JPH0342658B2 - - Google Patents

Info

Publication number
JPH0342658B2
JPH0342658B2 JP60000136A JP13685A JPH0342658B2 JP H0342658 B2 JPH0342658 B2 JP H0342658B2 JP 60000136 A JP60000136 A JP 60000136A JP 13685 A JP13685 A JP 13685A JP H0342658 B2 JPH0342658 B2 JP H0342658B2
Authority
JP
Japan
Prior art keywords
pattern
lmr
resist
monochlorobenzene
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60000136A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61159638A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP60000136A priority Critical patent/JPS61159638A/ja
Publication of JPS61159638A publication Critical patent/JPS61159638A/ja
Publication of JPH0342658B2 publication Critical patent/JPH0342658B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60000136A 1985-01-07 1985-01-07 レジストパタ−ンの形成方法 Granted JPS61159638A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60000136A JPS61159638A (ja) 1985-01-07 1985-01-07 レジストパタ−ンの形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60000136A JPS61159638A (ja) 1985-01-07 1985-01-07 レジストパタ−ンの形成方法

Publications (2)

Publication Number Publication Date
JPS61159638A JPS61159638A (ja) 1986-07-19
JPH0342658B2 true JPH0342658B2 (Sortimente) 1991-06-27

Family

ID=11465613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60000136A Granted JPS61159638A (ja) 1985-01-07 1985-01-07 レジストパタ−ンの形成方法

Country Status (1)

Country Link
JP (1) JPS61159638A (Sortimente)

Also Published As

Publication number Publication date
JPS61159638A (ja) 1986-07-19

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term