JPH04107153A - Thick film type thermal head and manufacture therefor - Google Patents
Thick film type thermal head and manufacture thereforInfo
- Publication number
- JPH04107153A JPH04107153A JP22774390A JP22774390A JPH04107153A JP H04107153 A JPH04107153 A JP H04107153A JP 22774390 A JP22774390 A JP 22774390A JP 22774390 A JP22774390 A JP 22774390A JP H04107153 A JPH04107153 A JP H04107153A
- Authority
- JP
- Japan
- Prior art keywords
- overglaze
- thick film
- resistance bodies
- height
- thermal head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims abstract description 34
- 238000000034 method Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 2
- 238000007639 printing Methods 0.000 abstract description 10
- 230000006866 deterioration Effects 0.000 abstract description 3
- 238000007650 screen-printing Methods 0.000 abstract description 3
- 238000002309 gasification Methods 0.000 abstract 1
- 238000013021 overheating Methods 0.000 abstract 1
- 238000000859 sublimation Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000008022 sublimation Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、個別対向型の厚膜型サーマルヘッドに係り、
特に、昇華型プリンタの印字品質を向上させるための、
オーバーグレーズの構造、ならびに、その製造方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an individually facing thick film thermal head,
In particular, to improve the print quality of dye-sublimation printers,
The present invention relates to the structure of an overglaze and its manufacturing method.
(従来の技術)
従来のりフトオフ法による個別対向型の厚膜型サーマル
ヘッドは、発熱抵抗体を形成した後、オーバーグレーズ
層となるオーバーグレーズペーストをスクリーン印刷に
より被膜し、焼成して製造されている。(Prior art) Individually facing thick film type thermal heads using the conventional lift-off method are manufactured by forming a heating resistor, then coating the head with an overglaze paste, which will become an overglaze layer, by screen printing, and then baking the head. There is.
第2図は、上述した従来の厚膜型サーマルヘッドの一部
の抵抗体の周辺の構造を示すものである。FIG. 2 shows the structure around a part of the resistor of the conventional thick-film thermal head described above.
同図(A)はその上面図、同図(B)は同図(A)のb
−b線に沿った断面図、同図(C)は同図(A)のC−
C線に沿った断面図である。図中、1はセラミック基板
、2は共通電極、3は個別電極、4は発熱抵抗体、6は
オーバーグレーズ層である。The same figure (A) is the top view, the same figure (B) is the b of the same figure (A)
-A cross-sectional view taken along the line b, the same figure (C) is the C- of the same figure (A)
It is a sectional view along the C line. In the figure, 1 is a ceramic substrate, 2 is a common electrode, 3 is an individual electrode, 4 is a heating resistor, and 6 is an overglaze layer.
発熱抵抗体4がリフトオフ法で形成され、発熱抵抗体間
に隙間が生じているから、オーバーグレーズ層を形成す
ると、発熱抵抗体上のオーバーグレーズの主走査方向の
断面形状が、同図(C)に示すように、発熱抵抗体上の
凸形状に沿って凸形状7を形成し、発熱抵抗体間のオー
バーグレーズ層は凹み8が生じる。Since the heating resistor 4 is formed by the lift-off method and there are gaps between the heating resistors, when an overglaze layer is formed, the cross-sectional shape of the overglaze on the heating resistor in the main scanning direction is as shown in the same figure (C ), a convex shape 7 is formed along the convex shape on the heat generating resistor, and a recess 8 is formed in the overglaze layer between the heat generating resistors.
この厚膜型サーマルヘッドを昇華型プリンタに搭載して
印字を行なうと、発熱抵抗体上のオーバーグレーズの凸
形状部分が、発熱抵抗体の発熱とともに印画紙表面を押
すことになる。第3図は、印字状況を説明するためのも
のである。昇華型プリンタ用の印画紙9の表面は、熱に
より変形しやすい性質を有している。したがって、表面
付近の断面形状が同図(A)に示すように、発熱抵抗体
間において凹みを呈する厚膜型サーマルヘッドで印字す
ると、同図(B)に上面図、同図(C)に断面図を示し
たように、印画紙9の表面は、発熱抵抗体上のオーバー
グレーズの凸部分7に対する部分がドツトごとに凹部1
0になり、その上にさらに染料が付き、凸形11が発生
する。発熱抵抗体間の凹み8に対する部分は凸部12と
なる。このため、印画紙表面はドツトごとに凹凸が激し
くなり、その結果、印字した画質の劣化を招く。When this thick-film thermal head is installed in a sublimation printer and prints, the convex portion of the overglaze on the heating resistor presses the surface of the photographic paper along with the heat generated by the heating resistor. FIG. 3 is for explaining the printing situation. The surface of photographic paper 9 for a sublimation printer has a property of being easily deformed by heat. Therefore, when printing with a thick-film thermal head in which the cross-sectional shape near the surface shows a recess between the heating resistors as shown in Figure (A), the top view in Figure (B) and the top view in Figure (C) As shown in the cross-sectional view, the surface of the photographic paper 9 has concave portions 1 for each dot in the area corresponding to the convex portion 7 of the overglaze on the heating resistor.
0, more dye is attached on top of it, and a convex shape 11 is generated. The portion corresponding to the recess 8 between the heating resistors becomes a convex portion 12 . For this reason, the surface of the photographic paper becomes extremely uneven on a dot-by-dot basis, resulting in deterioration of the quality of the printed image.
この凹みは、特公昭63−9728号公報に記載されて
いるような焼成条件の改良では対処できないものである
。This depression cannot be overcome by improving the firing conditions as described in Japanese Patent Publication No. 63-9728.
(発明が解決しようとする課題)
本発明は、上述された事情に鑑みてなされたもので、リ
フトオフ法による、個別対向型の厚膜型サーマルヘッド
において、発熱抵抗体上の万一バーグレーズと発熱抵抗
体間上のオーバーグレーズの高さを等しい構造にするこ
とによって、ドツトの再現性の良さを損なうことなく、
昇華型プリンタ等で印字した印画紙表面の凹凸をなくし
、画質を向上できる厚膜型サーマルヘッドを提供すると
ともに、そのための厚膜型サーマルヘッドの製造方法を
提供することを目的とするものである。(Problems to be Solved by the Invention) The present invention has been made in view of the above-mentioned circumstances, and is designed to provide an individually facing thick film thermal head using the lift-off method in the unlikely event that burglaze on the heating resistor is removed. By creating a structure in which the height of the overglaze between the heating resistors is equal, the dot reproducibility is not compromised.
The purpose of the present invention is to provide a thick-film thermal head that can improve image quality by eliminating unevenness on the surface of photographic paper printed by a dye-sublimation printer, etc., and to provide a method for manufacturing the thick-film thermal head for this purpose. .
(課題を解決するための手段)
本発明は、第1発明においては、個別対向の厚膜型サー
マルヘッドにおいて、発熱抵抗体上のオーバーグレーズ
と発熱抵抗体間上のオーバーグレーズの高さが等しいこ
とを特徴とするものであり、第2発明においては、厚膜
型サーマルヘッドの製造方法において、基板上にリフト
オフ法により個別対向の発熱抵抗体を形成した後、オー
バーグレーズ層を発熱抵抗体間のオーバーグレーズの高
さが前記発熱抵抗体の高さより高くなるように形成し、
ついで、オーバーグレーズ層を研磨して表面を平坦化す
ることを特徴とするものである。(Means for Solving the Problems) In the first aspect of the present invention, in the individually facing thick film type thermal head, the height of the overglaze on the heating resistor is equal to the height of the overglaze between the heating resistors. In the second invention, in the method for manufacturing a thick-film thermal head, after forming individual heating resistors facing each other on a substrate by a lift-off method, an overglaze layer is placed between the heating resistors. formed so that the height of the overglaze is higher than the height of the heating resistor,
This method is characterized in that the overglaze layer is then polished to flatten the surface.
(作 用)
本発明は、発熱抵抗体上のオーバーグレーズと発熱抵抗
体間上のオーバーグレーズの高さを等しい構造としたこ
とにより、昇華型プリンタ用の印画紙の表面が、印字の
際に熱が加えられたとしても、発熱抵抗体上のオーバー
グレーズの表面が平坦であるため、印画紙の表面が、変
形することがなく、印画紙表面の凹凸をなくすことがで
きる。(Function) The present invention has a structure in which the height of the overglaze on the heating resistor is equal to the height of the overglaze between the heating resistors, so that the surface of the photographic paper for a sublimation printer can be Even if heat is applied, since the surface of the overglaze on the heating resistor is flat, the surface of the photographic paper will not be deformed, and unevenness on the surface of the photographic paper can be eliminated.
(実施例)
第1図は、本発明の厚膜型サーマルヘッドの一実施例を
説明するための工程図である。第2図と同様な部分には
同じ符号を付して説明を省略する。(Example) FIG. 1 is a process diagram for explaining an example of a thick film type thermal head of the present invention. Components similar to those in FIG. 2 are denoted by the same reference numerals, and description thereof will be omitted.
同図(A)に示すように、セラミック基板1上に、例え
ば、0.3〜3.0μmの厚さのAuからなる導電膜を
形成し、フォトリソエツチング工程により、共通電極2
、個別電極3をパターニングする。発熱抵抗体4は対向
する電極2.3間に設けられることになるが、印字ドツ
トの1ドツトはこの発熱抵抗体と対応するので印字ドツ
トの解像度と電極の配線密度は同一となる。As shown in FIG. 2A, a conductive film made of Au with a thickness of 0.3 to 3.0 μm, for example, is formed on a ceramic substrate 1, and a common electrode 2 is formed by a photolithography process.
, patterning the individual electrodes 3. The heating resistor 4 is provided between the opposing electrodes 2 and 3, and since one of the printed dots corresponds to this heating resistor, the resolution of the printed dots and the wiring density of the electrodes are the same.
次に、膜厚が、例えば、5〜30μm程度の感光性レジ
スト5を周知のロールコータ法、スピンコータ法、ある
いはデイツプ法等を用いて一様に塗布し、フォトマスク
により露光現像し、発熱抵抗体が設けられる箇所に複数
個の開口部5′を形成する。感光性レジスト5は、通常
の混成ICの製造に用いられるレジストを用いればよく
、−例として、本実施例では東京応化工業株式会社製の
ネガ型フォトレジストPMERN−HC600(商品名
)を用いた(同図(B))。Next, a photosensitive resist 5 having a film thickness of, for example, about 5 to 30 μm is uniformly applied using a well-known roll coater method, spin coater method, dip method, etc., and is exposed and developed using a photomask, and the heat-generating resistor 5 is A plurality of openings 5' are formed at the locations where the bodies are provided. As the photosensitive resist 5, a resist used in the production of ordinary hybrid ICs may be used. As an example, in this example, a negative photoresist PMERN-HC600 (trade name) manufactured by Tokyo Ohka Kogyo Co., Ltd. was used. (Figure (B)).
この感光性レジスト5の開口部5゛に対し、開口部面積
より幅広く、感光性レジスト5の膜厚より厚く、例えば
、RuO2(酸化ルテニウム)とガラスフリットからな
る厚膜抵抗体ペースト4′をスクリーン印刷により形成
し、130’C程度で乾燥させる(同図(C))。同図
(D)は、同図(C)のci−d断面を示すものであり
、厚膜抵抗体ペースト4′は、感光性レジスト5を上回
って被着されるとともに、一部が共通電極2、個別電極
3に接触された状態となる。A thick film resistor paste 4' made of, for example, RuO2 (ruthenium oxide) and glass frit is applied to the opening 5' of the photosensitive resist 5 by a screen, which is wider than the area of the opening and thicker than the film thickness of the photosensitive resist 5. It is formed by printing and dried at about 130'C ((C) in the same figure). The same figure (D) shows the ci-d cross section of the same figure (C), and the thick film resistor paste 4' is deposited above the photosensitive resist 5, and part of it is attached to the common electrode. 2. It comes into contact with the individual electrode 3.
次の工程では、同図(E)に示すように、厚膜抵抗体4
′、感光性レジスト5のパターン上の部分が除去される
。同時に、感光性レジスト5の開口部5′に埋め込まれ
た厚膜抵抗体を、感光性レジスト5の厚膜と等しくなる
ように除去する。この際、厚膜抵抗体はまだ乾燥状態で
あるため、非常に柔らかい。したがって、2000〜6
000番のラッピングシートにより容易にラッピング除
去が可能であり、感光性レジスト5を損なうことなく精
度よく除去することができる。In the next step, as shown in the same figure (E), the thick film resistor 4
', the portion of the photosensitive resist 5 on the pattern is removed. At the same time, the thick film resistor embedded in the opening 5' of the photosensitive resist 5 is removed so that it becomes equal to the thick film of the photosensitive resist 5. At this time, the thick film resistor is still dry and therefore very soft. Therefore, 2000-6
Wrapping can be easily removed using a No. 000 wrapping sheet, and the photosensitive resist 5 can be removed with high accuracy without damaging it.
このようにして不必要部分を除去した厚膜抵抗体を、例
えば、800〜900℃程度で焼成することにより、厚
膜抵抗体を焼結させ、同時に感光性レジスト5も焼成、
気化させて除去する。このようにして、同図(F)に示
すように、対向する共通電極2と個別電極3の間に、こ
の厚膜抵抗体により構成される発熱抵抗体4が形成され
る。The thick film resistor from which unnecessary portions have been removed in this way is fired at, for example, about 800 to 900°C to sinter the thick film resistor, and at the same time, the photosensitive resist 5 is also fired.
Remove by vaporization. In this way, as shown in FIG. 2F, a heat generating resistor 4 made of this thick film resistor is formed between the common electrode 2 and the individual electrodes 3 which face each other.
その後、同図(G)に示すように、耐摩耗層としてオー
バーグレーズ層6をスクリーン印刷により形成し、例え
ば800〜900°Cで焼成する。Thereafter, as shown in FIG. 6G, an overglaze layer 6 is formed as an abrasion resistant layer by screen printing, and is fired at, for example, 800 to 900°C.
オーバーグレーズ層6に関しては、焼成後において、同
図(H)に示すように、発熱抵抗体4の間におけるオー
バーグレーズの高さが、発熱抵抗体4の高さより高くな
るようにする。このためには粘度、ぬれ性などの適当な
オーバーグレーズペーストを選択するか、多層印刷をす
ればよい。Regarding the overglaze layer 6, after firing, the height of the overglaze between the heat generating resistors 4 is made to be higher than the height of the heat generating resistors 4, as shown in FIG. For this purpose, select an overglaze paste with appropriate viscosity and wettability, or perform multilayer printing.
その後、2000〜5000番のラッピングシートでオ
ーバーグレーズ層6の表面を研磨することによって、同
図(I)に示すように、発熱抵抗体上と発熱抵抗体間上
のオーバーグレーズの高さが等しくなるようにして、主
走査方向を平坦化することができる。Thereafter, by polishing the surface of the overglaze layer 6 with a lapping sheet of No. 2000 to 5000, the height of the overglaze on the heating resistor and between the heating resistors is equalized, as shown in FIG. In this way, the main scanning direction can be flattened.
なお、この実施例では、オーバーグレーズの材料として
、LS201を用い、2層印刷を行なった。In this example, LS201 was used as the overglaze material and two-layer printing was performed.
以上のようにして作製された厚膜型サーマルヘッドによ
る印字結果を第4図に示す。発熱抵抗体の表面付近の断
面形状は、同図(A)に示すように、その表面が平坦で
あるため、この厚膜型サーマルヘッドで印字すると、同
図(B)に上面図、同図(C)に断面図を示したように
、印字した印画紙9の表面には、印画紙に移った昇華染
料による突起11が存在するだけで、第3図で説明した
ような抵抗体上のオーバーグレーズによる圧痕はまった
くなく、画質の良好な印字を行なうことができた。FIG. 4 shows the printing results using the thick film type thermal head produced as described above. The cross-sectional shape near the surface of the heating resistor is flat as shown in Figure (A), so when printing with this thick film type thermal head, the top view and Figure 2 (B) are the same. As shown in the cross-sectional view in (C), there are only protrusions 11 on the surface of the printed photographic paper 9 due to the sublimation dye transferred to the photographic paper, and there are no protrusions 11 on the resistor as explained in FIG. There were no impressions caused by overglaze, and it was possible to print with good image quality.
(発明の効果)
以上の説明から明らかなように、本発明によれば、抵抗
体上のオーバーグレーズが主走査方向に平坦化され、昇
華型プリンタ等による印字記録において、印画紙表面の
凹凸による画質の劣化のない良好な画質の印字を行なう
ことができる効果がある。(Effects of the Invention) As is clear from the above description, according to the present invention, the overglaze on the resistor is flattened in the main scanning direction, and the overglaze caused by the unevenness on the surface of the photographic paper is This has the effect of making it possible to print with good image quality without deterioration of image quality.
第1図は、本発明の厚膜型サーマルヘッドの一実施例を
説明するための工程図、第2図は、従来の厚膜型サーマ
ルヘッドの説明図、第3図、第4図は、従来の厚膜型サ
ーマルヘッドと本発明の厚膜型サーマルヘッドによる印
字結果の説明図である。
1・・・セラミック基板、2・・・共通電極、3・・・
個別電極、4・・・発熱抵抗体、6・・・オーバーグレ
ーズ層。
特許圧願人 富士ゼロックス株式金社FIG. 1 is a process diagram for explaining an embodiment of the thick film type thermal head of the present invention, FIG. 2 is an explanatory diagram of a conventional thick film type thermal head, and FIGS. 3 and 4 are FIG. 3 is an explanatory diagram of printing results by a conventional thick film thermal head and a thick film thermal head according to the present invention. 1... Ceramic substrate, 2... Common electrode, 3...
Individual electrode, 4... heating resistor, 6... overglaze layer. Patent applicant: Fuji Xerox Co., Ltd.
Claims (2)
抵抗体上のオーバーグレーズと発熱抵抗体間上のオーバ
ーグレーズの高さが等しいことを特徴とする厚膜型サー
マルヘッド。(1) A thick-film thermal head in which the overglaze on the heat-generating resistors and the overglaze between the heat-generating resistors are equal in height in the individually facing thick-film thermal head.
体を形成した後、オーバーグレーズ層を発熱抵抗体間の
オーバーグレーズの高さが前記発熱抵抗体の高さより高
くなるように形成し、ついで、オーバーグレーズ層を研
磨して表面を平坦化することを特徴とする厚膜型サーマ
ルヘッドの製造方法。(2) After forming individual heating resistors facing each other on the substrate by a lift-off method, an overglaze layer is formed so that the height of the overglaze between the heating resistors is higher than the height of the heating resistors, and then A method for manufacturing a thick-film thermal head, comprising polishing an overglaze layer to flatten the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22774390A JPH04107153A (en) | 1990-08-28 | 1990-08-28 | Thick film type thermal head and manufacture therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22774390A JPH04107153A (en) | 1990-08-28 | 1990-08-28 | Thick film type thermal head and manufacture therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04107153A true JPH04107153A (en) | 1992-04-08 |
Family
ID=16865678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22774390A Pending JPH04107153A (en) | 1990-08-28 | 1990-08-28 | Thick film type thermal head and manufacture therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04107153A (en) |
-
1990
- 1990-08-28 JP JP22774390A patent/JPH04107153A/en active Pending
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