JPH0343700A - Liquid continuation supply method and its device - Google Patents
Liquid continuation supply method and its deviceInfo
- Publication number
- JPH0343700A JPH0343700A JP17515889A JP17515889A JPH0343700A JP H0343700 A JPH0343700 A JP H0343700A JP 17515889 A JP17515889 A JP 17515889A JP 17515889 A JP17515889 A JP 17515889A JP H0343700 A JPH0343700 A JP H0343700A
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- JP
- Japan
- Prior art keywords
- liquid
- gas
- container
- pipe
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 86
- 238000000034 method Methods 0.000 title claims abstract description 6
- 238000012546 transfer Methods 0.000 claims description 2
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 6
- 238000007599 discharging Methods 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 40
- 239000000126 substance Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Jet Pumps And Other Pumps (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は例えば半導体素子製造工程において使用される
現像液、リンス７夜、洗浄Ｚ夜、レジストイ夜などの、
薬液を連続して現像装置、スピンナー装置等の液体使用
箇所へ供給する方法とその装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention is applicable to, for example, developing solutions used in semiconductor device manufacturing processes, rinsing 7 nights, cleaning Z nights, resist toy nights, etc.
The present invention relates to a method and apparatus for continuously supplying a chemical solution to a liquid usage area such as a developing device or a spinner device.
（従来の技術）
半導体ウェハー表面にレジストパターンを形成する一般
的な方法は、半導体ウェハー上にレジスト膜を形威し、
マスクを介して活性光線を照射し潜像を形成したのち現
像装置のチャック上にウェハーを吸着固定し、このレジ
スト膜上にノズルから現像ｌ夜を滴下し、ウェハーを回
転するによってレジスト膜上に現像；夜を均一に′広げ
てウェハー表面にレジストパターンを形成している。(Prior art) A general method for forming a resist pattern on the surface of a semiconductor wafer is to form a resist film on the semiconductor wafer,
After irradiating actinic rays through a mask to form a latent image, the wafer is suctioned and fixed onto the chuck of a developing device, and a developer is dripped onto this resist film from a nozzle, and the wafer is rotated to form a latent image on the resist film. Development: A resist pattern is formed on the wafer surface by spreading the pattern uniformly.
そして、通常の半導体素子製造工場にあっては薬液を連
続して液体使用箇所へ供給する必要がある。そこで、こ
こではその代表例として現像液の（＃給について具体的
に説明する。従来レジスト膜を現像するに際し、生産歩
留まりを上げるために、複数の現像装置を配置し、これ
ら複数の現像装置に一台のタンクから現像液を供給して
いるが、タンクと各現像装置とをつなぐ管路抵抗が各々
異なる等の理由によって各現像装置への現像液供給圧が
一定とならず、その結果、液滴下量も各現像装置ごとに
異なることになり、レジストパターンの不均一を招いて
いる。In a typical semiconductor device manufacturing factory, it is necessary to continuously supply the chemical liquid to the locations where the liquid is used. Therefore, as a typical example, we will specifically explain the (# supply) of the developer. Conventionally, when developing a resist film, in order to increase the production yield, multiple developing devices are arranged, and these multiple developing devices Although the developer is supplied from one tank, the pressure of the developer supplied to each developing device is not constant due to reasons such as differences in the resistance of the pipes connecting the tank and each developing device, and as a result, The amount of droplet dropped also differs for each developing device, leading to non-uniformity of the resist pattern.
そこで各現像装置ごとに密閉容器を用意し、この密閉容
器内に、−旦現像液を貯留し、密閉容器内に一定圧のガ
スを供給することで各現像装置に現像液を一定圧で供給
することが考えられる。Therefore, an airtight container is prepared for each developing device, the developer is stored in the airtight container, and gas at a constant pressure is supplied into the airtight container, thereby supplying the developer at a constant pressure to each developing device. It is possible to do so.
（発明が解決しようとする課題）
上述したように現像装置等の各液体使用箇所ごとに密閉
容器を設置し、この密閉容器に一定圧のガスを供給する
ようにすれば液体使用箇所が複数であっても、各使用箇
所での液体の供給圧が異なることはない。(Problem to be Solved by the Invention) As described above, if a sealed container is installed for each liquid usage location such as a developing device, and gas at a constant pressure is supplied to this sealed container, multiple liquid usage locations can be used. Even if there is, the supply pressure of the liquid at each point of use will not be different.
しかしながら、密閉容器内の液体が使用によって一定レ
ベルまで減少すると、新たな７夜体を密閉容器内に補充
しなければならない。そして新たな液体を補充している
間は密閉容器内のガス圧を一定に維持できないので、液
体の供給を停止しなければならず、生産効率の点で問題
があり、且つ供給再開の時の圧が不安定になる。However, when the liquid in the closed container decreases to a certain level due to use, a new body must be replenished into the closed container. Since the gas pressure inside the sealed container cannot be maintained constant while new liquid is being replenished, the liquid supply must be stopped, which poses a problem in terms of production efficiency, and when the supply is restarted, the gas pressure cannot be maintained constant. Pressure becomes unstable.
（課題を解決するための手段）
上記課題を解決すべく本発明は、現像装置等の液体使用
箇所の上流側に液体を貯留する密閉容器を設け、この密
閉容器と液体使用箇所とを液体取り出し管でつなぎ、ま
た密閉容器内の上部にガス供給管とガス排出管を接続し
、ガス供給管にはプレッシャレギュレータとバルブを、
ガス排出管にはバックプレッシャレギュレータとバルブ
を各々設けた。(Means for Solving the Problems) In order to solve the above problems, the present invention provides an airtight container for storing liquid upstream of a liquid usage area such as a developing device, and removes the liquid from this airtight container and the liquid usage area. A gas supply pipe and a gas discharge pipe are connected to the upper part of the sealed container, and a pressure regulator and a valve are connected to the gas supply pipe.
A back pressure regulator and a valve were installed on each gas exhaust pipe.
（作用）
通常の液体供給時に゛はタンクからの液体導入管及びガ
ス排出管のバルブを閉じ、ガス供給管のバルブを開とし
、密閉容器内に一定圧のガスを供給しつつ液体を取り出
し、一方密閉容器内にタンクから液体を補充する時には
、液体導入管及びガス排出管のバルブを開とし、ガス供
給管の開閉バルブを開としたまま、密閉容器内の圧が一
定となるようにガスを排出しつつＺ皮体を取り出す。(Function) During normal liquid supply, close the valves of the liquid introduction pipe and gas discharge pipe from the tank, open the valve of the gas supply pipe, and take out the liquid while supplying gas at a constant pressure into the sealed container. On the other hand, when refilling a sealed container with liquid from a tank, open the valves of the liquid inlet pipe and gas discharge pipe, and keep the open/close valve of the gas supply pipe open to keep the pressure inside the sealed container constant. Take out the Z skin body while expelling it.
（実施例） 以下に本発明の実施例を添付図面に基づいて説明する。(Example) Embodiments of the present invention will be described below based on the accompanying drawings.
第１図は本発明に係る液体の連続供給装置の全体図であ
り、液体の連続供給装置は固定タンク１内の液体Ｒを配
管２を介してヘッダー３に送り、このヘッダー３から導
出される複数の渡体導入管４・・・を介して定圧供給ユ
ニットＵ・・・に送り込み、各定圧供給ユニットＵから
夫々に対応するスピンナー装置等の液体使用箇所５に供
給するようにしている。FIG. 1 is an overall view of a continuous liquid supply device according to the present invention. The liquid is fed into constant pressure supply units U through a plurality of transfer body introduction pipes 4, and is supplied from each constant pressure supply unit U to a corresponding liquid usage point 5 such as a spinner device.
定圧供給ユニットＵは密閉容器１０を備えており、この
密閉容器１０内に前記液体導入管４を挿入し、密閉容器
１０内に液体Ｒを受は入れ、また密閉容器１０の底部か
ら導出される液体取り出し管１１を介して液体使用箇所
５に液体Ｒを供給する。ここで液体導入管４には開閉バ
ルブ１２及び逆止弁１３を、液体取り出し管１１には開
閉バルブ１４を設けている。The constant pressure supply unit U is equipped with a closed container 10, into which the liquid introduction pipe 4 is inserted, the liquid R is received in the closed container 10, and is led out from the bottom of the closed container 10. The liquid R is supplied to the liquid usage point 5 via the liquid take-out pipe 11. Here, the liquid introduction pipe 4 is provided with an on-off valve 12 and a check valve 13, and the liquid take-out pipe 11 is provided with an on-off valve 14.
また密閉容器１０にはＮ２等の不活性ガス供給源６から
のガスを供給するガス供給管１５及び密閉容器１０内の
ガスを排出するガス排出管１６を接続している。そして
、ガス供給管１５には供給するガスの圧力を調整するた
めのプレッシャレギュレータ１７、逆止弁１８及び開閉
バルブ１９を設け、ガス排出管１６には開閉バルブ２０
、排出するガスの圧力を調整するためのバックプレッシ
ャレギュレータ２１及び逆止弁２２を設け、更にガス排
出管１６にはバイパス管２３を付設し、このバイパス管
２３に開閉バルブ２４を設けている。Further, a gas supply pipe 15 for supplying gas from an inert gas supply source 6 such as N 2 and a gas exhaust pipe 16 for discharging the gas inside the closed container 10 are connected to the closed container 10 . The gas supply pipe 15 is provided with a pressure regulator 17, a check valve 18, and an on-off valve 19 for adjusting the pressure of the gas to be supplied, and the gas discharge pipe 16 is provided with an on-off valve 20.
A back pressure regulator 21 and a check valve 22 are provided for adjusting the pressure of the gas to be discharged. Furthermore, a bypass pipe 23 is attached to the gas discharge pipe 16, and an on-off valve 24 is provided to the bypass pipe 23.
尚、本実施例にあっては、ガス供給管１５及びガス排出
管１６には逆止弁１８．２２がついているので、ガス供
給管１５とガス排出管１６の一部を共通管２５としてい
る。In this embodiment, since the gas supply pipe 15 and the gas discharge pipe 16 are provided with check valves 18 and 22, a part of the gas supply pipe 15 and the gas discharge pipe 16 is used as a common pipe 25. .
また密閉容器１０は外側に液面計２６を有し、液面計２
６のセンサー２７ （ａ）、２７ （ｂ）にて密閉容器
１０内の液面を検出し、所定の信号を電磁弁２８に送り
、前記開閉バルブ１２，１９．２０２４を開閉せしめる
ようにしている。なお、本実施例では密閉容器１０の外
側に液面計２６及びセンサー２７ （ａ）、２７ （ｂ
）を設けているが、液面検知手段はこのようなものには
限定されず、例えば密閉容器１０の内側に設けたフロー
ト式液面計を設けたものでもよい。The sealed container 10 also has a liquid level gauge 26 on the outside.
Sensors 27 (a) and 27 (b) of 6 detect the liquid level in the closed container 10, and send a predetermined signal to the electromagnetic valve 28 to open and close the opening/closing valves 12, 19, and 2024. . In this embodiment, a liquid level gauge 26 and sensors 27 (a) and 27 (b) are installed outside the airtight container 10.
), but the liquid level detection means is not limited to such a means, and may be, for example, a float type liquid level gauge provided inside the closed container 10.
第２図は前記バックプレッシャレギュレータ２１の具体
的な構造を示す図であり、ケーシング３０とキャップ３
１との間にダイヤフラム３２を挟持し、このダイヤフラ
ム３２の弁体３３を貫通し、ナツト３４によって固着し
、ケーシング３０にはガスの入口３５及び出口３６を穿
設し、出口３６のケーシング３０内の部分には流路を形
成した弁座３７を螺着し、更にキャップ３１にはその頭
部がキャップ３１内に臨む調整ボルト３８を螺合し、ボ
ルト３８の頭部と前記ナツト３４との間にスプリング３
９を縮装し、弁体３３を閉じる方向（弁座に当接する方
向）に付勢している。而して人口３５からガスがケーシ
ング３０内の空間に導入され、その圧が所定値を超える
とスプリング３９に抗して弁体３３が上動して弁座３７
から離れ、図示の如き流路が開成される。FIG. 2 is a diagram showing a specific structure of the back pressure regulator 21, in which a casing 30 and a cap 3 are shown.
A diaphragm 32 is sandwiched between the diaphragm 32 and the valve body 33 of the diaphragm 32, and is fixed with a nut 34. The casing 30 is provided with an inlet 35 and an outlet 36 for gas, and the outlet 36 is inserted into the casing 30. A valve seat 37 with a flow path formed therein is screwed into the portion, and an adjustment bolt 38 whose head faces inside the cap 31 is screwed into the cap 31, so that the head of the bolt 38 and the nut 34 are screwed together. Spring 3 between
9 is compressed and biased in the direction of closing the valve body 33 (in the direction of contacting the valve seat). Gas is introduced into the space inside the casing 30 from the population 35, and when the pressure exceeds a predetermined value, the valve body 33 moves upward against the spring 39 and the valve seat 37
A flow path as shown in the figure is opened.
以上の如き構成からなる液体の連続供給装置を用いて各
液体使用筒所５へ液体を連続的に供給する方法を以下に
述べる。A method for continuously supplying liquid to each liquid use cylinder 5 using the continuous liquid supply apparatus constructed as described above will be described below.
先ず、密閉容器１０内に液体Ｒが十分に充填された図示
の状態を出発点として説明する。First, a description will be given starting from the illustrated state in which the closed container 10 is sufficiently filled with the liquid R.
上記の状態では液体導入管４の開閉バルブ１２、ガス排
出管１６．２３の開閉バルブ２０゜２４は閉じられ、液
体取り出し管１１の開閉バルブ１４及びガス供給管１５
の開閉バルブ１９は開いている。In the above state, the on-off valve 12 of the liquid introduction pipe 4 and the on-off valves 20 and 24 of the gas discharge pipe 16 and 23 are closed, and the on-off valve 14 of the liquid take-out pipe 11 and the gas supply pipe 15 are closed.
The on-off valve 19 is open.
このような状態とすることで不活性ガス供給源６からの
ガスがプレッシャレギュレータ１７を介して一定圧（例
えば１ ｋｇ／ｃｍ２）で密閉容器１０内に供給され、
容器１０内の液体Ｒが取り出し管１１を通って各液体使
用箇所５に一定圧で送られる。In this state, gas from the inert gas supply source 6 is supplied into the closed container 10 at a constant pressure (for example, 1 kg/cm2) via the pressure regulator 17,
The liquid R in the container 10 is sent to each liquid use point 5 at a constant pressure through the take-out pipe 11.
以上の如くして密閉容器１０内の液体Ｒを使用してゆく
と、密閉容器１０内の液面が徐々に下降する。そして、
所定レベルまで下降するとそれをセンサー２７ （ａ）
が感知し、ガス排出管１６の開閉バルブ２０を開き、更
に液体導入管４の開閉バルブ１２を開く。尚７夜体取り
出し管１１の開閉バルブ１４は開けたままとする。As the liquid R in the closed container 10 is used as described above, the liquid level in the closed container 10 gradually decreases. and,
When it falls to a predetermined level, it is detected by sensor 27 (a)
is sensed, opens the on-off valve 20 of the gas discharge pipe 16, and further opens the on-off valve 12 of the liquid introduction pipe 4. The opening/closing valve 14 of the body removal tube 11 was left open for seven nights.
液体導入管４の開閉バルブ１２を開けることで固定タン
ク１の圧力を密閉容器１０の所定圧より高くしておけば
（例えば２ ｋｇ／ｃｍ２） 、密閉容器１０内に多量
の液体Ｒが流入し、液面が上昇する。そして液面よりも
上方の空間内の圧力は液面が上昇しても、バックプレッ
シャレギュレータ２１を介して所定圧（例えば１ ｋｇ
／ｃｍ２）以上のガスは排出されるので、液体Ｒは常に
一定圧でもって密閉容器から取り出される。なお、液体
Ｒは所定レベルまで充填されるとセンサー２７ （ｂ）
が感知し、開閉バルブ１２．２０が閉じる。If the pressure in the fixed tank 1 is made higher than the predetermined pressure in the sealed container 10 by opening the on-off valve 12 of the liquid introduction pipe 4 (for example, 2 kg/cm2), a large amount of liquid R will flow into the sealed container 10. , the liquid level rises. Even if the liquid level rises, the pressure in the space above the liquid level is maintained at a predetermined pressure (for example, 1 kg) via the back pressure regulator 21.
/cm2) or more is exhausted, so the liquid R is always taken out from the closed container at a constant pressure. Note that when the liquid R is filled to a predetermined level, the sensor 27 (b)
is sensed, and the on-off valve 12.20 closes.
ところで、密閉容器１０内を一定圧に維持するには、ガ
ス供給管１５及びガス排出管１６の開閉バルブ１９．２
０を常に開とし、ガス供給管１５から所定圧以上のガス
を密閉容器１０内に供給するとともに所定圧以上のガス
をガス排出管１６から排出すれば開閉バルブ１９．２０
の開閉操作を液体Ｒの容器】Ｏへの供給の都度片なくて
もよいこととなるが、このようにすると波体供給（補給
）の際に容器１０内の圧が乱れ、均一な取り出しを行え
ない。By the way, in order to maintain a constant pressure inside the closed container 10, the on-off valves 19.2 of the gas supply pipe 15 and the gas discharge pipe 16 are
0 is always open, gas at a predetermined pressure or higher is supplied into the closed container 10 from the gas supply pipe 15, and gas at a predetermined pressure or higher is discharged from the gas exhaust pipe 16, so that the on-off valve 19.20
This means that the opening and closing operations of the liquid R do not have to be repeated each time the liquid R is supplied to the container 10. However, if this is done, the pressure inside the container 10 will be disturbed when the wave body is supplied (replenishment), making it difficult to take out the liquid R uniformly. I can't do it.
（発明の効果）
以上に説明したように本発明によれば、半導体素子製造
工程で使用される各種薬液等を途切れることなく連続し
て一定圧で使用箇所に送給することができる。特に液体
の使用箇所が複数の場合は、各使用箇所に均一な圧で液
体を送ることができるので、高品質の製品を得ることが
できる。(Effects of the Invention) As described above, according to the present invention, various chemical solutions and the like used in the semiconductor device manufacturing process can be continuously and uninterruptedly fed to the point of use at a constant pressure. Especially when there are multiple locations where the liquid is used, the liquid can be sent to each location with uniform pressure, making it possible to obtain a high quality product.
第１図は本発明に係る液体の連続供給装置の全体図、第
２図はバックプレッシャレギュレータの断面図である。
尚、図面中１は固定タンク、４は？Ｉｊｉ体導入管、５
は７夜体使用箇所、１０は密閉容器、１１は液体取り出
し管、１２，１４，１９，２０．２４は開閉バルブ、１
５はガス供給管、１６はガス排出管、２１はバックプレ
ッシャレギュレータ、Ｕは定圧供給ユニッ
トである。FIG. 1 is an overall view of a continuous liquid supply device according to the present invention, and FIG. 2 is a sectional view of a back pressure regulator. In addition, 1 in the drawing is a fixed tank, and 4 is? Iji body introduction tube, 5
7 is where the body is used, 10 is a sealed container, 11 is a liquid extraction pipe, 12, 14, 19, 20. 24 is an on-off valve, 1
5 is a gas supply pipe, 16 is a gas discharge pipe, 21 is a back pressure regulator, and U is a constant pressure supply unit.
Claims (3)
とで該液体を容器から液体使用箇所へ圧送するようにし
た供給方法において、前記容器内の液面が所定レベルと
なるまでは液体導入管及びガス排出管のバルブを閉とし
、ガス供給管の開閉バルブを開としプレッシャレギュレ
ータを介して一定圧のガスを密閉容器内に供給しつつ液
体を圧送供給し、密閉容器内の液面が所定レベル以下と
なったならばガス供給管の開閉バルブを開としたまま密
閉容器への液体導入管のバルブを開とし、更にガス排出
管のバルブを開とし、ガス排出管に設けたバックプレッ
シャレギュレータを介して密閉容器内のガス圧を一定に
維持しつつ液面が所定レベルに上昇するまでガスを抜く
ようにして液体を前記容器内に導入するとともに液体を
供給することを特徴とする液体の連続供給方法。(1) In a supply method in which the liquid in a closed container is pressurized with gas to forcefully transfer the liquid from the container to the point where the liquid is used, the liquid inlet pipe is used until the liquid level in the container reaches a predetermined level. Then, close the valve of the gas discharge pipe, open the on-off valve of the gas supply pipe, supply gas at a constant pressure into the sealed container via the pressure regulator, and supply the liquid under pressure until the liquid level in the sealed container reaches a predetermined level. If the temperature drops below this level, leave the on-off valve on the gas supply pipe open, open the valve on the liquid introduction pipe to the sealed container, then open the valve on the gas exhaust pipe, and press the back pressure regulator installed on the gas exhaust pipe. The liquid is introduced into the sealed container and supplied by removing the gas until the liquid level rises to a predetermined level while maintaining the gas pressure in the closed container constant through the container. Continuous feeding method.
る装置において、前記液体使用箇所の上流側には定圧供
給ユニットを設け、この定圧供給ユニットはタンクから
の液体を貯留する密閉容器と、この密閉容器内の下部と
前記液体使用箇所とをつなぐ液体取り出し管と、密閉容
器内の上部にガスを供給するガス供給管と、密閉容器内
の上部のガスを排出するガス排出管とを備え、更に前記
ガス供給管にはプレッシャレギュレータと開閉バルブを
、前記ガス排出管にはバックプレッシャレギュレータと
開閉バルブを夫々設けたことを特徴とする液体の連続供
給装置。(2) In a device that continuously supplies liquid in a tank to a liquid usage point, a constant pressure supply unit is provided upstream of the liquid usage point, and this constant pressure supply unit serves as a sealed container for storing the liquid from the tank. , a liquid take-out pipe that connects the lower part of the sealed container with the liquid usage point, a gas supply pipe that supplies gas to the upper part of the sealed container, and a gas exhaust pipe that discharges the gas from the upper part of the sealed container. 1. A continuous liquid supply device, further comprising a pressure regulator and an on-off valve on the gas supply pipe, and a back pressure regulator and an on-off valve on the gas discharge pipe.
に対応して定圧供給ユニットが設けられていることを特
徴とする請求項２に記載の液体の連続供給装置。(3) The continuous liquid supply device according to claim 2, wherein there are a plurality of the liquid usage locations, and a constant pressure supply unit is provided corresponding to each of the liquid usage locations.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17515889A JPH0343700A (en) | 1989-07-06 | 1989-07-06 | Liquid continuation supply method and its device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17515889A JPH0343700A (en) | 1989-07-06 | 1989-07-06 | Liquid continuation supply method and its device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0343700A true JPH0343700A (en) | 1991-02-25 |
Family
ID=15991278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17515889A Pending JPH0343700A (en) | 1989-07-06 | 1989-07-06 | Liquid continuation supply method and its device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0343700A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0968761A3 (en) * | 1998-07-03 | 2001-10-10 | Ngk Insulators, Ltd. | Discharge device for raw materials and fuels |
| CN101807005A (en) * | 2009-02-12 | 2010-08-18 | 东京毅力科创株式会社 | Treating fluid feed system and treating fluid supply method |
| JP2016000399A (en) * | 2015-08-03 | 2016-01-07 | 東芝三菱電機産業システム株式会社 | Pressurized liquid supply device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51150705A (en) * | 1975-06-19 | 1976-12-24 | Shigetada Ozaki | An automatic pressure constan t fluid supplying equipment |
| JPS6019970A (en) * | 1983-07-08 | 1985-02-01 | ハイバ−・システムズ・リミテツド | Pump |
-
1989
- 1989-07-06 JP JP17515889A patent/JPH0343700A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51150705A (en) * | 1975-06-19 | 1976-12-24 | Shigetada Ozaki | An automatic pressure constan t fluid supplying equipment |
| JPS6019970A (en) * | 1983-07-08 | 1985-02-01 | ハイバ−・システムズ・リミテツド | Pump |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0968761A3 (en) * | 1998-07-03 | 2001-10-10 | Ngk Insulators, Ltd. | Discharge device for raw materials and fuels |
| CN101807005A (en) * | 2009-02-12 | 2010-08-18 | 东京毅力科创株式会社 | Treating fluid feed system and treating fluid supply method |
| JP2010186844A (en) * | 2009-02-12 | 2010-08-26 | Tokyo Electron Ltd | Processing liquid supply system and processing liquid supply method |
| JP2016000399A (en) * | 2015-08-03 | 2016-01-07 | 東芝三菱電機産業システム株式会社 | Pressurized liquid supply device |
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