JPH04132635A - Ceramic coating glass - Google Patents

Ceramic coating glass

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Publication number
JPH04132635A
JPH04132635A JP25408090A JP25408090A JPH04132635A JP H04132635 A JPH04132635 A JP H04132635A JP 25408090 A JP25408090 A JP 25408090A JP 25408090 A JP25408090 A JP 25408090A JP H04132635 A JPH04132635 A JP H04132635A
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JP
Japan
Prior art keywords
glass
group
coating
molecular weight
ceramic coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25408090A
Other languages
Japanese (ja)
Other versions
JP3207197B2 (en
Inventor
Kazuo Inoue
和夫 井上
Kazuyoshi Kine
甲子 一良
Yasushi Komatsu
小松 保蒔
Sunao Suzuki
直 鈴木
Toshikatsu Takatsu
高津 利桂
Toru Funayama
舟山 徹
Takeshi Isoda
礒田 武志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
Original Assignee
Tonen Corp
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Publication date
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Publication of JPH04132635A publication Critical patent/JPH04132635A/en
Application granted granted Critical
Publication of JP3207197B2 publication Critical patent/JP3207197B2/en
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Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To increase adhesion of coating to glass, to improve denseness and smoothness of coating and to thicken a film by forming a ceramic coating film comprising silicon and nitrogen as essential components on the surface of glass. CONSTITUTION:An amorphous film comprising silicon and nitrogen as essential components and at least one selected from a group consisting of oxygen, hydrogen and a metal (one or more metals selected from a group of metal elements of group I to group VIII of the periodic table) as an arbitrary component in atomic ratio of the elements of <=3 N/Si, <=15 O/Si and <=5 M/Si (M is one or more metals selected from a group consisting of group I to group VIII of periodic table) is used as a ceramic coating film formed on the surface of glass. The ceramic coating glass is obtained by applying a polysilazane having a repeating unit shown by formula I and about 100-500,000 number-average molecular weight to glass and baking.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はセラミックコーティングガラスに係る。[Detailed description of the invention] [Industrial application field] The present invention relates to ceramic coated glass.

より詳し゛くは、アルカリ含有ガラス、特にソーダガラ
スのガラスやけやソーダ分溶出を抑制するための保護膜
として、あるいはガラス表面の強度、硬度、平滑性を向
上させるためにセラミックコーティングを施したガラス
に関する。
More specifically, it is a glass that is coated with a ceramic coating to prevent alkali-containing glass, especially soda glass, from burning and elution of soda, or to improve the strength, hardness, and smoothness of the glass surface. Regarding.

〔従来の技術〕[Conventional technology]

アルカリ含有ガラス、特にソーダガラスはガラスやけ、
即ち、雰囲気中の水分とガラス表面のナトリウムが反応
して、接触部にナトリウム分に冨んだ露状異物を生じた
り、さらにガラス内部のナトリウムがイオンの形で表層
部に平衡拡散したり、水分中の水素イオンとアルカリイ
オンの相互拡散により、ソーダ分が表面に溶出してしま
う。また、ガラス取扱い時に、他の部材との接触により
表面に接触傷が発生し強度が低下する、あるいは平滑性
が損なわれる問題がある。これらの問題点を解消するた
めに、ソーダガラス表面にシリカフィルムを形成する方
法が検討されている。
Alkali-containing glass, especially soda glass, can cause glass burn.
In other words, the moisture in the atmosphere and the sodium on the glass surface may react, producing dew-like foreign matter rich in sodium at the contact area, and furthermore, the sodium inside the glass may diffuse in equilibrium to the surface layer in the form of ions. Due to the interdiffusion of hydrogen ions and alkali ions in the water, soda content is eluted to the surface. Further, when handling the glass, there is a problem that contact scratches occur on the surface due to contact with other members, resulting in a decrease in strength or loss of smoothness. In order to solve these problems, a method of forming a silica film on the surface of soda glass is being considered.

−船釣なシリカフィルムの形成法としては、蒸着法やス
パッター法があるが、量産性に劣るという欠点がある。
- Methods for forming silica films by boat include vapor deposition and sputtering, but these methods have the disadvantage of being poor in mass production.

これに対して、珪素化合物RnSi (OH) 4−1
1とガラス質形成剤を有機溶媒に溶解した塗布液をガラ
ス表面に塗布し、これを焼成して酸化珪素SiO□を主
成分とする被膜を形成する量産性に優れた方法が開発さ
れた。
On the other hand, the silicon compound RnSi (OH) 4-1
A method with excellent mass productivity has been developed in which a coating solution containing No. 1 and a glass-forming agent dissolved in an organic solvent is applied to a glass surface, and the coating is fired to form a film containing silicon oxide (SiO□) as the main component.

また、ガラスの強度などを向上させることを目的として
各種プリセラミックポリマーをコーティングすることが
検討されている。破壊の起点となるキズを埋めて強度向
上を図るものである。
Additionally, coating with various preceramic polymers is being considered for the purpose of improving the strength of glass. This is intended to improve strength by filling in scratches that can be the starting point for fracture.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記の塗布液は、珪素化合物RnS i (OH) a
 −、、とガラス質形成剤に有機バインダーを加えたも
のであり、スピンコーティング、ディッピング等の施工
法によって、ガラス表面に塗布、500’C程度の温度
で焼成しSiO□膜を形成させるが、熱分解収率が高く
ないため、緻密性が十分ではなく、また、形成膜の厚さ
は0.05〜0.2ミクロン程度で厚膜化が困難という
問題がある。このため、厚膜化が可能で、ピンホール発
生の少ない緻密な膜の開発が望まれている。
The above coating liquid contains a silicon compound RnS i (OH) a
- It is a glass-forming agent with an organic binder added, and it is applied to the glass surface by spin coating, dipping, etc. and baked at a temperature of about 500'C to form a SiO□ film. Since the thermal decomposition yield is not high, the density is not sufficient, and the thickness of the formed film is about 0.05 to 0.2 microns, making it difficult to increase the thickness. Therefore, it is desired to develop a dense film that can be made thicker and has fewer pinholes.

また、上記プリセラミックポリマーのコーティングにお
いても、コーティングとガラスとの密着性、緻密性、平
滑性、厚膜化などの点においてまだ改良の余地がある。
In addition, there is still room for improvement in the above-mentioned preceramic polymer coating in terms of adhesion between the coating and glass, denseness, smoothness, thickening, and the like.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、上記課題を解決するために、セラミックコー
ティング膜が珪素及び窒素を必須成分とし、酸素、水素
及び金属類(元素周期律表第1族〜第■族の金属元素の
群から選択される1種又は2種以上の金属)の群から選
択される少なくとも1種を任意成分とし、各元素の比率
が原子比で表わしてN/Si3以下、0/Si15以下
、M / S 15以下(Mは元素周期律表第T族〜第
■族の金属元素の群から選択される上記1種又は2種以
上の金属)であり、かつ非晶質であることを特徴とする
セラミックコーティングガラスを提供する。
In order to solve the above problems, the present invention provides a ceramic coating film containing silicon and nitrogen as essential components, oxygen, hydrogen, and metals (selected from the group of metal elements of Groups 1 to 2 of the Periodic Table of Elements). The optional component is at least one selected from the group consisting of one or more metals, and the ratio of each element expressed in atomic ratio is N/Si3 or less, 0/Si15 or less, M/S 15 or less ( M is one or more metals selected from the group of metal elements of Groups T to Group (III) of the Periodic Table of the Elements), and is amorphous. provide.

本発明のセラミックコーティング膜は、珪素及び窒素を
必須成分とし、酸素及び金属類を任意の成分とするコー
テイング膜であり、結晶性については、結晶又は非晶質
の如何を問わないが、実質的に非晶質であるものが好ま
しい。
The ceramic coating film of the present invention is a coating film containing silicon and nitrogen as essential components, and oxygen and metals as optional components, and has crystallinity regardless of whether it is crystalline or amorphous, but substantially Preferably, the material is amorphous.

即ち、X線回折分析による非晶質のものまたは結晶子の
大きさ(X線回折半値中法(JONES法)を用いて測
定)がすべての方位で2000Å以下の微結晶相を含有
するものが好ましい。特に好ましい結晶子の大きさは1
000Å以下であり、更に好ましい結晶子の大きさは5
00Å以下である。
That is, those that are amorphous as determined by X-ray diffraction analysis or those that contain microcrystalline phases whose crystallite size (measured using the X-ray diffraction half-maximum method (JONES method)) are 2000 Å or less in all directions. preferable. A particularly preferable crystallite size is 1
000 Å or less, and the more preferable crystallite size is 5
00 Å or less.

本発明で用いるセラミックコーティングを構成する各元
素の比率は原子比で表わして、N/Si3以下 0/Si15以下 N/Si5以下 であり、好ましい原子比は、 N/Si1.4以下 0/SilO以下 M/Si2.5以下 である。更に好ましい原子比は、 N/Si1.3以下 0/Si4以下 M/Sil以下 である。
The ratio of each element constituting the ceramic coating used in the present invention, expressed as an atomic ratio, is N/Si3 or less 0/Si15 or less N/Si5 or less, and the preferable atomic ratio is N/Si1.4 or less 0/SilO or less. M/Si is 2.5 or less. A more preferable atomic ratio is N/Si 1.3 or less and 0/Si 4 or less M/Sil or less.

元素比が上記の範囲に包含されない場合、セラミックコ
ーティング膜の強度を発揮することができない。
If the element ratio is not within the above range, the strength of the ceramic coating film cannot be exhibited.

また金属Mとしては元素周期律表第1族〜第■族の金属
元素の群から選択される少なくとも一種が用いられるが
、更に好ましい金属は元素周期律表第1a族及び第■族
〜第V族の金属元素の群から選択される一種又は二種以
上の金属が挙げられるが、特に好ましい金属はアルミニ
ウム、チタン、ジルコニウム等である。
Further, as the metal M, at least one selected from the group of metal elements of Groups 1 to 2 of the Periodic Table of the Elements is used, and more preferred metals are Groups 1a and 1 to V of the Periodic Table of the Elements. Examples include one or more metals selected from the group of metal elements, and particularly preferred metals are aluminum, titanium, zirconium, and the like.

本発明で用いるセラミックコーティング膜は、一般式 II   H +5i−N+ で表わされる繰り返し単位を有し、数平均分子量が10
0〜500,000の範囲の環状又は鎖状の無機ポリシ
ラザン又はこれらの混合物、さらにはその複合物からな
るポリシラザンを塗布し、焼成して得ることができる。
The ceramic coating film used in the present invention has a repeating unit represented by the general formula II H +5i-N+ and has a number average molecular weight of 10.
It can be obtained by coating and firing a polysilazane consisting of a cyclic or chain inorganic polysilazane having a molecular weight of 0 to 500,000, a mixture thereof, or a composite thereof.

このようなポリシラザンは、たとえばハロシラン、例え
ばジクロロシランをピリジンの如き塩基と反応させて得
られるジクロロシランと塩基とのアダクトを更にアンモ
ニアと反応させることにより得ることができる(特開昭
60−145903号参照)。
Such polysilazane can be obtained, for example, by reacting a halosilane such as dichlorosilane with a base such as pyridine, and then reacting an adduct of dichlorosilane and a base with ammonia (JP-A-60-145903). reference).

また、上記ポリシラザンを加熱して高重合体化したもの
(数平均分子量200〜500,000) (特願昭6
2−202765号及び同63−74918号参照)、
あるいは上記無機ポリシラザンのアンモニア又はヒドラ
ジンによる脱水素縮合反応により改質したポリシラザン
を用いることができる(特願昭62−202767及び
同63−74919号参照)。
In addition, the above polysilazane is heated to form a high polymer (number average molecular weight 200 to 500,000) (Japanese patent application No. 6
2-202765 and 63-74918),
Alternatively, a polysilazane modified by a dehydrogenation condensation reaction of the above-mentioned inorganic polysilazane with ammonia or hydrazine can be used (see Japanese Patent Application No. 62-202767 and No. 63-74919).

さらに、本出願人が特願昭61−223970号明細書
等に開示したポリメタロシラザン、あるいは特開昭62
−195024号公報に開示したポリシロキサザンなど
も使用することができる。
Furthermore, polymetallosilazane disclosed by the present applicant in Japanese Patent Application No. 61-223970, etc., or
Polysiloxazane disclosed in Japanese Patent Publication No.-195024 can also be used.

つぎに、前記で得たポリシラザンを塗布溶液となした後
、塗布及び焼成して、セラミックコーティングガラスを
製造する。
Next, the polysilazane obtained above is made into a coating solution, which is then coated and fired to produce ceramic coated glass.

ガラスへのポリシラザンの塗布はディッピング、スピン
コード、ハケ塗り、スプレー等の各種手法により各種ガ
ラス上に塗布する。ポリシラザン自体、分子量に応じて
適当な粘度を有する液体であるので、そのまま塗布でき
るが、必要に応じて各種有機溶剤に溶解して塗布液とす
る。
Polysilazane is applied to various types of glass by various methods such as dipping, spin cording, brushing, and spraying. Since polysilazane itself is a liquid having an appropriate viscosity depending on its molecular weight, it can be applied as is, but if necessary, it can be dissolved in various organic solvents to form a coating liquid.

ポリシラザンは熱に対して不融であることから、不融化
処理の必要がなく、融解による塗膜のダレ等が発生しな
い。
Since polysilazane is infusible to heat, there is no need for infusibility treatment, and the coating film does not sag due to melting.

本発明で使用できるガラスの種類は特に限定されないが
、アルカリ含有ガラス、特にソーダガラスについては本
発明のセラミックコーティングがアルカリ分(ソーダ分
)の溶出に対する保護作用に優れているので、特に有効
である。
The type of glass that can be used in the present invention is not particularly limited, but the ceramic coating of the present invention is particularly effective for alkali-containing glass, especially soda glass, because it has an excellent protective effect against elution of alkali content (soda content). .

焼成は、真空下、又は窒素アルゴン等の不活性ガスや、
アンモニア、水素あるいはそれらの混合物からなる気体
の雰囲気下において実施される。
Firing is performed under vacuum or with an inert gas such as nitrogen argon,
It is carried out under a gas atmosphere consisting of ammonia, hydrogen or a mixture thereof.

焼成温度は、通常、200°C〜1000°Cであり、
焼成時間は1分から10時間である。最高熱処理温度は
ガラスの種類に依存するものである。
The firing temperature is usually 200°C to 1000°C,
Firing time is 1 minute to 10 hours. The maximum heat treatment temperature depends on the type of glass.

本発明のセラミックコーティングは次のような特長を有
する。
The ceramic coating of the present invention has the following features.

(1)熱分解収率が高いため、焼成過程での収縮率が小
さく、ピンホールやワレが発生しにくい。
(1) Since the thermal decomposition yield is high, the shrinkage rate during the firing process is small, and pinholes and cracks are less likely to occur.

したがって、緻密質であり、かつ厚膜化(例えば2坤以
上)が可能である。つまり、耐アルカリ性、強度、硬度
、平滑性の向上に対する寄与が大きい。
Therefore, it is dense and can be made thick (for example, 2 thick or more). In other words, it greatly contributes to improvements in alkali resistance, strength, hardness, and smoothness.

(2)基本的に有機基を含まないSi  、N、O。(2) Si, N, and O, which basically do not contain organic groups.

Hのみから成るポリマーであるため、化学的に活性であ
り、Si、Oを中心組成とするガラスとの接着性が高い
。このため、焼成後においても、ガラスとの接着強度が
高い。
Since it is a polymer consisting only of H, it is chemically active and has high adhesion to glass whose main composition is Si and O. Therefore, even after firing, the adhesive strength with glass is high.

(3)融点をもたない熱硬化性ポリマーであるため、不
融化処理の必要がなく、融解による塗膜のダレ等が発生
しない。
(3) Since it is a thermosetting polymer with no melting point, there is no need for infusibility treatment, and the coating film does not sag due to melting.

本発明は、このようなセラミックコーティングの特長を
生かして、薄膜トランジスタ方式液晶パネル用ガラス基
板、その他の光学用ガラス、各種窓ガラスなどに広く適
用できる。
The present invention can be widely applied to glass substrates for thin film transistor type liquid crystal panels, other optical glasses, various window glasses, etc. by taking advantage of the features of ceramic coatings.

〔作 用〕[For production]

本発明のセラミックコーティングは、緻密質、厚膜化可
能、ガラスとの密着性良好なので、ガラスの強度、硬度
、平滑性向上あるいはアルカリガラスの保護膜として有
効である。
The ceramic coating of the present invention is dense, can be formed into a thick film, and has good adhesion to glass, so it is effective for improving the strength, hardness, and smoothness of glass or as a protective film for alkali glass.

〔実施例〕〔Example〕

1考炎1 内容積10Lの四つロフラスコにガス吹き込み管、メカ
ニカルスターラー、ジュワーコンデンサーを装置した。
1. Flame 1 A four-bottle flask with an internal volume of 10 L was equipped with a gas blowing tube, a mechanical stirrer, and a dewar condenser.

反応器内部を脱酸素した乾燥窒素で置換した後、四つロ
フラスコに脱気した乾燥ピリジン5Lを入れ、これを氷
冷した。次にジクロロシラン516gを加えると白色固
体状のアダクト(SiHzCE z・2C5H6N)が
生成した。反応混合物を氷冷し、攪拌しながら、水酸化
ナトリウム管及び活性炭管を通して精製したアンモニア
510gを吹き込んだ。反応終了後、反応混合物を遠心
分離し、乾燥ピリジンを用いて洗浄した後、さらに窒素
雰囲気下で濾過して、濾液8.5Lを得た。得られた無
機ポリシラザンの数平均分子量はGPCにより測定した
ところ、980であった。
After the inside of the reactor was replaced with deoxygenated dry nitrogen, 5 L of degassed dry pyridine was placed in a four-necked flask and cooled on ice. Next, 516 g of dichlorosilane was added to produce a white solid adduct (SiHzCE z.2C5H6N). The reaction mixture was ice-cooled, and while stirring, 510 g of purified ammonia was blown into the reaction mixture through a sodium hydroxide tube and an activated carbon tube. After the reaction was completed, the reaction mixture was centrifuged, washed with dry pyridine, and further filtered under a nitrogen atmosphere to obtain 8.5 L of filtrate. The number average molecular weight of the obtained inorganic polysilazane was 980 as measured by GPC.

釡考汎又 参考例1で得られた無機ポリシラザンのピリジン溶液(
無機ポリシラザン濃度、6.2%)200mLを内容積
300mLの耐圧反応容器に入れ、窒素雰囲気、密閉系
で120°Cで3時間攪拌しながら反応を行った。この
間大量の気体が発生したが、ガスクロマトグラフィー測
定により、この気体は水素であった。反応前後における
圧力上昇は2 kg / cflであった。室温に冷却
後、乾燥0−キシレン400mLを加え、圧力3〜5 
mmHg、温度50〜70°Cで溶媒を除いたところ、
白色粉末が10.9 g得られ、この粉末は有機溶媒に
可溶であった。該重合体粉末の数平均分子量は1388
、重量平均分子量は3968、Si/N比は1.33で
あった。
In addition, a pyridine solution of the inorganic polysilazane obtained in Reference Example 1 (
(inorganic polysilazane concentration, 6.2%) was placed in a pressure-resistant reaction vessel with an internal volume of 300 mL, and the reaction was carried out at 120° C. for 3 hours with stirring in a nitrogen atmosphere in a closed system. During this time, a large amount of gas was generated, which was determined to be hydrogen by gas chromatography. The pressure increase before and after the reaction was 2 kg/cfl. After cooling to room temperature, add 400 mL of dry 0-xylene and reduce the pressure to 3-5.
When the solvent was removed at mmHg and a temperature of 50 to 70°C,
10.9 g of white powder was obtained, which was soluble in organic solvents. The number average molecular weight of the polymer powder is 1388
The weight average molecular weight was 3968, and the Si/N ratio was 1.33.

実力側0− 参考例2で得られた熱重合無機ポリシラザン(数平均分
子量Mn : 1388、重量平均分子量Mw:396
8、Si/N比: 1.33)の20wt%0−キシレ
ン溶液を用い、デイツプコーティング法により、ソーダ
ガラス基板と直径4φ×長さ4(1(mm)のソーダガ
ラス棒へ塗布した。乾燥後、前者は500°C×Ih、
N2中で熱処理し、5i−ON系コーティングとし、後
者は500°C×1h、大気中で熱処理し、5i−0−
N系コーティングとした。膜厚は、いずれも約0.5 
ttmであり、ピンホール、ワレ等は観察されなかった
Performance side 0 - Thermal polymerization inorganic polysilazane obtained in Reference Example 2 (number average molecular weight Mn: 1388, weight average molecular weight Mw: 396
8. A 20 wt % 0-xylene solution with a Si/N ratio of 1.33) was applied to a soda glass substrate and a soda glass rod with a diameter of 4φ and a length of 4 (1 (mm)) by a dip coating method. After drying, the former was heated to 500°C x Ih,
The latter was heat-treated in N2 to form a 5i-ON coating, and the latter was heat-treated at 500°C for 1 h in air to form a 5i-0-
N-based coating. The film thickness is approximately 0.5 in each case.
ttm, and no pinholes, cracks, etc. were observed.

コーティングしたソーダガラス基板の硬度をマイクロビ
ッカース硬度計により測定した結果、ソーダガラス基板
の450Kgf/胴2に対し、823Kgf/mm2へ
と増加した。また、コーティングしたソーダガラス棒の
3点曲げ強度を測定した結果、同一熱履歴を経たソーダ
ガラス棒の14Kgf/mm2に対し、37Kgf/胴
2へと増加した。
As a result of measuring the hardness of the coated soda glass substrate using a micro Vickers hardness meter, the hardness increased to 823 Kgf/mm 2 from 450 Kgf/2 cylinders of the soda glass substrate. Furthermore, as a result of measuring the three-point bending strength of the coated soda glass rod, it increased to 37 Kgf/mm2 compared to 14 Kgf/mm2 for the soda glass rod that underwent the same thermal history.

1施±1 参考例2で作製した熱重合無機ポリシラザン(数平均分
子量Mn  : 1388、重量平均分子量M讐:39
68、S i / N比:’1.33)の41ht%O
−キシレン溶液を用い、デイツプコーティング法により
、ソーダガラス基板へ塗布した。乾燥後、500°C×
1h、大気中で熱処理したところ、ピンホール、ワレの
ない膜厚2廂の緻密質な540□コーテイングを得た。
1 ± 1 Thermal polymerization inorganic polysilazane prepared in Reference Example 2 (number average molecular weight Mn: 1388, weight average molecular weight Mn: 39
68, Si/N ratio: '1.33)'s 41h%O
- Using a xylene solution, it was applied to a soda glass substrate by a dip coating method. After drying, 500°C
When heat treated in the air for 1 hour, a dense 540□ coating with a film thickness of 2 feet without pinholes or cracks was obtained.

交考開ユ 参考例1で得られた無機ポリシラザンのピリジン溶w!
1.(無機ポリシラザン濃度、6.2%)100mLを
内容積300mLの耐圧反応容器に入れ、精製した無水
アンモニア4.5gを加え、密閉系で50℃で3時間攪
拌をしながら反応を行った。この間大量の気体が発生し
たが、ガスクロマトグラフィー測定により、この気体は
水素であった。反応前後における圧力上昇は1 kg 
/ cllIであった。室温に冷却後、乾燥0−キシレ
ン300mLを加え、圧力3〜5 mm1g、温度50
〜70°Cで溶媒を除いたところ、白色粉末が8.0g
得られ、この粉末は有機溶媒に可溶であった。該重合体
粉末の数平均分子量は2352、重量平均分子量は10
735、Si/N比は1.05であった。
Dissolution of the inorganic polysilazane obtained in Reference Example 1 in pyridine!
1. (Inorganic polysilazane concentration, 6.2%) 100 mL was placed in a pressure-resistant reaction vessel with an internal volume of 300 mL, 4.5 g of purified anhydrous ammonia was added, and the reaction was carried out with stirring at 50° C. for 3 hours in a closed system. During this time, a large amount of gas was generated, which was determined to be hydrogen by gas chromatography. The pressure increase before and after the reaction is 1 kg.
/ cllI. After cooling to room temperature, add 300 mL of dry 0-xylene, pressure 3-5 mm 1 g, temperature 50
When the solvent was removed at ~70°C, 8.0g of white powder was obtained.
The powder obtained was soluble in organic solvents. The number average molecular weight of the polymer powder is 2352, and the weight average molecular weight is 10.
735, and the Si/N ratio was 1.05.

実隻孤1 参考例3で得られた改質無機ポリシラザン(数平均分子
量Mn  :2352、重量平均分子量M弱 :107
35、Si/N比: 1.05)の10wt%0−キシ
レン溶液を用い、スピンコーターにより、ソーダガラス
基板へ塗布した。乾燥後、500°CX30m1n、大
気中で熱処理し、5in2膜とした。膜厚は1100人
であった。
Modified inorganic polysilazane obtained in Reference Example 3 (number average molecular weight Mn: 2352, weight average molecular weight M: 107)
A 10 wt % 0-xylene solution of No. 35, Si/N ratio: 1.05) was applied to a soda glass substrate using a spin coater. After drying, it was heat-treated at 500° C. x 30 ml in the air to form a 5in2 film. The film thickness was 1100 people.

ガラス端面及び裏面をシールし、100°CX25h。Seal the edges and back of the glass and heat at 100°C for 25 hours.

超純水中に浸漬し、Na溶出量を分析したところ、0.
161Ig/clであり、素板ソーダガラスの1.68
n/cflに比べ、1/10程度に低下した。また、従
来法(東京応化製OCD使用)による同一膜厚(110
0人)のSiO。コーティングの場合、0.90μg 
/ aflであリ、本発明の方法に従うポリシラザンに
よるSiO。
When immersed in ultrapure water and analyzed the amount of Na elution, it was found to be 0.
161 Ig/cl, and 1.68 for the plain soda glass.
It decreased to about 1/10 compared to n/cfl. In addition, the same film thickness (110
0 people) SiO. For coating, 0.90μg
/ afl and SiO with polysilazane according to the method of the invention.

コーティングの方が、明らかに優れることがわかった。The coating was clearly superior.

災施桝↓ 実施例1(ディッピング法)及び実施例3(スピンコー
ド法の方法に従い、ソーダガラス(厚さ1mm)表面に
SiO□コーティングを施した。
A SiO□ coating was applied to the surface of soda glass (thickness: 1 mm) according to Example 1 (dipping method) and Example 3 (spin cord method).

得られたSiO□コーティングの表面粗さを測定した結
果を下記表に示す。
The results of measuring the surface roughness of the obtained SiO□ coating are shown in the table below.

人 〔発明の効果〕 本発明のセラミックコーティングガラスは緻密性、厚膜
性に優れ、アルカリガラスの保護、ガラスの強度、硬度
、平滑性の向上に効果がある。
[Effects of the Invention] The ceramic coated glass of the present invention has excellent density and thick film properties, and is effective in protecting alkali glass and improving glass strength, hardness, and smoothness.

Claims (1)

【特許請求の範囲】 1、セラミックコーティング膜が珪素及び窒素を必須成
分とし、酸素、水素及び金属類(元素周期律表第 I 族
〜第VIII族の金属元素の群から選択される1種又は2種
以上の金属)の群から選択される少なくとも1種を任意
成分とし、各元素の比率が原子比で表わしてN/Si3
以下、O/Si15以下、M/Si5以下(Mは元素周
期律表第 I 族〜第VIII族の金属元素の群から選択され
る上記1種又は2種以上の金属)であり、かつ非晶質で
あることを特徴とするセラミックコーティングガラス。 2、一般式 ▲数式、化学式、表等があります▼ で表わされる繰り返し単位を有し、数平均分子量が約1
00〜500,000の範囲のポリシラザンをガラス上
に塗布し、焼成することを特徴とするセラミックコーテ
ィングガラスの製造方法。
[Claims] 1. The ceramic coating film contains silicon and nitrogen as essential components, oxygen, hydrogen and metals (one selected from the group of metal elements of Groups I to VIII of the Periodic Table of Elements) or At least one selected from the group of two or more metals is an optional component, and the ratio of each element is expressed as an atomic ratio of N/Si3.
Hereinafter, O/Si is 15 or less, M/Si is 5 or less (M is one or more metals selected from the group of metal elements of Groups I to VIII of the Periodic Table of the Elements), and is amorphous. Ceramic coated glass characterized by its high quality. 2. It has a repeating unit represented by the general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ and the number average molecular weight is approximately 1.
1. A method for producing ceramic coated glass, which comprises applying polysilazane having a molecular weight of 0.00 to 500,000 on glass and firing it.
JP25408090A 1990-09-26 1990-09-26 Method for producing glass protective film Expired - Lifetime JP3207197B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25408090A JP3207197B2 (en) 1990-09-26 1990-09-26 Method for producing glass protective film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25408090A JP3207197B2 (en) 1990-09-26 1990-09-26 Method for producing glass protective film

Publications (2)

Publication Number Publication Date
JPH04132635A true JPH04132635A (en) 1992-05-06
JP3207197B2 JP3207197B2 (en) 2001-09-10

Family

ID=17259949

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3207197B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0947722A (en) * 1995-08-11 1997-02-18 Tokyo Ohka Kogyo Co Ltd Formation of silica based coating film
JPH09183949A (en) * 1995-12-28 1997-07-15 Tonen Corp Article coated with hard coat and method for coating with hard coat
WO2011121811A1 (en) * 2010-03-30 2011-10-06 東洋ガラス株式会社 Glass container and method for treating inner face of glass container
CN113784895A (en) * 2019-05-01 2021-12-10 康宁股份有限公司 Pharmaceutical packaging with a coating comprising polysilazane

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0947722A (en) * 1995-08-11 1997-02-18 Tokyo Ohka Kogyo Co Ltd Formation of silica based coating film
JPH09183949A (en) * 1995-12-28 1997-07-15 Tonen Corp Article coated with hard coat and method for coating with hard coat
WO2011121811A1 (en) * 2010-03-30 2011-10-06 東洋ガラス株式会社 Glass container and method for treating inner face of glass container
CN113784895A (en) * 2019-05-01 2021-12-10 康宁股份有限公司 Pharmaceutical packaging with a coating comprising polysilazane

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