JPH0342697B2 - - Google Patents

Info

Publication number
JPH0342697B2
JPH0342697B2 JP60240461A JP24046185A JPH0342697B2 JP H0342697 B2 JPH0342697 B2 JP H0342697B2 JP 60240461 A JP60240461 A JP 60240461A JP 24046185 A JP24046185 A JP 24046185A JP H0342697 B2 JPH0342697 B2 JP H0342697B2
Authority
JP
Japan
Prior art keywords
mask
substrate
cassette
unit
fork
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60240461A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62102538A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP60240461A priority Critical patent/JPS62102538A/ja
Publication of JPS62102538A publication Critical patent/JPS62102538A/ja
Publication of JPH0342697B2 publication Critical patent/JPH0342697B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Specific Conveyance Elements (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
JP60240461A 1985-10-29 1985-10-29 マスクまたはレチクル基板の搬送装置 Granted JPS62102538A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60240461A JPS62102538A (ja) 1985-10-29 1985-10-29 マスクまたはレチクル基板の搬送装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60240461A JPS62102538A (ja) 1985-10-29 1985-10-29 マスクまたはレチクル基板の搬送装置

Publications (2)

Publication Number Publication Date
JPS62102538A JPS62102538A (ja) 1987-05-13
JPH0342697B2 true JPH0342697B2 (enrdf_load_html_response) 1991-06-28

Family

ID=17059846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60240461A Granted JPS62102538A (ja) 1985-10-29 1985-10-29 マスクまたはレチクル基板の搬送装置

Country Status (1)

Country Link
JP (1) JPS62102538A (enrdf_load_html_response)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005340315A (ja) * 2004-05-25 2005-12-08 Nikon Corp 位置合わせ装置、露光装置、位置合わせ方法及び露光方法、並びにデバイス製造方法及び較正用（工具）レチクル
KR100770147B1 (ko) 2006-01-04 2007-10-30 코리아테크노(주) 마스크 인출장치
CN106527062B (zh) * 2017-01-11 2018-11-27 惠科股份有限公司 一种曝光机及其图像偏移防治方法和系统

Also Published As

Publication number Publication date
JPS62102538A (ja) 1987-05-13

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term