JPH0380871B2 - - Google Patents

Info

Publication number
JPH0380871B2
JPH0380871B2 JP19969783A JP19969783A JPH0380871B2 JP H0380871 B2 JPH0380871 B2 JP H0380871B2 JP 19969783 A JP19969783 A JP 19969783A JP 19969783 A JP19969783 A JP 19969783A JP H0380871 B2 JPH0380871 B2 JP H0380871B2
Authority
JP
Japan
Prior art keywords
gas
substrate
radiation
reaction chamber
adsorbed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP19969783A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6092475A (ja
Inventor
Atsushi Sekiguchi
Takashi Hiraga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP19969783A priority Critical patent/JPS6092475A/ja
Publication of JPS6092475A publication Critical patent/JPS6092475A/ja
Publication of JPH0380871B2 publication Critical patent/JPH0380871B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP19969783A 1983-10-25 1983-10-25 光化学的薄膜製造方法および装置 Granted JPS6092475A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19969783A JPS6092475A (ja) 1983-10-25 1983-10-25 光化学的薄膜製造方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19969783A JPS6092475A (ja) 1983-10-25 1983-10-25 光化学的薄膜製造方法および装置

Publications (2)

Publication Number Publication Date
JPS6092475A JPS6092475A (ja) 1985-05-24
JPH0380871B2 true JPH0380871B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-12-26

Family

ID=16412105

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19969783A Granted JPS6092475A (ja) 1983-10-25 1983-10-25 光化学的薄膜製造方法および装置

Country Status (1)

Country Link
JP (1) JPS6092475A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2670442B2 (ja) * 1986-03-31 1997-10-29 キヤノン株式会社 結晶の形成方法
US7611930B2 (en) * 2007-08-17 2009-11-03 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing display device

Also Published As

Publication number Publication date
JPS6092475A (ja) 1985-05-24

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