JPH0374828B2 - - Google Patents

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Publication number
JPH0374828B2
JPH0374828B2 JP59141402A JP14140284A JPH0374828B2 JP H0374828 B2 JPH0374828 B2 JP H0374828B2 JP 59141402 A JP59141402 A JP 59141402A JP 14140284 A JP14140284 A JP 14140284A JP H0374828 B2 JPH0374828 B2 JP H0374828B2
Authority
JP
Japan
Prior art keywords
stripping
methylene chloride
photoresist
present
alcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59141402A
Other languages
Japanese (ja)
Other versions
JPS6120946A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14140284A priority Critical patent/JPS6120946A/en
Publication of JPS6120946A publication Critical patent/JPS6120946A/en
Publication of JPH0374828B2 publication Critical patent/JPH0374828B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • G03F7/426Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、安定性が改良されたフオトレジスト
剥離用組成物に関する。 各種部品を搭載し、接続する配線を絶縁体上に
配線図形で作成したプリント配線板は、片面、両
面、又は多層配線板等各種の形体が知られてい
る。プリント配線板のパターン作成には、パター
ン密度が高い場合、スクリーン印刷法よりもフオ
トレジストを用いた写真法が好ましいとされてい
る。フオトレジストは露光→現像→エツチング等
の工程を経て最終的にはすべて剥離することが必
要である。このようなフオトレジストの剥離剤に
は特公昭52−45241号公報に記載された塩化メチ
レン及びメタノールの混合物が知られている。フ
オトレジスト剥離剤に要求される性能は、レジス
トの剥離能力が高いことの他プリント配線板に用
いる各種材料、特に金属材料に対して影響を与え
ないこと等が挙げられる。 本発明は、プリント配線板材質への影響が少な
く安定性の高いフオトレジスト剥離剤を新規に提
供するものであり、塩化メチレン及びアルコール
類を必須成分として含むフオトレジスト剥離剤
に、エポキサイド類及び/又はアミン類を配合し
たことを特徴とするフオトレジスト剥離用組成物
に関するものである。 本発明におけるフオトレジスト剥離用組成物中
の塩化メチレン及びアルコール類の配合割合は合
計で90wt%以上、好ましくは95wt%以上が適当
である。これ以下であると充分なフオトレジスト
の剥離能力が得られない。塩化メチレンとアルコ
ール類の配合比は、両者の共沸組成となる配合比
付近を選択することが好ましいが、実質的に不燃
性とする必要があり、引火性のアルコール類は引
火点のない塩化メチレンに対し少量とすることも
重要である。例えば、塩化メチレンとメタノール
では約13:1、塩化メチレンとイソプロパノール
では約12:1の配合比において共沸組成を形成
し、実質的に不燃性で問題はないが、エタノール
では95wt%以上必要であり、むしろ共沸組成は
好ましくない。共沸組成あるいはその付近での使
用は、蒸留再生使用時に、組成比変動が大きくな
らず、剥離性能を一定に保てる利点がある。通常
は塩化メチレンとアルコール類の配合比を7:1
〜25:1とすればよい。その他のアルコール類の
好適例には、n−プロピルアルコール、n−ブチ
ルアルコール、イソブチルアルコール、第2ブチ
ルアルコール、第3ブチルアルコール等の低級ア
ルコール類がある。これらのアルコール類は、本
発明の目的を阻害しない限り、2種以上混合使用
することもできる。 プリント配線板の絶縁部は、エポキシ樹脂やフ
エノール樹脂と紙やガラス繊維等との複合材から
形成されている。又、配線板の表面メツキには、
スズ−鉛メツキ、銅メツキ、あるいはニツケルを
下地とした金メツキ等が用いられている。フオト
レジスト剥離剤はこれらのプリント配線板を構成
する各種材質に悪影響を与えず、又剥離材自身
も、特に金属等の影響により分解しないことが求
められる。しかしながら、フオトレジスト剥離剤
の主要部を構成する塩化メチレンは、剥離力も優
れ、不燃性で、毒性も低いという特性を有するも
のの、金属、油、酸素、光又は水分の共存下に蒸
留再使用する際には、分解する傾向が強く、その
安定化は是非とも必要である。一方、プリント配
線板の材質に対する影響は、塩化メチレン自身で
はなく、塩化メチレンが分解して生成する酸によ
るものが大きく、この点からも塩化メチレンを含
む剥離剤の安定化は重要である。 本発明における剥離剤は、エポキサイド類及
び/又はアミン類を配合することにより、前述の
安定化を良く達成することができる。エポキサイ
ド類としては分子内に少なくとも1つの隣接エポ
キシ基
The present invention relates to photoresist stripping compositions with improved stability. 2. Description of the Related Art Printed wiring boards, in which various parts are mounted and connecting wiring is created in the form of wiring diagrams on an insulator, are known in various forms such as single-sided, double-sided, and multilayer wiring boards. When creating patterns for printed wiring boards, when the pattern density is high, a photographic method using a photoresist is said to be preferable to a screen printing method. The photoresist must undergo steps such as exposure, development, and etching, and finally be completely peeled off. A mixture of methylene chloride and methanol described in Japanese Patent Publication No. 52-45241 is known as such a photoresist stripping agent. The performance required of a photoresist stripping agent includes not only high resist stripping ability but also no influence on various materials used in printed wiring boards, especially metal materials. The present invention provides a novel photoresist stripping agent that has little effect on printed wiring board materials and has high stability.The present invention provides a photoresist stripping agent that has little effect on printed wiring board materials and is highly stable. Alternatively, the present invention relates to a photoresist stripping composition characterized in that it contains an amine. The total blending ratio of methylene chloride and alcohol in the photoresist stripping composition of the present invention is suitably at least 90 wt%, preferably at least 95 wt%. If it is less than this, sufficient photoresist peeling ability cannot be obtained. It is preferable to select a blending ratio of methylene chloride and alcohol that is close to an azeotropic composition of the two, but it must be substantially nonflammable, and flammable alcohols should be mixed with chlorides that have no flash point. It is also important to use a small amount relative to methylene. For example, methylene chloride and methanol form an azeotropic composition at a blending ratio of approximately 13:1, and methylene chloride and isopropanol at a blending ratio of approximately 12:1, and are virtually nonflammable and pose no problem, but for ethanol, 95 wt% or more is required. Yes, but rather an azeotropic composition is not preferred. Use at or near an azeotropic composition has the advantage that the composition ratio does not fluctuate greatly during distillation regeneration and that the stripping performance can be kept constant. Usually, the mixing ratio of methylene chloride and alcohol is 7:1.
It is sufficient to set the ratio to ~25:1. Suitable examples of other alcohols include lower alcohols such as n-propyl alcohol, n-butyl alcohol, isobutyl alcohol, sec-butyl alcohol, and tertiary-butyl alcohol. Two or more of these alcohols may be used in combination as long as they do not impede the object of the present invention. The insulating portion of the printed wiring board is made of a composite material of epoxy resin or phenol resin, paper, glass fiber, or the like. Also, for the surface plating of wiring boards,
Tin-lead plating, copper plating, or gold plating with a nickel base are used. The photoresist stripping agent is required not to have an adverse effect on the various materials constituting these printed wiring boards, and the stripping agent itself is also required not to decompose, especially due to the influence of metals. However, although methylene chloride, which constitutes the main component of photoresist stripping agents, has excellent stripping power, is nonflammable, and has low toxicity, it cannot be distilled and reused in the presence of metals, oil, oxygen, light, or moisture. In some cases, there is a strong tendency to decompose, and stabilization is absolutely necessary. On the other hand, the influence on the material of printed wiring boards is largely due to the acid generated by decomposition of methylene chloride, rather than the methylene chloride itself, and from this point of view as well, stabilization of stripping agents containing methylene chloride is important. The above-mentioned stabilization can be well achieved by incorporating epoxides and/or amines into the release agent of the present invention. Epoxides have at least one adjacent epoxy group in the molecule.

【式】を有する化合物であり、 具体的にはプロピレンオキサイド、1,2−ブチ
レンオキサイド、2,3−ブチレンオキサイド、
エピクロルヒドリン、スチレンオキサイド、ブチ
ルグリシジルエーテル、フエニルグリシジルエー
テル、グリシドール等が好ましい。特に好ましい
エポキサイド類はエピクロルヒドリンやプロピレ
ンオキサイドである。エポキサイド類の配合量は
特に限定されるものではないが、剥離剤中に0.02
〜3wt%、好ましくは0.05〜0.8wt%の少量で充分
な安定化効果がある。 アミン類としては、ジイソプロピルアミン、シ
クロヘキシルアミン、ジアリルアミン、n−メチ
ルベンジルアミン、N,N−ジメチルベンジルア
ミン、N−アルキルモルホリン等が好適であり、
特に好ましいものは、ジイソプロピルアミン、ジ
アリルアミン、N−メチルベンジルアミンであ
る。アミン類の配合量はエポキサイド類と同様、
特に限定されるものではなく、剥離剤中に0.001
〜0.1wt%、好ましくは0.01〜0.06wt%の極微量
配合すればよく、これ以上配合しても不経済とな
るだけで、効果に大きな差はない。 本発明における剥離剤にはその他の溶剤を配合
してもよく、例えば塩化メチレン及びアルコール
類に、1,2−ジクロルエタンを0.2〜7wt%、好
ましくは0.5〜5wt%配合することにより、剥離性
能がさらに向上し、剥離スピードを上げることが
できる。1,2−ジクロルエタンは、メタノール
やイソプロパノールと同程度の引火点を有するも
のの、塩化メチレンに対する配合量はこれらのア
ルコールよりも少量の添加で効果があり、1,2
−ジクロルエタンの添加によつても、実質的に不
燃性とすることができる。 本発明の剥離用組成物により剥離し得るフオト
レジストとしては、何ら限定されず、ポジ型又は
ネガ型の光露光用レジスト、遠紫外露光用レジス
ト、X線又は電子線用レジストを挙げることがで
きる。光露光用レジストの材質にはフエノール及
びクレゾールノボラツク樹脂をベーズにしたキノ
ンジアジド系、シス−1,4−ポリイソプレンを
主成分とする環化ゴム系、ポリけい皮酸系等があ
り、遠紫外用レジストにはポリメチルメタアクリ
レート、ポリメチルイソプロペニルケトン等があ
り、電子線、X線レジスタにはポリメタクリル酸
メチル、メタクリル酸グリシジル−アクリル酸エ
チル共重合体、メタクリル酸メチル−メタクリル
酸共重合体等が知られているが、本発明の剥離用
組成物はいずれにも有効である。 本発明の剥離用組成物は、特にプリント配線板
製造時のフオトレジスト剥離に適しているが、そ
の他のフオトレジスト応用分野例えば、半導体、
リードフレーム、TV用シヤドウマスク等の電子
部品分野をはじめ、金属、セラミツク、ガラス等
の蝕刻分野における剥離剤としても極めて効果的
である。 以下、本発明の実施例についてさらに具体的に
説明する。 実施例 1[安定性能] 鉄分、水分、酸素を共存させ、光照射下に加熱
還流を7日間行ない、鉄片の状態及び安定性能評
価後の液のpHを測定することにより、本発明の
剥離剤の安定性能を評価した。結果を第1表に示
す。 鉄片の状態◎……表面の変化全くなし ○……表面の一部がくもる △……50%程度くもる ×……全面くもり又は一部錆
A compound having the formula: specifically propylene oxide, 1,2-butylene oxide, 2,3-butylene oxide,
Epichlorohydrin, styrene oxide, butyl glycidyl ether, phenyl glycidyl ether, glycidol and the like are preferred. Particularly preferred epoxides are epichlorohydrin and propylene oxide. The amount of epoxides added is not particularly limited, but 0.02
A small amount of ~3wt%, preferably 0.05-0.8wt% has a sufficient stabilizing effect. Suitable amines include diisopropylamine, cyclohexylamine, diallylamine, n-methylbenzylamine, N,N-dimethylbenzylamine, N-alkylmorpholine, etc.
Particularly preferred are diisopropylamine, diallylamine, and N-methylbenzylamine. The blending amount of amines is the same as that of epoxides.
There are no particular limitations, and 0.001 in the release agent.
A very small amount of ~0.1wt%, preferably 0.01~0.06wt% may be added, and even if more than this is added, it will only become uneconomical and there will be no significant difference in effectiveness. The stripping agent of the present invention may contain other solvents. For example, by blending 0.2 to 7 wt%, preferably 0.5 to 5 wt% of 1,2-dichloroethane with methylene chloride and alcohol, the stripping performance can be improved. Further, it is possible to increase the peeling speed. Although 1,2-dichloroethane has a flash point similar to that of methanol and isopropanol, it is effective when added in a smaller amount to methylene chloride than these alcohols;
- Addition of dichloroethane can also make it substantially non-flammable. The photoresist that can be removed by the stripping composition of the present invention is not limited in any way, and examples include positive or negative photoresist, deep ultraviolet exposure resist, and X-ray or electron beam resist. . Materials for resists for light exposure include quinone diazide based on phenol and cresol novolak resin, cyclized rubber based on cis-1,4-polyisoprene, polycinnamic acid, etc. Resists include polymethyl methacrylate and polymethyl isopropenyl ketone, and electron beam and X-ray resists include polymethyl methacrylate, glycidyl methacrylate-ethyl acrylate copolymer, and methyl methacrylate-methacrylic acid copolymer. Coalescence and the like are known, but the stripping composition of the present invention is effective for both. The stripping composition of the present invention is particularly suitable for stripping photoresists during the production of printed wiring boards, but is also suitable for other photoresist application fields such as semiconductors,
It is extremely effective as a remover in the field of electronic components such as lead frames and TV shadow masks, as well as in the field of etching metals, ceramics, glass, etc. Examples of the present invention will be described in more detail below. Example 1 [Stability performance] The stripping agent of the present invention was prepared by coexisting iron, moisture, and oxygen, heating under reflux for 7 days under light irradiation, and measuring the condition of the iron piece and the pH of the liquid after stability performance evaluation. The stability performance was evaluated. The results are shown in Table 1. Condition of the iron piece ◎...No change in the surface ○... Part of the surface is cloudy △... About 50% cloudy ×... Fully cloudy or partially rusted

【表】【table】

Claims (1)

【特許請求の範囲】[Claims] 1 塩化メチレン及びアルコール類を必須成分と
して含むフオトレジスト剥離剤に、エポキサイド
類及び/又はアミン類を配合したことを特徴とす
るフオトレジスト剥離用組成物。
1. A photoresist stripping composition comprising a photoresist stripping agent containing methylene chloride and alcohol as essential components, and epoxides and/or amines added thereto.
JP14140284A 1984-07-10 1984-07-10 Composition for peeling photoresist Granted JPS6120946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14140284A JPS6120946A (en) 1984-07-10 1984-07-10 Composition for peeling photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14140284A JPS6120946A (en) 1984-07-10 1984-07-10 Composition for peeling photoresist

Publications (2)

Publication Number Publication Date
JPS6120946A JPS6120946A (en) 1986-01-29
JPH0374828B2 true JPH0374828B2 (en) 1991-11-28

Family

ID=15291166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14140284A Granted JPS6120946A (en) 1984-07-10 1984-07-10 Composition for peeling photoresist

Country Status (1)

Country Link
JP (1) JPS6120946A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2601703B1 (en) * 1986-07-21 1993-05-07 Atochem METHYLENE CHLORIDE COMPOSITION - USE THEREOF FOR REMOVING PHOTORESIST FILMS
JP2591644B2 (en) * 1987-03-11 1997-03-19 東京応化工業株式会社 Photoresist stripper
JP3095296B2 (en) * 1991-12-19 2000-10-03 株式会社日立製作所 Resist stripping method, method of manufacturing thin film circuit element using the same, and resist stripping solution

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913103A (en) * 1972-04-07 1974-02-05
JPS49116012A (en) * 1973-02-23 1974-11-06
JPS49135904A (en) * 1973-05-16 1974-12-27
JPS49135905A (en) * 1973-05-16 1974-12-27
JPS49135903A (en) * 1973-05-16 1974-12-27
JPS5217002A (en) * 1975-07-30 1977-02-08 Toshiba Corp Manufaceuring method of pick-up cantilever
JPS5217003A (en) * 1975-07-30 1977-02-08 Hitachi Maxell Ltd Magnetic recording tape
JPS5245241A (en) * 1975-10-08 1977-04-09 Hitachi Metals Ltd Wide-band concentrated constant type circulator
JPS5545636A (en) * 1978-09-28 1980-03-31 Toagosei Chem Ind Co Ltd Stabilization of methylene chloride
JPS5597479A (en) * 1978-12-01 1980-07-24 Dow Chemical Europ Stabilized methylene chloride composition for steam rendering
JPS5637212A (en) * 1979-08-29 1981-04-10 Kyoritsu Yuki Kogyo Kenkyusho:Kk Activated carbon dehydrating method
JPS56113715A (en) * 1980-02-12 1981-09-07 Shin Etsu Chem Co Ltd Methylene chloride composition
JPS56131530A (en) * 1980-08-05 1981-10-15 Tokuyama Soda Co Ltd Stabilizing method of methylene chloride
JPS59487A (en) * 1982-06-23 1984-01-05 東洋エクステリア株式会社 Extensible gate door

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913103A (en) * 1972-04-07 1974-02-05
JPS49116012A (en) * 1973-02-23 1974-11-06
JPS49135904A (en) * 1973-05-16 1974-12-27
JPS49135905A (en) * 1973-05-16 1974-12-27
JPS49135903A (en) * 1973-05-16 1974-12-27
JPS5217002A (en) * 1975-07-30 1977-02-08 Toshiba Corp Manufaceuring method of pick-up cantilever
JPS5217003A (en) * 1975-07-30 1977-02-08 Hitachi Maxell Ltd Magnetic recording tape
JPS5245241A (en) * 1975-10-08 1977-04-09 Hitachi Metals Ltd Wide-band concentrated constant type circulator
JPS5545636A (en) * 1978-09-28 1980-03-31 Toagosei Chem Ind Co Ltd Stabilization of methylene chloride
JPS5597479A (en) * 1978-12-01 1980-07-24 Dow Chemical Europ Stabilized methylene chloride composition for steam rendering
JPS5637212A (en) * 1979-08-29 1981-04-10 Kyoritsu Yuki Kogyo Kenkyusho:Kk Activated carbon dehydrating method
JPS56113715A (en) * 1980-02-12 1981-09-07 Shin Etsu Chem Co Ltd Methylene chloride composition
JPS56131530A (en) * 1980-08-05 1981-10-15 Tokuyama Soda Co Ltd Stabilizing method of methylene chloride
JPS59487A (en) * 1982-06-23 1984-01-05 東洋エクステリア株式会社 Extensible gate door

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Publication number Publication date
JPS6120946A (en) 1986-01-29

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