JPH037105B2 - - Google Patents

Info

Publication number
JPH037105B2
JPH037105B2 JP57199642A JP19964282A JPH037105B2 JP H037105 B2 JPH037105 B2 JP H037105B2 JP 57199642 A JP57199642 A JP 57199642A JP 19964282 A JP19964282 A JP 19964282A JP H037105 B2 JPH037105 B2 JP H037105B2
Authority
JP
Japan
Prior art keywords
polymer
monomer represented
general formula
solution
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57199642A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5988733A (ja
Inventor
Yoshuki Harita
Yoichi Kamoshita
Masashige Takatori
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP19964282A priority Critical patent/JPS5988733A/ja
Publication of JPS5988733A publication Critical patent/JPS5988733A/ja
Publication of JPH037105B2 publication Critical patent/JPH037105B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP19964282A 1982-11-13 1982-11-13 電離放射線感応性材料の製法 Granted JPS5988733A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19964282A JPS5988733A (ja) 1982-11-13 1982-11-13 電離放射線感応性材料の製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19964282A JPS5988733A (ja) 1982-11-13 1982-11-13 電離放射線感応性材料の製法

Publications (2)

Publication Number Publication Date
JPS5988733A JPS5988733A (ja) 1984-05-22
JPH037105B2 true JPH037105B2 (enrdf_load_stackoverflow) 1991-01-31

Family

ID=16411240

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19964282A Granted JPS5988733A (ja) 1982-11-13 1982-11-13 電離放射線感応性材料の製法

Country Status (1)

Country Link
JP (1) JPS5988733A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58187923A (ja) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd 放射線感応性レジスト材を用いる微細加工法
JPS5923341A (ja) * 1982-07-30 1984-02-06 Japan Synthetic Rubber Co Ltd 樹脂組成物

Also Published As

Publication number Publication date
JPS5988733A (ja) 1984-05-22

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