JPH0334233U - - Google Patents
Info
- Publication number
- JPH0334233U JPH0334233U JP9389189U JP9389189U JPH0334233U JP H0334233 U JPH0334233 U JP H0334233U JP 9389189 U JP9389189 U JP 9389189U JP 9389189 U JP9389189 U JP 9389189U JP H0334233 U JPH0334233 U JP H0334233U
- Authority
- JP
- Japan
- Prior art keywords
- control section
- focusing
- wafer
- detection beam
- controlled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 13
- 238000004033 diameter control Methods 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Description
第１図は本案による縮小投影露光装置の一実施
例を示す概略構成図、第２図は本案による、検出
ビームとビーム径とビーム位置のそれぞれの設定
例を示す図、第３図はＬＳＩ製作中の半導体表面
段差例と検出ビームの例を示す図である。
１……光源（水銀ランプ）、２……レテイクル
、３……縮小レンズ、４……ウエハ、５……レジ
スト、６……ウエハステージ部、８……前体制御
部、４１……単１露光エリア、６１……ウエハチ
ヤツク、６２……レベリング調整部、６３……Ｚ
ステージ、６４……ＸＹステージ、６５……ＸＹ
ステージ制御系、６６……Ｚステージ制御系、６
７……レベリング制御系、６８……ウエハステー
ジ制御系、７１……焦点合せ用検出ビーム発信部
、７２……焦点合せ検出ビーム発信器、７３……
ビーム径制御部、７４……ビーム位置制御部、７
５……発信部制御部、７６……焦点合せ用検出ビ
ーム発信部、７７……焦点合せ用検出ビーム受信
器、７８……検出ビーム。
Fig. 1 is a schematic configuration diagram showing an embodiment of a reduction projection exposure apparatus according to the present invention, Fig. 2 is a diagram showing an example of setting each of the detection beam, beam diameter, and beam position according to the present invention, and Fig. 3 is an LSI fabrication diagram. It is a figure which shows the example of a semiconductor surface step difference in the inside, and the example of a detection beam. DESCRIPTION OF SYMBOLS 1...Light source (mercury lamp), 2...Reticle, 3...Reducing lens, 4...Wafer, 5...Resist, 6 ...Wafer stage section, 8...Front body control section, 41...Single 1 Exposure area, 61... Wafer chuck, 62... Leveling adjustment section, 63...Z
Stage, 64...XY Stage, 65...XY
Stage control system, 66...Z stage control system, 6
7... Leveling control system, 68... Wafer stage control system, 71... Focusing detection beam transmitter, 72... Focusing detection beam transmitter, 73...
Beam diameter control section, 74...Beam position control section, 7
5... Transmitter control unit, 76... Focusing detection beam transmitter, 77... Focusing detection beam receiver, 78... Detection beam.
Claims (1)
ステージと、このウエハステージを駆動するウエ
ハステージ制御部と、前記ウエハステージ上方に
配置された縮小レンズと、この縮小レンズ上方に
配置されたレテイクルと、このレテイクル上の回
路パターンを前記ウエハ上に転写する露光の光源
と、装置全体を制御する全体制御部とを具備する
縮小投影露光装置において、前記ウエハと前記縮
小レンズの位置を最適焦点位置に調整し露光する
焦点合せ手段として、焦点合せ用の検出ビームを
前記ウエハ上のレジストに向けて発信する焦点合
せ検出ビーム発信部とこの検出ビームのレジスト
からの反射ビームを発信する焦点合せ検出ビーム
発信部とを有し、前記焦点合せ検出ビーム発信部
は発信部制御部で制御されるビーム径制御部およ
びビーム位置制御部とで制御されて、前記焦点合
せ用の検出ビームのビーム径またはビームをレジ
ストに当てる位置を可変とし、それぞれ最適値に
設定できるようにして、最適な焦点合せを可能と
したことを特徴とする縮小投影露光装置。 A wafer stage on which a wafer or the like is placed and step-feeded, a wafer stage control unit that drives the wafer stage, a reduction lens placed above the wafer stage, and a reticle placed above the reduction lens; In a reduction projection exposure apparatus that includes an exposure light source that transfers the circuit pattern on the reticle onto the wafer and an overall control section that controls the entire apparatus, the positions of the wafer and the reduction lens are adjusted to optimal focal positions. As a focusing means for exposure, a focusing detection beam transmitter transmits a focusing detection beam toward the resist on the wafer, and a focusing detection beam transmitter transmits a reflected beam of the detection beam from the resist. The focusing detection beam transmission section is controlled by a beam diameter control section and a beam position control section that are controlled by a transmission section control section, so that the beam diameter or the beam of the detection beam for focusing is controlled by a beam diameter control section and a beam position control section, which are controlled by a transmission section control section. 1. A reduction projection exposure apparatus characterized in that the position of exposure to the light beam is made variable and each can be set to an optimum value, thereby making it possible to achieve optimum focusing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9389189U JPH0334233U (en) | 1989-08-11 | 1989-08-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9389189U JPH0334233U (en) | 1989-08-11 | 1989-08-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0334233U true JPH0334233U (en) | 1991-04-04 |
Family
ID=31643251
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9389189U Pending JPH0334233U (en) | 1989-08-11 | 1989-08-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0334233U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005237643A (en) * | 2004-02-26 | 2005-09-08 | Taiyo Parts Kk | Elevating device |
| JP2007125419A (en) * | 2007-01-11 | 2007-05-24 | Takara Standard Co Ltd | Storage device of elevating storage rack |
-
1989
- 1989-08-11 JP JP9389189U patent/JPH0334233U/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005237643A (en) * | 2004-02-26 | 2005-09-08 | Taiyo Parts Kk | Elevating device |
| JP4585775B2 (en) * | 2004-02-26 | 2010-11-24 | 太陽パーツ株式会社 | lift device |
| JP2007125419A (en) * | 2007-01-11 | 2007-05-24 | Takara Standard Co Ltd | Storage device of elevating storage rack |
| JP4602997B2 (en) * | 2007-01-11 | 2010-12-22 | タカラスタンダード株式会社 | Elevating storage rack storage device |
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