JPH0346968B2 - - Google Patents
Info
- Publication number
- JPH0346968B2 JPH0346968B2 JP56209152A JP20915281A JPH0346968B2 JP H0346968 B2 JPH0346968 B2 JP H0346968B2 JP 56209152 A JP56209152 A JP 56209152A JP 20915281 A JP20915281 A JP 20915281A JP H0346968 B2 JPH0346968 B2 JP H0346968B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- resist
- exposure energy
- dose
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 84
- 229920002120 photoresistant polymer Polymers 0.000 claims description 32
- 238000011161 development Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 description 31
- 230000006870 function Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 238000004886 process control Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 230000001427 coherent effect Effects 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 3
- 238000003079 width control Methods 0.000 description 3
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56209152A JPS58111040A (ja) | 1981-12-25 | 1981-12-25 | フォトレジストプロセスにおける露光量決定方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56209152A JPS58111040A (ja) | 1981-12-25 | 1981-12-25 | フォトレジストプロセスにおける露光量決定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58111040A JPS58111040A (ja) | 1983-07-01 |
| JPH0346968B2 true JPH0346968B2 (enrdf_load_stackoverflow) | 1991-07-17 |
Family
ID=16568169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56209152A Granted JPS58111040A (ja) | 1981-12-25 | 1981-12-25 | フォトレジストプロセスにおける露光量決定方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58111040A (enrdf_load_stackoverflow) |
-
1981
- 1981-12-25 JP JP56209152A patent/JPS58111040A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58111040A (ja) | 1983-07-01 |
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