JPH04116453A - Flaw inspecting apparatus - Google Patents
Flaw inspecting apparatusInfo
- Publication number
- JPH04116453A JPH04116453A JP23659190A JP23659190A JPH04116453A JP H04116453 A JPH04116453 A JP H04116453A JP 23659190 A JP23659190 A JP 23659190A JP 23659190 A JP23659190 A JP 23659190A JP H04116453 A JPH04116453 A JP H04116453A
- Authority
- JP
- Japan
- Prior art keywords
- inspected
- beams
- light
- defect
- scanning direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007689 inspection Methods 0.000 claims abstract description 21
- 230000003287 optical effect Effects 0.000 claims abstract description 9
- 238000011835 investigation Methods 0.000 claims 1
- 108091008695 photoreceptors Proteins 0.000 abstract description 8
- 230000007547 defect Effects 0.000 abstract 5
- 230000002950 deficient Effects 0.000 abstract 1
- 238000005259 measurement Methods 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 241000270281 Coluber constrictor Species 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- OQZCSNDVOWYALR-UHFFFAOYSA-N flurochloridone Chemical compound FC(F)(F)C1=CC=CC(N2C(C(Cl)C(CCl)C2)=O)=C1 OQZCSNDVOWYALR-UHFFFAOYSA-N 0.000 description 1
- 108020003175 receptors Proteins 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は傷検査装置に関し、特に大面積平面の高速検査
に適用しうる傷検査装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a flaw inspection device, and more particularly to a flaw inspection device that can be applied to high-speed inspection of large-area planes.
従来の技術としては、例えば、特開昭59−68653
号公報に示されるような物体表面の傷検査方法がある。As a conventional technique, for example, Japanese Patent Application Laid-Open No. 59-68653
There is a method for inspecting flaws on the surface of an object as shown in the above publication.
従来の傷検査装置はレーザ発振器と、コリーメータと、
遮光体および受光体とを含んで構成される。第3図は従
来の傷検査装置の一例を示す断面図である。第3図に示
す傷検査装置は、レーザ発振器3]と、変調器32と、
コリーメータ33と、遮光体34と、受光体35と、受
光体35が光を受けたとき、その光量に比例した信号を
出力する表示器36とを含んでいる。レーサー発振器3
1から発振されるレーザ光を変調器32で変調してコリ
メータ33に入れ、ここてレーザ光を平行光にして物体
の表面に照射する。照射された光は物体の表面で反射さ
れる。このとき、反射光の反射角度は物体の表面の状態
により異なる。即ち、表面に傷が無く、塵芥も付着して
いない正常状態では、反射光の反射パターンが一定面積
に収まるが、表面に傷がついていなり、塵芥が付着して
いる異常状態では、反射光の散乱が大きくなり、正常時
の反射パターン面積の外側にまて散乱する。Conventional flaw inspection equipment uses a laser oscillator, a collimator,
It is configured to include a light shielding body and a light receiving body. FIG. 3 is a sectional view showing an example of a conventional flaw inspection device. The flaw inspection device shown in FIG. 3 includes a laser oscillator 3], a modulator 32,
It includes a collimator 33, a light shield 34, a light receiver 35, and an indicator 36 that outputs a signal proportional to the amount of light when the light receiver 35 receives light. racer oscillator 3
The laser beam oscillated from the laser beam 1 is modulated by a modulator 32 and input into a collimator 33, where the laser beam is converted into parallel light and irradiated onto the surface of the object. The irradiated light is reflected by the surface of the object. At this time, the reflection angle of the reflected light varies depending on the condition of the surface of the object. In other words, in a normal state with no scratches on the surface and no dust attached, the reflection pattern of the reflected light falls within a certain area, but in an abnormal state with scratches on the surface and dust attached, the reflected light The scattering of the light becomes large, and the light is scattered outside the normal reflection pattern area.
そこで、本発明では正常時の反射光パターン上に、少く
ともそのパターンの面積より広い面積の遮光体34を設
けて正常時の反射光を遮断し、遮光体34の外側に受光
体35を設けて、物体の異常時に遮光体34の外側にま
て散乱する異常反射光だけを当該受光体35により受光
するようにしたものである。Therefore, in the present invention, a light shield 34 having an area at least larger than the area of the pattern is provided on the reflected light pattern during normal operation to block the reflected light during normal operation, and a light receptor 35 is provided outside of the light shield 34. Thus, when an object is abnormal, only the abnormal reflected light scattered outside the light shielding body 34 is received by the light receiving body 35.
上述した従来の傷検査装置は、検査精度を高めるために
ビーム径を小さくし分解能を高めていた。In the conventional flaw inspection apparatus described above, the beam diameter is made small to improve resolution in order to improve inspection accuracy.
高精度で、即ち、小さいビームで全て走査を行うために
、検査面が大きくなると検査時間か長くなるという欠点
があった。Since all scanning is performed with high precision, that is, with a small beam, there is a drawback that the larger the inspection surface, the longer the inspection time.
本発明は、第1および第2の光源と、前記2つの光源か
ら出射された光を回転多面鏡により被走査面を走査する
主走査手段と、前記主走査手段による走査方向と直角方
向に前記被走査面を駆動する副走査手段と、前記2つの
光を萌記被走査面−にて互いに異なるビーム径で副走査
方向に隣接させる光学系と、前記2つの光を切換えるシ
ャッタと、前記被走査面からの散乱光を受光する受光手
段より構成されている。The present invention includes first and second light sources, a main scanning means for scanning a surface to be scanned using a rotating polygon mirror with light emitted from the two light sources, and a main scanning means for scanning a surface to be scanned with a rotating polygon mirror, and a sub-scanning means for driving the surface to be scanned; an optical system for directing the two lights to be adjacent to each other in the sub-scanning direction with different beam diameters on the surface to be scanned; a shutter for switching the two lights; and a shutter for switching the two lights; It is composed of a light receiving means that receives scattered light from the scanning surface.
次に、本発明の実施例についで、図面を参照して詳細に
説明する。Next, embodiments of the present invention will be described in detail with reference to the drawings.
第1図は本発明の一実施例を示す斜視図である。FIG. 1 is a perspective view showing an embodiment of the present invention.
第1図の傷検査装置は、2つのレーザ発振器]およびレ
ーザ発振器2と、これらレーザ発振器]および2から出
射されるレーザ光をそれぞれ平行光にするコリーメータ
3およびコリーメータ4と、コリーメータ4て平行光と
なった光を被検査面」二て合焦(ビーム径:約0.1.
mm)させるための光学レンズ5と、レーザ発振器1.
より出射されたビーム6と、レーザ発振器2より出射さ
れたビーム7との光軸を合成するビーム合成器8と、合
成したビーム全体と被検査面の−・軸」−て走査させる
ためのガルバノミラ−9と、被検査面からの散乱光を受
光するための受光体10と、受光体]Oの出力を入力し
、その大きさを示す測定表示器11と、ビーム6および
ビーム7をオンオフするためのシャッタ12およびシャ
ッタと、走査方向と直角方向に被検査物を移動させるス
テージ]4とを含んで構成させる。The flaw inspection apparatus shown in FIG. 1 includes two laser oscillators] and a laser oscillator 2; The parallel light is focused on the surface to be inspected (beam diameter: approx. 0.1 mm).
mm) and a laser oscillator 1.
a beam combiner 8 that combines the optical axes of the beam 6 emitted from the laser oscillator 2 and the beam 7 emitted from the laser oscillator 2; and a galvanometer mirror that scans the entire combined beam with the axis of the surface to be inspected. -9, a photoreceptor 10 for receiving the scattered light from the surface to be inspected, and the output of the photoreceptor ]O, and the measurement display 11 that shows the size, and the beams 6 and 7 are turned on and off. A stage]4 for moving the object to be inspected in a direction perpendicular to the scanning direction.
次に、第1図に示した傷検査装置の作用および動作を順
を追って説明する。Next, the function and operation of the flaw inspection apparatus shown in FIG. 1 will be explained in order.
レーザ発振器1より出射されたビーム6は、コリーメー
タ3でビーム径が約1mmの平行光となる。そして、ビ
ーム合成器8を透過し、ガルバノミラ−9で偏向されて
被検査面上を走査する。受光体10は被検査面での反射
光を直接入射しないよう、その両側に走査方向と平行に
設置する。走査のとき、被検査面上に傷があれば、散乱
光か生して、これが受光体10に入射し、その光量に応
じた出力か測定表示器11より得られる。この出力を予
め設定した値と比較することにより傷の有無を検査する
ことができる。このとき、ステージ14により被検査面
をビーム径の分たば走査方向と直角方向に移動させるこ
とにより、2次元面内の検査が行える。The beam 6 emitted from the laser oscillator 1 is turned into parallel light with a beam diameter of about 1 mm by the collimator 3. Then, the beam passes through the beam combiner 8, is deflected by the galvanometer mirror 9, and scans the surface to be inspected. The photoreceptor 10 is installed on both sides parallel to the scanning direction so that the light reflected from the surface to be inspected does not directly enter the photoreceptor 10 . During scanning, if there is a flaw on the surface to be inspected, scattered light is generated and enters the photoreceptor 10, and an output corresponding to the amount of light is obtained from the measurement display 11. By comparing this output with a preset value, the presence or absence of scratches can be inspected. At this time, by moving the surface to be inspected by the stage 14 in a direction perpendicular to the scanning direction by the beam diameter, inspection within the two-dimensional plane can be performed.
一方、レーザ発振器2から出射されたビーム7は、コリ
ーメータてビーム径を拡大され平行光となる。そして、
光学レンス5を通りビーム合成器8に入射し、直角に偏
向されてビーム6と、このビーム径の半径分だけ平行に
ずれた光軸となってガルバノミラ−9に入射する。この
ガルバノミラ−9により偏向されて被検査面上を走査す
る。On the other hand, the beam 7 emitted from the laser oscillator 2 is expanded in beam diameter by a collimator and becomes parallel light. and,
The beam passes through an optical lens 5 and enters a beam combiner 8, is deflected at right angles, becomes a beam 6, and the optical axis is shifted parallel to the beam by the radius of this beam, and enters a galvanometer mirror 9. It is deflected by this galvano mirror 9 and scans the surface to be inspected.
また、ビーム7は光学レンス5を通っているなめ、ここ
で合焦する(ビーム径 約0.1.mm)。このとき、
被検査面上に傷があれは散乱光が生じ、受光体10で受
光することにより被検査面上での傷の有無を検査できる
。In addition, the beam 7 passes through the optical lens 5 and is focused there (beam diameter: approximately 0.1 mm). At this time,
If there is a flaw on the surface to be inspected, scattered light is generated, and by receiving the light with the photoreceptor 10, it is possible to inspect the presence or absence of a flaw on the surface to be inspected.
ビーム6は被検査面上でのビーム径が大きいため、1回
の走査で大面積の傷検査が行える。Since the beam 6 has a large beam diameter on the surface to be inspected, a large area can be inspected for flaws in one scan.
方、ビーム7は被検査面」二で合焦しているため、1回
の走査では小面積の傷検査しか行えないが、ビーム6に
比べて微小な傷の検査か可能である。On the other hand, since the beam 7 is focused on the surface to be inspected, it is possible to inspect only a small area of flaws in one scan, but compared to the beam 6, it is possible to inspect minute flaws.
また、傷の有無のみでなく、傷の位置、形状等の情報に
ついてもビーム6に比べて詳細に検査できる。Furthermore, compared to the beam 6, it is possible to inspect not only the presence or absence of scratches but also information such as the position and shape of the scratches.
続いて、本発明の傷検査装置による検査方法について説
明する。まず、ビーム7はシャッタにより遮光し、ビー
ム6で傷検査を行う。このとき、ビーム径はビーム7に
比べて大きく、従って、高速で検査が行える。このとき
、被検査面に傷があると、測定表示器11に何らかの出
力変化が生ずる。ビーム径が大きいため傷による出力変
化は相対的に小さく、傷の位置、大きさ等の情報を精度
よく検出できない。しかしながら、この僅かな出力変化
に応じて、ただちにシャッタ12を開き、かつシャッタ
13を閉しでビーム7に切換えて走査を行う。ビーム7
はビーム6に比べてビーム径が小さく、傷の位置、大き
さ等の情報をビーム6での検査を比べて精度よく検出で
きる。Next, an inspection method using the flaw inspection apparatus of the present invention will be explained. First, the beam 7 is blocked by a shutter, and a flaw inspection is performed using the beam 6. At this time, the beam diameter is larger than the beam 7, and therefore inspection can be performed at high speed. At this time, if there is a scratch on the surface to be inspected, some output change will occur on the measurement display 11. Since the beam diameter is large, output changes due to scratches are relatively small, making it impossible to accurately detect information such as the position and size of scratches. However, in response to this slight change in output, the shutter 12 is immediately opened, the shutter 13 is closed, and the beam is switched to beam 7 to perform scanning. beam 7
The beam diameter is smaller than that of beam 6, and information such as the position and size of a flaw can be detected with higher accuracy than when inspecting with beam 6.
第2図にビーム6およびビーム7の位置関係を示す。ビ
ーム7はビーム6と被検査面の移動方向との反対側に隣
接している。FIG. 2 shows the positional relationship between beam 6 and beam 7. Beam 7 is adjacent to beam 6 on the opposite side to the direction of movement of the surface to be inspected.
本発明の傷検査装置は、隣接する大小2つのビームを有
し、傷の有無によりビームを切換えることにより、高速
かつ高精度2に2次元面内の傷検査ができるという効果
がある。The flaw inspection device of the present invention has two adjacent large and small beams, and by switching the beams depending on the presence or absence of flaws, it has the advantage of being able to inspect flaws in a two-dimensional plane at high speed and with high precision.
第1図は本発明の一実施例を示す斜視図、第2図は大小
2つのビームの位置関係を示す斜視図、第3図は従来例
を示す断面図である。
1.2・・・レーザ発振器、3,4・・・コリーメータ
、5・・・光学レンズ、6.7・・・ビーム、8・・・
ビーム合成器、9・・・ガルバノミラ−10・・・受光
体、11・・・測定表示器、12.13・・・シャッタ
、14・・・ステージ。FIG. 1 is a perspective view showing an embodiment of the present invention, FIG. 2 is a perspective view showing the positional relationship between two large and small beams, and FIG. 3 is a sectional view showing a conventional example. 1.2... Laser oscillator, 3, 4... Collimator, 5... Optical lens, 6.7... Beam, 8...
Beam combiner, 9... Galvanometer mirror 10... Photoreceptor, 11... Measurement display, 12.13... Shutter, 14... Stage.
Claims (1)
た光を回転多面鏡により被走査面を走査する主走査手段
と、前記主走査手段による走査方向と直角方向に前記被
走査面を駆動する副捜査手段と、前記2つの光を前記被
走査面上で互いに異なるビーム径で副走査方向に隣接さ
せる光学系と、前記2つの光を切換えるシャッタと、前
記被走査面からの散乱光を受光する受光手段とを備えた
ことを特徴とする傷検査装置。a first and a second light source; a main scanning means for scanning a surface to be scanned using a rotating polygon mirror with light emitted from the two light sources; a sub-investigation means to be driven; an optical system that causes the two lights to be adjacent to each other in the sub-scanning direction with different beam diameters on the surface to be scanned; a shutter to switch the two lights; and scattered light from the surface to be scanned. A flaw inspection device comprising: a light receiving means for receiving light.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23659190A JPH04116453A (en) | 1990-09-06 | 1990-09-06 | Flaw inspecting apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23659190A JPH04116453A (en) | 1990-09-06 | 1990-09-06 | Flaw inspecting apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04116453A true JPH04116453A (en) | 1992-04-16 |
Family
ID=17002915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23659190A Pending JPH04116453A (en) | 1990-09-06 | 1990-09-06 | Flaw inspecting apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04116453A (en) |
-
1990
- 1990-09-06 JP JP23659190A patent/JPH04116453A/en active Pending
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