JPH036220B2 - - Google Patents
Info
- Publication number
- JPH036220B2 JPH036220B2 JP8915985A JP8915985A JPH036220B2 JP H036220 B2 JPH036220 B2 JP H036220B2 JP 8915985 A JP8915985 A JP 8915985A JP 8915985 A JP8915985 A JP 8915985A JP H036220 B2 JPH036220 B2 JP H036220B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- sputtering
- substrate
- thin film
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 44
- 239000010409 thin film Substances 0.000 claims description 19
- 238000007789 sealing Methods 0.000 claims description 3
- 230000000903 blocking effect Effects 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 32
- 239000010408 film Substances 0.000 description 16
- 239000007789 gas Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 239000011810 insulating material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8915985A JPS61250164A (ja) | 1985-04-25 | 1985-04-25 | スパツタリングカソ−ド |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8915985A JPS61250164A (ja) | 1985-04-25 | 1985-04-25 | スパツタリングカソ−ド |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61250164A JPS61250164A (ja) | 1986-11-07 |
| JPH036220B2 true JPH036220B2 (ref) | 1991-01-29 |
Family
ID=13963051
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8915985A Granted JPS61250164A (ja) | 1985-04-25 | 1985-04-25 | スパツタリングカソ−ド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61250164A (ref) |
-
1985
- 1985-04-25 JP JP8915985A patent/JPS61250164A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61250164A (ja) | 1986-11-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |