMLとしては、それの表面に付着
形成された静電潜像(電荷像)が長期間にわたりそのま
まのパターンで残留させうるような高い絶縁抵抗値を有
する材料(例えば、シリコン樹脂)、あるいは液晶、P
LZT、エレクトロクロミック祠のような各種の材料、
すなわち、それ自体で電荷像を保持することにより記録
の対象にされている情報の記録を行なう記録層部材、あ
るいは印加された電界強度に応じて生じる物理的・化学
的な変化により記録の対象にされている情報の記録が行
なわれるような記録層部材の何れのものでも使用できる
。また、前記した記録層部材CMLとしては、例えば高
分子材料中に液晶を分散させて構成した高分子一液晶メ
モリ膜、すなわち、例えば、メタクリル樹脂、ポリエス
テル樹脂、ポリカーボネート樹脂、塩化ビニール樹脂、
ポリアミド樹脂、ポリエチレン樹脂、ポリプロピレン樹
脂、ポリスチレン樹脂、シリコン樹脂のような体積抵抗
率が1014Ωcm以上の多孔質の高分子材料膜中にラ
ンダムに分布している状態で形成されている無数の微小
な細孔、例えば0.5ミクロン程度以下の径の細孔中に
、室温において液晶相を示し、かつ、高い体積抵抗率を
有するネマティック液晶、またはスメクティック液晶を
封入させることによって構成させた高分子一液晶メモリ
膜が使用されてもよい。
The recording layer member CML described above is made of a material having a high insulation resistance value (for example, silicone resin) that allows the electrostatic latent image (charge image) formed on the surface of the recording layer member CML to remain in the same pattern for a long period of time. ), or liquid crystal, P
Various materials such as LZT, electrochromic shrine,
In other words, a recording layer member that records the information to be recorded by retaining a charge image by itself, or a recording layer member that records the information to be recorded by retaining a charge image, or a material that records the information to be recorded by a physical or chemical change that occurs in response to the applied electric field strength. Any recording layer member capable of recording information can be used. In addition, the recording layer member CML described above is, for example, a polymer-liquid crystal memory film formed by dispersing liquid crystal in a polymer material, that is, for example, methacrylic resin, polyester resin, polycarbonate resin, vinyl chloride resin,
Countless fine particles are randomly distributed in a porous polymeric material film such as polyamide resin, polyethylene resin, polypropylene resin, polystyrene resin, or silicone resin with a volume resistivity of 1014 Ωcm or more. A polymer mono-liquid crystal formed by sealing nematic liquid crystal or smectic liquid crystal, which exhibits a liquid crystal phase at room temperature and has a high volume resistivity, into pores, for example, pores with a diameter of about 0.5 microns or less. A memory membrane may also be used.

撮像装置は、第2図(C)に示すように、光学的なシャ
ッタPSが開閉制御信号CTL (L)により開放状態
になされた場合に、撮像レンズTLによって被写体Oの
光学像が透明基板BPIと透明電極Ellとを介して感
光体層部材PCLに結像される。さらに、スイッチSW
の開閉動作の制御に使用される開閉制御信号CTL (
V)によって、スイッチSWがオンの状態になされると
、透明電極Ellと電極Et2との間に電源Eから所定
の電圧(感光体層部材PCLと記録層部材CMLとの間
の放電開始電圧よりも高い電圧値の電圧)が印加されて
、前記した感光体層部材PCLに結像された被写体Oの
光学像と対応する記録が記録層部材CM 1.、に対し
て行なわれる。
As shown in FIG. 2(C), in the imaging device, when the optical shutter PS is set to the open state by the opening/closing control signal CTL (L), the optical image of the object O is transferred to the transparent substrate BPI by the imaging lens TL. The image is formed on the photoreceptor layer member PCL via the transparent electrode Ell and the transparent electrode Ell. Furthermore, switch SW
Opening/closing control signal CTL (
V), when the switch SW is turned on, a predetermined voltage (from the discharge starting voltage between the photoreceptor layer member PCL and the recording layer member CML) is applied from the power source E between the transparent electrode Ell and the electrode Et2. A voltage of a high voltage value) is applied, and a record corresponding to the optical image of the subject O imaged on the photoreceptor layer member PCL is recorded on the recording layer member CM1. , is performed for .

光学的なシャッタPSが開放状態になされた期間に撮像
レンズTLを介して入射した光束が透明電極Ellを透
過して感光体層部材PCLに入射すると、感光体層部材
PCLは電気抵抗値がそれに入射した光束の光量に応じ
て変化して(暗抵抗率から明抵抗率に変化して)、感光
体層部材PCLの各部の電気抵抗値が被写体の各部の光
量と対応して変化している状態になされるが、この状態
においてスイッチSWがオンの状態になされていて、前
記した透明電極Etlと電極Et2との間に、感光体層
部材P CLと記録層部材CMLとの間の電圧を放電開
始電圧よりも高い電圧値の電圧にさせるような電圧が印
加されていた場合には、記録層部材CMLに対して、感
光体層部t、I’ P CLにおける電気抵抗値の変化
の状態と対応している電荷を61着させて、記録層部材
CMLに被写体の光学像と対応している静電潜像(電荷
像)や電界の変化に応じた物理的・化学的変化か記録さ
れることになる。
When the light beam incident through the imaging lens TL during the period when the optical shutter PS is in the open state passes through the transparent electrode Ell and enters the photoreceptor layer member PCL, the electric resistance value of the photoreceptor layer member PCL changes to that value. The electric resistance value of each part of the photoreceptor layer member PCL changes in accordance with the light amount of each part of the subject, changing according to the light amount of the incident light flux (changing from dark resistivity to bright resistivity). In this state, the switch SW is turned on, and the voltage between the photoreceptor layer member PCL and the recording layer member CML is applied between the transparent electrode Etl and the electrode Et2. If a voltage that causes the voltage to be higher than the discharge starting voltage is applied, the state of change in the electrical resistance value in the photoreceptor layer portion t, I'PCL with respect to the recording layer member CML. A charge corresponding to 61 is deposited on the recording layer member CML, and an electrostatic latent image (charge image) corresponding to the optical image of the object and physical/chemical changes in response to changes in the electric field are recorded. That will happen.

ここで、第2図(A)及び(B)に示した撮像装置の電
気的な特性について詳述する。感光体層部材PCLの等
価抵抗をR、同等価容量をC8とし、記録層部材CML
の等価抵抗をR、同等価容量をCとする。すると、撮像
装置の等値開路は第1図のようになり、記録層部材CM
 Lの両端電圧Vについてステップ応答を求めると、と
なる。ただし、 すなわち、記録層部材CMLの両端電圧■は、電圧印加
直後では、電圧V。を容量分割(各8mの逆数比)した
ものとなり、時間の経過とともに抵抗分割に移行してい
く。
Here, the electrical characteristics of the imaging device shown in FIGS. 2(A) and 2(B) will be described in detail. The equivalent resistance of the photoreceptor layer member PCL is R, the equivalent capacitance is C8, and the recording layer member CML is
Let R be the equivalent resistance and C be the equivalent capacitance. Then, the equivalent open circuit of the imaging device becomes as shown in Fig. 1, and the recording layer member CM
The step response for the voltage V across L is calculated as follows. However, that is, the voltage (2) across the recording layer member CML is the voltage V immediately after voltage application. is divided into capacitances (reciprocal ratio of 8m each), and as time passes, it shifts to resistance division.

したがって、第3図に示すように の時は、時間の経過とともに、記録層部IJのC肛の両
端電圧Vは上昇しく曲線A)、 の時は、時間の経過とともに、記録層部材CMLの両端
電圧Vは降下することとなる(曲線B)。
Therefore, as shown in FIG. 3, the voltage V across the C end of the recording layer portion IJ increases with the passage of time (curve A); The voltage V between both ends will drop (curve B).

しかし、上述したように、本発明になる撮像装置では、
感光体層部材PCL及び記録層部材C肛とて、その等価
抵抗の和R+Rと等価容量のCm 和C+Cからなる比と、記録層部材CMLのCm 等価抵抗Rと感光体層部4JPCLの等価容量C。から
なる比とが等しくなるように、すなわち、(R+R):
(C+C)=R:C c       m            c   
    m         m       cと構
成されているので、 Co      Rm C十CR+R CrtICIll である。
However, as described above, in the imaging device according to the present invention,
The sum of the equivalent resistances R+R and the equivalent capacitance Cm of the photoconductor layer member PCL and the recording layer member C; C. (R+R):
(C+C)=R:C c m c
Since it is composed of m m c, Co Rm C0CR+R CrtICIll.

したがって、第3図に示すように、記録層部材CMLの
両端電圧v1記録時の電圧印加時間の経過とともに無用
な変動をすることがない(曲線C)。よって、記録層部
材CMLとして、第4図にその特性を示すような高分子
一液晶複合膜などのしきい値を有する光変調材を用いて
も、暗電位が電界印加時間によって変化することがなく
、すなわち、記録層部材CMLとして機能する光変調材
の動作点が変動することがない。
Therefore, as shown in FIG. 3, the voltage across the recording layer member CML does not change unnecessarily with the elapse of the voltage application time during recording v1 (curve C). Therefore, even if a light modulating material having a threshold value such as a polymer-liquid crystal composite film whose characteristics are shown in FIG. 4 is used as the recording layer member CML, the dark potential will not change depending on the electric field application time. In other words, the operating point of the light modulating material functioning as the recording layer member CML does not change.

このように、本撮像装置によれば、撮像状態に応じて電
気的なシャッタ時間(電界印加時間)を変化させても、
撮像結果が変動せず、高品位な撮像をなすことができる
In this way, according to the present imaging device, even if the electrical shutter time (electric field application time) is changed depending on the imaging state,
Imaging results do not vary and high-quality imaging can be performed.

(発明の効果) 以上詳述したように、本発明によれば、撮像状態に応じ
て光学的なシャッタの開放時間や電気的シャッタ時間を
任意に可変設定しても、記録層部4イの暗電位が電界印
加時間によって変化することがないので、動作点にしき
い値を有する光変調ヰ4などを記録層部材として使用す
ることができ、良好なコントラストを有する高品位な撮
像をなすことができる。
(Effects of the Invention) As described in detail above, according to the present invention, even if the optical shutter opening time and the electrical shutter time are arbitrarily set variably according to the imaging state, the recording layer section 4 Since the dark potential does not change depending on the electric field application time, it is possible to use a light modulator having a threshold value at the operating point as a recording layer member, and it is possible to perform high-quality imaging with good contrast. can.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明になる撮像装置の一実施例を示す図で、
撮像装置の等値開路、第2図(A)及び(B)は撮像装
置の構成図、第2図(C)はンヤッタ時間を説明する図
、第3図は記録層部材(記録層)にかかる電圧の時間依
存性の差を説明する図、第4図は記録層部+4の印加電
圧と特性(透過] 3 率)との関係を示す図、第5図は従来例を説明する図、
第6図(A)及び(B)は電界印加時間と記録層部材に
おける電圧との関係を示す図である。 0・・・被写体、TL・・・撮像レンズ、PS・・・光
学的なシャッタ、 Ell・・・透明電極、Et2・・・電極、PCL・・
・光導電体による感光体層部材、CML・・・記録層部
材、 SW・・・スイッチ、E・・・電源、 R・・感光体層部材の等価抵抗、 C・・・感光体層部材の等価容量、 R・・・記録層部材の等価抵抗、 C・・・記録層部材の等価容量。
FIG. 1 is a diagram showing an embodiment of an imaging device according to the present invention.
2(A) and 2(B) are block diagrams of the imaging device, FIG. 2(C) is a diagram illustrating the Nyatta time, and FIG. 3 is a diagram of the recording layer member (recording layer). A diagram illustrating the difference in the time dependence of such voltage, FIG. 4 is a diagram illustrating the relationship between the applied voltage of the recording layer portion +4 and the characteristics (transmission] 3 rate), and FIG. 5 is a diagram illustrating the conventional example.
FIGS. 6A and 6B are diagrams showing the relationship between the electric field application time and the voltage across the recording layer member. 0...Subject, TL...Imaging lens, PS...Optical shutter, Ell...Transparent electrode, Et2...Electrode, PCL...
・Photoconductor layer member by photoconductor, CML...recording layer member, SW...switch, E...power supply, R...equivalent resistance of photoconductor layer member, C...of photoconductor layer member Equivalent capacitance, R...Equivalent resistance of the recording layer member, C...Equivalent capacitance of the recording layer member.

Claims (1)

【特許請求の範囲】[Claims] 第1の電極と第2の電極との間に配置させた感光体層部
材及び記録層部材に対して、前記電極間に所定の電圧を
供給するとともに、前記感光体層部材に記録の対象とさ
れる電磁放射線束を入射させて、前記記録層部材に記録
の対象にされている電磁放射線情報を記録させる撮像装
置において、前記感光体層部材及び記録層部材との等価
抵抗の和と等価容量との和とからなる比と、記録層部材
の等価抵抗と感光体層部材の等価容量とからなる比とが
略等しくなるようにしたことを特徴とする撮像装置。
A predetermined voltage is supplied between the electrodes of a photoreceptor layer member and a recording layer member disposed between a first electrode and a second electrode, and a recording target is applied to the photoreceptor layer member. In an imaging device that records electromagnetic radiation information targeted for recording on the recording layer member by making the electromagnetic radiation flux incident thereon, the sum of the equivalent resistances and the equivalent capacitance of the photoreceptor layer member and the recording layer member. 1. An imaging device characterized in that the ratio of the sum of the sum of the two and the ratio of the equivalent resistance of the recording layer member and the equivalent capacitance of the photoreceptor layer member are approximately equal to each other.
JP2262394A 1990-09-29 1990-09-29 Image pickup device Pending JPH04139972A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2262394A JPH04139972A (en) 1990-09-29 1990-09-29 Image pickup device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2262394A JPH04139972A (en) 1990-09-29 1990-09-29 Image pickup device

Publications (1)

Publication Number Publication Date
JPH04139972A true JPH04139972A (en) 1992-05-13

Family

ID=17375158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2262394A Pending JPH04139972A (en) 1990-09-29 1990-09-29 Image pickup device

Country Status (1)

Country Link
JP (1) JPH04139972A (en)

Similar Documents

Publication Publication Date Title
EP0442416B1 (en) Method and apparatus for recording information
US5191408A (en) Color imaging system with selectively openable optical shutter
JPH04139972A (en) Image pickup device
US3717459A (en) Method of imaging involving pre-heating using interdigitated electrodes, a photoconductive layer and a magnetic imaging layer
JP2854875B2 (en) Information recording and playback method
JPH04207588A (en) Image pickup device
JPH04139424A (en) Image pickup device
US3778145A (en) Magnetic imaging
EP0403307B1 (en) Method for operating photo-to-photo transducer
JPH04227174A (en) Image pickup device
JPH0815009A (en) Photosensor and information recording method and apparatus
JP2623894B2 (en) Recording method of electromagnetic radiation information
JP2551198B2 (en) Multiple information recording / reproducing device
US5241376A (en) Cinematographic system
EP0646851B1 (en) Color imaging system
CA1109717A (en) Image reversal development method and apparatus
EP0632346A2 (en) Method and apparatus for recording information
JPH03274875A (en) Electronic still camera system
JPH03246560A (en) Recording method
JPH04277716A (en) Information recording medium and information recording device
EP0657764B1 (en) Photo-to-photo transducer
JPH08114973A (en) Electrostatic information recording medium and electrostatic information recording and reproducing method
JP3375483B2 (en) Development operation control device for electronic development type camera
JP3312704B2 (en) Information recording method and apparatus
JPH03289616A (en) Method and device for image pickup operation