JPH0359543B2 - - Google Patents
Info
- Publication number
- JPH0359543B2 JPH0359543B2 JP57084189A JP8418982A JPH0359543B2 JP H0359543 B2 JPH0359543 B2 JP H0359543B2 JP 57084189 A JP57084189 A JP 57084189A JP 8418982 A JP8418982 A JP 8418982A JP H0359543 B2 JPH0359543 B2 JP H0359543B2
- Authority
- JP
- Japan
- Prior art keywords
- rotating disk
- stainless steel
- ion implantation
- aluminum
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910001220 stainless steel Inorganic materials 0.000 claims description 52
- 239000010935 stainless steel Substances 0.000 claims description 52
- 229910052782 aluminium Inorganic materials 0.000 claims description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 23
- 238000001816 cooling Methods 0.000 claims description 19
- 238000005468 ion implantation Methods 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000010884 ion-beam technique Methods 0.000 claims description 10
- 150000002500 ions Chemical class 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 18
- 239000000498 cooling water Substances 0.000 description 13
- 238000002513 implantation Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005536 corrosion prevention Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57084189A JPS5951448A (ja) | 1982-05-18 | 1982-05-18 | イオン打込用回転円板の冷却機構 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57084189A JPS5951448A (ja) | 1982-05-18 | 1982-05-18 | イオン打込用回転円板の冷却機構 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5951448A JPS5951448A (ja) | 1984-03-24 |
JPH0359543B2 true JPH0359543B2 (enrdf_load_stackoverflow) | 1991-09-10 |
Family
ID=13823521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57084189A Granted JPS5951448A (ja) | 1982-05-18 | 1982-05-18 | イオン打込用回転円板の冷却機構 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5951448A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6977392B2 (en) | 1991-08-23 | 2005-12-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor display device |
US7420628B1 (en) | 1991-02-16 | 2008-09-02 | Semiconductor Energy Laboratory Co., Ltd. | Method of making an active-type LCD with digitally graded display |
US7489367B1 (en) | 1991-03-26 | 2009-02-10 | Semiconductor Energy Laboratory, Co., Ltd. | Electro-optical device and method for driving the same |
-
1982
- 1982-05-18 JP JP57084189A patent/JPS5951448A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7420628B1 (en) | 1991-02-16 | 2008-09-02 | Semiconductor Energy Laboratory Co., Ltd. | Method of making an active-type LCD with digitally graded display |
US7489367B1 (en) | 1991-03-26 | 2009-02-10 | Semiconductor Energy Laboratory, Co., Ltd. | Electro-optical device and method for driving the same |
US6977392B2 (en) | 1991-08-23 | 2005-12-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor display device |
Also Published As
Publication number | Publication date |
---|---|
JPS5951448A (ja) | 1984-03-24 |
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