JPH0410690Y2 - - Google Patents
Info
- Publication number
- JPH0410690Y2 JPH0410690Y2 JP7279387U JP7279387U JPH0410690Y2 JP H0410690 Y2 JPH0410690 Y2 JP H0410690Y2 JP 7279387 U JP7279387 U JP 7279387U JP 7279387 U JP7279387 U JP 7279387U JP H0410690 Y2 JPH0410690 Y2 JP H0410690Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- flow path
- storage groove
- substrate processing
- lid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 80
- 238000004140 cleaning Methods 0.000 claims description 70
- 239000000758 substrate Substances 0.000 claims description 26
- 238000007789 sealing Methods 0.000 claims description 14
- 239000003638 chemical reducing agent Substances 0.000 claims description 9
- 238000005530 etching Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 5
- 239000003595 mist Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7279387U JPH0410690Y2 (zh) | 1987-05-14 | 1987-05-14 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7279387U JPH0410690Y2 (zh) | 1987-05-14 | 1987-05-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63180927U JPS63180927U (zh) | 1988-11-22 |
JPH0410690Y2 true JPH0410690Y2 (zh) | 1992-03-17 |
Family
ID=30916560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7279387U Expired JPH0410690Y2 (zh) | 1987-05-14 | 1987-05-14 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0410690Y2 (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100344092B1 (ko) * | 1998-12-29 | 2002-11-23 | 주식회사 에스아이테크 | 반도체 장비의 덮개 구조 |
JP3428969B2 (ja) * | 2001-03-30 | 2003-07-22 | 住友精密工業株式会社 | 内部気体の漏出遮断構造を備えた容器 |
-
1987
- 1987-05-14 JP JP7279387U patent/JPH0410690Y2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS63180927U (zh) | 1988-11-22 |
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