JPH0410646A - Package for housing glass-sealed semiconductor element - Google Patents

Package for housing glass-sealed semiconductor element

Info

Publication number
JPH0410646A
JPH0410646A JP11412890A JP11412890A JPH0410646A JP H0410646 A JPH0410646 A JP H0410646A JP 11412890 A JP11412890 A JP 11412890A JP 11412890 A JP11412890 A JP 11412890A JP H0410646 A JPH0410646 A JP H0410646A
Authority
JP
Japan
Prior art keywords
semiconductor element
glass
weight
oxide
external lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11412890A
Other languages
Japanese (ja)
Other versions
JP2759300B2 (en
Inventor
Masaaki Iguchi
井口 公明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP11412890A priority Critical patent/JP2759300B2/en
Publication of JPH0410646A publication Critical patent/JPH0410646A/en
Application granted granted Critical
Publication of JP2759300B2 publication Critical patent/JP2759300B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To prevent a crack from being produced even under a sverere condition in a high-temperature atmosphere, provide perfect air-tight sealing, and make it possible to normally and stably operate a semiconductor element for a long time by using crystalline glass of a specified composition as glass members to fix external lead terminals to the upper face of an insulating substrate. CONSTITUTION:Recesses to contain a semiconductor element 3 are made in the center of an insulating substrate 1 and the center of a lid 2 and the semiconductor element 3 is fastened to the bottom of the recess 1a of the insulating substrate 1 with bond such as a brazing filler material. One end of each metallic external lead terminal 4 is fixed to the upper face of the insulating substrate 1 with glass members 5 and the electrodes of the semiconductor element 3 are electrically connected to the external lead terminals 4 with wires 6. The glass members 5 to fix the external lead terminals 4 to the upper face of the insulating substrate 1 are made of crystal glass composed of 55.0-60.0wt.% lead oxide, 7.0-11.0wt.% silicon oxide, 5.5-9.5wt.% boron oxide, 0.2-3.0wt.% aluminum oxide, and 20.0-30.0wt.% zinc oxide and are not softened and molten after crystallization unless they are exposed at a very high temperature.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は半導体素子を収容するための半導体素子収納用
パッケージに関し、より詳細にはガラス溶着によってパ
ッケージの封止を行うガラス封止型半導体素子収納用パ
ッケージの改良に関するものである。
Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a semiconductor element storage package for accommodating a semiconductor element, and more particularly to a glass-sealed semiconductor element in which the package is sealed by glass welding. This invention relates to improvements to storage packages.

(従来技術及びその課題) 従来、半導体素子、特に半導体集積回路素子を収容する
ためのガラス封止型半導体素子収納用パッケージは、ア
ルミナセラミックス等の電気絶縁材料から成り、中央部
に半導体素子を収容するための方形状の凹部を有し、上
面に封止用の低融点非晶質ガラス層が被着された絶縁基
体と、同じく電気絶縁材料から成り、中央部に半導体素
子を収容するための凹部を有し、下面に封止用の低融点
非晶質ガラス層が被着された蓋体と、内部に収容する半
導体素子を外部の電気回路に電気的に接続するための外
部リード端子とにより構成されており、絶縁基体の上面
に外部リード端子を載置させるとともに予め被着させて
おいた封止用の低融点非晶質ガラス層を溶融させること
によって外部す−ド端子を絶縁基体に仮止めし、次に前
記絶縁基体の凹部に半導体素子を取着するとともに該半
導体素子の各電極をボンディングワイヤを介して外部リ
ード端子に接続し、しかる後、絶縁基体と蓋体とをその
相対向する主面に被着させておいた封止用の低融点非晶
質ガラス層を溶融一体止させ、絶縁基体と蓋体とから成
る絶縁容器を気密に封止することによって半導体装置と
なる。
(Prior art and its problems) Conventionally, a glass-sealed semiconductor device storage package for accommodating a semiconductor device, especially a semiconductor integrated circuit device, is made of an electrically insulating material such as alumina ceramics, and the semiconductor device is housed in the center. The insulating base has a rectangular recess for accommodating the semiconductor element, and a low melting point amorphous glass layer for sealing is adhered to the upper surface of the insulating base. A lid body having a concave portion and having a low melting point amorphous glass layer adhered to the bottom surface for sealing, and an external lead terminal for electrically connecting a semiconductor element housed inside to an external electric circuit. The external lead terminal is placed on the top surface of the insulating base, and the external lead terminal is placed on the insulating base by melting the low melting point amorphous glass layer for sealing that has been applied in advance. Next, a semiconductor element is attached to the recessed part of the insulating base, and each electrode of the semiconductor element is connected to an external lead terminal via a bonding wire. After that, the insulating base and the lid are attached to each other. A semiconductor device and Become.

しかし乍ら、この従来のガラス封止型半導体素子収納用
パッケージは半導体素子を絶縁基体の凹部に取着する際
、半導体素子の取着を強固とするために絶縁基体を約4
50°Cの温度に加熱しており、該加熱によって絶縁基
体の上面に外部リード端子を仮止めしている封止用の低
融点非晶質ガラス層が軟化溶融してしまい、絶縁基体の
上面における外部リード端子の取着位置が変動し、外部
リード端子と絶縁基体との相対的位置決めが困難となる
欠点を有していた。
However, in this conventional glass-sealed package for storing semiconductor elements, when attaching the semiconductor element to the recess of the insulating base, the insulating base is approximately
It is heated to a temperature of 50°C, and due to the heating, the low melting point amorphous glass layer for sealing, which temporarily fixes the external lead terminals on the top surface of the insulating base, softens and melts, causing the top surface of the insulating base to melt. The attachment position of the external lead terminal fluctuates, making it difficult to relatively position the external lead terminal and the insulating base.

またこの時、溶融した低融点非晶質ガラスの一部が絶縁
基体の凹部内に流れ込んで半導体素子に接触し、半導体
素子の特性に劣化を招来してしまうという欠点も有して
いた。
Further, at this time, a portion of the molten low-melting amorphous glass flows into the recess of the insulating substrate and comes into contact with the semiconductor element, resulting in deterioration of the characteristics of the semiconductor element.

そこで上記欠点を解消するために絶縁基体上に外部リー
ド端子を固定するガラスとして半導体素子の取着固定の
熱によっても軟化溶融しない高融点の結晶質ガラスを使
用することが提案されている(案分昭和63−3166
号参照)。
Therefore, in order to eliminate the above-mentioned drawbacks, it has been proposed to use crystalline glass with a high melting point that does not soften or melt even with the heat of mounting and fixing semiconductor elements as the glass for fixing external lead terminals on the insulating substrate. Branch Showa 63-3166
(see issue).

しかし乍ら、この結晶質ガラスは一般に酸化鉛(PbO
) 61.0重量%、酸化亜鉛(ZnO) 9.3重量
%、酸化ジルコニウム(ZrO□)9.2重量%、シリ
カ(Si02) 8.4重量%及び酸化ホウ素(B20
*) 8.8重量%から成り、その熱膨張係数は約80
XIO−7/ °Cで半導体素子収納用パッケージの絶
縁基体及び蓋体を形成するアルミナセラミックスの熱膨
張係数(65〜75X10−7/ °C)と差異を有す
る。
However, this crystalline glass is generally lead oxide (PbO).
) 61.0% by weight, zinc oxide (ZnO) 9.3% by weight, zirconium oxide (ZrO□) 9.2% by weight, silica (Si02) 8.4% by weight, and boron oxide (B20)
*) It consists of 8.8% by weight, and its coefficient of thermal expansion is approximately 80.
The coefficient of thermal expansion at XIO-7/°C is different from that of alumina ceramics (65 to 75 x 10-7/°C) which forms the insulating base and lid of the package for storing semiconductor elements.

そのためこの半導体素子収納用パッケージの内部に半導
体素子を収容し半導体装置と成した後、該半導体装置を
外部回路基板上にリフロー半田等の高温雰囲気による過
酷な条件のもとで取着接続させた場合、結晶質ガラスと
絶縁基体との間に両者の熱膨張係数の相違に起因して生
じる応力によって結晶質ガラスにクラックが発生し、そ
の結果、容器の気密封止が破れ、絶縁容器内部に収容す
る半導体素子を長期間にわたり正常、且つ安定に作動さ
せることができないという解決すべき課題を有していた
Therefore, after a semiconductor element is housed inside this semiconductor element storage package to form a semiconductor device, the semiconductor device is attached and connected to an external circuit board under harsh conditions such as reflow soldering in a high-temperature atmosphere. In this case, the stress generated between the crystalline glass and the insulating substrate due to the difference in their thermal expansion coefficients causes cracks in the crystalline glass, which breaks the hermetic seal of the container and causes damage inside the insulating container. There was a problem to be solved in that it was not possible to operate the semiconductor elements accommodated normally and stably for a long period of time.

(発明の目的) 本発明は上述の諸欠点に鑑み案出されたものでその目的
はりフロー半田等の高温雰囲気による過酷な条件が印加
されたとしても結晶質ガラスにクラックが発生するのを
皆無となし、半導体素子を収容する絶縁容器の気密封止
を完全として絶縁容器内部に収容する半導体素子を長期
間にわたり正常、且つ安定に作動させることができる半
導体素子収納用パッケージを提供することにある。
(Object of the Invention) The present invention was devised in view of the above-mentioned drawbacks, and its purpose is to eliminate the occurrence of cracks in crystalline glass even under harsh conditions caused by high-temperature atmospheres such as flow soldering. An object of the present invention is to provide a package for storing a semiconductor element, which completely hermetically seals an insulating container housing the semiconductor element and allows the semiconductor element housed inside the insulating container to operate normally and stably for a long period of time. .

(課題を解決するための手段) 本発明は半導体素子を外部回路に電気的に接続する外部
リード端子が熔融結晶化させた結晶質ガラスによって固
着された絶縁基体と、前記結晶質ガラスより低い温度で
軟化溶融するガラス部材を備えた蓋体とから成り、前記
蓋体のガラス部材を絶縁基体上に加熱溶融させ、絶縁基
体と蓋体とを接合させることによって内部に半導体素子
を気密に封入するようになしたガラス封止型半導体素子
収納用パッケージにおいて、前記結晶質ガラスが酸化鉛
55.0乃至60.0重量%、酸化シリコン7.0乃至
11.0重量%、酸化ホウ素5.5乃至9.5重量%、
酸化アルミニウム0.2乃至3.0重量%、酸化亜鉛2
0.0乃至30.0重量%から成ることを特徴とするも
のである。
(Means for Solving the Problems) The present invention provides an insulating substrate in which an external lead terminal for electrically connecting a semiconductor element to an external circuit is fixed to a crystalline glass that is melt-crystallized, and a temperature lower than that of the crystalline glass. The semiconductor element is hermetically sealed inside by heating and melting the glass member of the lid onto an insulating base and joining the insulating base and the lid. In the glass-sealed semiconductor device storage package, the crystalline glass contains 55.0 to 60.0% by weight of lead oxide, 7.0 to 11.0% by weight of silicon oxide, and 5.5 to 11.0% by weight of boron oxide. 9.5% by weight,
Aluminum oxide 0.2 to 3.0% by weight, zinc oxide 2
It is characterized by comprising 0.0 to 30.0% by weight.

(実施例) 次に本発明を添付図面に基づき詳細に説明する。(Example) Next, the present invention will be explained in detail based on the accompanying drawings.

第1図は本発明のガラス封止型半導体素子収納用パッケ
ージの一実施例を示し、1はアルミナセラミックス等の
電気絶縁材料より成る絶縁基体、2は同じく電気絶縁材
料より成る蓋体である。この絶縁基体lと蓋体2とによ
り半導体素子3を収容する絶縁容器が構成される。
FIG. 1 shows an embodiment of the glass-sealed semiconductor element storage package of the present invention, in which 1 is an insulating base made of an electrically insulating material such as alumina ceramics, and 2 is a lid also made of an electrically insulating material. The insulating base 1 and the lid 2 constitute an insulating container in which the semiconductor element 3 is housed.

前記絶縁基体l及び蓋体2にはそれぞれの中央部に半導
体素子3を収容するための凹部が設けて=6 あり、絶縁基体1の凹部1a底面には半導体素子3がロ
ウ材等の接着材を介し取着固定される。
The insulating base 1 and the lid 2 each have a recess in the center thereof for accommodating the semiconductor element 3, and the semiconductor element 3 is placed on the bottom surface of the recess 1a of the insulating base 1 with adhesive such as brazing material. It is attached and fixed through.

尚、前記絶縁基体l及び蓋体2は従来周知のプレス成形
法を採用することによって形成され、例えば絶縁基体l
及び蓋体2がアルミナセラミックスから成る場合には第
1図に示すような絶縁基体lまたは蓋体2に対応した形
状を有するプレス型内にアルミナセラミックスの粉末を
充填させるとともに一定圧力を印加して成形し、しかる
後、成形品を約1500°Cの温度で焼成することによ
って製作される。
Note that the insulating base l and the lid body 2 are formed by employing a conventionally well-known press molding method, for example, the insulating base l and the lid body 2 are
When the lid body 2 is made of alumina ceramics, alumina ceramic powder is filled into a press mold having a shape corresponding to the insulating base l or the lid body 2 as shown in FIG. 1, and a constant pressure is applied. It is manufactured by molding and then firing the molded product at a temperature of about 1500°C.

前記絶縁基体lはその上面にコバール(Fe−Ni−C
o合金)や42Alloy(Fe−Ni合金)等の金属
材料から成る外部リード端子4の一端がガラス部材5に
より固着されており、該外部リード端子4は半導体素子
3の各電極がワイヤ6を介し電気的に接続され、外部リ
ード端子4を外部回路に接続することにより半導体素子
3は外部回路と接続されることとなる。
The insulating substrate l has Kovar (Fe-Ni-C) on its upper surface.
One end of an external lead terminal 4 made of a metal material such as O alloy) or 42Alloy (Fe-Ni alloy) is fixed by a glass member 5, and each electrode of the semiconductor element 3 is connected to the external lead terminal 4 through a wire 6. By electrically connecting the external lead terminals 4 to the external circuit, the semiconductor element 3 is connected to the external circuit.

前記外部リード端子4を絶縁基体1上面に固着するガラ
ス部材5は酸化鉛55.0乃至60.0重量%、酸化シ
リコン7.0乃至11.0重量%、酸化ホウ素5゜5乃
至9.5重量%、酸化アルミニウム0.2乃至3゜0重
量%、酸化亜鉛20.0乃至3060重量%の結晶質ガ
ラスより成り、該結晶質ガラスから成るガラス部材5は
一旦結晶化すると極めて高い温度(例えば約600°C
前後)にしない限り軟化、溶融することはなく、従って
外部リード端子4がガラス部材5を介して固着された絶
縁基体lの凹部1aに半導体素子3を取着する際、該半
導体素子3の取着強度を強固とするために絶縁基体1を
約450°Cに加熱したとしてもガラス部材5は軟化、
溶融することはなく、外部リード端子4の絶縁基体1上
面における相対的な位置決めを完全なものとなすととも
にガラス部材5が溶融し半導体素子3に接触して半導体
素子3の特性に劣化をきたすこともない。
The glass member 5 for fixing the external lead terminal 4 to the upper surface of the insulating base 1 contains 55.0 to 60.0% by weight of lead oxide, 7.0 to 11.0% by weight of silicon oxide, and 5.5 to 9.5% by weight of boron oxide. The glass member 5 is made of crystalline glass containing 0.2 to 30% by weight of aluminum oxide and 20.0 to 3060% by weight of zinc oxide. Approximately 600°C
Therefore, when attaching the semiconductor element 3 to the recess 1a of the insulating base l to which the external lead terminal 4 is fixed via the glass member 5, the semiconductor element 3 will not soften or melt unless it is Even if the insulating substrate 1 is heated to about 450°C to strengthen the adhesive strength, the glass member 5 will soften.
Without melting, the relative positioning of the external lead terminal 4 on the upper surface of the insulating base 1 is perfected, and the glass member 5 melts and comes into contact with the semiconductor element 3, causing deterioration in the characteristics of the semiconductor element 3. Nor.

また前記ガラス部材5はその熱膨張係数が62×JO−
7/’Cであり、絶縁基体lを形成するアルミナセラミ
ックスの熱膨張係数と近似することからりフロー半田等
の高温雰囲気が印加されたとしても一 フロー半田等の高温雰囲気が印加されたとしても絶縁基
体1とガラス部材5との間に両者の熱膨張係数の相違に
起因して生じる応力によってガラス部材5にクラックが
発生することは一切なく、絶縁容器の気密封止を常に完
全となし、絶縁容器内部に収容する半導体素子を長期間
にわたり正常、且つ安定に作動させることが可能となる
Further, the glass member 5 has a coefficient of thermal expansion of 62×JO−
7/'C, which approximates the coefficient of thermal expansion of the alumina ceramics forming the insulating substrate l. The glass member 5 never cracks due to the stress generated between the insulating base 1 and the glass member 5 due to the difference in their coefficients of thermal expansion, and the insulating container is always completely hermetically sealed. It becomes possible to operate the semiconductor element housed inside the insulating container normally and stably for a long period of time.

尚、前記ガラス部材5は酸化鉛(PbO)が55.0重
量%未満であると熱膨張係数が小さくなってガラス部材
5の熱膨張係数が絶縁基体lの熱膨張係数と合わなくな
り、また60.0重量%を越えるとガラス部材5の耐薬
品性が劣化して絶縁容器の気密封止の信頼性が大きく低
下するため酸化鉛(PbO)は55.0乃至60.0重
量%の範囲に限定される。
Incidentally, if the lead oxide (PbO) content of the glass member 5 is less than 55.0% by weight, the coefficient of thermal expansion of the glass member 5 will become small and the coefficient of thermal expansion of the glass member 5 will not match that of the insulating substrate l; If it exceeds .0% by weight, the chemical resistance of the glass member 5 will deteriorate and the reliability of hermetic sealing of the insulating container will be greatly reduced, so lead oxide (PbO) should be in the range of 55.0 to 60.0% by weight. Limited.

また酸化シリコン(SiO□)が7.0重量%未満であ
ると熱膨張係数が大きくなって絶縁基体1の熱膨張係数
と合わなくなるとともにガラス部材5の流動性が損なわ
れ、絶縁容器の気密封止が困難となってしまい、また1
1.0重量%を越えるとガラスの溶融温度が上がり絶縁
容器内部に収容する半導体素子に熱劣化を招来させるこ
とから酸化シリコン(SiO□)は7.0乃至11.0
重量%の範囲に限定される。
Furthermore, if silicon oxide (SiO□) is less than 7.0% by weight, the coefficient of thermal expansion becomes too large to match that of the insulating substrate 1, and the fluidity of the glass member 5 is impaired, resulting in the airtight sealing of the insulating container. It became difficult to stop, and it happened again.
If the content exceeds 1.0% by weight, the melting temperature of the glass will rise, causing thermal deterioration of the semiconductor elements housed inside the insulating container.
% by weight.

また酸化ホウ素(B2o3)が5.5重量%未満である
とガラス部材5の熱膨張係数が大きくなって絶縁基体1
の熱膨張係数と合わなくなり、また9、5重量%を越え
るとガラス部材5の耐薬品性が劣化して絶縁容器の気密
封止の信頼性が大きく低下するため酸化ホウ素(B20
a)は5.5乃至9.5重量%の範囲に限定される。
Further, if boron oxide (B2o3) is less than 5.5% by weight, the coefficient of thermal expansion of the glass member 5 becomes large and the insulating base 1
Boron oxide (B20
a) is limited to a range of 5.5 to 9.5% by weight.

また酸化アルミニウム(Alz03)が0.2重量%未
満であるとガラスの流動性が損なわれ絶縁容器の気密封
止が困難となってしまい、また3、0重量%を越えると
ガラス部材5の熱膨張係数が小さくなって絶縁基体1の
熱膨張係数と合わなくなることから酸化アルミニウム(
AlzOs)は0.2乃至3.0重量%の範囲に限定さ
れる。
Also, if aluminum oxide (Alz03) is less than 0.2% by weight, the fluidity of the glass will be impaired and it will be difficult to hermetically seal the insulating container, and if it exceeds 3.0% by weight, the heat of the glass member 5 will be reduced. Aluminum oxide (
AlzOs) is limited to a range of 0.2 to 3.0% by weight.

また酸化亜鉛(ZnO)が20.0重量%未満であると
ガラス結晶化が困難となって外部リード端子4を強固に
固定することができなくなり、また30.0重量%を越
えるとガラスの流動性が損なわれ絶縁容器の気密封止が
困難となってしまうことから酸化亜鉛(ZnO)は20
.0乃至30.0重量%の範囲に限定される。
If zinc oxide (ZnO) is less than 20.0% by weight, it will be difficult to crystallize the glass, making it impossible to firmly fix the external lead terminal 4, and if it exceeds 30.0% by weight, the glass will flow. Zinc oxide (ZnO) is
.. It is limited to a range of 0 to 30.0% by weight.

前記ガラス部材5を用いて外部リード端子4を絶縁基体
1の上面に固着する方法としては、まず上述したガラス
原料粉末に適当な溶剤を添加し、ガラスペーストを作る
とともにこのガラスペーストを従来周知のスクリーン印
刷法により絶縁基体1の上面に印刷塗布させ、次に前記
絶縁基体1に塗布したガラスペースト上に外部リード端
子4の一端を載置するとともにこれを約500°Cの温
度に加熱し、ガラスペーストを加熱溶融させ、結晶状態
と成すことによって行われる。
The method for fixing the external lead terminals 4 to the upper surface of the insulating substrate 1 using the glass member 5 is as follows: First, a suitable solvent is added to the above-mentioned glass raw material powder to make a glass paste, and this glass paste is processed using a conventionally well-known method. The top surface of the insulating base 1 is printed and coated using a screen printing method, and then one end of the external lead terminal 4 is placed on the glass paste applied to the insulating base 1 and heated to a temperature of about 500°C. This is done by heating and melting the glass paste to bring it into a crystalline state.

また前記蓋体2にはその下面に低融点の非晶質ガラスか
ら成るガラス部材7が被着されており、該ガラス部材7
は蓋体2を絶縁基体l上面に取着し、絶縁容器の内部を
気密に封止する作用を為す。
Further, a glass member 7 made of amorphous glass with a low melting point is attached to the lower surface of the lid body 2.
The lid body 2 is attached to the upper surface of the insulating base l, and serves to airtightly seal the inside of the insulating container.

尚、前記ガラス部材7は酸化鉛(PbO) 75重量%
、酸化チタン(TiO+) 9.0重量%、酸化ホウ素
(B20a)7.5重量%°、酸化亜鉛(ZnO)2.
0重量%等から成り、該ガラス原料粉末に適当な溶剤を
添加して得たガラスペーストを従来周知のスクリーン印
刷等の厚膜手法を採用することにより蓋体2の下面に所
望厚みに被着形成される。
Note that the glass member 7 contains 75% by weight of lead oxide (PbO).
, titanium oxide (TiO+) 9.0% by weight, boron oxide (B20a) 7.5% by weight, zinc oxide (ZnO) 2.
A glass paste obtained by adding an appropriate solvent to the glass raw material powder is applied to the lower surface of the lid body 2 to a desired thickness by employing a conventionally well-known thick film method such as screen printing. It is formed.

前記ガラス部材7はその軟化、溶融温度が約400℃前
後の低いものであることから、該ガラス部材7を約40
0°Cの温度に加熱し、蓋体2を絶縁基体1上面に取着
して絶縁容器を気密封止する際、絶縁基体l上面に取着
されているガラス部材5に気密封止の熱が印加されたと
してもガラス部材5は軟化溶融することは一切なく、外
部リード端子4を常に所定位置に固定しておくことがで
きる。
Since the glass member 7 has a low softening and melting temperature of about 400°C, the glass member 7 is heated at a temperature of about 40°C.
When heating to a temperature of 0°C and attaching the lid 2 to the top surface of the insulating base 1 to hermetically seal the insulating container, the heat of the hermetic sealing is applied to the glass member 5 attached to the top surface of the insulating base 1. Even if the external lead terminal 4 is applied, the glass member 5 never softens or melts, and the external lead terminal 4 can always be fixed at a predetermined position.

かくしてこの半導体素子収納用パッケージによれば絶縁
基体lの凹部1a底面に半導体素子3を取着固定すると
ともに該半導体素子3の各電極をワイヤ6により外部リ
ード端子4に接続させ、しかる後、絶縁基体1と蓋体2
とを蓋体2の下面に予め被着させておいたガラス部材7
を加熱溶融させ、接合させることによって内部に半導体
素子3を気密に封止し、これによって最終製品としての
半導−11= 体装置が完成する。
Thus, according to this semiconductor element storage package, the semiconductor element 3 is attached and fixed to the bottom surface of the recess 1a of the insulating base l, and each electrode of the semiconductor element 3 is connected to the external lead terminal 4 by the wire 6, and then the insulation is removed. Base body 1 and lid body 2
The glass member 7 has been previously attached to the lower surface of the lid body 2.
By heating and melting and bonding, the semiconductor element 3 is hermetically sealed inside, thereby completing a semiconductor device as a final product.

(発明の効果) 本発明は絶縁基体の上面に外部リード端子を固着するガ
ラス部材として酸化鉛55.0乃至60.0重量%、酸
化シリコン7.0乃至11.0重量%、酸化ホウ素5.
5乃至9.5重量%、酸化アルミニウム0.2乃至3.
0重量%、酸化亜鉛20.0乃至30.0重量%から成
る結晶質ガラスを使用したことから絶縁基体の凹部内に
半導体素子を取着する際、該半導体素子の取着強度を強
固とするために絶縁基体を約450°Cに加熱したとし
ても外部リード端子を固着するガラス部材は軟化、溶融
することが一切なく、外部リード端子の絶縁基体上面に
おける相対的な位置決めを完全なものとなすとともにガ
ラス部材が溶融し半導体素子に接触して半導体素子の特
性に劣化をきたすこともない。
(Effects of the Invention) The present invention uses 55.0 to 60.0% by weight of lead oxide, 7.0 to 11.0% by weight of silicon oxide, and 5.0% by weight of boron oxide as a glass member for fixing external lead terminals to the upper surface of an insulating substrate.
5-9.5% by weight, aluminum oxide 0.2-3.
Since the crystalline glass containing 0% by weight and 20.0 to 30.0% by weight of zinc oxide is used, the mounting strength of the semiconductor element is strengthened when the semiconductor element is mounted in the recess of the insulating substrate. Therefore, even if the insulating base is heated to approximately 450°C, the glass member to which the external lead terminals are fixed does not soften or melt at all, and the relative positioning of the external lead terminals on the top surface of the insulating base is perfect. At the same time, the glass member does not melt and come into contact with the semiconductor element, thereby preventing deterioration of the characteristics of the semiconductor element.

また前記ガラス部材はその熱膨張係数が62×10−7
/ ”Cであり、絶縁基体を形成するアルミナセラミッ
クスの熱膨張係数と近似することからりフロー半田等の
高温雰囲気による過酷な条件が印加されたとしても絶縁
基体とガラス部材・との間に両者の熱膨張係数の相違に
起因して生じる応力によってガラス部材にクラックが発
生することは一切なく、絶縁容器の気密封止を常に完全
として絶縁容器内部に収容する半導体素子を長期間にわ
たり正常、且つ安定に作動させることが可能となる。
Further, the glass member has a coefficient of thermal expansion of 62×10-7
/ ”C, which is similar to the coefficient of thermal expansion of alumina ceramics that forms the insulating substrate, so even if harsh conditions such as flow soldering are applied in a high-temperature atmosphere, there will be no damage between the insulating substrate and the glass member. The glass member never cracks due to the stress caused by the difference in the thermal expansion coefficient of the insulating container, and the hermetic sealing of the insulating container is always perfect, and the semiconductor elements housed inside the insulating container can be operated normally for a long period of time. It becomes possible to operate stably.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係るガラス封止型半導体素子収納用パ
ッケージの一実施例を示す断面図である。 1・・絶縁基体 2・・蓋体 4・・外部リード端子 5・・結晶質ガラスから成るガラス部材7・・蓋体に被
着されたガラス部材
FIG. 1 is a sectional view showing an embodiment of a glass-sealed semiconductor element storage package according to the present invention. 1. Insulating base 2. Lid 4. External lead terminal 5. Glass member 7 made of crystalline glass. Glass member adhered to the lid.

Claims (1)

【特許請求の範囲】[Claims]  半導体素子を外部回路に電気的に接続する外部リード
端子が熔融結晶化させた結晶質ガラスによって固着され
た絶縁基体と、前記結晶質ガラスより低い温度で軟化溶
融するガラス部材を備えた蓋体とから成り、前記蓋体の
ガラス部材を絶縁基体上に加熱溶融させ、絶縁基体と蓋
体とを接合させることによって内部に半導体素子を気密
に封入するようになしたガラス封止型半導体素子収納用
パッケージにおいて、前記結晶質ガラスが酸化鉛55.
0乃至60.0重量%、酸化シリコン7.0乃至11.
0重量%、酸化ホウ素5.5乃至9.5重量%、酸化ア
ルミニウム0.2乃至3.0重量%、酸化亜鉛20.0
乃至30.0重量%から成ることを特徴とするガラス封
止型半導体素子収納用パッケージ。
an insulating base on which external lead terminals for electrically connecting a semiconductor element to an external circuit are fixed with crystalline glass melted and crystallized; and a lid body comprising a glass member that softens and melts at a lower temperature than the crystalline glass. A glass-sealed semiconductor element storage device comprising: a glass member of the lid body is heated and melted onto an insulating base body, and a semiconductor element is hermetically sealed inside by bonding the insulating base body and the lid body. In the package, the crystalline glass is lead oxide 55.
0 to 60.0% by weight, silicon oxide 7.0 to 11.
0% by weight, boron oxide 5.5-9.5% by weight, aluminum oxide 0.2-3.0% by weight, zinc oxide 20.0%
A glass-sealed package for housing a semiconductor element, characterized in that the glass-sealed package contains 30.0% by weight.
JP11412890A 1990-04-27 1990-04-27 Glass-encapsulated semiconductor element storage package Expired - Lifetime JP2759300B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11412890A JP2759300B2 (en) 1990-04-27 1990-04-27 Glass-encapsulated semiconductor element storage package

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11412890A JP2759300B2 (en) 1990-04-27 1990-04-27 Glass-encapsulated semiconductor element storage package

Publications (2)

Publication Number Publication Date
JPH0410646A true JPH0410646A (en) 1992-01-14
JP2759300B2 JP2759300B2 (en) 1998-05-28

Family

ID=14629838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11412890A Expired - Lifetime JP2759300B2 (en) 1990-04-27 1990-04-27 Glass-encapsulated semiconductor element storage package

Country Status (1)

Country Link
JP (1) JP2759300B2 (en)

Also Published As

Publication number Publication date
JP2759300B2 (en) 1998-05-28

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