JPS60126833A - プラズマエツチング装置 - Google Patents

プラズマエツチング装置

Info

Publication number
JPS60126833A
JPS60126833A JP58222644A JP22264483A JPS60126833A JP S60126833 A JPS60126833 A JP S60126833A JP 58222644 A JP58222644 A JP 58222644A JP 22264483 A JP22264483 A JP 22264483A JP S60126833 A JPS60126833 A JP S60126833A
Authority
JP
Japan
Prior art keywords
internal electrode
plasma
etching
chamber
axial direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58222644A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0354457B2 (enExample
Inventor
Shigeji Kinoshita
木下　繁治
Kenichi Hatasako
畑迫　健一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP58222644A priority Critical patent/JPS60126833A/ja
Publication of JPS60126833A publication Critical patent/JPS60126833A/ja
Publication of JPH0354457B2 publication Critical patent/JPH0354457B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
JP58222644A 1983-11-24 1983-11-24 プラズマエツチング装置 Granted JPS60126833A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58222644A JPS60126833A (ja) 1983-11-24 1983-11-24 プラズマエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58222644A JPS60126833A (ja) 1983-11-24 1983-11-24 プラズマエツチング装置

Publications (2)

Publication Number Publication Date
JPS60126833A true JPS60126833A (ja) 1985-07-06
JPH0354457B2 JPH0354457B2 (enExample) 1991-08-20

Family

ID=16785678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58222644A Granted JPS60126833A (ja) 1983-11-24 1983-11-24 プラズマエツチング装置

Country Status (1)

Country Link
JP (1) JPS60126833A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62241336A (ja) * 1986-04-11 1987-10-22 Nec Kyushu Ltd プラズマエツチング装置
JPH0319318A (ja) * 1989-06-16 1991-01-28 Tokyo Erekutoron Kyushu Kk 被処理体処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127761A (en) * 1976-04-19 1977-10-26 Fujitsu Ltd Gas plasma etching unit
JPS5358761A (en) * 1976-11-08 1978-05-26 Sony Corp Vapor phase growth apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127761A (en) * 1976-04-19 1977-10-26 Fujitsu Ltd Gas plasma etching unit
JPS5358761A (en) * 1976-11-08 1978-05-26 Sony Corp Vapor phase growth apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62241336A (ja) * 1986-04-11 1987-10-22 Nec Kyushu Ltd プラズマエツチング装置
JPH0319318A (ja) * 1989-06-16 1991-01-28 Tokyo Erekutoron Kyushu Kk 被処理体処理装置

Also Published As

Publication number Publication date
JPH0354457B2 (enExample) 1991-08-20

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