JPS5938929A - Production of magnetic recording medium of thin metallic film type - Google Patents
Production of magnetic recording medium of thin metallic film typeInfo
- Publication number
- JPS5938929A JPS5938929A JP14836982A JP14836982A JPS5938929A JP S5938929 A JPS5938929 A JP S5938929A JP 14836982 A JP14836982 A JP 14836982A JP 14836982 A JP14836982 A JP 14836982A JP S5938929 A JPS5938929 A JP S5938929A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- deposited
- substrate
- nonmagnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 78
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 47
- 239000002184 metal Substances 0.000 claims abstract description 46
- 239000010409 thin film Substances 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 abstract description 15
- 230000008020 evaporation Effects 0.000 abstract description 7
- 238000001704 evaporation Methods 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 6
- 229910020630 Co Ni Inorganic materials 0.000 abstract description 3
- 229910002440 Co–Ni Inorganic materials 0.000 abstract description 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 229920000728 polyester Polymers 0.000 abstract description 2
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 9
- 238000000151 deposition Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910020676 Co—N Inorganic materials 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は金属薄膜型磁気記録媒体の製法に係る、背景技
術とその問題点
金属薄膜型磁気記録媒体におけるその金属薄膜磁性層は
、これにバインダーが混入されていないことから充填密
度の向上を図ることができ、高密度記録に好適で脚光を
浴びるに至っている。この神金属薄膜磁性層としてコ／
？ ）レトＣＯ１或いはコノくルトＣｏ−ニッケルＮｉ
等の磁性金属を斜め蒸着して形成するとき、これに高い
抗磁力が得ら′ｉ′しることが知られている。しかしな
がらこの場合、蒸着方向を被蒸着面に対する垂線に対し
て４０°〜８００に傾ける必要があることから蒸着効率
が低く生産性に問題がある。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing a metal thin film magnetic recording medium, and relates to background art and its problems. Since it is free of contaminants, it is possible to improve the packing density, making it suitable for high-density recording and has come into the spotlight. As this divine metal thin film magnetic layer,
? ) Reto CO1 or Konoku Ruto Co-Nickel Ni
It is known that a high coercive force can be obtained when a magnetic metal such as a metal is formed by oblique vapor deposition. However, in this case, it is necessary to tilt the deposition direction at an angle of 40° to 800 degrees with respect to the perpendicular to the surface to be deposited, resulting in low deposition efficiency and productivity problems.
しかしながら、このような斜め蒸着によらずに高い抗磁
力を有する磁性層を形成することは容易でなく、例えば
結晶磁気異方性が大きく高抗磁力が得られると期待され
るＣｏ或いはＣｏ−Ｎｉを単に蒸着してもその抗磁力は
１０００６（エルステッド）以下であシ、磁気記録媒体
としては不適当である。However, it is not easy to form a magnetic layer with high coercive force without using such oblique deposition. Even if it is simply deposited, its coercive force is less than 10,006 Oersteds, making it unsuitable for use as a magnetic recording medium.
これに対して本出願人は、先に非磁性支持体上にビスマ
スＢｉのような低融点金属を蒸着することによってこれ
による不連続な非磁性金属層を形成し、これの上に金属
磁性層、例えばＣｏを蒸着することによって、この下地
層の非磁性金属層の影響を受けて微細粒子構造の磁性金
属層を形成して高抗磁力の磁性層を得ることができるよ
うにした磁気記録媒体を提案した。In contrast, the present applicant first deposits a low melting point metal such as bismuth Bi on a nonmagnetic support to form a discontinuous nonmagnetic metal layer, and then forms a metal magnetic layer on top of this. , for example, by vapor-depositing Co, a magnetic metal layer with a fine grain structure is formed under the influence of the non-magnetic metal layer of the underlayer, and a magnetic layer with high coercive force can be obtained. proposed.
更に、本出願人は非磁性支持体の構成材料に依存するこ
となく、高抗磁力の金属磁性層を形成することができる
ものとして、非磁性支持体上にシリコンｓｔ′！！たけ
Ｓｌの化合物の非晶質連続膜を形成しこれの上に低融点
の非晶質金属の例えばＢｉを不連続の島状の層表して蒸
着し、これの上に例えばＣｏの蒸着膜による金ＰＡ磁性
層を形成するようにした磁気記録媒体を提案した。Furthermore, the present applicant has developed silicon st'! on a non-magnetic support as a metal magnetic layer with high coercive force that can be formed without depending on the constituent material of the non-magnetic support. ! An amorphous continuous film of a compound of Bamboo Sl is formed, and a low melting point amorphous metal such as Bi is vapor deposited as a discontinuous island-like layer on top of this. A magnetic recording medium in which a gold PA magnetic layer is formed has been proposed.
このように表面にＳｌが被着さｉｔだ或いはＳｉが被着
されない非磁性支持体上に不連続々島状の非磁性金属層
を形成し、これの上に磁性金属層が積層されてなる金属
薄膜型磁気記録媒体を得る方法としては、非磁性支持体
として長尺物を用意し、これを真空熱Ｎ層内でその供給
ロール側から巻取りロール側へと巻取りつつ移行させ、
この移行状態で島状に不連続にＢｉを蒸着１．て不連后
１；な非磁性金属層を形成してこれを一旦＠堆りロール
に巻取り、その後、例えば巻取９０−ル側を供給ロール
側と１〜て他方のロールへと移行させてＢｉの不連続な
非磁性金属層上にＣｏ 、或いはＣｏ−Ｎ１を連続磁性
金属層として蒸沼形成する方法が考えられる◇しかしな
がら、このようにＢｉを一旦蒸着させ、これを巻取る場
合、非磁性支持体が高温加熱状態にあり、低融点のＢｉ
がまだ溶融状態でその巻取が行われるためにこれが非磁
性支持体上の他方の面に転写されるなどして、その後こ
れの上に形成したＣｏ或いはＣｏ−Ｎ１の蒸着層が均一
に表面性のよい層として形成されない。また、他の方法
としては真空蒸着槽内にＳ１層が表面に形成された、或
いは形成されていない非磁性体を固定配置し、これに上
述した低融点非磁性金属のＢｉを不連続の島状の層とし
て蒸着し、そ−の後、これの上にＣｏ若しくはＣｏ−Ｎ
１の金属磁性層を蒸着することが考えられる。In this way, a discontinuous island-shaped non-magnetic metal layer is formed on the non-magnetic support whose surface is not coated with Sl or Si, and a magnetic metal layer is laminated on top of this. As a method for obtaining a metal thin film type magnetic recording medium, a long material is prepared as a nonmagnetic support, and this is transferred while being wound from the supply roll side to the take-up roll side in a vacuum thermal N layer.
In this transition state, Bi is deposited discontinuously in the form of islands.1. After that, a non-magnetic metal layer is formed, which is once wound onto a deposit roll, and then, for example, the winding 90-roll side is transferred to the supply roll side, and then the other roll is transferred. A possible method is to form a continuous magnetic metal layer of Co or Co-N1 on a discontinuous non-magnetic metal layer of Bi. However, when Bi is once deposited in this way and then rolled up, The non-magnetic support is heated to a high temperature, and the low melting point Bi
Since it is wound while still in a molten state, it is transferred to the other side of the non-magnetic support, and the Co or Co-N1 vapor deposited layer formed thereon is then uniformly formed on the surface. It is not formed as a layer with good properties. Another method is to fix a nonmagnetic material with or without an S1 layer formed on its surface in a vacuum evaporation tank, and place the above-mentioned low melting point nonmagnetic metal Bi on the nonmagnetic material in discontinuous islands. Co or Co-N is deposited on top of this.
It is conceivable to deposit one metal magnetic layer.
しかしながら、これらいずれの方法による場合において
も充分高い抗磁力が得られず、上述した金属薄膜型磁気
記録媒体を得る場合、その製造手順が大きな影響を及ぼ
すことを見出した。However, it has been found that a sufficiently high coercive force cannot be obtained with any of these methods, and that the manufacturing procedure has a significant influence when obtaining the above-mentioned thin metal film type magnetic recording medium.
発明の概要
本発明においては、非磁性支持体上にこの非磁性支持体
を移動させながら不連続な島状の非磁性金属層とこれの
上に磁性金属１−とを形成する〇実施例
本発明において、例えば第１図に示すように真空蒸着＃
（１）内に、例えば長尺物として用意された１非磁性支
持体（２）をその供給ロール（３）側から巻取りロール
（４）側へと矢印ａに示す方向に一方向に移行させる。Summary of the Invention In the present invention, a discontinuous island-shaped nonmagnetic metal layer and a magnetic metal 1- are formed on the non-magnetic support while moving the non-magnetic support. In the invention, for example, as shown in FIG.
(1), one non-magnetic support (2) prepared as a long object, for example, is transferred in one direction from the supply roll (3) side to the take-up roll (4) side in the direction shown by arrow a. let
この非磁性支持体（１）は、例えばポリエステル、ポリ
イミド、ポリエチレンテレフタレート等の高分子フィル
ムを使用し得る。この支持体（２）はその表面に冒頭に
述べたような３ｉ非晶質層が予め被着されるか或いは被
着されないものが使用される。As this non-magnetic support (1), for example, a polymer film such as polyester, polyimide, polyethylene terephthalate, etc. can be used. This support (2) is used either with or without a 3i amorphous layer previously deposited on its surface as mentioned at the beginning.
そしてこの非磁性支持体（２）の供給ロール（３）側か
ら巻取りロール（４）側への移行途上において、その一
方の面に対向して図においては下方に不連続な島状の非
磁性金属層を形成し得る低融点金属材料の例えばＢｌの
蒸着源（５）を配置すると共に、この非磁性支持体（２
）の移行方向に関する流れ１の後方、すなわち後段側に
金属薄膜磁性層を形成するだめの強磁性金属例えばＣｏ
或いはＣｏ−Ｎｉ等の磁性金属蒸着源（６）を配置する
。図において（７）は加熱用ラングを示す。また蒸着源
（５）及び（６）と非蒸着体としての非磁性支持体（２
）との間には遮蔽板（８）が配置される。In the middle of the transition of the non-magnetic support (2) from the supply roll (3) side to the take-up roll (4) side, a discontinuous island-shaped non-magnetic material is formed downwardly in the figure, facing one side of the non-magnetic support (2). A vapor deposition source (5) of a low-melting metal material, such as Bl, which can form a magnetic metal layer is arranged, and the non-magnetic support (2
) A ferromagnetic metal, e.g.
Alternatively, a magnetic metal vapor deposition source (6) such as Co--Ni is arranged. In the figure, (7) indicates a heating rung. Also, the evaporation sources (5) and (6) and the non-magnetic support (2) as a non-evaporation body
) A shielding plate (8) is arranged between the two.
このような装置によって非磁性支持体（２）を移行させ
ながら例えばＢｉの蒸着を行って、第２図に示−すよう
に非磁性支持体（りの一方の面にこのＢｉよりなる島状
の不連続な非磁性金属層（９）を形成し、続いてこれの
上にＣｏ或いはＣｏ−Ｎｉ等の連続磁性金１ｆｆｉ １
４ （１１１を形成して巻取りロール（４）へと巻取ら
れるようになされる。For example, by vapor-depositing Bi while moving the non-magnetic support (2) using such an apparatus, an island-like structure made of Bi is formed on one surface of the non-magnetic support (2) as shown in FIG. A discontinuous non-magnetic metal layer (9) is formed, and then a continuous magnetic gold layer such as Co or Co-Ni is formed on this layer.
4 (111) and is wound onto a winding roll (4).
ここに不連続の島状の非磁性金属層（９）の構成材料と
しては、すなわち蒸着源（５）としては上述したＢｌに
限らず、その他Ｓｂ ＋ Ｔｔ ＋ Ｓｅ ＋ Ｃｄ
＋ Ｉｎ ＋Ｓｎ ＋ Ｔｅ ＋ Ｐｂ ＋ Ｐｏまた
はそれらの合金を用い得る。これらの材料は蒸着条件を
選定することによシ非磁性支持体（２）上に不連続な島
状の層として形成することができるが、これらの金属元
素中でも特にＢｉを用いた場合は、これの上に磁性金属
層ｑＱを蒸着したときにその磁性金属蒸着層の抗磁力Ｈ
ｅが顕著に大きくなることができることが確められた。Here, the constituent material of the discontinuous island-shaped nonmagnetic metal layer (9), that is, the vapor deposition source (5), is not limited to the above-mentioned Bl, but also Sb + Tt + Se + Cd.
+ In + Sn + Te + Pb + Po or alloys thereof may be used. These materials can be formed as discontinuous island-like layers on the non-magnetic support (2) by selecting the deposition conditions, but when using Bi among these metal elements, When a magnetic metal layer qQ is deposited on top of this, the coercive force H of the magnetic metal deposited layer is
It has been established that e can become significantly large.
従ってこのような不連続島状の非磁性金Ｈ４層（９）と
してはＢｌを用いることが望ましい。また、この非磁性
金属Ａｌ（９）の厚さは、その平均膜厚が１０〜１００
０１ （１ｔｉｇ／ｃｍ２〜１００ ｔｔｇ／ｃｍ”
）好ましくは１００〜１０００ Ｘに選ばれる。Therefore, it is desirable to use Bl as such a non-magnetic gold H4 layer (9) in the form of discontinuous islands. Moreover, the average thickness of this non-magnetic metal Al(9) is 10 to 100
01 (1tig/cm2~100ttg/cm”
) is preferably selected from 100 to 1000X.
また磁性層０１け、ｃｏ単体或いはＣｏ合金の例えばＮ
ｌを４（Ｌｆｔｉ１以下含有しだＣｏ−Ｎｉ合金の蒸着
膜によって形成することが好ましい。そしてとの膜厚ハ
１００〜１０００ Ｘ、好寸シ＜は２５０〜５００ Ｘ
Ｋ 選ばれる。すなわちこれはこの磁性層（１０の厚
さがあまシ薄いと充分な磁束密度が得られなくなり、ま
た厚すぎると抗磁力Ｈｃ、更に角型比Ｒｓが充分に得ら
れなくなることを認めたことになる。In addition, the magnetic layer 01 is made of Co alone or a Co alloy such as N.
It is preferable to form a vapor-deposited film of a Co-Ni alloy containing 4 (Lfti or less).
K is selected. In other words, this is based on the recognition that if the thickness of this magnetic layer (10) is too thin, sufficient magnetic flux density cannot be obtained, and if it is too thick, sufficient coercive force Hc and squareness ratio Rs cannot be obtained. Become.
尚、上述した例では長尺物の非磁性支持体（２）を一方
向に移動させながら不連続な島状の非磁性金属層（９）
とこれの上に磁性金属層ａ１とを蒸着形成するようにし
た場合であるが、ある嚇合は蒸着源に対してシート状な
いしはディスク状の非磁性支持体（２）を相対的に回転
させながら同様の不連続な島状の非磁性金Ｍ１１と磁性
金属層との蒸着形成を行うようにすることもできる。In the above example, while moving the elongated nonmagnetic support (2) in one direction, the discontinuous island-shaped nonmagnetic metal layer (9) is
This is a case where the magnetic metal layer a1 is formed on the magnetic metal layer a1 by vapor deposition, but in some cases, the sheet-like or disk-like non-magnetic support (2) is rotated relative to the vapor deposition source. However, similar discontinuous island-shaped non-magnetic gold M11 and magnetic metal layer may be formed by vapor deposition.
しかしながら、いずれの場合においても非磁性支持体（
２）に対する各非磁性金Ｍ ＃ （９）及び磁性金属層
αＱの蒸着に当っての非磁性支持体（２）の移行速度は
線速度が０．１〜１００ ｍ７分となるように選ばれ、
この範囲で支持体（２）の移行による特性向上への影響
が顕著であることが確められた。However, in both cases, the non-magnetic support (
The transfer speed of the non-magnetic support (2) during the vapor deposition of each non-magnetic gold M# (9) and the magnetic metal layer αQ for the 2) was selected such that the linear velocity was 0.1 to 100 m7min. ,
It was confirmed that within this range, the influence of transfer of support (2) on property improvement was significant.
実施例１゜
第１図で説明した真空蒸着装置を用いて非磁性支持体（
２）の温度を１５０℃とし、巻取り速度が１．５ｍ／分
で支持体（２）を移行させなからＢｌとＣｏとを１１次
連続的に蒸着して不連続な島状の非磁性金属層（９）と
磁性金属層０〔）とを形成して金属薄膜型磁気記録媒体
を得た。この場合Ｃｏの膜厚は３００Ｘ、Ｂｌの膜厚が
１５０Ｘにおいて抗磁力Ｈｅは８６００ｅ 、角形比Ｒ
ｓは０．７５であった。Example 1 A non-magnetic support (
The temperature in step 2) was set to 150°C, the winding speed was 1.5 m/min, and without moving the support (2), Bl and Co were continuously evaporated 11 times to form discontinuous island-shaped non-magnetic A metal thin film type magnetic recording medium was obtained by forming a metal layer (9) and a magnetic metal layer 0 [). In this case, the Co film thickness is 300X, the Bl film thickness is 150X, the coercive force He is 8600e, and the squareness ratio R
s was 0.75.
実施例２
実施例１と同様の方法において非磁性支持体（２）の温
度を１７０℃としてその巻取り速度１．５ ｍ７分の条
件で同様の蒸着を行った。この場合ＣＯの膜厚が３５０
Ｘ、Ｂｌの膜厚が１５０Ｘにおい７Ｈｃは８３００ｅ、
Ｒｉは０．８０であった。Example 2 In the same manner as in Example 1, vapor deposition was performed in the same manner as in Example 1, with the temperature of the nonmagnetic support (2) being 170° C. and the winding speed being 1.5 m7 minutes. In this case, the CO film thickness is 350
X, Bl film thickness is 150X, 7Hc is 8300e,
Ri was 0.80.
実施例３
シート状或いはディスク状の非磁性支持体をボールグー
に固定し、その中心が蒸Ｍ源真上の中心から１０ｃｒｎ
離すようにして蒸着源に対して偏心させた状態で膜厚分
布が均一になるように蒸着源に′対してホルダー、した
がってシート状或いはディスク状の非磁性支持体を回転
させなからＢｉを２００ Ｘ蒸着して不連続な島状の非
磁性金属層（９）を形成し、これの上にＣｏを３００Ｘ
の厚さに蒸着した。このときの回転数は５０ ｒｐｍと
した。この場合、そのＨｃは８６００ｓ 、 Ｒｇは０
．８８となった。尚、このような回転方式による」δ自
においてもその線速度は各部において０．１〜１００ｍ
／分の範囲となっている。Example 3 A sheet-like or disk-like nonmagnetic support is fixed to a ball goo, and its center is 10 crn from the center directly above the vapor source.
The holder (therefore, the sheet-like or disk-like nonmagnetic support) is rotated with respect to the vapor deposition source so that the film thickness distribution becomes uniform while the Bi is placed eccentrically with respect to the vapor deposition source. A discontinuous island-like nonmagnetic metal layer (9) is formed by X evaporation, and Co is deposited on top of this by 300X
It was deposited to a thickness of . The rotation speed at this time was 50 rpm. In this case, its Hc is 8600s and Rg is 0
．． It became 88. In addition, even in the case of ``δ'' using such a rotation method, the linear velocity is 0.1 to 100 m at each part.
/minute range.
参考例１
基体温度１５０℃、すなわち非磁性支持体（２）の温度
１５０℃下において先ずＢｉを２００Ｘの厚さに島状に
蒸清し、これを一旦巻取シ再びＣｏを３００Ｘの厚さに
蒸着して得た。この場合の磁性金属層すなわちＣｏの表
面は肉眼によっても不均一な膜となった。Reference Example 1 At a substrate temperature of 150°C, that is, a temperature of the non-magnetic support (2) of 150°C, Bi was first distilled into islands to a thickness of 200X, which was then wound up and Co was again distilled to a thickness of 300X. It was obtained by vapor deposition. In this case, the surface of the magnetic metal layer, ie, Co, was a non-uniform film even to the naked eye.
比較例１
非磁性支持体をボールグーに固定し、この固定したまま
の状態でＢｉを２００Ｘ蒸着し、その後これの上にＣｏ
を３００Ｘの厚さに蒸着した。このようにして得た磁気
記録媒体はＨｃが８５０、Ｒ８が０．６７となった。Comparative Example 1 A non-magnetic support was fixed to a ball goo, Bi was evaporated at 200X while it remained fixed, and then Co was deposited on top of this.
was deposited to a thickness of 300X. The magnetic recording medium thus obtained had an Hc of 850 and an R8 of 0.67.
上述したように各実施例１〜３は参考例１及び比較例１
と比較して明らかなように、その角型比が格段的に向上
していることがわかる。As mentioned above, each of Examples 1 to 3 is Reference Example 1 and Comparative Example 1.
As is clear from the comparison, the squareness ratio is significantly improved.
発明の効果
本発明製法によって得た磁気記録媒体によれば高い抗磁
力ＴＩｃを確実に得ることができた状態で、角型比ＲＳ
に優れた磁気記録媒体を得ることができ、また連続蒸着
によってその製造を行なうことができるので量産性にも
優れ工業的にその利益は犬である。Effects of the Invention According to the magnetic recording medium obtained by the manufacturing method of the present invention, a high coercive force TIc can be reliably obtained, and the squareness ratio RS can be
It is possible to obtain a magnetic recording medium with excellent properties, and since it can be manufactured by continuous vapor deposition, it is excellent in mass production and has great industrial advantages.
第１図は本発明製法を実施する蒸着装置の一例を示す路
線的構成図、第２図は本発明によって得た金属薄膜型磁
気記録媒体の一例の路線的断面図である。FIG. 1 is a schematic block diagram showing an example of a vapor deposition apparatus for implementing the manufacturing method of the present invention, and FIG. 2 is a schematic cross-sectional view of an example of a metal thin film type magnetic recording medium obtained by the present invention.
Claims (1)
４枕な島状の非磁性金属層を形成し、該非磁性金属層上
に磁性金属層を形成することを特徴とする金属薄膜型磁
気記録媒体の製法。A metal thin film characterized in that a nonmagnetic metal layer in the form of an island is formed on a nonmagnetic support without moving the nonmagnetic support, and a magnetic metal layer is formed on the nonmagnetic metal layer. Manufacturing method for type magnetic recording media.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14836982A JPS5938929A (en) | 1982-08-26 | 1982-08-26 | Production of magnetic recording medium of thin metallic film type |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14836982A JPS5938929A (en) | 1982-08-26 | 1982-08-26 | Production of magnetic recording medium of thin metallic film type |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5938929A true JPS5938929A (en) | 1984-03-03 |
Family
ID=15451216
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14836982A Pending JPS5938929A (en) | 1982-08-26 | 1982-08-26 | Production of magnetic recording medium of thin metallic film type |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5938929A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7008705B2 (en) | 2000-10-25 | 2006-03-07 | Fujitsu Limited | Layered polycrystalline structure and method of making the same |
-
1982
- 1982-08-26 JP JP14836982A patent/JPS5938929A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7008705B2 (en) | 2000-10-25 | 2006-03-07 | Fujitsu Limited | Layered polycrystalline structure and method of making the same |
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