JPH0366022A - Thin film-type magnetic recording medium - Google Patents

Thin film-type magnetic recording medium

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Publication number
JPH0366022A
JPH0366022A JP20215689A JP20215689A JPH0366022A JP H0366022 A JPH0366022 A JP H0366022A JP 20215689 A JP20215689 A JP 20215689A JP 20215689 A JP20215689 A JP 20215689A JP H0366022 A JPH0366022 A JP H0366022A
Authority
JP
Japan
Prior art keywords
film
magnetic recording
recording medium
substrate
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20215689A
Other languages
Japanese (ja)
Inventor
Yoichi Ogawa
容一 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Ltd filed Critical Hitachi Maxell Ltd
Priority to JP20215689A priority Critical patent/JPH0366022A/en
Publication of JPH0366022A publication Critical patent/JPH0366022A/en
Pending legal-status Critical Current

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  • Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To obtain the high-quality recording medium which is not creased when the film is formed by using a film having a specified static friction coefficient when a stainless steel column under specified conditions is placed on the film and slid at a specified temp. as a substrate. CONSTITUTION:A polymeric film is placed on a heated stainless steel sheet, and a stainless steel column having 0.1mum surface roughness on the center line, 0.4mum maximum surface roughness, 12mm diameter and 20kg weight is placed thereon. When the film is heated to 150-300 deg.C and the column is slid on the film, the static friction coefficient is controlled to <= 0.6, and such a film is used as the substrate. The substrate 4 is inserted between reels 1 and 3 through a roll 2, and the Co and Cr as the vaporization source 6 are vaporized by an electron beam to vacuum-deposit a perpendicular magnetic film on the substrate 4. Consequently, a high-quality recording medium which is not creased when the film is formed is obtained.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は薄膜型磁気記録媒体に関する。更に詳細には、
本発明は改良された基板フィルムを有する薄膜型磁気記
録媒体に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic recording medium. More specifically,
The present invention relates to thin film magnetic recording media having improved substrate films.

[従来の技術] 従来から一般に普及している磁気記録媒体は、針状の磁
性粉と高分子結合剤とを主体とする磁性塗料を非磁性基
体上に塗布して磁性層を形成した塗布型の磁気記録媒体
である。
[Prior Art] Magnetic recording media that have been widely used in the past are coating-type media in which a magnetic layer is formed by coating a magnetic coating mainly consisting of acicular magnetic powder and a polymeric binder on a non-magnetic substrate. This is a magnetic recording medium.

現在、磁気記録再生装置はますます高密度化の傾向にあ
り、短波長記録特性に優れた磁気記録媒体が要望されて
いる。
Currently, there is a trend toward higher density magnetic recording and reproducing devices, and there is a demand for magnetic recording media with excellent short wavelength recording characteristics.

しかし、塗布型磁気記録媒体における短波長記録特性の
改善には限界がある。これに対して、CoCrなどのC
oを主成分とする強磁性体を真空蒸着、スパッタリング
、またはイオンブレーティング等のいわゆる物理蒸着法
によって非磁性基体ヒに胎成する金属薄膜型の磁気j己
録媒体は、その磁性層中に非磁性の結合剤が混入されて
いないので著しく高い残留磁束密度をIIJることかで
き、かつ、磁外層を極めて薄く形成することができるた
めに、高出力で短波長応答性に優れているという利点を
有する。この特徴により、最近は薄膜型磁気記録媒体が
磁気媒体の−E流となりつつある。
However, there are limits to the improvement of short wavelength recording characteristics in coated magnetic recording media. On the other hand, C such as CoCr
A metal thin film type magnetic self-recording medium in which a ferromagnetic material mainly composed of O is deposited on a non-magnetic substrate by a so-called physical vapor deposition method such as vacuum evaporation, sputtering, or ion blating, has Since no non-magnetic binder is mixed in, it is possible to achieve extremely high residual magnetic flux density, and because the magnetic outer layer can be formed extremely thin, it is said to have high output and excellent short wavelength response. has advantages. Due to this feature, thin film magnetic recording media have recently become the -E type of magnetic media.

[発明が解決しようとする課題] 近年磁気記録の高密度化に伴い、薄膜型の垂直磁気記録
方式の研究が活発に行われている。この薄膜型の垂直磁
気記録媒体を用いて磁気テープ、フロッピーディスクな
ど高分子フィルムを基板とする媒体を作製するには、長
尺で薄いフィルムをローラで巻き取りつつ膜形成を行う
必要がある。
[Problems to be Solved by the Invention] In recent years, with the increase in the density of magnetic recording, research on thin-film perpendicular magnetic recording systems has been actively conducted. In order to use this thin-film type perpendicular magnetic recording medium to produce a medium using a polymer film as a substrate, such as a magnetic tape or a floppy disk, it is necessary to form a film while winding a long thin film with a roller.

しかしこのような薄いフィルムを巻き取る技術は非常に
難しく、少しでも張力が不均質になると皺が発生する。
However, the technology for winding such thin films is extremely difficult, and wrinkles will occur if the tension becomes even slightly uneven.

特に垂直磁気記録方式はスペーシングの影響が大きく、
極めて表面性の良好なフィルムを用いる必要があるため
、フィルム−ローラ間の摩耗や張り付きが大きくなり、
皺が発生しやすい。
In particular, perpendicular magnetic recording has a large effect on spacing.
Since it is necessary to use a film with extremely good surface properties, wear and sticking between the film and roller will be large.
Wrinkles are likely to occur.

また、良好な垂直磁気特性を有するCo−Cr垂直磁化
膜を作製するには基板を加熱するか、あるいは、蒸着粒
子のエネルギーを大きくする必要がある。どちらにせよ
基板フィルムは膜作製時に−・時的に高温になる。この
ようにフィルムが高温になるとますます皺が発生しやす
くなり平坦な媒体が得られないという問題があった。
Furthermore, in order to produce a Co--Cr perpendicularly magnetized film having good perpendicular magnetic properties, it is necessary to heat the substrate or increase the energy of the deposited particles. In any case, the substrate film becomes hot at times during film production. As described above, when the film is heated to a high temperature, wrinkles are more likely to occur and a flat medium cannot be obtained.

この発明は、上記従来技術が持っていた蒸着膜の皺の発
生という欠点を解消し、以て信頼性に優れた薄膜型磁気
記録媒体を提供することを目的とする。
It is an object of the present invention to eliminate the drawback of the above-mentioned prior art, which is the occurrence of wrinkles in the deposited film, and thereby provide a thin film magnetic recording medium with excellent reliability.

[課題を解決するための手段] 前記目的を達成するために、本発明では、高分子フィル
ムを基板とする薄膜型磁気記録媒体において、前記高分
子フィルムを加熱したステンレススチール(SUS)の
甲板のEに乗せ、この−ヒに中心線表面粗さRaが0.
1μm1表面高さの最大高さR■axが0.4μmの表
面粗さを有する直径121h重さ20gのSUS円柱を
乗せて前記フィルムと円柱の底面を滑らせた時の静摩擦
係数がフィルム温度150℃〜300℃で0.6以ドで
あることを特徴とする薄膜型磁気記録媒体を提供する。
[Means for Solving the Problem] In order to achieve the above object, the present invention provides a thin film magnetic recording medium having a polymer film as a substrate, in which a stainless steel (SUS) deck on which the polymer film is heated is used. E, and the center line surface roughness Ra is 0.
When a SUS cylinder with a diameter of 121h and a weight of 20g is placed and the film slides on the bottom of the cylinder, the coefficient of static friction is the film temperature of 150. Provided is a thin film type magnetic recording medium characterized in that it has a hardness of 0.6 or more at a temperature of 0.degree. C. to 300.degree.

薄膜型磁気記録媒体は例えば、Co−Cr垂直磁気記録
媒体である。
The thin film magnetic recording medium is, for example, a Co-Cr perpendicular magnetic recording medium.

高分子フィルムの中心線平均粗さRaが100Å以下で
、表面粗さの最大高さRmaxが200Å以下であるこ
とが好ましい。
It is preferable that the center line average roughness Ra of the polymer film is 100 Å or less, and the maximum height Rmax of surface roughness is 200 Å or less.

[作用] 薄膜型磁気記録媒体の製造において皺の発生が特に問題
になるのは、成膜時の温度が比較的高い場合である。例
えば、co−Cr垂直磁化膜の膜作製時のフィルム温度
は基板加熱のため、あるいは高エネルギー粒子による衝
撃により瞬間的には150℃〜300℃の高温になる。
[Operation] In the production of thin-film magnetic recording media, the occurrence of wrinkles becomes a particular problem when the temperature during film formation is relatively high. For example, the film temperature during the production of a co-Cr perpendicularly magnetized film instantaneously reaches a high temperature of 150° C. to 300° C. due to substrate heating or impact from high-energy particles.

本発明者は、このような高温状態でのフィルム−3US
間の静摩擦係数が0.6以下の基板フィルムを用いると
蒸着時にフィルムに発生する皺が解消されることを見い
だした。
The inventor of the present invention has developed the film-3US under such high temperature conditions.
It has been found that when a substrate film with a static friction coefficient of 0.6 or less is used, wrinkles that occur in the film during vapor deposition can be eliminated.

これは、フィルムが加熱されて膨張した時に摩擦が大き
いと、フィルムとローラが滑らず、膨張したフィルムの
分だけ上に持ち上がって皺になっているためと考えられ
る。また、垂直磁気記録のスペーシング依存性を考慮し
て、表面粗さがRaで100Å以下、最大高さRIla
xで200Åの高分子フィルムを用いると高品質の薄膜
型磁気記録媒体が得られる。
This is thought to be because when the film is heated and expanded, if the friction is large, the film and roller do not slip, and the expanded film lifts up and becomes wrinkled. In addition, considering the spacing dependence of perpendicular magnetic recording, the surface roughness Ra is 100 Å or less, and the maximum height RIla
If a polymer film with a thickness of 200 Å is used, a high quality thin film magnetic recording medium can be obtained.

[実施例] 以下、実施例により本発明を更に詳細に説明する。[Example] Hereinafter, the present invention will be explained in more detail with reference to Examples.

実丑艷(L 第1図に示されるような真空蒸着装置を用いてCo−C
r垂直磁気記録媒体を作製した。供給ロール1から送り
出されたフィルム基板4は加熱ロール2を介して巻取ロ
ール3に巻き取られる。この時加熱ロール下部にある蒸
発源6のGo及びCrが電子銃5からの電子ビームによ
り加熱溶解され、Co−Cr1:直磁化膜が形成される
Co-C using a vacuum evaporator as shown in Figure 1
An r-perpendicular magnetic recording medium was manufactured. The film substrate 4 sent out from the supply roll 1 is wound onto a take-up roll 3 via a heating roll 2. At this time, Go and Cr in the evaporation source 6 located at the bottom of the heating roll are heated and melted by the electron beam from the electron gun 5, and a Co--Cr1: directly magnetized film is formed.

基板フィルム4としては第2図に示す静摩擦係数を有す
る膜厚20μmのポリイミドフィルムを用いた。Co−
Cr膜の膜厚は2000Å、組成は重量比でCo : 
Cr=80 : 20であった。蒸着速度は1000^
/sec、フィルム送り速度は2m/mtn 、加熱ロ
ールの温度は250℃であった。
As the substrate film 4, a polyimide film having a thickness of 20 μm and having a coefficient of static friction shown in FIG. 2 was used. Co-
The thickness of the Cr film is 2000 Å, and the composition is Co:
Cr=80:20. The deposition rate is 1000^
/sec, the film feed speed was 2 m/mtn, and the temperature of the heating roll was 250°C.

実丑律14 第3図に示すようなスパッタリング装置を用いてCo−
Cr垂直磁気記録媒体を作製した。供給ロール10から
送り出されたフィルム基板14は加熱ロール12を介し
て巻取ロール13に巻き取られる。この時加熱ロール下
部にあるターゲット15から高周波マグネトロンスパッ
タリングによりCo−Cr垂直磁化膜が形成される。ス
パッタリング処理の際しては、ガス導入口16から反応
室内にArガスを導入した。
Practical Principle 14 Using a sputtering device as shown in Fig. 3,
A Cr perpendicular magnetic recording medium was manufactured. The film substrate 14 sent out from the supply roll 10 is wound onto a take-up roll 13 via a heating roll 12 . At this time, a Co--Cr perpendicularly magnetized film is formed by high-frequency magnetron sputtering from the target 15 located at the bottom of the heating roll. During the sputtering process, Ar gas was introduced into the reaction chamber from the gas inlet 16.

基板フィルムとしては第4図に示す静摩擦係数を有する
膜厚10μmのポリイミドフィルムを用いた。Co−C
r膜の膜厚は2000Å、組成は重量比でCo : C
r=80 : 20であった。膜形成速度は50入/5
ecsフィルム送り速度は15゜m/win 1加熱ロ
ールの温度は150℃であった。
As the substrate film, a polyimide film having a thickness of 10 μm and having a coefficient of static friction shown in FIG. 4 was used. Co-C
The thickness of the r film is 2000 Å, and the composition is Co:C by weight.
r=80:20. Film formation speed is 50/5
The ecs film feeding speed was 15 mm/win, and the temperature of the first heating roll was 150°C.

止嵯旌上 基板フィルムとして第5図に示す静摩擦係数を有する膜
厚20μmのポリイミドフィルムを用いた他は実施例1
と同様にしてCo−Cr垂直磁化膜を作製した。
Example 1 except that a polyimide film with a thickness of 20 μm and having a coefficient of static friction shown in FIG. 5 was used as the retaining upper substrate film.
A Co--Cr perpendicular magnetization film was produced in the same manner.

比較1」一 基板フィルムとして第6図に示す静摩擦係数を一有する
膜厚10μmのポリイミドフィルムを用いた他は実施例
2と同様にしてCo−Cr垂直磁化膜を作製した。
Comparison 1 A Co--Cr perpendicular magnetization film was prepared in the same manner as in Example 2, except that a 10 μm thick polyimide film having a coefficient of static friction shown in FIG. 6 was used as the substrate film.

各Co−Cr垂直磁化膜の作製中に、ポリイミドフィル
ムに皺が発生する状態を肉眼で観察した。
During the production of each Co--Cr perpendicularly magnetized film, wrinkles were observed in the polyimide film with the naked eye.

観察結果を下記の表1に要約して示す。The observation results are summarized in Table 1 below.

(以下余白) 表」− 前記の結果から明らかなように、静摩擦係数が0.6以
下の高分子フィルムを基板として使用すると、成膜時に
基板フィルムに皺が発生せず、優れた品質の磁気記録媒
体が得られる。
(Left below) Table - As is clear from the above results, when a polymer film with a static friction coefficient of 0.6 or less is used as a substrate, wrinkles do not occur on the substrate film during film formation, and excellent quality magnetic properties can be obtained. A recording medium is obtained.

以上、ポリイミドフィルムについて本発明を説明してき
たが、本発明で使用できる高分子フィルムはこれに限定
されることなく、150℃〜300℃で0.6以下の静
摩擦係数を有する高分子フィルムであればその他のフィ
ルム、例えば、ポリフェニレンサルファイドフィルム、
ポリアミドフィルムなども好適に使用できる。
Although the present invention has been described above with respect to a polyimide film, the polymer film that can be used in the present invention is not limited thereto, and any polymer film having a coefficient of static friction of 0.6 or less at 150°C to 300°C can be used. and other films such as polyphenylene sulfide film,
Polyamide films and the like can also be suitably used.

また、成膜方法も真空蒸着およびスパッタリングに限ら
ず、薄膜型磁気記録媒体の作製に使用されるベーパデポ
ジション法ならば何れも実施可能である。
Further, the film forming method is not limited to vacuum evaporation and sputtering, but any vapor deposition method used for manufacturing thin film magnetic recording media can be used.

暇直磁気記録媒体の作製に使用される強磁性体も、Co
−Crに限定されず、FeやNiあるいはこれらの合金
類も同様に使用することができる。
The ferromagnetic material used in the production of direct magnetic recording media is also Co
The material is not limited to -Cr, and Fe, Ni, or alloys thereof can also be used.

また、垂直磁気記録媒体に限らず、成膜時の温度が15
0℃〜300℃になるような斜め蒸着膜の薄膜型磁気記
録媒体の作製においても本発明の高分子フィルム基板を
使用すれば皺が発生しない高品質の磁気記録媒体を得る
ことが出来る。
In addition, not only perpendicular magnetic recording media, but also when the temperature during film formation is 15
Even in the production of thin-film magnetic recording media with obliquely deposited films at temperatures of 0° C. to 300° C., by using the polymer film substrate of the present invention, it is possible to obtain high-quality magnetic recording media free from wrinkles.

[発明の効果] 以上説明したように、150℃〜300℃における静摩
擦係数が0.6以下の高分子フィルムを基板として使用
することにより成膜中に皺が発生しない高品質の薄膜型
磁気記録媒体特に、垂直磁気記録媒体を得ることができ
る。
[Effects of the Invention] As explained above, by using a polymer film with a static friction coefficient of 0.6 or less at 150°C to 300°C as a substrate, high quality thin film magnetic recording without wrinkles occurring during film formation can be achieved. A medium, particularly a perpendicular magnetic recording medium, can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の磁気記録媒体の作製に使用される真空
蒸着装置の−・例を示す概要図であり、第2図は本発明
の実施例1の磁気記録媒体の作製に使用されたポリイミ
ドフィルムの温度と静摩擦係数との関係を示す特性図で
あり、第3図は本発明の磁気記録媒体の作製に使用され
るスパッタリング装置の一例を示す概要図であり、第4
図は本発明の実施例2の磁気記録媒体の作製に使用され
たポリイミドフィルムの温度と静摩擦係数との関係を示
す特性図であり、第5図は比較例1における磁気記録媒
体の作製に使用されたポリイミドフィルムの温度と静摩
擦係数との関係を示す特性図であり、第6図は比較例2
における磁気記録媒体の作製に使用されたポリイミドフ
ィルムの温度と静摩擦係数との関係を示す特性図である
。 1.11・・・供給ロール 2.12・・・加熱ロール 3.13・・・巻取ロール 4.14・・・高分子フィルム基板 5・・・電子銃 6・・・蒸発諒 15・・・ターゲット 16・・・ガス導入[1
FIG. 1 is a schematic diagram showing an example of a vacuum evaporation apparatus used for producing the magnetic recording medium of the present invention, and FIG. 2 is a schematic diagram showing an example of a vacuum evaporation apparatus used for producing the magnetic recording medium of Example 1 of the present invention. FIG. 3 is a characteristic diagram showing the relationship between temperature and static friction coefficient of a polyimide film; FIG. 3 is a schematic diagram showing an example of a sputtering apparatus used for producing the magnetic recording medium of the present invention;
The figure is a characteristic diagram showing the relationship between the temperature and the coefficient of static friction of the polyimide film used in the production of the magnetic recording medium of Example 2 of the present invention, and FIG. FIG. 6 is a characteristic diagram showing the relationship between the temperature and static friction coefficient of the polyimide film obtained in Comparative Example 2.
FIG. 2 is a characteristic diagram showing the relationship between temperature and static friction coefficient of a polyimide film used in the production of a magnetic recording medium in FIG. 1.11... Supply roll 2.12... Heating roll 3.13... Take-up roll 4.14... Polymer film substrate 5... Electron gun 6... Evaporation head 15...・Target 16...Gas introduction [1

Claims (4)

【特許請求の範囲】[Claims] (1)高分子フィルムを基板とする薄膜型磁気記録媒体
において、前記高分子フィルムを加熱したステンレスス
チール(SUS)の平板の上に乗せ、この上に中心線表
面粗さRaが0.1μm、表面高さの最大高さRmax
が0.4μmの表面粗さを有する直径12mm、重さ2
0gのSUS円柱を乗せて前記フィルムと円柱の底面を
滑らせた時の静摩擦係数がフィルム温度150℃〜30
0℃で0.6以下であることを特徴とする薄膜型磁気記
録媒体。
(1) In a thin-film magnetic recording medium using a polymer film as a substrate, the polymer film is placed on a heated stainless steel (SUS) flat plate, and the center line surface roughness Ra is 0.1 μm. Maximum surface height Rmax
has a surface roughness of 0.4 μm, a diameter of 12 mm, and a weight of 2
The coefficient of static friction when a 0g SUS cylinder is placed on it and the film and the bottom of the cylinder slide is at a film temperature of 150°C to 30°C.
A thin film magnetic recording medium characterized in that the temperature is 0.6 or less at 0°C.
(2)Co−Cr垂直磁気記録媒体であることを特徴と
する請求項1記載の薄膜型磁気記録媒体。
(2) The thin film magnetic recording medium according to claim 1, which is a Co--Cr perpendicular magnetic recording medium.
(3)前記高分子フィルムの中心線平均粗さRaが10
0Å以下であることを特徴とする請求項1または2記載
の薄膜型磁気記録媒体。
(3) The center line average roughness Ra of the polymer film is 10
3. The thin film magnetic recording medium according to claim 1, wherein the thickness of the thin film magnetic recording medium is 0 Å or less.
(4)前記高分子フィルムの表面粗さの最大高さRma
xが200Å以下であることを特徴とする請求項1また
は2記載の薄膜型磁気記録媒体。
(4) Maximum height Rma of surface roughness of the polymer film
3. The thin film magnetic recording medium according to claim 1, wherein x is 200 Å or less.
JP20215689A 1989-08-03 1989-08-03 Thin film-type magnetic recording medium Pending JPH0366022A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20215689A JPH0366022A (en) 1989-08-03 1989-08-03 Thin film-type magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20215689A JPH0366022A (en) 1989-08-03 1989-08-03 Thin film-type magnetic recording medium

Publications (1)

Publication Number Publication Date
JPH0366022A true JPH0366022A (en) 1991-03-20

Family

ID=16452886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20215689A Pending JPH0366022A (en) 1989-08-03 1989-08-03 Thin film-type magnetic recording medium

Country Status (1)

Country Link
JP (1) JPH0366022A (en)

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