JPH03285975A - Photopolymerization chamber of photosensitive composition - Google Patents
Photopolymerization chamber of photosensitive compositionInfo
- Publication number
- JPH03285975A JPH03285975A JP8624990A JP8624990A JPH03285975A JP H03285975 A JPH03285975 A JP H03285975A JP 8624990 A JP8624990 A JP 8624990A JP 8624990 A JP8624990 A JP 8624990A JP H03285975 A JPH03285975 A JP H03285975A
- Authority
- JP
- Japan
- Prior art keywords
- inert gas
- photosensitive composition
- film
- base material
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 43
- 239000011261 inert gas Substances 0.000 claims abstract description 36
- 239000000463 material Substances 0.000 claims description 30
- 239000010410 layer Substances 0.000 claims description 6
- 239000012790 adhesive layer Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 11
- 229920000915 polyvinyl chloride Polymers 0.000 abstract description 2
- 239000004800 polyvinyl chloride Substances 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 239000002313 adhesive film Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Landscapes
- Adhesive Tapes (AREA)
Abstract
Description
本発明は感光性組成物の光重合室に関する。
更に詳細には、粘着フィルムあるいはシートを製造する
ときに、使用する感光性組成物の光重合室に関する。The present invention relates to a photopolymerization chamber for photosensitive compositions. More specifically, the present invention relates to a photopolymerization chamber for a photosensitive composition used when producing an adhesive film or sheet.
従来、フィルム状基材の表面に、感光性組成物層を設け
、光を照射して、この感光性組成物を重合させて粘着剤
層とする粘着フィルムまたはシートの製造方法は公知で
ある。
例えば、特開昭５８−１１８８７３号公報には、粘着フ
ィルムの製造法と題して、フィルム状基材の表面に感光
性組成物を塗布し、光を照射して感光性組成物を重合さ
せて粘着剤層とする方法について記載されている。
上記製造方法は、感光組成物中に溶存する酸素濃度が高
いと、重合が阻止されるので、従来、不活性ガスを導入
して、雰囲気酸素濃度を１１０００ｐｐ以下に保った光
重合室の中を、感光性組成物層が表面に設けられたフィ
ルム状基材を通過させ、この組成に光を照射して重合し
ていた。Conventionally, a method for producing an adhesive film or sheet is known in which a photosensitive composition layer is provided on the surface of a film-like base material, and the photosensitive composition is polymerized to form an adhesive layer by irradiation with light. For example, JP-A-58-118873 describes a method for producing an adhesive film, in which a photosensitive composition is applied to the surface of a film-like base material, and the photosensitive composition is polymerized by irradiation with light. A method for forming an adhesive layer is described. In the above manufacturing method, polymerization is inhibited if the oxygen concentration dissolved in the photosensitive composition is high. , the composition was passed through a film-like base material with a photosensitive composition layer provided on the surface, and this composition was irradiated with light to polymerize.
この雰囲気酸素濃度を１１０００ｐｐ以下にするには、
通常、窒素ガス等の不活性ガスをこの光重合室の中に導
入して、光重合室内の空気を不活性ガスで入れ換える方
法で行われているが、この方法は不活性ガスを大量に導
入するから、感光性組成物の中の蒸発し易い七ツマ−が
多量蒸発して感光性組成物の組成が変わり、性能劣悪な
粘着剤になるという問題がある。
本発明は、かかる感光組成物中のモノマーの蒸発を少な
くし、性能の劣悪化を防ぐ光重合室を提供することを目
的とする。To reduce the atmospheric oxygen concentration to 11,000 pp or less,
Normally, this method involves introducing an inert gas such as nitrogen gas into the photopolymerization chamber to replace the air in the photopolymerization chamber with the inert gas, but this method involves introducing a large amount of inert gas. Therefore, there is a problem in that a large amount of the easily evaporated 7-mer in the photosensitive composition evaporates and the composition of the photosensitive composition changes, resulting in an adhesive with poor performance. An object of the present invention is to provide a photopolymerization chamber that reduces evaporation of monomers in such photosensitive compositions and prevents deterioration of performance.
本発明は、上記問題を解決し、上記目的を達成するため
になしたもので、光を照射させながら、表面に感光性組
成物層を設けたフィルム状基材を通過させ、感光性組成
物を重合して粘着剤層とする感光性組成物の光重合室に
おいて、不活性ガスを、前記フィルム状基材の入口付近
から導入し、出口付近から排出するようにし、不活性ガ
スの流速とフィルム状基材の進行速度とを略一致させる
のである。
本発明に使用するフィルム状基材とは、従来、粘着テー
プ、フィルム、あるいはシートに使用されている基材の
すべてを含むものである６例えば、ポリ塩化ビニルフィ
ルム、ポリエステルフィルム、ポリエチレンフィルム、
ポリプロピレンフィルム等の合成樹脂フィルムやクラフ
ト紙のような紙製品やセロファン等が好適に使用される
。
本発明において、感光性組成物とは、モノマーと光重合
開始剤からなるものであって、光を照射することにより
、重合して粘着剤となるものをいう。これらの感光性組
成物は、従来、多くのものが知られている。例えば、ア
クリル系、ポリエステル系、エポキシ系等多くの感光性
組成物が知られている。本発明では、これらの公知の感
光性組成物のすべてが使用可能である。特に、アクリル
系感光性組成物が好適である。ここで使用する七ツマ−
は、一般に、蒸発し易いものが使用される。
本発明において、光とは、可視光線、紫外線、電子線等
のＩＩ磁波を舵称する。
本発明光重合室ではこの光重合室の中に不活性ガスを吹
き込む導入口をフィルム状基材の入口付近に設け、不活
性ガスの排出口をフィルム状基材の出口付近に設けて、
不活性ガスの流速とフィルム状基材の進行速度とを略一
致させるのである。The present invention was made in order to solve the above problems and achieve the above objects.The present invention was made in order to solve the above problems and achieve the above objects. In the photopolymerization chamber for the photosensitive composition polymerized to form an adhesive layer, an inert gas is introduced from near the inlet of the film-like base material and discharged from near the exit, and the inert gas flow rate and The advancing speed of the film-like base material is made to substantially match that of the film-like base material. The film-like base material used in the present invention includes all base materials conventionally used for adhesive tapes, films, or sheets.6 For example, polyvinyl chloride film, polyester film, polyethylene film,
Synthetic resin films such as polypropylene films, paper products such as kraft paper, cellophane, etc. are preferably used. In the present invention, the photosensitive composition is composed of a monomer and a photopolymerization initiator, and is polymerized to become an adhesive when irradiated with light. Many of these photosensitive compositions are conventionally known. For example, many photosensitive compositions such as acrylic, polyester, and epoxy are known. All of these known photosensitive compositions can be used in the present invention. In particular, acrylic photosensitive compositions are suitable. Nanatsuma used here
Generally, those that evaporate easily are used. In the present invention, light refers to II magnetic waves such as visible light, ultraviolet rays, and electron beams. In the photopolymerization chamber of the present invention, an inlet for blowing an inert gas into the photopolymerization chamber is provided near the entrance of the film-like base material, an outlet for the inert gas is provided near the exit of the film-like base material,
The flow velocity of the inert gas and the advancing velocity of the film-like base material are made to substantially match.
本発明においては、光重合室の中に不活性ガスを吹き込
む導入口をフィルム状基材の入口付近に設け、不活性ガ
スの排出口をフィルム状基材の出口付近に設けて、不活
性ガスの流速とフィルム状基材の進行速度を略一致させ
るがら、感光性粘着剤から蒸発したモノマーは、この不
活性ガスに含まれたまま、フィルム状基材と一緒になっ
て流れる。従って、感光性組成物中のモノマーは、最初
は蒸発するが、感光性組成物層の直ぐ上の不活性ガスは
直ぐに飽和して蒸発し難くなり、感光性組成物の組成変
化が少なくなる。In the present invention, an inlet for blowing inert gas into the photopolymerization chamber is provided near the entrance of the film-like base material, an inert gas outlet is provided near the exit of the film-like base material, and the inert gas is The monomer evaporated from the photosensitive adhesive flows together with the film-like base material while remaining contained in this inert gas, while making the flow rate of the film substantially match the advancing speed of the film-like base material. Therefore, although the monomer in the photosensitive composition evaporates at first, the inert gas immediately above the photosensitive composition layer quickly becomes saturated and becomes difficult to evaporate, reducing compositional changes in the photosensitive composition.
以下、図面を参照しながら、本発明の詳細な説明する。
第１図は本発明の一実施態様を判り易く示した説明図で
ある。
第１図において、１は光重合室であり、１１はフィルム
状基材２の入口であり、１２は出口である。
２はフィルム状基材であって、この上に感光性組成物層
２１が設けられている。そして、このフィルム状基材１
は、図の矢印のように、左から右に運行している。
３はこのフィルム状基材２の入口１１付近に設けられた
不活性ガスの導入口である。
４はこのフィルム状基材２の出口Ｉ２付近に設けられた
不活性ガスの排出口である。
５は光照射装置である。
次に、この実施例の使用状況およびそのときの作用につ
いて説明する。
フィルム状基材２の上に、図示されていない塗布装置で
、感光性組成物を塗布し、感光性組成物層２１を設ける
。
次に、このフィルム状基材２を入口１１から光重合室１
の中に導入し、光重合室ｌの中を運行させ、出口１２か
ら出させる。
一方、不活性ガスの導入口３がら不活性ガスが導入され
、不活性ガス排出口４から排出される。
この際の不活性ガスの流速はフィルム状基材２の運行速
度と略等しくなるように調節されている。
このように、不活性ガスの流速とフィルム状基材２の運
行速度を略等しくすると、不活性ガスはフィルム状基材
２の同じ位置に留まった状態で同時に運行する。換言す
ると、フィルム状基材２に対する不活性ガスの相対的な
流速は０となり、不活性ガスの流れによる攪拌作用での
蒸発はなくなる。
従って、フィルム状基材２の上に設けられた感光性組成
物から揮発し易いモノマーが蒸発しても、直ぐ上の不活
性ガスの中に留まり、直ぐに飽和して、それ以上蒸発し
難くなる。
この光重合室１の中をフィルム状基材２が運行している
間に、光照射装置５から放射される紫外線で照射され、
感光性組成物が重合し、粘着剤となる。
このようにすると、不活性ガスの移動が少ないので、感
光性組成物の中のモノマーの蒸発が少なく、従って、感
光性組成物の組成の変化が少なく、このまま感光性組成
物が重合すると、良好な粘着剤となる。Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is an explanatory diagram showing an embodiment of the present invention in an easy-to-understand manner. In FIG. 1, 1 is a photopolymerization chamber, 11 is an inlet of a film-like substrate 2, and 12 is an outlet. 2 is a film-like base material, on which a photosensitive composition layer 21 is provided. Then, this film-like base material 1
The trains run from left to right, as shown by the arrows in the diagram. 3 is an inert gas introduction port provided near the inlet 11 of this film-like base material 2. Reference numeral 4 denotes an inert gas outlet provided near the outlet I2 of the film-like base material 2. 5 is a light irradiation device. Next, the usage situation of this embodiment and its effects will be explained. A photosensitive composition is applied onto the film-like base material 2 using a coating device (not shown) to provide a photosensitive composition layer 21 . Next, this film-like base material 2 is transferred from the entrance 11 to the photopolymerization chamber 1.
is introduced into the photopolymerization chamber 1, and is caused to move through the photopolymerization chamber 1 and exit from the exit 12. On the other hand, inert gas is introduced through the inert gas inlet 3 and discharged through the inert gas outlet 4. The flow rate of the inert gas at this time is adjusted to be approximately equal to the traveling speed of the film-like base material 2. In this way, when the flow velocity of the inert gas and the travel speed of the film-like base material 2 are made approximately equal, the inert gas travels simultaneously while remaining at the same position on the film-like base material 2. In other words, the relative flow velocity of the inert gas to the film-like base material 2 becomes 0, and evaporation due to the stirring action due to the flow of the inert gas disappears. Therefore, even if the easily volatile monomer evaporates from the photosensitive composition provided on the film-like substrate 2, it remains in the inert gas immediately above, becomes saturated immediately, and becomes difficult to evaporate any further. . While the film-like substrate 2 is running inside the photopolymerization chamber 1, it is irradiated with ultraviolet rays emitted from the light irradiation device 5,
The photosensitive composition polymerizes and becomes an adhesive. In this way, since there is less movement of inert gas, there is less evaporation of the monomer in the photosensitive composition, and therefore, there is less change in the composition of the photosensitive composition, and if the photosensitive composition is polymerized as it is, it will be good. It becomes a strong adhesive.
本発明では不活性ガスの流速とフィルム状基材の運行速
度とが略一致させているから、感光性組成物の組成の変
化が少なくなり、良好な粘着材となる。In the present invention, since the flow rate of the inert gas and the traveling speed of the film-like substrate are made to substantially match, changes in the composition of the photosensitive composition are reduced, resulting in a good adhesive material.
第１図は本発明の一実施態様を示した説明図である。 光重合室 フィルム状基材 不活性ガス導入口 不活性ガス排出口 〜−−−−光照射装置 １−−−−−−−−−−−−− ３・−・−・ ４−−−−・ FIG. 1 is an explanatory diagram showing one embodiment of the present invention. Photopolymerization chamber Film base material Inert gas inlet Inert gas outlet ～---Light irradiation device 1------------ 3・−・−・ 4----・
Claims (1)
けたフィルム状基材を通過させて、感光性組成物を重合
させて粘着剤層とする感光性組成物の光重合室において
、不活性ガスを、前記フィルム状基材の入口付近から導
入し、出口付近から排出するようにし、不活性ガスの流
速とフィルム状基材の進行速度とを略一致させることを
特徴とする感光性組成物の光重合室。(1) In a photopolymerization chamber for a photosensitive composition, in which the photosensitive composition is polymerized to form an adhesive layer by passing through a film-like base material having a photosensitive composition layer on the surface while irradiating light. , an inert gas is introduced from near the inlet of the film-like base material and discharged from near the exit, and the flow rate of the inert gas and the advancing speed of the film-like base material are made to substantially match. photopolymerization chamber for the composition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8624990A JPH03285975A (en) | 1990-03-31 | 1990-03-31 | Photopolymerization chamber of photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8624990A JPH03285975A (en) | 1990-03-31 | 1990-03-31 | Photopolymerization chamber of photosensitive composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH03285975A true JPH03285975A (en) | 1991-12-17 |
Family
ID=13881545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8624990A Pending JPH03285975A (en) | 1990-03-31 | 1990-03-31 | Photopolymerization chamber of photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03285975A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4646457B2 (en) * | 2001-07-25 | 2011-03-09 | 日東電工株式会社 | Method and apparatus for producing pressure-sensitive adhesive sheet |
| US7919140B2 (en) | 2007-02-05 | 2011-04-05 | Nitto Denko Corporation | Process for producing pressure-sensitive adhesive layer |
| EP2543710A1 (en) | 2011-07-08 | 2013-01-09 | Nitto Denko Corporation | Method and apparatus for producing pressure-sensitive adhesive sheet |
-
1990
- 1990-03-31 JP JP8624990A patent/JPH03285975A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4646457B2 (en) * | 2001-07-25 | 2011-03-09 | 日東電工株式会社 | Method and apparatus for producing pressure-sensitive adhesive sheet |
| US7919140B2 (en) | 2007-02-05 | 2011-04-05 | Nitto Denko Corporation | Process for producing pressure-sensitive adhesive layer |
| EP2543710A1 (en) | 2011-07-08 | 2013-01-09 | Nitto Denko Corporation | Method and apparatus for producing pressure-sensitive adhesive sheet |
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