JPH0345413Y2 - - Google Patents
Info
- Publication number
- JPH0345413Y2 JPH0345413Y2 JP14834886U JP14834886U JPH0345413Y2 JP H0345413 Y2 JPH0345413 Y2 JP H0345413Y2 JP 14834886 U JP14834886 U JP 14834886U JP 14834886 U JP14834886 U JP 14834886U JP H0345413 Y2 JPH0345413 Y2 JP H0345413Y2
- Authority
- JP
- Japan
- Prior art keywords
- emitter
- temperature
- liquid
- gas
- ion source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14834886U JPH0345413Y2 (enrdf_load_stackoverflow) | 1986-09-26 | 1986-09-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14834886U JPH0345413Y2 (enrdf_load_stackoverflow) | 1986-09-26 | 1986-09-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6354236U JPS6354236U (enrdf_load_stackoverflow) | 1988-04-12 |
| JPH0345413Y2 true JPH0345413Y2 (enrdf_load_stackoverflow) | 1991-09-25 |
Family
ID=31062531
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14834886U Expired JPH0345413Y2 (enrdf_load_stackoverflow) | 1986-09-26 | 1986-09-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0345413Y2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5086105B2 (ja) * | 2008-01-07 | 2012-11-28 | 株式会社日立ハイテクノロジーズ | ガス電界電離イオン源 |
| JP5134439B2 (ja) * | 2008-05-30 | 2013-01-30 | 株式会社日立ハイテクノロジーズ | イオンビーム装置 |
| JP5677365B2 (ja) * | 2012-05-11 | 2015-02-25 | 株式会社日立ハイテクノロジーズ | 荷電粒子顕微鏡 |
-
1986
- 1986-09-26 JP JP14834886U patent/JPH0345413Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6354236U (enrdf_load_stackoverflow) | 1988-04-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Benassayag et al. | In situ high voltage TEM observation of an electrohydrodynamic (EHD) ion source | |
| Forbest | Understanding how the liquid-metal ion source works | |
| Boyle et al. | Electrical breakdown in high vacuum | |
| US4638209A (en) | Ion beam generating apparatus | |
| US4139773A (en) | Method and apparatus for producing bright high resolution ion beams | |
| Mair et al. | Gallium‐field‐ion emission from liquid point anodes | |
| JPH0345413Y2 (enrdf_load_stackoverflow) | ||
| Zobnin et al. | Transverse ionization instability of the elongated dust cloud in the gas discharge uniform positive column under microgravity conditions | |
| US4710632A (en) | Ion microbeam apparatus | |
| KR100228517B1 (ko) | 액체금속 이온소오스 안정화 동작방법 | |
| Farson et al. | Electrical discharges between platinum nanoprobe tips and gold films at nanometre gaplengths | |
| EP0362813A2 (en) | Ion analyzer | |
| US6998626B1 (en) | Method of producing a dopant gas species | |
| JPH03241646A (ja) | 液体金属イオン源のコントロール方法 | |
| Niemela | Electrostatic charging and levitation of helium II drops | |
| JPH10241588A (ja) | 集束イオンビーム加工方法およびその装置 | |
| KR20010042622A (ko) | 액체 금속 이온원 및 액체 금속 이온원의 플로우 임피던스측정방법 | |
| HAINE et al. | High brightness electron guns | |
| US2712074A (en) | Electrical control circuit | |
| JPH06101040A (ja) | イオン注入装置 | |
| JPH10239298A (ja) | 液体クロマトグラフ質量分析装置 | |
| JPH08195298A (ja) | ビームエネルギー安定化装置 | |
| JPH0721954A (ja) | イオンビーム発生方法および電界電離型ガスフェーズイオン源 | |
| JPH04186154A (ja) | 金属の成分分析装置 | |
| JPS63216251A (ja) | ガスフエ−ズイオン源 |