JPH0330136A - Production of magneto-optical recording medium - Google Patents

Production of magneto-optical recording medium

Info

Publication number
JPH0330136A
JPH0330136A JP16565489A JP16565489A JPH0330136A JP H0330136 A JPH0330136 A JP H0330136A JP 16565489 A JP16565489 A JP 16565489A JP 16565489 A JP16565489 A JP 16565489A JP H0330136 A JPH0330136 A JP H0330136A
Authority
JP
Japan
Prior art keywords
temperature
magneto
substrate
optical recording
polycarbonate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16565489A
Other languages
Japanese (ja)
Inventor
Tadashi Sugiyama
杉山 直史
Masaaki Nomura
正明 野村
Takashi Yamada
隆 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP16565489A priority Critical patent/JPH0330136A/en
Publication of JPH0330136A publication Critical patent/JPH0330136A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a magneto-optical recording medium having stable mechanical properties with little optical distorsion, no warpage or local deformation by subjecting a polycarbonate disk substrate to heat treatment according to a specified temp. variation program and then providing a magneto-optical recording layer on the polycarbonate substrate. CONSTITUTION:A disk polycarbonate substrate is heated rather slowly at the temp. rising speed of 150-300 deg.C/hour to about 131-132 deg.C which is higher by 10 deg.C than the softening point (121-122 deg.C) of polycarbonate. Then the substrate is maintained at about 131-132 within + or -2 deg.C variation for at least 0.5 hour but shorter than 24 hours, and then cooled slowly at 300-100 deg.C/hour to room temp. about 30 deg.C. By this method, a polycarbonate substrate having little double refraction and little distortion with reduced local deformation in its surface can be obtained at low cost.

Description

【発明の詳細な説明】 〔産業上の利用分野] 本発明は、光磁気記録媒体の製造方法に関し、特に基板
の熱処理の改良により機械特性が向上した光磁気記録媒
体の提供を可能にする方法に関するものである. 〔従来技術及びその問題点〕 光磁気記録方式は、高密度で大容量であることまた記録
再生ヘッドと非接触であること消去、再記録が容易であ
ること等多くの特徴を有するので、光磁気記録媒体は高
速データファイルや映像記録の記録媒体として、近年そ
の開発実用化が活発に進められている。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a magneto-optical recording medium, and in particular a method that makes it possible to provide a magneto-optical recording medium with improved mechanical properties by improving heat treatment of a substrate. It is related to. [Prior art and its problems] Magneto-optical recording has many features such as high density and large capacity, non-contact with the recording/reproducing head, and easy erasing and rewriting. Magnetic recording media have been actively developed and put into practical use in recent years as recording media for high-speed data files and video recording.

そしてその基本的構戊は、基板上に誘電体保護層等の薄
膜や希土類金属及び遷移金属等を主体とする薄膜等から
なる光磁気記録層を設けたものが一般的である。
The basic structure is generally such that a magneto-optical recording layer made of a thin film such as a dielectric protective layer or a thin film mainly made of rare earth metals, transition metals, etc. is provided on a substrate.

前記光磁気記録媒体の基板としては、ガラスあるいはポ
リカーボネート、ポリメチルメタクリレート、エボキシ
等の樹脂が使用される。
As the substrate of the magneto-optical recording medium, glass or resin such as polycarbonate, polymethyl methacrylate, or epoxy is used.

前記ガラス基板は、光学的特性、表面性、化学的安定性
に優れる反面、量産加工性が低いこと、壊れ易く取り扱
いが難しいこと、高価であること等の問題がある。
Although the glass substrate has excellent optical properties, surface properties, and chemical stability, it has problems such as low mass production processability, being easily broken and difficult to handle, and being expensive.

しれに対し、前記樹脂基板は、量産加工性が高く取り扱
いが容易であること、比較的安価であること等の利点を
有しており現在樹脂基板を主体に開発万く進められてい
る。
On the other hand, the resin substrates have advantages such as high mass production processability, easy handling, and relatively low cost, and are currently being extensively developed mainly using resin substrates.

前記樹脂基板の中でも、ポリメチルメタク1.I L,
ートは、吸水率が大きく経時で反りがでてくること、ま
た耐熱温度が比較的低く熱変形が起こり易い等の幾つか
の問題点があった。
Among the resin substrates, polymethylmethac1. IL,
The sheet metal has several problems, such as its high water absorption rate, which causes it to warp over time, and its heat resistance, which is relatively low, which makes it susceptible to thermal deformation.

それに対して、特開昭62−252546号公報、特開
昭6 2−2 6 4 4 6 3号公報、特開昭63
−97627号公報等に開示されているポリカーボネー
ト基板は、光透過率に優れ、吸湿性も小さく耐熱性も良
好であり且つコストも安く光磁気記録媒体用の基板とし
て有望視されている。
On the other hand, JP-A-62-252546, JP-A-62-2-6-4-4-6-3, JP-A-63
The polycarbonate substrate disclosed in Japanese Patent No. 97627 and the like has excellent light transmittance, low hygroscopicity, good heat resistance, and low cost, and is seen as a promising substrate for magneto-optical recording media.

上記の光磁気記録媒体用の樹脂基板は、樹脂素材を射出
戒形法等で規定の寸法のディスクに戒形することにより
製造されるのが一般的である。ところが、ポリカーボネ
ート基板には成形工程に伴う固有の光学歪みがあり、こ
れがいわゆる複屈折として挙動して、しばしば光磁気記
録媒体のC/Nを低下させることがあった。
The resin substrate for the magneto-optical recording medium described above is generally manufactured by forming a resin material into a disk of specified dimensions using an injection molding method or the like. However, polycarbonate substrates have inherent optical distortions associated with the molding process, which behaves as so-called birefringence and often lowers the C/N of the magneto-optical recording medium.

この光学歪みを除去するために例えば特開昭62−13
7747号公報に開示されているように高分子基板の熱
変形温度以下の温度で熱処理する方法、特開昭62−2
62248号公報に開示されているようにポリカーボネ
ート基+反を130℃以下の温度で熱処理する方法、さ
らに、「プラスチック材料講座5」 (松金幹夫 著 
日刊工業新開社 昭和44年9月30日初版発行)には
、ポリカーポネートを130℃で20日間熱処理するこ
とによって集中応力を除去する方法等が提案されている
In order to remove this optical distortion, for example, JP-A-62-13
A method of heat treatment at a temperature below the thermal deformation temperature of a polymer substrate as disclosed in Japanese Patent Laid-Open No. 7747, JP-A-62-2
As disclosed in Publication No. 62248, a method of heat-treating a polycarbonate group + fabric at a temperature of 130°C or less, and furthermore, "Plastic Materials Course 5" (authored by Mikio Matsugane)
Nikkan Kogyo Shinkaisha, first edition published September 30, 1960) proposes a method of removing concentrated stress by heat treating polycarbonate at 130° C. for 20 days.

しかしながら、ポリカーボネートi仮の製造に伴う付随
的な問題として、熱処理によって基板に反りが生し基板
の機械特性が不安定となってこの基板を用いた光磁気記
録媒体を記録再生用ドライブにかけた際、特に高速回転
(1800rpm、3600rpm等)時、トラッキン
グやフォー力シングの安定性が損なわれ、いわゆる而振
れ加速度が大きくなって再生が不能になることさえあっ
た. この問題を軽凍するために、予め基板に逆の反りをつけ
て戒形すること等の方法が提案されている。
However, an incidental problem associated with the temporary production of polycarbonate i is that the substrate warps due to heat treatment, making the mechanical properties of the substrate unstable. Especially when rotating at high speeds (1,800 rpm, 3,600 rpm, etc.), the stability of tracking and force-singing was impaired, and the so-called vibration acceleration became so large that playback was even impossible. In order to alleviate this problem, methods have been proposed in which the substrate is warped in the opposite direction in advance.

しかしながら、前述した従来の方法では光学歪みを充分
に除去し、C/Nの高い光磁気記録媒体を得ることと基
板の反りをなくし機械的特性が安定した光磁気記録媒体
を得ることを両立させることが困難であった。
However, with the conventional method described above, it is possible to sufficiently remove optical distortion and obtain a magneto-optical recording medium with a high C/N, and to eliminate warping of the substrate and obtain a magneto-optical recording medium with stable mechanical properties. It was difficult.

すなわち、熱処理温度が低すぎると基板の反りは発生し
ないが、光学歪みは充分に除去することができず、また
、熱処理温度が高すぎると光学歪みは除去できても基板
の反りを発生させてしまっていた。更に、基板の局部的
な変形すなわち基板全体としては反りはないが部分的に
凹凸が発生することに対しては従来の方法では殆ど考慮
されておらず特に昇温速度を大きくした場合基板に局部
的な変形が生じ易く、基板の上下方向における面振れ加
速度(ビック・アップの上下移動の加速度として測定さ
れる。)の増加を招く等忠実な記録再生に支障をきたす
ような問題が生したりした。
In other words, if the heat treatment temperature is too low, the substrate will not warp, but the optical distortion will not be sufficiently removed, and if the heat treatment temperature is too high, the substrate will warp even though the optical distortion can be removed. It was put away. Furthermore, the conventional method hardly takes into account the local deformation of the substrate, that is, the occurrence of unevenness locally even though the substrate as a whole does not warp. This may cause problems such as an increase in surface runout acceleration (measured as the acceleration of the vertical movement of the big up) in the vertical direction of the board, which hinders faithful recording and reproduction. did.

基板に予め反りをつけておく方法においても、その反り
の度合い(反り角)の調節が難しく上記の課題を達威す
ることが容易でなかった。
Even in the method of warping the substrate in advance, it is difficult to adjust the degree of warpage (warp angle), making it difficult to achieve the above-mentioned problem.

〔発明が解央しようとする問題点〕[Problems that the invention attempts to solve]

本発明は、前記の従来技術の問題点に鑑みなされたもの
であり、特にポリカーボネート基板の熱処理方法を改良
することによって光学歪みが小さ< C/Nが高い且つ
反りや局部的な変形のない機械特性の安定した光磁気記
録媒体を提供することを目的としている。
The present invention was made in view of the problems of the prior art described above, and in particular improves the heat treatment method for polycarbonate substrates to create a machine with low optical distortion < high C/N and no warping or local deformation. The purpose is to provide a magneto-optical recording medium with stable characteristics.

〔問題点を解決するための手段] 前記本発明の目的は、ディスク状に成形されたポリカー
ボネート基板を常温から150乃至300℃/時間の昇
温速度で該ポリカーボネート基板の軟化温度+10±2
℃の温度まで昇忠させ、その温度で0.  5乃至24
時間保持してから、次いで300乃至100℃/時間の
降温速度で30℃以下の温度にまで降温させる温度変化
パターンの熱処理を施した後に、前記ポリカーボネート
基板上に光磁気記録層を設けることを特徴とする光磁気
記録媒体の製造方法により達成される。
[Means for Solving the Problems] The object of the present invention is to increase the softening temperature of the polycarbonate substrate by 10±2 by raising the temperature from room temperature to 150 to 300° C./hour.
℃ temperature, and at that temperature 0. 5 to 24
The magneto-optical recording layer is provided on the polycarbonate substrate after the polycarbonate substrate is held for a period of time and then subjected to heat treatment in a temperature change pattern in which the temperature is lowered to 30°C or less at a cooling rate of 300 to 100°C/hour. This is achieved by a method of manufacturing a magneto-optical recording medium.

〔発明の実施態様] 本発明においては、噴出成形法等によってポリカーボネ
ートを光磁気記録媒体用に規定された所定の寸法にディ
スク状に成形されたポリカーボネート基板に、150乃
至300’C/時間以下という比較的緩やかな昇温速度
で室温からポリカーボネートの熱軟化温度(121乃至
122℃)よりもほぼ10℃高い13I乃至132℃に
設定しかつ131乃至132℃を中心に±2℃の精度で
調整された温度に少なくとも0.5時間、しかし24時
間を越えない時間保持した後に、300乃至100℃/
時間の比較的緩やかな降温速度で30℃以下の室温近く
まで降温させる熱処理を施すことにより、光学歪みを除
去すると同時に反りや局部的な変形のないポリカーボネ
ート基板を得ることができる。
[Embodiments of the Invention] In the present invention, a polycarbonate substrate formed by molding polycarbonate into a disk shape with predetermined dimensions prescribed for magneto-optical recording media by injection molding or the like is heated at a rate of 150 to 300 C/hour or less. The temperature was set at a relatively slow temperature increase rate from room temperature to 13I to 132°C, which is approximately 10°C higher than the thermal softening temperature of polycarbonate (121 to 122°C), and adjusted with an accuracy of ±2°C around 131 to 132°C. 300-100°C/
By performing heat treatment to lower the temperature to 30° C. or lower, close to room temperature, at a relatively slow rate, it is possible to remove optical distortion and at the same time obtain a polycarbonate substrate without warping or local deformation.

とができる。I can do it.

すなわち、本発明は、熱処理により基板に局部的な変形
が生じるのは基板を熱処理雰囲気においてからの昇温速
度に問題があり、ある特定の範囲内に昇温速度を押さえ
る必要があること、また光学歪みを充分に除去するため
の熱処理温度には閾値があり、ある温度を越えると急速
に基板に反りが発生し、ついにはグループが消失してし
まうこと、さらに、この闇値の温度に保持する時間が適
正でないと光学歪みが効果的に除去できず、長すぎると
基板に反りが発生すること、また、前記瓜度に特定時間
保持した後、室温まで降温するときの降温を特定の範囲
の速度にしないと前記ポリカーボネート基板に局部的な
変形が生し、面振れ加速度が増加すること等の発明者等
の検討結果に基づき、なされたものである。
That is, the present invention provides that local deformation of the substrate due to heat treatment is caused by a problem in the rate of temperature increase from the time the substrate is placed in the heat treatment atmosphere, and that it is necessary to suppress the temperature increase rate within a certain range. There is a threshold temperature for heat treatment to sufficiently remove optical distortion; once a certain temperature is exceeded, the substrate will rapidly warp, and eventually the groups will disappear; If the time is not appropriate, optical distortion cannot be effectively removed, and if it is too long, the substrate will warp. This was done based on the findings of the inventors that if the speed is not set to , local deformation will occur in the polycarbonate substrate and surface runout acceleration will increase.

本発明の光磁気記録媒体の製造方法における前記ポリカ
ーボネート基板の熱処理において熱処理雰囲気の昇温速
度を150乃至300℃/時間以下の比較的緩やかなで
きるだけ一定の速度で昇温することが好ましい。
In the heat treatment of the polycarbonate substrate in the method for manufacturing a magneto-optical recording medium of the present invention, it is preferable that the temperature of the heat treatment atmosphere be raised at a relatively slow rate of 150 to 300° C./hour or less and as constant as possible.

昇温速度が300’C/時間を越えると基板に局部的な
変形が生したり得られた光磁気記録媒体の回転時に面振
れ加速度が増加したりして忠実な記録再生に支障を来す
ので好ましくない。
If the temperature increase rate exceeds 300'C/hour, local deformation will occur in the substrate and surface runout acceleration will increase during rotation of the resulting magneto-optical recording medium, which will impede faithful recording and reproduction. So I don't like it.

また、昇温速度が150℃/時間未満では熱処理が長時
間となり製造コスト上好ましくない。
Moreover, if the temperature increase rate is less than 150° C./hour, the heat treatment will take a long time, which is not preferable in terms of manufacturing cost.

前記熱処理の設定温度が134℃よりも高くなると、温
度上昇とともに急激に反りが発生し易くなり、また13
0℃よりも低くなると光学歪みが除去が充分にできなく
なるので好ましくない。
When the set temperature for the heat treatment is higher than 134°C, warping is likely to occur rapidly as the temperature rises;
If the temperature is lower than 0° C., optical distortion cannot be removed sufficiently, which is not preferable.

温度制御巾が±2℃よりも大きくなると、反りの防止と
光学歪みの除去が両立しなくなるので好ましくない。
If the temperature control width is larger than ±2° C., it is not preferable because prevention of warpage and removal of optical distortion are not compatible.

また、前記ポリカーポネート基板を前記の温度で保持す
る時間は、少なくとも30分以上24時間以下であり、
望ましくは、30分乃至8時間である.前記熱処理の時
間が短いと光学歪みの除去が充分に行えずまた長すぎる
と機械的反りの発生が起こるようになる。
Further, the time for holding the polycarbonate substrate at the temperature is at least 30 minutes or more and 24 hours or less,
Preferably, the time is 30 minutes to 8 hours. If the heat treatment time is too short, optical distortion cannot be removed sufficiently, and if the heat treatment time is too long, mechanical warping may occur.

さらに、前記の特定温度で保持した後に、室温付近の3
0℃の温度にまでする降温速度は、300乃至100℃
/時間である。前記降温速度が300’C/時間を越え
ると前記ポリカーボネート基板に局部的な変形が生して
、得られた光磁気記録媒体の回転時の面振れ加速度が増
加して、忠実な記録再生を阻害するようになる。
Furthermore, after holding at the above-mentioned specific temperature,
The cooling rate to reach the temperature of 0℃ is 300 to 100℃
/It is time. If the cooling rate exceeds 300'C/hour, local deformation occurs in the polycarbonate substrate, increasing surface runout acceleration during rotation of the resulting magneto-optical recording medium, which impedes faithful recording and reproduction. I come to do it.

前記降温速度が100℃/時間未満では降温に時間を要
し製造コスト上好ましくない。
If the temperature decreasing rate is less than 100° C./hour, it takes time to decrease the temperature, which is not preferable in terms of manufacturing cost.

本発明の方法における前記ポリカーボネート基板の熱処
理は通常恒温槽の中に放置することによって行う。
The heat treatment of the polycarbonate substrate in the method of the present invention is usually carried out by leaving it in a constant temperature bath.

本発明においては前述のようにポリカーボネート基板を
熱処理した後にその上に光磁気記録層が形或される。
In the present invention, after the polycarbonate substrate is heat treated as described above, a magneto-optical recording layer is formed thereon.

光磁気記録層は通常遷移金属、希土類金属を主体とする
記録層の薄膜と該記録層をサンドイッチした形でその上
下に例えばSiOx,SiNxAINx及びZnS等の
酸化物、窒化物及び硫化物等誘電体保護層の薄膜が積層
されて設けられることにより前記ポリカーボネート基板
上に光磁気記録層が形成される。
The magneto-optical recording layer is usually made by sandwiching a thin recording layer mainly made of transition metals or rare earth metals, and dielectric materials such as oxides, nitrides, and sulfides such as SiOx, SiNxAINx, and ZnS are placed above and below the recording layer. A magneto-optical recording layer is formed on the polycarbonate substrate by laminating thin protective layers.

これらのFllilの或膜方法は、スパッタリング法で
行うのが一般的である。
These films are generally formed by sputtering.

本発明においては、前記光磁気記録層を前記ポリカーボ
ネート基板上に設ける前に、前述したような条件で前記
ポリカーボネート基板に熱処理を施しているので基板の
複屈折によるノイズレヘルの増大がなくまた基板の反り
の発生も抑えられているのでC/Nが高く、且つ機械特
性も安定した光磁気記録媒体を得ることができる。
In the present invention, before the magneto-optical recording layer is provided on the polycarbonate substrate, the polycarbonate substrate is heat-treated under the conditions described above, so there is no increase in noise level due to birefringence of the substrate, and warpage of the substrate is prevented. Since the occurrence of is also suppressed, a magneto-optical recording medium with a high C/N and stable mechanical properties can be obtained.

本発明の方法において使用されるディスク状の前記ポリ
カーボ不一ト基板の大きさ、寸法には特に制限はない。
There are no particular limitations on the size or dimensions of the disk-shaped polycarbonate substrate used in the method of the present invention.

また、本発明の方法の効果はポリカーボネート基板に限
定されるものでもなく他の透明樹脂基板であっても複屈
折の大きいものについては同様な効果を得ることができ
る。すなわち、その樹脂の熱軟化温度よりもほぼ10℃
高い設定温度で熱処理することにより同様な効果が期待
される。
Further, the effects of the method of the present invention are not limited to polycarbonate substrates, and similar effects can be obtained with other transparent resin substrates with large birefringence. That is, approximately 10°C lower than the thermal softening temperature of the resin.
A similar effect is expected by heat treatment at a high set temperature.

本発明の方広が適用される前記光磁気記録媒体の前記光
磁気記録層の厚さは、遷移金属及び希土類金属を主体と
した薄膜に代表される記録層の薄膜の厚さとしては、2
00乃至2000人であることが好ましい、前記誘導体
保護層の薄膜の厚さとしては、500乃至2000入で
あることが好ましい。
The thickness of the magneto-optical recording layer of the magneto-optical recording medium to which the present invention is applied is as follows: 2.
The thickness of the thin film of the dielectric protective layer is preferably from 500 to 2,000 thick.

本発明において適用される前記光磁気記録媒体の前記光
磁気記録層の記録層の素材としては前述した遷移金属及
び希土類金属を含めて各種の酸化物及び金属の磁性体の
薄膜が使用できる。例えば、MnBi  MnAIGe
,MnCuBi等の結晶性材料、GdJG,BiSmE
rGalG,BiSmYbCoGe IG,等の単結晶
材料、さらに、GdCo,GdFe,TbFe  Dy
Fe,GdFeBi,GdTbFe,GdTbCo,T
bFeCo,TbFeNi等の非品質材料を用いた薄膜
である。中でも感度、C/N等の点で希土類金属、遷移
金属を主体とする記録層が最も好ましい.〔発明の効果
〕 特定範囲の昇温速度で、ポリカーボネート基板の熱軟化
温度+10±2℃にまで昇温し、その温度に特定時間保
持した後に、特定範囲の速度で室温付近にまで降温する
ことによって、複屈折が小さく、反りも小さいかつ表面
の局部変形が軽減されたポリカーボネート基板を安価な
製造コストで得ることができる。
As the material for the recording layer of the magneto-optical recording layer of the magneto-optical recording medium applied in the present invention, thin films of magnetic substances of various oxides and metals including the aforementioned transition metals and rare earth metals can be used. For example, MnBi MnAIGe
, crystalline materials such as MnCuBi, GdJG, BiSmE
Single crystal materials such as rGalG, BiSmYbCoGe IG, as well as GdCo, GdFe, TbFe Dy
Fe, GdFeBi, GdTbFe, GdTbCo, T
It is a thin film using non-quality materials such as bFeCo and TbFeNi. Among these, a recording layer mainly composed of rare earth metals or transition metals is most preferable in terms of sensitivity, C/N, etc. [Effects of the invention] The temperature is raised to the thermal softening temperature of the polycarbonate substrate +10±2°C at a heating rate within a specific range, and after being held at that temperature for a specific period of time, the temperature is lowered to near room temperature at a rate within a specific range. Accordingly, a polycarbonate substrate with low birefringence, low warpage, and reduced local deformation of the surface can be obtained at low manufacturing cost.

そして、本発明の方法によって熱処理されたポリカーボ
ネート基板を用いた光磁気記録媒体の機械特性を向上さ
せることができる。
Furthermore, the mechanical properties of a magneto-optical recording medium using a polycarbonate substrate heat-treated by the method of the present invention can be improved.

本発明の新規な効果を以下の実施例及び比較例に基づい
て説明する。
The novel effects of the present invention will be explained based on the following examples and comparative examples.

〔実施例−1〕 130φ、厚さ1.2mmに射出戒形されたポリカーボ
ネート基板を、恒温槽(ヤマト科学■製クリーンオーブ
ン)中に室温(23℃)で投入した後、220’C/時
間の昇温速度で昇温し、所定温度に到達してから2時間
放置して、その後150℃/時間の速度で室温(23℃
)まで降温して前記ポリカーボネート基板の熱処理を終
了した。
[Example-1] A polycarbonate substrate injection molded to a size of 130φ and a thickness of 1.2mm was placed in a thermostatic oven (clean oven manufactured by Yamato Kagaku ■) at room temperature (23°C), and then heated at 220°C/hour. After reaching the specified temperature, the temperature was raised at a rate of
) to complete the heat treatment of the polycarbonate substrate.

その際の設定温度、温度の制御中を第1表のように変え
て試料aからeまでの6al!のポリカーボネート基板
の試料を作威した。
At that time, changing the set temperature and temperature control as shown in Table 1, 6al! for samples a to e! A sample of polycarbonate substrate was fabricated.

〔比較例−1〕 熱処理せずに室温下に放置したポリカーボ不一ト基板の
試料として試料fを作成した。
[Comparative Example-1] Sample f was prepared as a sample of a polycarbonate substrate that was left at room temperature without being heat-treated.

上記の実施例−1および比較例−1で得られたポリカー
ボネート基板の上にマグネットロンスパッタリング法に
よって、厚さ900人のS iNxの誘電体保itri
の薄膜、厚さ1000人のTbFeCoの記録層の薄膜
、厚さ1000人のSiNXの誘電体保護層の薄膜を順
次この順番で成膜して、試料aから試料fまでの前記ポ
リカーボネート基板上に3N構戒の光磁気記録層を設け
た光磁気記録媒体の試料AからFまでを得た.以上のよ
うにして得た前記ポリカーボネート基板の各試料の複屈
折及び反りを以下のような条件で測定した。また、光磁
気記録媒体の各試料のC/Nを以下のような条件で測定
した。
On the polycarbonate substrates obtained in Example-1 and Comparative Example-1 above, a dielectric insulator of SiNx with a thickness of 900 mm was deposited by magnetron sputtering.
A thin film of TbFeCo with a thickness of 1,000 thick, a thin film of a dielectric protective layer of SiNX with a thickness of 1,000 thick were sequentially formed in this order on the polycarbonate substrates from sample a to sample f. Samples A to F of magneto-optical recording media provided with a 3N magneto-optical recording layer were obtained. The birefringence and warpage of each sample of the polycarbonate substrate obtained as described above were measured under the following conditions. Further, the C/N of each sample of the magneto-optical recording medium was measured under the following conditions.

複屈折の測定法:He−Neレーザー(λ=632.8
nm)の平行ビームを用いてディスク反射光から測定し
た。
Birefringence measurement method: He-Ne laser (λ=632.8
Measurements were made from the disk reflected light using a parallel beam of 100 nm).

反りの測定方法:N.A.=0.55,  λ−830
nmのフォーカスビームによるピック・アノプ移動量を
静電容量として測定した. 半径60mm位置の半径方向の反りと周方向の反りの2
乗和の平方根を反りの値とした。
Warpage measurement method: N. A. =0.55, λ-830
The amount of pick-anop movement by a nm focused beam was measured as capacitance. Radial warpage and circumferential warpage at a radius of 60mm
The square root of the sum of the products was taken as the warpage value.

C/Nの測定方法:差動方弐の光学系を備えた光磁気デ
ィスクテスター(N.A.=0.55、λ=8 3 0
 nm)を用いた。
C/N measurement method: Magneto-optical disk tester equipped with a differential optical system (N.A. = 0.55, λ = 8 3 0
nm) was used.

なお、前記ポリカーボネート基板の熱軟化温度をAST
M  D648により荷重1 8 .  6 kg/c
iを印加して測定したところ122℃であった。
Note that the thermal softening temperature of the polycarbonate substrate is AST
Load 18. by MD648. 6 kg/c
When measured by applying i, the temperature was 122°C.

それぞれの測定結果は第2表のとおりであった。The results of each measurement are shown in Table 2.

第  1  表 第2表 第2表から明らかなように、ポリカーボネート基板の熱
軟化温度(122’c)+10℃である132℃の設定
温度で熱処理した場合温度制御幅が±2℃である試料C
の基板では他の場合に比べ複屈折、反りともに小さく、
その基板を用いて作威した光磁気記録媒体のC/Nも良
好な値であった。
As is clear from Table 1 and Table 2, Sample C has a temperature control width of ±2°C when heat treated at a set temperature of 132°C, which is the thermal softening temperature (122'c) of the polycarbonate substrate + 10°C.
With this substrate, both birefringence and warpage are smaller than in other cases.
The C/N of the magneto-optical recording medium produced using this substrate was also a good value.

一方、設定温度が試料Cと同じ132℃であっても制御
温度の幅が±2℃よりも大きく±5℃である試料Dの基
板では複屈折は比較的小さいが反りが大きくなってしま
った. また、設定温度が132℃よりも低い122℃(試料A
)、127℃(試料B)においては、温度制御幅を±2
℃としても反りは小さかったが複屈折の値が大きくなっ
てしまいそれを用いて得られた光磁気記録媒体のC/N
があまり高くならなかった。
On the other hand, even if the set temperature is 132°C, which is the same as that of sample C, the substrate of sample D, whose controlled temperature range is ±5°C, which is larger than ±2°C, has a relatively small birefringence but a large warpage. .. In addition, the set temperature is 122°C (sample A), which is lower than 132°C.
), 127°C (sample B), the temperature control width is ±2
℃, the warpage was small, but the birefringence value increased, and the C/N of the magneto-optical recording medium obtained using it increased.
was not very high.

更にまた、設定温度が132℃よりも高い137 ”C
の場合(試料E)では、温度制御幅を±2℃で熱処理し
ても複屈折は小さくできたが反りが大きくなってしまっ
た。
Furthermore, if the set temperature is 137"C higher than 132"C
In the case (sample E), even if the heat treatment was performed with a temperature control range of ±2° C., the birefringence could be reduced, but the warpage became large.

熱処理を行わなかった試料Fの基板は複屈折が大きくそ
れを用いて作威した光磁気記録媒体のC/Nはあまり大
きくならなかった。
The substrate of Sample F, which was not heat-treated, had a large birefringence, and the C/N of the magneto-optical recording medium produced using it did not become very large.

〔実施例−2〕 熱軟化温度が125℃のポリカーポネート基板を第3表
に示す設定温度、制御温度幅で熱処理した以外実施例−
1と同゛一の条件で熱処理及び光磁気記録媒体を作成し
た。
[Example 2] Example except that a polycarbonate substrate with a heat softening temperature of 125°C was heat treated at the set temperature and control temperature range shown in Table 3.
A heat treatment was carried out under the same conditions as in Example 1, and a magneto-optical recording medium was produced.

得られた結果を第4表に示す。The results obtained are shown in Table 4.

第3表 第  4  表 熱軟化温度1 2 5 + l O ’Cよりも設定温
度が低くてもまた高くても複屈折も反りも共に好ましい
ポリカーボネートa板とならなかった。
Table 3, Table 4 Thermal softening temperature 1 2 5 + l O'C Even if the set temperature was lower or higher than C, the polycarbonate a plate did not have desirable birefringence or warpage.

〔実施例−3〕 熱軟化温度122℃のポリカーボネート基板を設定温度
を132℃、制御温度幅を±2℃とし、設定温度下での
処理時間を第5表に示す条件にした以外は実施例−1と
同一の条件で熱処理を行って試料jから試料rまでのポ
リカーボネート基板を得、それらの基板を用いた光磁気
記録媒体の作成を行った。(試料J−R) 得られた結果を同しく第5表に示す。
[Example-3] Example except that a polycarbonate substrate with a thermal softening temperature of 122°C was set at a temperature of 132°C, a controlled temperature range of ±2°C, and the processing time under the set temperature was set to the conditions shown in Table 5. Polycarbonate substrates from sample j to sample r were obtained by heat treatment under the same conditions as in -1, and magneto-optical recording media were created using these substrates. (Sample J-R) The obtained results are also shown in Table 5.

第  5  表 設定温度に達してからの基板の処理時間が30分に達し
ない試料J及びRでは、複屈折の値が大きくそれらの基
板を用いて作成した光磁気記録媒体のC/Nがあまり高
くならなかった。
Table 5 Samples J and R whose substrate processing time does not reach 30 minutes after reaching the set temperature have large birefringence values, and the C/N of magneto-optical recording media made using these substrates is low. It didn't get high.

また、処理時間が24時間を越えた試料Q及びRでは基
板の反りが大きくなってしまった。
Further, in samples Q and R for which the processing time exceeded 24 hours, the warpage of the substrate became large.

〔実施例−4〕 ポリカーボネート基板を恒温槽(ヤマト科学■製 クリ
ーンオーブン)中に室温(23℃)で入れた後、第6表
に示した昇湛速度で132℃まで昇温してその温度を設
定温度として制御温度±2”Cで処理した以外は実施例
−1と同一の条件にして基板の熱処理を行って試料Sか
らyまでの基板を得、それらの基板を用いて光磁気記録
媒体の作成を行った。(試料S−X) なお、比較のために所定の昇温過程を通さずに132℃
の設定温度に恒温槽内の温度が達したところでポリカー
ボ不一ト基板をいきなり入れて熱処理を行った試料Zを
作成した。
[Example-4] A polycarbonate substrate was placed in a constant temperature oven (Yamato Scientific Clean Oven) at room temperature (23°C), and then heated to 132°C at the rate shown in Table 6. The substrates were heat-treated under the same conditions as in Example-1 except that the temperature was set at a control temperature of ±2"C to obtain substrates from samples S to y, and these substrates were used for magneto-optical recording. A medium was prepared (Sample S-X).
When the temperature in the constant temperature bath reached the set temperature, a polycarbonate substrate was suddenly inserted and heat treated to prepare Sample Z.

また、光磁気記録媒体の各試料の面振れ加速度を以下の
条件で作成した。
In addition, the surface runout acceleration of each sample of the magneto-optical recording medium was prepared under the following conditions.

面振れ加速度の測定法:光磁気記録媒体の回転数を18
0Orpmとし基板の中心から外周に向けて半径30圓
から60−の間を8等分した位置における面振れ加速度
のうち最大値をその光磁気記録媒体の面振れ加速度(基
板の上下方向の寸度安定性)とした。
Measuring method of surface runout acceleration: The number of rotations of the magneto-optical recording medium is 18
The maximum value of the surface runout acceleration at the positions where the radius from the center of the substrate to the outer circumference of the substrate is divided into eight equal parts from 30 degrees to the outer circumference with 0 Orpm is the surface runout acceleration of the magneto-optical recording medium (the vertical dimension of the substrate). stability).

熱処理した基板の測定結果およびその基板を用いて作或
した光磁気記録媒体の面振れ加速度の測定結果を第6表
に示す. 昇温速度が300”C/時間以内の比較的緩やかな条件
では面振れ加速度は2.0m/sec”以下と比較的小
さい値を示したが、300℃/時間を越えるとかなり大
きくなってしまった。
Table 6 shows the measurement results of the heat-treated substrate and the surface runout acceleration of the magneto-optical recording medium made using the substrate. When the heating rate was relatively slow, within 300"C/hour, the surface runout acceleration was relatively small at 2.0m/sec or less, but when it exceeded 300"C/hour, it became considerably large. Ta.

また、昇温過程を経ない試料Yでは、面振れ加速度は相
当大きくなり基板表面が局部的に変形しているのが肉眼
でも観察できた。
In addition, in sample Y that did not undergo the temperature raising process, the surface runout acceleration was considerably large, and local deformation of the substrate surface could be observed with the naked eye.

〔実施例−5〕 130φ、厚さ1.2皿に噴出戒形されたポリカーボネ
ート基板を、恒温槽(ヤマト科学■製クリーンオーブン
)中に室温(23℃)で入れた後、220℃/時間の昇
温速度で昇温し、132℃に到達してから2時間その温
度に2時間保持した後、第7表に示した降温速度で室温
(23℃)にまで降温して前記ポリカーボネート基板の
熱処理を行い、次いで得られた各ボリカーポネート基板
の上に実施例−1と同一の条件で光磁気記録層を形威し
て、光磁気記録媒体の試料α、β、γ、δ、εを得た。
[Example-5] A 130φ, 1.2-inch thick polycarbonate substrate was placed in a constant temperature oven (clean oven manufactured by Yamato Scientific ■) at room temperature (23°C), and then heated at 220°C/hour. After reaching 132°C, the temperature was maintained at that temperature for 2 hours, and then the temperature was lowered to room temperature (23°C) at the cooling rate shown in Table 7. Heat treatment was performed, and then a magneto-optical recording layer was formed on each of the obtained polycarbonate substrates under the same conditions as in Example-1 to form samples α, β, γ, δ, and ε of magneto-optical recording media. I got it.

なお、降温速度は、恒温槽内側に熱電対を設け、恒温槽
内をファンを廻し、空気を循環させることにより制御し
た。
The rate of temperature decrease was controlled by providing a thermocouple inside the thermostatic chamber and rotating a fan to circulate air inside the thermostatic chamber.

7 表7 table

Claims (1)

【特許請求の範囲】[Claims] ディスク状に成形されたポリカーボネート基板を常温か
ら150乃至300℃/時間の昇温速度でその軟化温度
+10±2℃の温度まで昇温させ、その温度で0.5乃
至24時間保持してから、次いで300乃至100℃/
時間の降温速度で30℃以下の温度にまで降温させる温
度変化パターンの熱処理を施した後に、前記ポリカーボ
ネート基板上に光磁気記録層を設けることを特徴とする
光磁気記録媒体の製造方法。
A polycarbonate substrate formed into a disk shape is heated from room temperature at a heating rate of 150 to 300 °C/hour to a temperature of its softening temperature + 10 ± 2 °C, and held at that temperature for 0.5 to 24 hours. Then 300 to 100℃/
A method for manufacturing a magneto-optical recording medium, comprising providing a magneto-optical recording layer on the polycarbonate substrate after performing heat treatment in a temperature change pattern that lowers the temperature to a temperature of 30° C. or less at a cooling rate per hour.
JP16565489A 1989-06-28 1989-06-28 Production of magneto-optical recording medium Pending JPH0330136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16565489A JPH0330136A (en) 1989-06-28 1989-06-28 Production of magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16565489A JPH0330136A (en) 1989-06-28 1989-06-28 Production of magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPH0330136A true JPH0330136A (en) 1991-02-08

Family

ID=15816462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16565489A Pending JPH0330136A (en) 1989-06-28 1989-06-28 Production of magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPH0330136A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998049678A1 (en) * 1997-04-25 1998-11-05 Iomega Corporation Temperature treatment of flexible media for their dimensional stability

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998049678A1 (en) * 1997-04-25 1998-11-05 Iomega Corporation Temperature treatment of flexible media for their dimensional stability

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