JPH0410333U - - Google Patents
Info
- Publication number
- JPH0410333U JPH0410333U JP5135890U JP5135890U JPH0410333U JP H0410333 U JPH0410333 U JP H0410333U JP 5135890 U JP5135890 U JP 5135890U JP 5135890 U JP5135890 U JP 5135890U JP H0410333 U JPH0410333 U JP H0410333U
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- cover
- cvd
- wafer
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5135890U JPH0410333U (no) | 1990-05-16 | 1990-05-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5135890U JPH0410333U (no) | 1990-05-16 | 1990-05-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0410333U true JPH0410333U (no) | 1992-01-29 |
Family
ID=31570730
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5135890U Pending JPH0410333U (no) | 1990-05-16 | 1990-05-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0410333U (no) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011077315A (ja) * | 2009-09-30 | 2011-04-14 | Oki Electric Industry Co Ltd | 窒化物薄膜成膜装置 |
| JP4970683B2 (ja) * | 2000-01-31 | 2012-07-11 | マットソン テクノロジー インコーポレイテッド | 基板をエピタキシャルにより処理するための装置及び方法 |
| JP2016025309A (ja) * | 2014-07-24 | 2016-02-08 | 株式会社ニューフレアテクノロジー | 成膜装置、サセプタ、及び成膜方法 |
-
1990
- 1990-05-16 JP JP5135890U patent/JPH0410333U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4970683B2 (ja) * | 2000-01-31 | 2012-07-11 | マットソン テクノロジー インコーポレイテッド | 基板をエピタキシャルにより処理するための装置及び方法 |
| JP2011077315A (ja) * | 2009-09-30 | 2011-04-14 | Oki Electric Industry Co Ltd | 窒化物薄膜成膜装置 |
| JP2016025309A (ja) * | 2014-07-24 | 2016-02-08 | 株式会社ニューフレアテクノロジー | 成膜装置、サセプタ、及び成膜方法 |