JPH0349098B2 - - Google Patents

Info

Publication number
JPH0349098B2
JPH0349098B2 JP58065942A JP6594283A JPH0349098B2 JP H0349098 B2 JPH0349098 B2 JP H0349098B2 JP 58065942 A JP58065942 A JP 58065942A JP 6594283 A JP6594283 A JP 6594283A JP H0349098 B2 JPH0349098 B2 JP H0349098B2
Authority
JP
Japan
Prior art keywords
thin film
metal
layer
film layer
metal thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58065942A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59191029A (ja
Inventor
Takeo Morya
Toshio Yamagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP58065942A priority Critical patent/JPS59191029A/ja
Publication of JPS59191029A publication Critical patent/JPS59191029A/ja
Publication of JPH0349098B2 publication Critical patent/JPH0349098B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58065942A 1983-04-13 1983-04-13 金属画像形成材料 Granted JPS59191029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065942A JPS59191029A (ja) 1983-04-13 1983-04-13 金属画像形成材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065942A JPS59191029A (ja) 1983-04-13 1983-04-13 金属画像形成材料

Publications (2)

Publication Number Publication Date
JPS59191029A JPS59191029A (ja) 1984-10-30
JPH0349098B2 true JPH0349098B2 (enrdf_load_stackoverflow) 1991-07-26

Family

ID=13301523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065942A Granted JPS59191029A (ja) 1983-04-13 1983-04-13 金属画像形成材料

Country Status (1)

Country Link
JP (1) JPS59191029A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5876833A (ja) * 1981-11-02 1983-05-10 Konishiroku Photo Ind Co Ltd 画像形成材料
JPS59210443A (ja) * 1983-03-24 1984-11-29 Kimoto & Co Ltd 感光性材料

Also Published As

Publication number Publication date
JPS59191029A (ja) 1984-10-30

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