JPH0348570B2 - - Google Patents
Info
- Publication number
- JPH0348570B2 JPH0348570B2 JP60182504A JP18250485A JPH0348570B2 JP H0348570 B2 JPH0348570 B2 JP H0348570B2 JP 60182504 A JP60182504 A JP 60182504A JP 18250485 A JP18250485 A JP 18250485A JP H0348570 B2 JPH0348570 B2 JP H0348570B2
- Authority
- JP
- Japan
- Prior art keywords
- coil
- magnetic pole
- recording
- magnetic
- magnetoresistive element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 239000010408 film Substances 0.000 description 19
- 238000004544 sputter deposition Methods 0.000 description 10
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 6
- 229910000889 permalloy Inorganic materials 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気ヘツドの構造に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to the structure of a magnetic head.
本発明は磁気ヘツドにおいて、記録電流を流す
多巻きのコイルと軟磁性薄膜の磁路で構成される
記録用磁気ヘツドの磁路の一部に、信号再生用の
磁気抵抗効果素子を入れ、かつコイルの一部に電
流を流して磁気抵抗効果素子にバイアス磁界を加
えることにより、記録用と再生用の磁気ヘツドを
分離することなく一連の薄膜プロセスで形成し、
かつ記録電流を少なくし、磁気抵抗効果素子によ
つて低速で運動する媒体からでも高出力を得るよ
うにしたものである。
The present invention provides a magnetic head in which a magnetoresistive element for signal reproduction is inserted into a part of the magnetic path of the magnetic head for recording, which is composed of a multi-turn coil through which a recording current flows and a magnetic path of a soft magnetic thin film. By applying a bias magnetic field to the magnetoresistive element by applying a current to a part of the coil, the recording and reproducing magnetic heads are formed using a series of thin film processes without being separated.
In addition, the recording current is reduced, and a high output can be obtained even from a medium moving at low speed using a magnetoresistive element.
磁気抵抗効果素子を用いた従来の磁気ヘツドは
再生専用が多く、磁気記録装置としては記録用の
磁気ヘツドが必要であつた。また、IEEE
TRANSACTIONS ON MAGNE−TICS、
VOL.MAG−17、No.６、NOVEMBER 1981、
PP2890−2892、あるいは、同誌VOL.MAG−19、
No.５、SEPTEMBER 1983.PP1737−1739のよう
に、薄膜プロセスによつて記録用磁気ヘツドと再
生用磁気ヘツドを一体化したものがあるが、記録
用のコイルは１ターンで、記録に必要な電流は数
100ｍＡ必要であつた。
Conventional magnetic heads using magnetoresistive elements are often used only for reproduction, and magnetic recording devices require magnetic heads for recording. Also, IEEE
TRANSACTIONS ON MAGNE−TICS,
VOL.MAG−17, No.6, NOVEMBER 1981,
PP2890−2892, or the same magazine VOL.MAG−19,
No. 5, SEPTEMBER 1983. PP1737-1739 has integrated a magnetic head for recording and a magnetic head for reproduction using a thin film process, but the recording coil has only one turn, and only one turn is required for recording. The current is a number
100mA was required.
しかし、前述の従来技術では、再生用磁気ヘツ
ドの他に記録用の磁気ヘツドが必要となり、磁気
記録装置を小型化する場合の障害となる。また、
電池駆動等低消費電力化を行なう場合、記録電流
は小さくなければならない。
However, the above-mentioned prior art requires a recording magnetic head in addition to a reproducing magnetic head, which poses an obstacle to downsizing the magnetic recording apparatus. Also,
When achieving low power consumption such as battery drive, the recording current must be small.
そこで本発明はこのような問題点を解決するも
ので、その目的とするところは、低電流で大きな
起磁力が得られる多数巻きのコイルを持つ記録用
磁気ヘツドの磁路の一部に再生用の磁気抵抗効果
素子を挿入し、記録・再生用磁気ヘツドを一体化
するとともに、再生時にはコイルの一部に電流を
流して磁気抵抗効果素子にバイアス磁界をかける
ことにより、バイアス印加用の導体を別個に作ら
なくても良い磁気ヘツドを提供することにある。 The present invention is intended to solve these problems.The purpose of the present invention is to install a reproducing magnetic head in a part of the magnetic path of a recording magnetic head, which has a multi-turn coil that can generate a large magnetomotive force with a low current. A magnetic head for recording and reproduction is integrated by inserting a magnetoresistive element, and at the time of reproduction, a current is passed through a part of the coil to apply a bias magnetic field to the magnetoresistive element, so that the conductor for bias application is The object of the present invention is to provide a magnetic head that does not need to be manufactured separately.
本発明の磁気ヘツドは、基板上に形成された下
磁極と、前記下磁極上にコイル形成をするための
絶縁膜と、前記絶縁膜上にコイルとが順に複層に
形成され、前記コイルはコイル接合部で接合され
てなる磁気ヘツドにおいて、
前記磁気ヘツドは、最上層の前記コイル上に形
成された絶縁膜を介して形成された磁気抵抗効果
素子と、該磁気抵抗効果素子上に形成された絶縁
膜と、該磁気抵抗効果素子上に形成された絶縁膜
を介して形成された上磁極とを有し、
前記磁気抵抗効果素子は、前記最上層のコイル
の１ターン部分のギヤツプ側のコイル幅上に設け
られ且つ前記磁気抵抗効果素子は前記コイルの長
手方向に沿つて両端にそれぞれ出力端子を有する
導体で接続されてなり、
前記上磁極は、前記ギヤツプ側で第一層のコイ
ル形成のための絶縁膜上に接合され、前記磁気抵
抗効果素子上の不連続部で不連続となり、前記ギ
ヤツプ側より反対方向のコイル中央付近の磁極接
合部で下磁極接合していることを特徴とする。
The magnetic head of the present invention includes a lower magnetic pole formed on a substrate, an insulating film for forming a coil on the lower magnetic pole, and a coil on the insulating film in order, and the coil is formed in multiple layers. In a magnetic head joined at a coil junction, the magnetic head includes a magnetoresistive element formed through an insulating film formed on the uppermost coil, and a magnetoresistive element formed on the magnetoresistive element. an insulating film formed on the magnetoresistive element, and an upper magnetic pole formed through the insulating film formed on the magnetoresistive element; The magnetoresistive element is provided on the width of the coil and is connected along the longitudinal direction of the coil with a conductor having output terminals at both ends, and the upper magnetic pole is connected to the first layer of coil formation on the gap side. The magneto-resistance effect element is bonded to an insulating film, the magnetic pole is discontinuous at a discontinuous portion on the magnetoresistive element, and the lower magnetic pole is bonded at a magnetic pole bonding portion near the center of the coil in the opposite direction from the gap side. do.
第１図は本発明の磁気ヘツドの平面図である。
図が繁雑になるので第１層コイル１１０がその上
の膜にかくれる部分は省いてある。電流端子１０
５，１０７，１０９の位置は図を見やすくするた
めに任意の場所に描いてある。第２図は第１図の
磁気ヘツド部AA′の断面図である。第３図は本発
明の第２層コイル１０８だけを描いたものであ
る。以下これらの図を参照しながら本発明の磁気
ヘツドの構造を説明する。
FIG. 1 is a plan view of the magnetic head of the present invention.
The portion where the first layer coil 110 is hidden by the film above it is omitted to avoid complication of the drawing. Current terminal 10
The positions 5, 107, and 109 are drawn at arbitrary locations to make the diagram easier to see. FIG. 2 is a sectional view of the magnetic head portion AA' of FIG. 1. FIG. 3 depicts only the second layer coil 108 of the present invention. The structure of the magnetic head of the present invention will be explained below with reference to these figures.
Al2O3・Tic基板の上にAl2O3をスパツタで形成
して研磨した基板２０１の上にパーマロイの下磁
極２０２をめつき法で2μｍ厚に形成する。基板
２０１としてフエライトを用いれば、それを下磁
極として下磁極２０２を省くことができる。また
下磁極２０２としてスパツタ法で形成したパーマ
ロイ、センダスト、非晶質軟磁性薄膜を用いても
良い。続いてギヤツプ２０４を形成するAl2O3を
スパツタ法で1μｍ付着させる。続いて第１層コ
イル１１０をCuをめつきして約2μｍ厚に形成す
る。コイル幅は5μｍ、コイル間隔は2μｍとした。
コイルはAl系合金をエツチングして形成しても
良い。続いて絶縁膜２０５としてバイアススパツ
タ法でSiO2を付着させる。コイル上の厚みは2μ
ｍで、バイアススパツタ法によつてコイルの段差
を緩和している。続いて第２層コイル１０８を第
１層コイルと同様に形成するが、第２層コイル１
０８は第３図に示すように３つの電流端子１０
７，１０９を持つている。電流端子１０９は電流
端子１１１と対になつており、記録電流は１０９
と１１１に印加され、コイル全巻数に記録電流が
流れる。一方、再生時には電流端子１０７を用い
てコイルの１ターン部分１０６にだけ電流を流
し、磁気抵抗効果素子１０３にバイアス磁界を印
加する。 A permalloy lower magnetic pole 202 is formed to a thickness of 2 μm by plating on a substrate 201 which has been formed by sputtering Al 2 O 3 on an Al 2 O 3 Tic substrate and polished. If ferrite is used as the substrate 201, it can be used as the lower magnetic pole and the lower magnetic pole 202 can be omitted. Further, as the lower magnetic pole 202, permalloy, sendust, or an amorphous soft magnetic thin film formed by a sputtering method may be used. Subsequently, Al 2 O 3 forming the gap 204 is deposited to a thickness of 1 μm using a sputtering method. Subsequently, the first layer coil 110 is plated with Cu to a thickness of approximately 2 μm. The coil width was 5 μm, and the coil spacing was 2 μm.
The coil may be formed by etching an Al alloy. Subsequently, SiO 2 is deposited as an insulating film 205 by bias sputtering. The thickness on the coil is 2μ
m, the height difference in the coil is alleviated by the bias sputtering method. Next, the second layer coil 108 is formed in the same manner as the first layer coil, but the second layer coil 108 is formed in the same manner as the first layer coil.
08 are three current terminals 10 as shown in FIG.
It has 7,109. The current terminal 109 is paired with the current terminal 111, and the recording current is 109
and 111, and a recording current flows through all the turns of the coil. On the other hand, during reproduction, a current is applied to only one turn portion 106 of the coil using the current terminal 107 to apply a bias magnetic field to the magnetoresistive element 103.
続いて絶縁膜２０６としてバイアススパツタ法
で2μｍ形成する。続いて磁界中でパーマロイを
500Å蒸着して磁気抵抗効果素子１０３を形成す
る。パーマロイはスパツタ法で形成しても良い。
続いて磁気抵抗効果素子１０３に電流を流し、出
力を取出すための電極１０４を形成する。続いて
絶縁膜２０７としてバイアススパツタ法でSiO2
を0.4μｍ形成する。続いて絶縁膜２０５，２０
６，２０７をCF4＋５％O2ガスでエツチングす
る。この時エツチング断面がテーパーになるよう
にする。絶縁膜２０５，２０６，２０７はそれぞ
れの形成段階でエツチングしても良い。次いでギ
ヤツプ絶縁膜２０３をイオンエツチングして磁極
接合部１０２にて下磁極２０２を露出させる。続
いて上磁極１０１としてパーマロイを2μｍめつ
き法で形成する。上磁極１０１として、スパツタ
法でパーマロイ、センダスト、非晶質軟磁性薄膜
を形成して不連続部２０８をエツチングして形成
しても良い。磁気抵抗効果素子の幅Ｗは9μｍ、
不連続部２０８の長さｌは5μｍである。２０９
はスパツタ法で形成したオーバーコート膜であ
る。絶縁膜２０５，２０６，２０７としてフオト
レジスト、ポリイミドを用いても良く、この場合
はギヤツプ絶縁膜２０３としてSiO2を用いても
良い。 Subsequently, an insulating film 206 is formed to a thickness of 2 μm by bias sputtering. Next, permalloy is placed in a magnetic field.
A magnetoresistive element 103 is formed by depositing 500 Å. Permalloy may be formed by a sputtering method.
Subsequently, a current is passed through the magnetoresistive element 103 to form an electrode 104 for extracting an output. Next, as an insulating film 207, SiO 2 was deposited using a bias sputtering method.
0.4 μm. Next, insulating films 205 and 20
6,207 is etched with CF 4 +5% O 2 gas. At this time, the etched cross section should be tapered. The insulating films 205, 206, and 207 may be etched at each formation stage. Next, the gap insulating film 203 is ion-etched to expose the lower magnetic pole 202 at the magnetic pole junction 102. Subsequently, permalloy is formed as the upper magnetic pole 101 by a 2 μm plating method. The upper magnetic pole 101 may be formed by forming permalloy, sendust, or an amorphous soft magnetic thin film by sputtering, and then etching the discontinuous portion 208. The width W of the magnetoresistive element is 9 μm,
The length l of the discontinuous portion 208 is 5 μm. 209
is an overcoat film formed by a sputtering method. Photoresist or polyimide may be used as the insulating films 205, 206, and 207, and in this case, SiO 2 may be used as the gap insulating film 203.
次に、本発明の磁気ヘツドの動作を説明する。
記録を行う場合には電流端子１０９と１１１を用
いてコイル１０８と１１０に電流を流す。第１層
コイル１１０と第２層コイル１０８はコイル接合
部１１２で接続されており、記録用コイルの巻数
は９ターンとなる。記録電流を60ｍＡとすると起
磁力は0.54ATとなり、この電流によつてギヤツ
プ２０４に記録磁界が発生する。 Next, the operation of the magnetic head of the present invention will be explained.
When recording, current is applied to coils 108 and 110 using current terminals 109 and 111. The first layer coil 110 and the second layer coil 108 are connected by a coil joint 112, and the number of turns of the recording coil is nine turns. When the recording current is 60 mA, the magnetomotive force is 0.54 AT, and this current generates a recording magnetic field in the gap 204.
一方、再生を行なう場合には、磁気抵抗効果素
子１０３にバイアス磁界を印加するために電流端
子１０７を用いて第２層コイル１０８の一部１０
６に電流を流す。このコイルの一部１０６は磁気
抵抗効果素子１０３の直下にある。電流は10ｍＡ
の程度であり、起磁力は0.01ATと小さい。記録
媒体からの信号磁束は上磁極１０１を通つて磁気
抵抗効果素子１０３に達し、その出力は出力端子
１０５で得られる。 On the other hand, when performing reproduction, the current terminal 107 is used to apply a bias magnetic field to the magnetoresistive element 103.
Apply current to 6. A portion 106 of this coil is located directly below the magnetoresistive element 103. Current is 10mA
The magnetomotive force is as small as 0.01 AT. The signal magnetic flux from the recording medium passes through the upper magnetic pole 101 and reaches the magnetoresistive element 103, and its output is obtained at the output terminal 105.
以上述べたように、本発明によれば、記録媒体
と磁気ヘツドの相対速度に依存しない再生出力が
得られ、テープ、あるいは3.5インチ等の小径フ
ロツピーデイスクでも高再生出力が得られる磁気
抵抗効果素子を記録用の薄膜磁気ヘツドの磁路の
一部に挿入し、記録用のコイルを多数巻きとし、
その一部を磁気抵抗効果素子のバイアス磁界印加
用に用いることによつて、記録と再生用の磁気ヘ
ツドを分離することなく、低電流駆動できる磁気
ヘツドが得られる。また、記録用コイルの一部を
磁気抵抗効果素子のバイアス磁界印加用に用いて
いるので、バイアス印加用の導体を別に作る必要
はない。
As described above, according to the present invention, it is possible to obtain a playback output that is independent of the relative speed between the recording medium and the magnetic head, and the magnetoresistive effect allows a high playback output to be obtained even with a tape or a small-diameter floppy disk such as 3.5 inches. The element is inserted into a part of the magnetic path of a thin film magnetic head for recording, and a recording coil is wound in large numbers.
By using a portion of the magnetic head for applying a bias magnetic field to a magnetoresistive element, a magnetic head that can be driven with a low current can be obtained without separating the recording and reproducing magnetic heads. Further, since a part of the recording coil is used for applying a bias magnetic field to the magnetoresistive element, there is no need to separately prepare a conductor for applying a bias.
また、磁気抵抗効果素子が磁気ヘツド先端に露
出していないので、記録媒体との接触走行によつ
ても磁気抵抗効果素子の劣化がないという効果も
有する。 Furthermore, since the magnetoresistive element is not exposed at the tip of the magnetic head, the magnetoresistive element does not deteriorate even when running in contact with a recording medium.
第１図は本発明の磁気ヘツドの概略を示す平面
図、第２図は第１図の磁気ヘツド主要部AA′の断
面図、第３図は本発明の磁気ヘツドの記録用とバ
イアス印加用の機能を一体化したコイルを示した
平面図である。
１０１……上磁極、１０２……磁極接合部、１
０３……磁気抵抗効果素子、１０４……出力用電
極、１０５……出力端子、１０６……バイアス用
コイル、１０７……バイアス用電流端子、１０８
……第２層コイル、１０９……記録用電流端子、
１１０……第１層コイル、１１１……記録用電流
端子、１１２……コイル接合部、２０１……基
板、２０２……下磁極、２０３……ギヤツプ絶縁
膜、２０４……ギヤツプ、２０５……絶縁膜、２
０６……絶縁膜、２０７……絶縁膜、２０８……
磁極不連続部、２０９……オーバーコート。
FIG. 1 is a plan view schematically showing the magnetic head of the present invention, FIG. 2 is a sectional view of the main part AA' of the magnetic head in FIG. 1, and FIG. 3 is a magnetic head for recording and bias application of the present invention. FIG. 2 is a plan view showing a coil that integrates the functions of FIG. 101... Upper magnetic pole, 102... Magnetic pole junction, 1
03... Magnetoresistive element, 104... Output electrode, 105... Output terminal, 106... Bias coil, 107... Bias current terminal, 108
...Second layer coil, 109...Recording current terminal,
110... First layer coil, 111... Recording current terminal, 112... Coil junction, 201... Substrate, 202... Lower magnetic pole, 203... Gap insulating film, 204... Gap, 205... Insulation membrane, 2
06... Insulating film, 207... Insulating film, 208...
Magnetic pole discontinuity, 209...overcoat.
Claims (1)
に第１絶縁膜を介して複数ターン形成されるコイ
ルと、前記コイル上に第２絶縁膜を介して形成さ
れるとともに１端が前記下磁極の１端と接合し多
端が前記下磁極と対向してギヤツプを形成する上
磁極とを備えた磁気ヘツドにおいて、 前記上磁極は前記コイルの前記ギヤツプに近い
外端のターン部分と対向する部分が除かれ不連続
部が形成され、両端に出力端子を有する磁気抵抗
効果素子が前記不連続部及び前記コイルの外端の
ターン部分と重なるように前記第２絶縁膜上に形
成され、且つ前記コイルの外端のターン部分にの
みバイアス電流を流すように該ターン部分からバ
イアス電流端子を引き出してなることを特徴とす
る磁気ヘツド。[Claims] 1. A lower magnetic pole formed on a substrate, a coil formed with a plurality of turns on the lower magnetic pole with a first insulating film interposed therebetween, and a coil formed on the coil with a second insulating film interposed therebetween. and an upper magnetic pole having one end connected to one end of the lower magnetic pole and the other end facing the lower magnetic pole to form a gap, wherein the upper magnetic pole is located at an outer end of the coil near the gap. A discontinuous portion is formed by removing a portion facing the turn portion of the second insulating film, and the magnetoresistive element having output terminals at both ends overlaps the discontinuous portion and the turn portion at the outer end of the coil. 1. A magnetic head, characterized in that a bias current terminal is formed on the coil and extends from the turn portion at the outer end of the coil so that a bias current flows only through the turn portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18250485A JPS6243813A (en) | 1985-08-20 | 1985-08-20 | Magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18250485A JPS6243813A (en) | 1985-08-20 | 1985-08-20 | Magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6243813A JPS6243813A (en) | 1987-02-25 |
| JPH0348570B2 true JPH0348570B2 (en) | 1991-07-24 |
Family
ID=16119450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18250485A Granted JPS6243813A (en) | 1985-08-20 | 1985-08-20 | Magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6243813A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4907113A (en) * | 1987-07-29 | 1990-03-06 | Digital Equipment Corporation | Three-pole magnetic recording head |
| JP2563597B2 (en) * | 1989-08-04 | 1996-12-11 | 松下電器産業株式会社 | Composite thin film magnetic head |
| KR940004989B1 (en) * | 1989-08-04 | 1994-06-09 | 마쯔시다덴기산교 가부시기가이샤 | Thin film magnetic head |
| JPH04111212A (en) * | 1990-08-31 | 1992-04-13 | Hitachi Ltd | Thin-film magnetic head |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6148116A (en) * | 1984-08-11 | 1986-03-08 | Fujitsu Ltd | Thin film magnetic head |
-
1985
- 1985-08-20 JP JP18250485A patent/JPS6243813A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6148116A (en) * | 1984-08-11 | 1986-03-08 | Fujitsu Ltd | Thin film magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6243813A (en) | 1987-02-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |