JPH038117B2 - - Google Patents
Info
- Publication number
- JPH038117B2 JPH038117B2 JP57104077A JP10407782A JPH038117B2 JP H038117 B2 JPH038117 B2 JP H038117B2 JP 57104077 A JP57104077 A JP 57104077A JP 10407782 A JP10407782 A JP 10407782A JP H038117 B2 JPH038117 B2 JP H038117B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- gallium arsenide
- indium phosphide
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 claims description 22
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 12
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 6
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- 230000005641 tunneling Effects 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- MODGUXHMLLXODK-UHFFFAOYSA-N [Br].CO Chemical compound [Br].CO MODGUXHMLLXODK-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 description 1
- SAOPTAQUONRHEV-UHFFFAOYSA-N gold zinc Chemical compound [Zn].[Au] SAOPTAQUONRHEV-UHFFFAOYSA-N 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
- H01L31/1075—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers, e.g. absorption or multiplication layers, form an heterostructure, e.g. SAM structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US275346 | 1981-06-19 | ||
| US06/275,346 US4473835A (en) | 1981-06-19 | 1981-06-19 | Long wavelength avalanche photodetector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS582077A JPS582077A (ja) | 1983-01-07 |
| JPH038117B2 true JPH038117B2 (US07608600-20091027-C00054.png) | 1991-02-05 |
Family
ID=23051901
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57104077A Granted JPS582077A (ja) | 1981-06-19 | 1982-06-18 | 半導体デバイス |
Country Status (5)
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5736878A (en) * | 1980-08-18 | 1982-02-27 | Kokusai Denshin Denwa Co Ltd <Kdd> | Semiconductor photodetector |
| JPS5861679A (ja) * | 1981-10-07 | 1983-04-12 | Kokusai Denshin Denwa Co Ltd <Kdd> | 量子井戸層付アバランシ・ホトダイオ−ド |
| JPS5984589A (ja) * | 1982-11-08 | 1984-05-16 | Fujitsu Ltd | アバランシフオトダイオード |
| US4631566A (en) * | 1983-08-22 | 1986-12-23 | At&T Bell Laboratories | Long wavelength avalanche photodetector |
| CA1228663A (en) * | 1984-04-10 | 1987-10-27 | Paul P. Webb | Photodetector with isolated avalanche region |
| CA1228662A (en) * | 1984-04-10 | 1987-10-27 | Paul P. Webb | Double mesa avalanche photodetector |
| US4586066A (en) * | 1984-04-10 | 1986-04-29 | Rca Inc. | Avalanche photodetector |
| CA1228661A (en) * | 1984-04-10 | 1987-10-27 | Rca Inc. | Avalanche photodetector |
| US4597004A (en) * | 1985-03-04 | 1986-06-24 | Rca Corporation | Photodetector |
| US5051804A (en) * | 1989-12-01 | 1991-09-24 | The United States Of America As Represented By The United States Department Of Energy | Photodetector having high speed and sensitivity |
| US10032950B2 (en) | 2016-02-22 | 2018-07-24 | University Of Virginia Patent Foundation | AllnAsSb avalanche photodiode and related method thereof |
| US12074243B1 (en) | 2023-08-24 | 2024-08-27 | Amplification Technologies, Corp. | Method for fabricating high-sensitivity photodetectors |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5643781A (en) * | 1979-09-17 | 1981-04-22 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor photodetecting element |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3995303A (en) * | 1975-06-05 | 1976-11-30 | Bell Telephone Laboratories, Incorporated | Growth and operation of a step-graded ternary III-V heterojunction p-n diode photodetector |
| US4122476A (en) * | 1976-11-22 | 1978-10-24 | International Business Machines Corporation | Semiconductor heterostructure |
| US4144540A (en) * | 1978-02-06 | 1979-03-13 | The United States Of America As Represented By The Secretary Of The Navy | Tunable infrared detector with narrow bandwidth |
| US4353081A (en) * | 1980-01-29 | 1982-10-05 | Bell Telephone Laboratories, Incorporated | Graded bandgap rectifying semiconductor devices |
| US4383269A (en) * | 1980-09-19 | 1983-05-10 | Bell Telephone Laboratories, Incorporated | Graded bandgap photodetector |
-
1981
- 1981-06-19 US US06/275,346 patent/US4473835A/en not_active Expired - Lifetime
-
1982
- 1982-06-11 FR FR8210219A patent/FR2508235B1/fr not_active Expired
- 1982-06-18 GB GB08217777A patent/GB2100928B/en not_active Expired
- 1982-06-18 JP JP57104077A patent/JPS582077A/ja active Granted
- 1982-06-18 DE DE19823222848 patent/DE3222848A1/de active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5643781A (en) * | 1979-09-17 | 1981-04-22 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor photodetecting element |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3222848A1 (de) | 1982-12-30 |
| US4473835A (en) | 1984-09-25 |
| FR2508235B1 (fr) | 1985-12-13 |
| GB2100928A (en) | 1983-01-06 |
| FR2508235A1 (fr) | 1982-12-24 |
| JPS582077A (ja) | 1983-01-07 |
| DE3222848C2 (US07608600-20091027-C00054.png) | 1988-03-31 |
| GB2100928B (en) | 1985-01-03 |
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