JPH03284272A - Decomposing treatment method of halogenated organic compound - Google Patents

Decomposing treatment method of halogenated organic compound

Info

Publication number
JPH03284272A
JPH03284272A JP8471690A JP8471690A JPH03284272A JP H03284272 A JPH03284272 A JP H03284272A JP 8471690 A JP8471690 A JP 8471690A JP 8471690 A JP8471690 A JP 8471690A JP H03284272 A JPH03284272 A JP H03284272A
Authority
JP
Japan
Prior art keywords
halogenated organic
organic compound
decomposition
ultraviolet rays
sample gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8471690A
Other languages
Japanese (ja)
Inventor
Akira Okada
章 岡田
Takashi Anami
傑士 阿波
Hideki Shimada
秀樹 島田
Kazuo Suzuki
一雄 鈴木
Isao Ito
功 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP8471690A priority Critical patent/JPH03284272A/en
Publication of JPH03284272A publication Critical patent/JPH03284272A/en
Pending legal-status Critical Current

Links

Landscapes

  • Fire-Extinguishing Compositions (AREA)

Abstract

PURPOSE:To quickly and continuously decompose and treat a halogenated organic compound at a high efficiency without producing hazardous decomposed byproducts by a method wherein specified ultraviolet rays are radiated to the halogenated organic compound in the presence of alkaline solution. CONSTITUTION:Ultraviolet rays having a wave length of 100-400nm are radiated to a halogenated organic compound with presence of an alkaline solution. That is, when the halogenated organic compound is decomposed with use of a decomposing equipment, a sample gas such as fluorocarbon gas is introduced into a decomposing vessel 1 through a fluorocarbon gas inlet pipe 2, an alkaline solution 7 is sprayed to the sample gas through spray pipes, and simultaneously the sample gas is irradiated with the ultraviolet rays by an ultraviolet fluorescent light 5.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、例えばフルオロカーボン、クロロカーボン、
クロロフルオロカーボン、トリクロロエチレンなどのハ
ロゲン化有機化合物の分解処理方法に関する。
[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention is directed to the use of fluorocarbons, chlorocarbons,
This invention relates to a method for decomposing halogenated organic compounds such as chlorofluorocarbons and trichloroethylene.

(従来の技術) 冷媒、発泡剤、洗浄剤、エアゾールなどに広く用いられ
てきたフロン(フルオロカーボン、クロロフルオロカー
ボンの慣用名)および洗浄、脱脂に用いられるクロロカ
ーボンは、成層圏オゾン層を破壊し、健康・環境上の悪
影響が懸念されており、使用量の削減や法的規制が進め
られている。
(Prior art) CFCs (common name for fluorocarbons, chlorofluorocarbons), which have been widely used in refrigerants, blowing agents, cleaning agents, aerosols, etc., and chlorocarbons, which are used in cleaning and degreasing, destroy the stratospheric ozone layer and pose a threat to human health.・There are concerns about its negative impact on the environment, and efforts are being made to reduce its usage and legal regulations.

一方、フロン、クロロカーボンなどのハロゲン化有機化
合物は、化学的に非常に安定しており、その分解処理は
困難であった。最近、ハロゲン化有機化合物の分解処理
方法として、(1)燃焼法、(2)高周波プラズマ法、
(3)超臨界水性、(4)微生物分解法が検討され始め
ている。しかし、(1)燃焼法、(2)高周波プラズマ
法などの高温を利用する方法は、分解副生物として非常
に有害な遊離塩素やフッ素を発生するという欠点があっ
た。また、(3)超臨界水性は超高圧容器を必要とし、
分解効率がやや低く、(4)微生物分解法は分解に長時
間を要するという欠点があった。
On the other hand, halogenated organic compounds such as fluorocarbons and chlorocarbons are chemically very stable, and their decomposition treatment has been difficult. Recently, as methods for decomposing halogenated organic compounds, (1) combustion method, (2) high-frequency plasma method,
(3) supercritical aqueous and (4) microbial decomposition methods are beginning to be considered. However, methods that utilize high temperatures, such as (1) the combustion method and (2) the high-frequency plasma method, have the disadvantage that extremely harmful free chlorine and fluorine are generated as decomposition by-products. In addition, (3) supercritical water-based requires an ultra-high pressure container;
The decomposition efficiency was rather low, and (4) the microbial decomposition method had the disadvantage of requiring a long time for decomposition.

(発明が解決しようとする課題) 上述したように、従来のハロゲン化有機化合物の分解処
理方法は有害な分解副生物を発生したり、長時間を要す
るなどの問題点があった。本発明は、このような従来の
技術の課題を解決するためになされたもので、その目的
とするところは、有害な分解副生物を発生することなく
、迅速かつ連続的にハロゲン化有機化合物を高効率で分
解処理する方法を提供することにある。
(Problems to be Solved by the Invention) As described above, conventional methods for decomposing halogenated organic compounds have problems such as generating harmful decomposition by-products and requiring a long time. The present invention was made to solve the problems of the conventional technology, and its purpose is to rapidly and continuously decompose halogenated organic compounds without producing harmful decomposition by-products. The object of the present invention is to provide a highly efficient decomposition method.

[発明の構成] (課題を解決するための手段および作用)上記目的を達
成するために、本発明のハロゲン化有機化合物の分解処
理方法は、ハロゲン化有機化合物に、アルカリ水溶液の
共存下、波長100〜400nmの紫外線を照射するこ
とを特徴とする。
[Structure of the Invention] (Means and Effects for Solving the Problems) In order to achieve the above object, the method for decomposing a halogenated organic compound of the present invention provides a method for decomposing a halogenated organic compound in the presence of an aqueous alkali solution. It is characterized by irradiating ultraviolet light with a wavelength of 100 to 400 nm.

本発明方法を詳しく説明すると、液体、気体もしくは固
体に付着したハロゲン化有機化合物に波長100〜40
0nmの紫外線を照射して解離分解反応を起こさせ、そ
の過程もしくは結果として発生するフッ化水素、塩化水
素などのハロゲン化水素をアルカリ水溶液に中和吸収し
て無害化するとともに、この生成物を分解系内から除く
ことにより分解反応を促進する方法である。すなわち、
ハロゲン化有機化合物において、c−cl、cFの結合
エネルギーはそれぞれ78.5,105.4 K ca
ll / molてあり、また波長400nI11の紫
外線の光量子エネルギーは3 、 1einstein
であり72 K caIL/ molの解離エネルギー
に相当するので、ハロゲン化有機化合物に波長400n
m以下の紫外線を照射すれば、上記結合が開裂を起こす
可能性を生じる。
To explain the method of the present invention in detail, a halogenated organic compound attached to a liquid, gas, or solid has a wavelength of 100 to 40%.
Irradiation with 0 nm ultraviolet rays causes a dissociative decomposition reaction, and the hydrogen halides such as hydrogen fluoride and hydrogen chloride generated in the process or as a result are neutralized and absorbed into an alkaline aqueous solution to make them harmless, and this product is This method accelerates the decomposition reaction by removing it from the decomposition system. That is,
In halogenated organic compounds, the binding energies of c-cl and cF are 78.5 and 105.4 K ca, respectively.
ll/mol, and the photon energy of ultraviolet light with a wavelength of 400nI11 is 3,1einstein
This corresponds to a dissociation energy of 72 K caIL/mol, so a wavelength of 400 nm is applied to a halogenated organic compound.
If ultraviolet rays of less than m are irradiated, there is a possibility that the above-mentioned bonds will be cleaved.

ただし、分子が結合解離エネルギーより高いエネルギー
を持つ光を吸収した場合に、結合解離のみが起こるとい
うわけではなく、再結合も起こるので、単に紫外線を照
射するだけでは分解効率は低い。そこで、本発明では紫
外線を照射するとともに、ハロゲン化有機化合物が解離
分解した後に生じる中間生成物や分解生成物であるフッ
化水素塩化水素などのハロゲン化水素をアルカリ水溶液
を用いて中和し、フッ化ナトリウム、塩化ナトリウム等
の無害な塩にして分解系内から除くことにより、化学平
衡を進めて分解の効率を向上させている。
However, when a molecule absorbs light with an energy higher than the bond dissociation energy, not only bond dissociation occurs, but also recombination, so simply irradiating with ultraviolet light has low decomposition efficiency. Therefore, in the present invention, in addition to irradiating ultraviolet rays, hydrogen halides such as hydrogen fluoride and hydrogen chloride, which are intermediate products and decomposition products generated after the dissociation and decomposition of halogenated organic compounds, are neutralized using an alkaline aqueous solution. By converting it into harmless salts such as sodium fluoride and sodium chloride and removing them from the decomposition system, chemical equilibrium is promoted and decomposition efficiency is improved.

ところで、照射する紫外線の波長が400nmより長い
場合には、ハロゲン化有機化合物に上記結合解離を起こ
すために充分なエネルギーを与えることができないので
、波長が400nm以下であることが必要であるが、一
方、波長が1100n未満の場合には、中間生成物や分
解生成物として、無害な塩以外に有害なフッ素ガス等を
生成する可能性が大きく、好ましくない。従って、照射
する紫外線の波長は100〜400nmであることが好
ましい。
By the way, if the wavelength of the ultraviolet rays to be irradiated is longer than 400 nm, sufficient energy cannot be given to the halogenated organic compound to cause the above-mentioned bond dissociation, so the wavelength needs to be 400 nm or less. On the other hand, if the wavelength is less than 1100 nm, there is a high possibility that harmful fluorine gas and the like will be produced as intermediate products or decomposition products in addition to harmless salts, which is not preferable. Therefore, it is preferable that the wavelength of the ultraviolet rays to be irradiated is 100 to 400 nm.

また、本発明の対象となるハロゲン化有機化合物として
は、少なくとも1個のフッ素原子、塩素原子、臭素原子
等のハロゲン原子、特にフッ素原子または塩素原子で置
換された飽和、不飽和または芳香族の有機化合物であれ
ば制限はないが、好ましくはフルオロカーボン、クロロ
カーボン、クロロフルオロカーボン、トリクロロエチレ
ン、四塩化炭素などが挙げられる。
In addition, the halogenated organic compounds to be covered by the present invention include at least one halogen atom such as fluorine atom, chlorine atom, bromine atom, etc., especially saturated, unsaturated or aromatic compounds substituted with fluorine atom or chlorine atom. There are no limitations as long as it is an organic compound, but preferred examples include fluorocarbon, chlorocarbon, chlorofluorocarbon, trichloroethylene, and carbon tetrachloride.

本発明で用いるアルカリ水溶液としては、ハロゲン化水
素を中和吸収し得るものであれば特に制限はなく、例え
ば、水酸化ナトリウム、水酸化力リウムなどのアルカリ
金属水酸化物、水酸化カルシウムなどのアルカリ土類金
属水酸化物、アンモニアなどの水溶液が挙げられるが、
その濃度は、pH8〜12であることが好ましい。例え
ば、水酸化ナトリウム水溶液を用いる場合には、濃度は
0.1〜1.0N(4〜40g/斐)であることが好ま
しい。
The alkaline aqueous solution used in the present invention is not particularly limited as long as it can neutralize and absorb hydrogen halides, and examples include alkali metal hydroxides such as sodium hydroxide and hydrium hydroxide, calcium hydroxide, etc. Examples include aqueous solutions of alkaline earth metal hydroxides, ammonia, etc.
The concentration thereof is preferably pH 8-12. For example, when using an aqueous sodium hydroxide solution, the concentration is preferably 0.1 to 1.0 N (4 to 40 g/hour).

処理温度は、好ましくは0〜100℃、さらに好ましく
は30〜80℃である。処理時間は、ハロゲン化有機化
合物の種類、紫外線の波長などにより異なるが、通常3
0分〜2時間である。
The treatment temperature is preferably 0 to 100°C, more preferably 30 to 80°C. The processing time varies depending on the type of halogenated organic compound, the wavelength of ultraviolet rays, etc., but it is usually 3.
The duration is 0 minutes to 2 hours.

次に、本発明の作用について説明すると、本発明方法で
は従来の燃焼法などのように分解反応が高温状態ではな
いので、遊離塩素やフッ素のような有害な分解副生物を
発生することはなく、分解装置の腐食や損傷が少ない。
Next, to explain the effect of the present invention, in the method of the present invention, the decomposition reaction is not carried out at high temperatures as in conventional combustion methods, so harmful decomposition by-products such as free chlorine and fluorine are not generated. , less corrosion and damage to the decomposition equipment.

また、分解生成物であるフッ化水素、塩化水素などのハ
ロゲン化水素は、アルカリ水溶液に非常によく吸収され
フッ化ナトリウム、塩化ナトリウムのような塩となり無
害化されるので、処理が容易である。さらに、アルカリ
水溶液の存在下で紫外線を照射することにより、中間生
成物や分解生成物として発生ずるフッ化水素、塩化水素
などのハロゲン化水素は中和塩として除かれていくので
、分解反応が促進されて、効率良く、連続的に分解を行
うことが可能である。
In addition, hydrogen halides such as hydrogen fluoride and hydrogen chloride, which are decomposition products, are easily absorbed into alkaline aqueous solutions and rendered harmless as salts such as sodium fluoride and sodium chloride. . Furthermore, by irradiating ultraviolet light in the presence of an alkaline aqueous solution, hydrogen halides such as hydrogen fluoride and hydrogen chloride generated as intermediate products and decomposition products are removed as neutralizing salts, so the decomposition reaction is prevented. It is possible to carry out the decomposition efficiently and continuously.

(実施例) 以下に、実施例により本発明をさらに詳細するが、かか
る実施例は本発明の範囲を何ら制限するものではない。
(Examples) The present invention will be described in further detail with reference to Examples below, but these Examples do not limit the scope of the present invention in any way.

なお、以下の実施例では第1図に示すような分解処理装
置を用いて実験を行った。この装置は、クロンガス、ト
リクロロエチレン、四塩化炭素のようなガス化し得るハ
ロゲン化有機化合物の分解を連続的に行うものである。
In the following examples, experiments were conducted using a decomposition treatment apparatus as shown in FIG. This equipment continuously decomposes halogenated organic compounds that can be gasified, such as chlorine gas, trichlorethylene, and carbon tetrachloride.

図に示すようにこの分解処理装置は、石英製分解容器1
に、フロン等の試料ガスを導入するためのフロン入管2
、試料ガスを排出するためのフロン山背3、廃液を排出
するためのドレン管4が設けられ、分解容器1上部には
水酸化ナトリウム溶液のようなアルカリ水溶液を分解容
器1内に噴霧するためのノズル付き噴霧管6が取付けら
れている。分解容器1−内には紫外線螢光灯5が設置さ
れている。
As shown in the figure, this decomposition treatment equipment consists of a quartz decomposition vessel 1
A fluorocarbon inlet pipe 2 for introducing sample gas such as fluorocarbon into the
, a fluorocarbon mountain back 3 for discharging the sample gas, and a drain pipe 4 for discharging waste liquid are provided, and the upper part of the decomposition vessel 1 is for spraying an alkaline aqueous solution such as a sodium hydroxide solution into the decomposition vessel 1. A spray pipe 6 with a nozzle is attached. An ultraviolet fluorescent lamp 5 is installed inside the decomposition vessel 1-.

この分解装置を用いてノλロゲン化有機化合物の分解を
行う場合には、まずフロンガス等の試料ガスをフロン入
管2から分解容器1内に導入し、噴霧管からアルカリ水
溶液7を試料ガスに噴霧するとともに、紫外線螢光灯5
により試料ガスに紫外線を照射する。紫外線により試料
ガスはフッ化水素や塩化水素のようなハロゲン化水素と
なり、アルカリ水溶液7に吸収されて無害なフッ化ナト
リウム、塩化ナトリウムのような塩に変換される。
When decomposing a halogenated organic compound using this decomposition device, first introduce a sample gas such as chlorofluorocarbon gas into the decomposition vessel 1 from the fluorocarbon inlet pipe 2, and then spray the aqueous alkali solution 7 onto the sample gas from the spray pipe. At the same time, an ultraviolet fluorescent lamp 5
The sample gas is irradiated with ultraviolet light. The sample gas becomes hydrogen halides such as hydrogen fluoride and hydrogen chloride due to the ultraviolet rays, and is absorbed by the alkaline aqueous solution 7 and converted into harmless salts such as sodium fluoride and sodium chloride.

ハロゲン化水素を吸収したアルカリ水溶液7はドレン管
4から連続的に系外に取り出すことができ、それにより
試料ガスの分解生成物が分解容器1内から除去されて化
学平衡が進み、試料ガスの分解反応が促進される。この
ようにして試料ガスの分解を連続的に行うことができる
The alkaline aqueous solution 7 that has absorbed the hydrogen halide can be continuously taken out of the system through the drain pipe 4, thereby removing the decomposition products of the sample gas from the decomposition vessel 1 and promoting chemical equilibrium. Decomposition reactions are promoted. In this way, the sample gas can be decomposed continuously.

実施例1 上記分解処理装置を用いて、フロン(CHC12;フロ
ン22)の分解を連続的に行った。
Example 1 Using the above decomposition treatment apparatus, fluorocarbons (CHC12; fluorocarbons 22) were continuously decomposed.

アルカリ水溶液としては、0.5N−NaOH溶液を用
い、60℃で、波長254nmの紫外線を照射した。そ
の結果、2時間後、88%の回収率でフロンはフッ化ナ
トリウムに変換された。
A 0.5N-NaOH solution was used as the alkaline aqueous solution, and ultraviolet rays with a wavelength of 254 nm were irradiated at 60°C. As a result, after 2 hours, Freon was converted to sodium fluoride with a recovery rate of 88%.

[発明の効果] 以上説明したように、本発明方法によれば、環境に有害
なハロゲン化有機化合物を、有害な分解副生物を生じる
ことなく、連続的に効率良く無害な塩に分解処理するこ
とが可能となる。従って、工業的価値が極めて大きく、
また、環境への安全性の向上を図ることができる。
[Effects of the Invention] As explained above, according to the method of the present invention, halogenated organic compounds harmful to the environment can be continuously and efficiently decomposed into harmless salts without producing harmful decomposition by-products. becomes possible. Therefore, the industrial value is extremely large.
Furthermore, it is possible to improve environmental safety.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例において用いた分解処理装置の
構成を概略的に示す縦断面図である。 1・・・分解容器 2・・・フロン入管 3・・・フロン山背 4・・・ドレン管 5・・・紫外線螢光灯 6・・・噴霧管 7・・・アルカリ水溶液
FIG. 1 is a vertical cross-sectional view schematically showing the configuration of a decomposition treatment apparatus used in an embodiment of the present invention. 1... Decomposition container 2... Freon inlet pipe 3... Freon mountain back 4... Drain pipe 5... Ultraviolet fluorescent lamp 6... Spray tube 7... Alkaline aqueous solution

Claims (1)

【特許請求の範囲】[Claims]  ハロゲン化有機化合物に、アルカリ水溶液の共有下、
波長100〜400nmの紫外線を照射することを特徴
とするハロゲン化有機化合物の分解処理方法。
A halogenated organic compound is mixed with an alkaline aqueous solution,
A method for decomposing a halogenated organic compound, the method comprising irradiating ultraviolet light with a wavelength of 100 to 400 nm.
JP8471690A 1990-03-30 1990-03-30 Decomposing treatment method of halogenated organic compound Pending JPH03284272A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8471690A JPH03284272A (en) 1990-03-30 1990-03-30 Decomposing treatment method of halogenated organic compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8471690A JPH03284272A (en) 1990-03-30 1990-03-30 Decomposing treatment method of halogenated organic compound

Publications (1)

Publication Number Publication Date
JPH03284272A true JPH03284272A (en) 1991-12-13

Family

ID=13838402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8471690A Pending JPH03284272A (en) 1990-03-30 1990-03-30 Decomposing treatment method of halogenated organic compound

Country Status (1)

Country Link
JP (1) JPH03284272A (en)

Similar Documents

Publication Publication Date Title
JP4080336B2 (en) Decomposition of fluorine-containing compounds
JPH08323133A (en) Detoxicating treatment of waste gas generated by high temperature hydrolysis of organic halogen compounds using high-frequency induction heat plasma
JPH0312220A (en) Contact decomposition of chlorofluoroalkane
JPH03284272A (en) Decomposing treatment method of halogenated organic compound
JPH0669499B2 (en) How to decompose CFCs
JPH05269374A (en) Device for decomposing low boiling point organic halogen
JP3188830B2 (en) Method and apparatus for removing NF3 exhaust gas
JPS6348571B2 (en)
JP3216868B2 (en) Decomposition method of halide gas
JP4284413B2 (en) Method for decomposing persistent fluorinated carboxylic acids
JPH07155543A (en) Treatment for volatile organic chlorine compound and device therefor
JPH10216479A (en) Detoxifying method of gaseous nitrogen trifluoride
JP3725889B2 (en) Method and apparatus for promoting reaction of chemical substance using ultrasonic wave, and method for producing fluororesin using ultrasonic wave
JP3360986B2 (en) Method for decomposing halogenated organic compound and apparatus for decomposing halogenated organic compound
JPH04279178A (en) Decomposition of organic halogen compound
JPH07178313A (en) Method of processing halon or halon-containing fluorocarbon or chlorofluorocarbon
JP3739169B2 (en) Organochlorine compound decomposition equipment
JPS62225228A (en) Treatment of nitrogen fluoride
JP3441119B2 (en) Decomposition method of halogen-containing organic compounds
JPH08318122A (en) Treatment of decomposed fluorocarbon waste gas
KR20130041683A (en) Hydrogen halide removing method using adsorbent and absorbent process
JPH08270922A (en) Method for making fluorocarbon harmless
JP3570136B2 (en) Method for treating gas containing organic halogen compound and catalyst for decomposing organic halogen compound
JPH0483515A (en) Method for decomposing fluorocarbon type cooling medium
WO2024100066A1 (en) Method for processing contaminated carbonaceous material