JPH038857U - - Google Patents
Info
- Publication number
- JPH038857U JPH038857U JP6811989U JP6811989U JPH038857U JP H038857 U JPH038857 U JP H038857U JP 6811989 U JP6811989 U JP 6811989U JP 6811989 U JP6811989 U JP 6811989U JP H038857 U JPH038857 U JP H038857U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electrode support
- ion implantation
- electrodes
- multipole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005405 multipole Effects 0.000 claims description 7
- 238000005468 ion implantation Methods 0.000 claims description 5
- 238000010884 ion-beam technique Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6811989U JPH038857U (cs) | 1989-06-13 | 1989-06-13 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6811989U JPH038857U (cs) | 1989-06-13 | 1989-06-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH038857U true JPH038857U (cs) | 1991-01-28 |
Family
ID=31602284
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6811989U Pending JPH038857U (cs) | 1989-06-13 | 1989-06-13 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH038857U (cs) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000223054A (ja) * | 1999-02-02 | 2000-08-11 | Advantest Corp | 電子ビーム照射装置の静電偏向器 |
-
1989
- 1989-06-13 JP JP6811989U patent/JPH038857U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000223054A (ja) * | 1999-02-02 | 2000-08-11 | Advantest Corp | 電子ビーム照射装置の静電偏向器 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IE39610B1 (en) | Improvements in or relating to two-phase charge shift arrangements | |
US7271399B2 (en) | Manipulator assembly in ion implanter | |
JPH038857U (cs) | ||
JPS6354241U (cs) | ||
JPS6384892U (cs) | ||
JPH0196700U (cs) | ||
JPH0614399Y2 (ja) | 静電偏向器 | |
JPS6445162U (cs) | ||
JPH0388257U (cs) | ||
JPH0717153Y2 (ja) | 静電チャック装置 | |
JPH0313655U (cs) | ||
JPS62182538U (cs) | ||
JPS6354244U (cs) | ||
EP0548032A3 (en) | Electric arc evaporator | |
JPH0357586U (cs) | ||
JPH0395546U (cs) | ||
JPS62188052U (cs) | ||
JPH0619178Y2 (ja) | 陰極線管ソケット | |
JPH02247969A (ja) | イオン注入装置 | |
JPS6267455U (cs) | ||
JPS63109435U (cs) | ||
JPH01174842U (cs) | ||
JPS62136570U (cs) | ||
JPH0373425U (cs) | ||
JPH0368348U (cs) |