JPH0364059B2 - - Google Patents

Info

Publication number
JPH0364059B2
JPH0364059B2 JP9409985A JP9409985A JPH0364059B2 JP H0364059 B2 JPH0364059 B2 JP H0364059B2 JP 9409985 A JP9409985 A JP 9409985A JP 9409985 A JP9409985 A JP 9409985A JP H0364059 B2 JPH0364059 B2 JP H0364059B2
Authority
JP
Japan
Prior art keywords
developer
parts
ether
sodium
silicate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9409985A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61251857A (ja
Inventor
Juzo Yokota
Hidekazu Takai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Foil Manufacturing Co Ltd
Original Assignee
Nippon Foil Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Foil Manufacturing Co Ltd filed Critical Nippon Foil Manufacturing Co Ltd
Priority to JP9409985A priority Critical patent/JPS61251857A/ja
Publication of JPS61251857A publication Critical patent/JPS61251857A/ja
Publication of JPH0364059B2 publication Critical patent/JPH0364059B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9409985A 1985-05-01 1985-05-01 感光性平版印刷版用現像剤 Granted JPS61251857A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9409985A JPS61251857A (ja) 1985-05-01 1985-05-01 感光性平版印刷版用現像剤

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9409985A JPS61251857A (ja) 1985-05-01 1985-05-01 感光性平版印刷版用現像剤

Publications (2)

Publication Number Publication Date
JPS61251857A JPS61251857A (ja) 1986-11-08
JPH0364059B2 true JPH0364059B2 (enrdf_load_html_response) 1991-10-03

Family

ID=14100995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9409985A Granted JPS61251857A (ja) 1985-05-01 1985-05-01 感光性平版印刷版用現像剤

Country Status (1)

Country Link
JP (1) JPS61251857A (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPS61251857A (ja) 1986-11-08

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