JPH04279178A - Decomposition of organic halogen compound - Google Patents
Decomposition of organic halogen compoundInfo
- Publication number
- JPH04279178A JPH04279178A JP5053291A JP5053291A JPH04279178A JP H04279178 A JPH04279178 A JP H04279178A JP 5053291 A JP5053291 A JP 5053291A JP 5053291 A JP5053291 A JP 5053291A JP H04279178 A JPH04279178 A JP H04279178A
- Authority
- JP
- Japan
- Prior art keywords
- organic halogen
- compound
- decomposition
- plasma
- halogen compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002896 organic halogen compounds Chemical group 0.000 title claims abstract description 14
- 238000000354 decomposition reaction Methods 0.000 title description 9
- 238000000034 method Methods 0.000 claims abstract description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 abstract description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 6
- 229910000039 hydrogen halide Inorganic materials 0.000 abstract description 5
- 239000012433 hydrogen halide Substances 0.000 abstract description 5
- 239000001569 carbon dioxide Substances 0.000 abstract description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 3
- 239000003575 carbonaceous material Substances 0.000 abstract description 2
- 238000006356 dehydrogenation reaction Methods 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 8
- 150000003071 polychlorinated biphenyls Chemical group 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- YVGGHNCTFXOJCH-UHFFFAOYSA-N DDT Chemical compound C1=CC(Cl)=CC=C1C(C(Cl)(Cl)Cl)C1=CC=C(Cl)C=C1 YVGGHNCTFXOJCH-UHFFFAOYSA-N 0.000 description 6
- 150000002013 dioxins Chemical class 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- -1 DT) Chemical class 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 238000005695 dehalogenation reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000009841 combustion method Methods 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000005180 public health Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- SMYMJHWAQXWPDB-UHFFFAOYSA-N (2,4,5-trichlorophenoxy)acetic acid Chemical compound OC(=O)COC1=CC(Cl)=C(Cl)C=C1Cl SMYMJHWAQXWPDB-UHFFFAOYSA-N 0.000 description 1
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- TXVHTIQJNYSSKO-UHFFFAOYSA-N benzo[e]pyrene Chemical class C1=CC=C2C3=CC=CC=C3C3=CC=CC4=CC=C1C2=C34 TXVHTIQJNYSSKO-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000001246 bromo group Chemical group Br* 0.000 description 1
- 238000009903 catalytic hydrogenation reaction Methods 0.000 description 1
- 238000002144 chemical decomposition reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000033444 hydroxylation Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Fire-Extinguishing Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】この発明は、ポリ塩化ビフェニル
(PCB)、ジクロロジフェニルトリクロロエタン(D
DT)のような危険なる有機ハロゲン化合物を分解し、
無害化する方法に関するものである。[Industrial Application Field] This invention relates to polychlorinated biphenyl (PCB), dichlorodiphenyltrichloroethane (D
Decomposes dangerous organic halogen compounds such as DT),
It concerns a method of rendering it harmless.
【0002】0002
【従来の技術】従来ハロゲン元素を含有した各種の有機
化合物を無秩序に廃棄処分することにより、環境を破壊
し公衆衛生上の危険を生じていることは良く知られてい
る通りである。ポリ塩化ビフェニル、トリクロロフェノ
キシ酢酸、ジクロロジフェニルトリクロロエタン等はか
つては有用な化合物であったが、その毒性、蓄積性など
から持続性のある環境破壊物であることが判り、安全で
効果的な処理方法が必要とされるに至っている。有機ハ
ロゲン化合物に内在する炭素ーハロゲン結合は、極めて
安定性の高いものであることから、生物分解に対する抵
抗が大きく、また一般の化学的分解作用では実用上有効
な分解を行うことはできない。触媒水素化脱ハロゲン反
応、溶融塩反応、アルカリ金属還元反応、超臨界水酸化
反応等の既知方法によっては、通常は部分的な脱ハロゲ
ン反応が起るだけで、高価な試薬、広範囲の温度調整、
不活性な雰囲気、複雑な装置を必要とし、更にエネルギ
ー消費が大きい等の難点があった。BACKGROUND OF THE INVENTION It is well known that the disorderly disposal of various organic compounds containing halogen elements destroys the environment and poses a danger to public health. Polychlorinated biphenyls, trichlorophenoxyacetic acid, dichlorodiphenyltrichloroethane, etc. were once useful compounds, but due to their toxicity and accumulative properties, they have been found to be persistent environmental hazards, and safe and effective treatment methods have been developed. has come to be needed. Since the carbon-halogen bonds inherent in organic halogen compounds are extremely stable, they have a high resistance to biological decomposition, and cannot be effectively decomposed using general chemical decomposition. Depending on the known methods, such as catalytic hydrogenation dehalogenation, molten salt reaction, alkali metal reduction, and supercritical hydroxylation, only partial dehalogenation usually occurs, and expensive reagents and wide range of temperature control are required. ,
This method requires an inert atmosphere, complicated equipment, and consumes a large amount of energy.
【0003】熱分解による方法は、現在最も実用に近い
と考えられているが、その際に炉内で生じる未燃炭化水
素類が、塩化物や酸素等と反応して、猛毒のダイオキシ
ン類や有害な中間生成物を生成し、二次公害を発生し易
い。そのため炭化水素類の分解除去率は99.9999
%以上になるように、加熱条件として1,400℃以上
の高温に滞留時間1.5秒以上にするなどにすることが
必要とされている。このような条件を満たす熱分解方法
として、改良電気反応器法、プラズマアーク法、回転円
筒炉燃焼法などが期待されている。[0003] The method of thermal decomposition is currently considered to be the closest to practical use, but the unburned hydrocarbons produced in the furnace during this process react with chlorides, oxygen, etc., producing highly toxic dioxins and It produces harmful intermediate products and is likely to cause secondary pollution. Therefore, the decomposition and removal rate of hydrocarbons is 99.9999.
% or more, it is necessary to set the heating conditions to a high temperature of 1,400° C. or higher and a residence time of 1.5 seconds or more. The improved electric reactor method, plasma arc method, rotary cylindrical furnace combustion method, etc. are expected to be pyrolysis methods that meet these conditions.
【0004】改良電気反応器法では、窒素雰囲気中で近
赤外線領域の熱放射により、約2,200℃に急速に電
気加熱してPCB、ダイオキシン等を分解する。プラズ
マアーク法ではプラズマアークを利用し、液状物質をプ
ラズマでイオン化されたガス流中に噴霧し、10,00
0℃の高温でマイクロ秒のオーダで分解するものである
。しかし、これらの方法では分解に膨大なエネルギーを
必要とし、また高温で発生する塩化水素による装置の腐
蝕損傷を防止するための費用も少なくないので大量の処
理には適さない。回転円筒炉燃焼法によれば、熱回収効
率は高くなるが、高温で発生する塩化水素による装置の
損傷防止の問題は残り、さらに燃焼温度が比較的に低い
ので、滞留時間を長くしても不完全燃焼によるダイオキ
シン類の発生の可能性が大きい難点がある。In the improved electric reactor method, PCBs, dioxins, etc. are decomposed by rapid electrical heating to about 2,200° C. using thermal radiation in the near-infrared region in a nitrogen atmosphere. The plasma arc method uses a plasma arc to spray a liquid substance into a gas stream ionized by plasma.
It decomposes in a microsecond order at a high temperature of 0°C. However, these methods require a huge amount of energy for decomposition, and are not suitable for large-scale processing because they require considerable cost to prevent corrosion damage to equipment due to hydrogen chloride generated at high temperatures. According to the rotary cylindrical furnace combustion method, the heat recovery efficiency is high, but there remains the problem of preventing damage to the equipment due to hydrogen chloride generated at high temperatures.Furthermore, since the combustion temperature is relatively low, it is difficult to recover even if the residence time is long. The drawback is that there is a large possibility of generation of dioxins due to incomplete combustion.
【0005】[0005]
【発明が解決しようとする課題】上記のように従来の熱
分解法では、有機ハロゲン化合物を含有する炭素質のも
のを完全に分解するため、高温を必要としていたので、
これがエネルギー効率の甚だ低いことと、ハロゲン化水
素による装置の損傷を発生することの原因になっていた
。一方化学的な手法を利用する分解方法では比較的低温
で分解できるが、高価な試薬を必要とし、分解が不完全
で反応に比較的長時間を要するなどの欠点があった。
そこでこの発明は、上記従来の方法に比較して著しい利
点を有し、比較的低温で迅速に有機ハロゲン化合物の脱
ハロゲン反応を行い、分解する方法を提供することを目
的としている。[Problems to be Solved by the Invention] As mentioned above, conventional thermal decomposition methods require high temperatures to completely decompose carbonaceous substances containing organic halogen compounds.
This caused extremely low energy efficiency and damage to the equipment due to hydrogen halide. On the other hand, decomposition methods using chemical methods can decompose at relatively low temperatures, but they have drawbacks such as requiring expensive reagents, incomplete decomposition, and requiring a relatively long time for the reaction. SUMMARY OF THE INVENTION An object of the present invention is to provide a method for rapidly dehalogenating and decomposing organic halogen compounds at relatively low temperatures, which has significant advantages over the conventional methods described above.
【0006】[0006]
【課題を解決するための手段】上記の目的を達成するた
めに、本発明においては、プラズマ放電下で有機ハロゲ
ン化合物を水蒸気と反応させ、ハロゲン化水素の生成に
よる脱ハロゲン反応及び炭素質の炭酸ガス化反応等によ
り分解するものである。[Means for Solving the Problems] In order to achieve the above object, in the present invention, an organic halogen compound is reacted with water vapor under plasma discharge, and a dehalogenation reaction is performed by producing hydrogen halide, and carbonaceous carbonate is produced. It is decomposed by gasification reaction etc.
【0007】[0007]
【作用】プラズマ放電は窒素気流化が好ましいが、空気
気流中でも適用できる。雰囲気ガス温度は数1000℃
の高温から適用できるが常温付近が好ましい。雰囲気ガ
ス温度は低くても、プラズマで励起生成したイオンの温
度は高く、数1,000℃はあるのでイオン化した反応
ガスにより迅速な分解反応を生じる。プラズマとしては
低周波放電プラズマ、高周波放電プラズマ、マイクロ波
放電プラズマ等を利用できるが、この中で電極を直接挿
入する必要が無くてプラズマ発生効率の高い高周波放電
プラズマが好ましい。[Operation] Plasma discharge is preferably performed in a nitrogen stream, but it can also be applied in an air stream. Atmospheric gas temperature is several thousand degrees Celsius
Although it can be applied from a high temperature of , it is preferable to use it at around room temperature. Even if the atmospheric gas temperature is low, the temperature of the ions excited and produced by the plasma is high, at several 1,000 degrees Celsius, so that the ionized reaction gas causes a rapid decomposition reaction. As the plasma, low-frequency discharge plasma, high-frequency discharge plasma, microwave discharge plasma, etc. can be used, and among these, high-frequency discharge plasma is preferred because it does not require direct insertion of electrodes and has high plasma generation efficiency.
【0008】有機ハロゲン化合物は、このガス気流中に
水蒸気とともに噴霧注入する。噴霧注入が困難な場合に
は、粉末状、液滴状、薄膜状などになるように注入する
ことにより同様な効果を上げることができる。水蒸気は
反応当量より過剰にあることが必要で、この量が少ない
場合には中間の有害な反応生成物により二次公害を生じ
易い。発生するハロゲン化水素は腐蝕性の激しいもので
あるが、温度が低いので工業的に使用できる耐食材は多
く、またアルカリ層を通過させることにより容易に除去
できる。[0008] The organic halogen compound is sprayed into the gas stream together with water vapor. If spray injection is difficult, the same effect can be achieved by injecting it in the form of a powder, droplets, thin film, etc. It is necessary that the water vapor is in excess of the reaction equivalent; if this amount is small, secondary pollution is likely to occur due to intermediate harmful reaction products. The generated hydrogen halide is highly corrosive, but since the temperature is low, it has many corrosion-resistant materials that can be used industrially, and can be easily removed by passing it through an alkaline layer.
【0009】[0009]
【実施例1】プラズマ発生器を具備した流通式反応試験
装置中に窒素を流量2〜5 l/minで流し、13.
56MHz ,300Wの高周波によりプラズマを発生
させた。この時の電極部の温度は常温〜100℃で、窒
素ガスのプラズマ中の滞留時間は1/10秒以下であっ
た。水及びPCB(4塩化物)をそれぞれの濃度が、4
0,000ppm 及び2,000ppm になるよう
に、キャリヤーとして窒素を用いプラズマ中に噴霧注入
し反応させた結果、出口ガス中にPCBは検出されず、
ハロゲン化水素の他には炭酸ガス及び水が検出された。[Example 1] Nitrogen was flowed at a flow rate of 2 to 5 l/min into a flow-through reaction test apparatus equipped with a plasma generator, and 13.
Plasma was generated using a high frequency of 56 MHz and 300 W. The temperature of the electrode portion at this time was room temperature to 100° C., and the residence time of nitrogen gas in the plasma was 1/10 second or less. The respective concentrations of water and PCB (tetrachloride) are 4
As a result of spraying and reacting with nitrogen as a carrier so that the concentration was 0,000 ppm and 2,000 ppm, no PCB was detected in the exit gas.
In addition to hydrogen halides, carbon dioxide gas and water were detected.
【0010】0010
【実施例2】プラズマ発生器を具備した流通式反応試験
装置中に窒素を流量2〜5 l/minで流し、13.
56MHz ,300Wの高周波による電界を電極間に
加えてプラズマ放電させた。この時の電極部の温度は常
温〜100℃で、窒素ガスのプラズマ中の滞留時間は1
/10秒以下であった。水及びDDT(粉末)をそれぞ
れの濃度が50,000ppm 及び2、000ppm
になるように、キャリヤーとして窒素を用いプラズマ
中に噴霧注入し反応させた結果、出口ガス中にDDTは
検出されず、塩化水素の他に炭酸ガス及び水等が検出さ
れた。[Example 2] Nitrogen was flowed at a flow rate of 2 to 5 l/min into a flow reaction test apparatus equipped with a plasma generator, and 13.
A high frequency electric field of 56 MHz and 300 W was applied between the electrodes to cause plasma discharge. At this time, the temperature of the electrode part is room temperature to 100℃, and the residence time of nitrogen gas in the plasma is 1
/10 seconds or less. Water and DDT (powder) at concentrations of 50,000 ppm and 2,000 ppm, respectively
As a result of spraying nitrogen as a carrier and injecting it into plasma and causing a reaction, no DDT was detected in the exit gas, but carbon dioxide gas, water, etc. were detected in addition to hydrogen chloride.
【0011】本発明による有機ハロゲン化合物の分解方
法は、ここに示したPCBやDDTなどの多塩素芳香族
化合物の他に、ダイオキシン類、ベンツピレン類などの
ような蓄積性のある毒物、含フッ素化合物、含臭素化合
物の分解など、広く有害な有機ハロゲン化合物の分解に
適用できることは勿論である。The method for decomposing organic halogen compounds according to the present invention can be used to decompose not only polychlorinated aromatic compounds such as PCB and DDT shown here, but also accumulative toxic substances such as dioxins and benzpyrenes, and fluorine-containing compounds. It goes without saying that it can be applied to a wide range of decompositions of harmful organic halogen compounds, such as decomposition of bromine-containing compounds.
【0012】0012
【発明の効果】本発明は、上述のようにプラズマ放電下
で、有機ハロゲン化合物を水蒸気と反応させ分解するも
ので、以下記述のような効果を奏するとともに広く環境
保全や公衆衛生上及び産業上極めて有効である。
(1)常温近辺で、PCB、DDTなどの廃棄物処理上
問題になる危険な化合物を迅速に分解し無害化できる。
(2)熱分解法のように、ダイオキシン類生成による二
次公害発生のおそれが無く、完全に分解できる。
(3)低温であるため、エネルギー損失は少なく、また
発生するハロゲン化水素による装置類の損傷を抑制でき
工業的に使用できる構造材に困らないので実用化し易い
。Effects of the Invention As described above, the present invention decomposes organic halogen compounds by reacting with water vapor under plasma discharge, and has the following effects and is widely used for environmental conservation, public health, and industrial purposes. Extremely effective. (1) At around room temperature, dangerous compounds such as PCBs and DDT that pose problems in waste disposal can be rapidly decomposed and rendered harmless. (2) Unlike the thermal decomposition method, there is no risk of secondary pollution caused by the formation of dioxins, and it can be completely decomposed. (3) Since the temperature is low, there is little energy loss, and damage to equipment due to generated hydrogen halide can be suppressed, and there is no problem in finding structural materials that can be used industrially, so it is easy to put into practical use.
Claims (1)
族化合物を分解するのに、プラズマ放電下において水蒸
気と反応させることを特徴とする有機ハロゲン化合物の
分解方法。1. A method for decomposing organic halogen compounds, particularly polychlorinated aromatic compounds, which comprises reacting the organic halogen compounds with water vapor under plasma discharge.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5053291A JPH04279178A (en) | 1991-02-22 | 1991-02-22 | Decomposition of organic halogen compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5053291A JPH04279178A (en) | 1991-02-22 | 1991-02-22 | Decomposition of organic halogen compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04279178A true JPH04279178A (en) | 1992-10-05 |
Family
ID=12861608
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5053291A Pending JPH04279178A (en) | 1991-02-22 | 1991-02-22 | Decomposition of organic halogen compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04279178A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5414204A (en) * | 1991-08-23 | 1995-05-09 | Japan Atomic Energy Research Institute | Method of treating refractory activated carbon by exposure to ionizing radiation |
US6888040B1 (en) * | 1996-06-28 | 2005-05-03 | Lam Research Corporation | Method and apparatus for abatement of reaction products from a vacuum processing chamber |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02107387A (en) * | 1988-08-11 | 1990-04-19 | Veb Chemieanlagenbaukomb Leipzig Grimma | Treatment of toxious waste and plasma chemical reactor |
JPH03242158A (en) * | 1990-02-20 | 1991-10-29 | Mitsubishi Heavy Ind Ltd | Cracking treatment of fluorocarbon |
-
1991
- 1991-02-22 JP JP5053291A patent/JPH04279178A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02107387A (en) * | 1988-08-11 | 1990-04-19 | Veb Chemieanlagenbaukomb Leipzig Grimma | Treatment of toxious waste and plasma chemical reactor |
JPH03242158A (en) * | 1990-02-20 | 1991-10-29 | Mitsubishi Heavy Ind Ltd | Cracking treatment of fluorocarbon |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5414204A (en) * | 1991-08-23 | 1995-05-09 | Japan Atomic Energy Research Institute | Method of treating refractory activated carbon by exposure to ionizing radiation |
US6888040B1 (en) * | 1996-06-28 | 2005-05-03 | Lam Research Corporation | Method and apparatus for abatement of reaction products from a vacuum processing chamber |
US8664560B2 (en) | 1996-06-28 | 2014-03-04 | Lam Research Corporation | Method and apparatus for abatement of reaction products from a vacuum processing chamber |
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