JPH0377436U - - Google Patents
Info
- Publication number
- JPH0377436U JPH0377436U JP13746689U JP13746689U JPH0377436U JP H0377436 U JPH0377436 U JP H0377436U JP 13746689 U JP13746689 U JP 13746689U JP 13746689 U JP13746689 U JP 13746689U JP H0377436 U JPH0377436 U JP H0377436U
- Authority
- JP
- Japan
- Prior art keywords
- lid
- heat treatment
- vertical heat
- reaction tube
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims 4
- 238000007789 sealing Methods 0.000 claims 2
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Description
第1図は本考案に係る第1実施例の縦型処理装
置の断面図、第2図は同実施例の要部のみを拡大
して示した断面図、第3図は第2実施例の要部の
みを示した略示的断面図である。
1……炉本体、1a……補助部材、2……炉体
カバー、3……断熱層、4……ヒートコイル、5
……均熱管、6……反応管、7……蓋部材、8…
…シヤフト、9……ウエーハボート、10……半
導体ウエーハ、11……バツフア、12……脚部
、13……燃焼ノズル、14……噴出ノズル、1
5,16……ガス導管、20……上面板、20a
……外蓋、21……突出栓部、21a……内蓋、
22……軸管、23……断熱材、24……小孔、
24a……小室、25……減圧手段、26……連
通部、27……ダクト、30……案内凸部、31
……ツバ、32……吸引溝、33……吸引パイプ
、34……栓部材、a……間隙、A,B……すり
合わせ面。
FIG. 1 is a sectional view of a vertical processing apparatus according to a first embodiment of the present invention, FIG. 2 is an enlarged sectional view of only the main parts of the same embodiment, and FIG. FIG. 2 is a schematic cross-sectional view showing only essential parts. DESCRIPTION OF SYMBOLS 1... Furnace body, 1a... Auxiliary member, 2... Furnace cover, 3... Heat insulation layer, 4... Heat coil, 5
... Soaking tube, 6 ... Reaction tube, 7 ... Lid member, 8 ...
...shaft, 9 ... wafer boat, 10 ... semiconductor wafer, 11 ... buffer, 12 ... leg, 13 ... combustion nozzle, 14 ... jet nozzle, 1
5, 16...Gas conduit, 20...Top plate, 20a
...Outer lid, 21...Protruding plug part, 21a...Inner lid,
22...Axis tube, 23...Insulating material, 24...Small hole,
24a...Small chamber, 25...Decompression means, 26...Communication section, 27...Duct, 30...Guiding convex portion, 31
...Brim, 32... Suction groove, 33... Suction pipe, 34... Plug member, a... Gap, A, B... Grinding surface.
Claims (1)
つて施蓋される縦型熱処理装置において、該すり
合わせ面に吸引溝を形成し、該吸引溝を負圧にし
たことを特徴とする縦型熱処理装置の施蓋密閉構
造。 (2) 反応管に開口部と蓋部材との間に補助部材
が介在している請求項(1)記載の縦型熱処理装置
の施蓋密閉構造。 (3) 蓋部材に設けられたシヤフトの貫通孔とシ
ヤフトとの間に形成される間隙に連通させて減圧
手段を設け、この間隙を大気の圧力及び反応管の
内部圧力よりも負圧に維持するようにした請求項
(1),(2)記載の縦型熱処理装置の施蓋密閉構造。[Claims for Utility Model Registration] (1) In a vertical heat treatment apparatus in which the opening of a reaction tube is closed by rubbing a lid member together, a suction groove is formed on the rubbing surface, and the suction groove is placed under negative pressure. A closed lid structure for a vertical heat treatment equipment. (2) The lid-sealing structure for a vertical heat treatment apparatus according to claim (1), wherein an auxiliary member is interposed between the opening of the reaction tube and the lid member. (3) A pressure reduction means is provided in communication with the gap formed between the shaft and the through hole of the shaft provided in the lid member, and this gap is maintained at a pressure lower than atmospheric pressure and the internal pressure of the reaction tube. Claims made to
A lid-sealing structure of the vertical heat treatment equipment described in (1) and (2).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13746689U JPH0377436U (en) | 1989-11-28 | 1989-11-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13746689U JPH0377436U (en) | 1989-11-28 | 1989-11-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0377436U true JPH0377436U (en) | 1991-08-05 |
Family
ID=31684622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13746689U Pending JPH0377436U (en) | 1989-11-28 | 1989-11-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0377436U (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61156730A (en) * | 1984-12-27 | 1986-07-16 | Deisuko Saiyaa Japan:Kk | Vertical thermal treatment apparatus for semiconductor article |
JPS63193443A (en) * | 1987-02-06 | 1988-08-10 | Fujitsu Ltd | Rotary anode x-ray generating device |
JPH01170017A (en) * | 1987-12-25 | 1989-07-05 | Toshiba Corp | Semiconductor processing device |
-
1989
- 1989-11-28 JP JP13746689U patent/JPH0377436U/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61156730A (en) * | 1984-12-27 | 1986-07-16 | Deisuko Saiyaa Japan:Kk | Vertical thermal treatment apparatus for semiconductor article |
JPS63193443A (en) * | 1987-02-06 | 1988-08-10 | Fujitsu Ltd | Rotary anode x-ray generating device |
JPH01170017A (en) * | 1987-12-25 | 1989-07-05 | Toshiba Corp | Semiconductor processing device |
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