JPH0354457B2 - - Google Patents

Info

Publication number
JPH0354457B2
JPH0354457B2 JP58222644A JP22264483A JPH0354457B2 JP H0354457 B2 JPH0354457 B2 JP H0354457B2 JP 58222644 A JP58222644 A JP 58222644A JP 22264483 A JP22264483 A JP 22264483A JP H0354457 B2 JPH0354457 B2 JP H0354457B2
Authority
JP
Japan
Prior art keywords
internal electrode
gas
chamber
etching
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58222644A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60126833A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58222644A priority Critical patent/JPS60126833A/ja
Publication of JPS60126833A publication Critical patent/JPS60126833A/ja
Publication of JPH0354457B2 publication Critical patent/JPH0354457B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
JP58222644A 1983-11-24 1983-11-24 プラズマエツチング装置 Granted JPS60126833A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58222644A JPS60126833A (ja) 1983-11-24 1983-11-24 プラズマエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58222644A JPS60126833A (ja) 1983-11-24 1983-11-24 プラズマエツチング装置

Publications (2)

Publication Number Publication Date
JPS60126833A JPS60126833A (ja) 1985-07-06
JPH0354457B2 true JPH0354457B2 (enExample) 1991-08-20

Family

ID=16785678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58222644A Granted JPS60126833A (ja) 1983-11-24 1983-11-24 プラズマエツチング装置

Country Status (1)

Country Link
JP (1) JPS60126833A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62241336A (ja) * 1986-04-11 1987-10-22 Nec Kyushu Ltd プラズマエツチング装置
JP2832724B2 (ja) * 1989-06-16 1998-12-09 東京エレクトロン株式会社 被処理体処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127761A (en) * 1976-04-19 1977-10-26 Fujitsu Ltd Gas plasma etching unit
JPS5358761A (en) * 1976-11-08 1978-05-26 Sony Corp Vapor phase growth apparatus

Also Published As

Publication number Publication date
JPS60126833A (ja) 1985-07-06

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