JPH03280230A - Stamper for optical disk - Google Patents

Stamper for optical disk

Info

Publication number
JPH03280230A
JPH03280230A JP7881590A JP7881590A JPH03280230A JP H03280230 A JPH03280230 A JP H03280230A JP 7881590 A JP7881590 A JP 7881590A JP 7881590 A JP7881590 A JP 7881590A JP H03280230 A JPH03280230 A JP H03280230A
Authority
JP
Japan
Prior art keywords
stamper
thin film
substrate
resist
metallic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7881590A
Other languages
Japanese (ja)
Inventor
Shigeru Matake
茂 真竹
Seisaburo Shimizu
清水 征三郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP7881590A priority Critical patent/JPH03280230A/en
Priority to EP19910104892 priority patent/EP0449261A3/en
Priority to US07/676,544 priority patent/US5242731A/en
Publication of JPH03280230A publication Critical patent/JPH03280230A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To inexpensively produce the stamper which can produce optical disk substrates having high accuracy by subjecting the metallic thin film of the stamper having the metallic thin film formed with the rugged patterns corresponding to signals on a substrate to a vapor treatment by a silazane compd. CONSTITUTION:A photoresist of a positive type is uniformly applied on the glass substrate and is recorded and exposed with prescribed pit patterns by using an exposing machine; thereafter, the resist is subjected to development processing to obtain the resist patterns having desired ruggedness. After the thin film of metallic chromium is formed thereon, the excess resist and metallic thin film exclusive of the pattern positions are peeled away, by which the patterns consisting of the metallic chromium thin film are finally formed on the substrate. The stamper formed in such a manner is made to coexist together with the silazane compd. in a vessel made of glass or stainless steel, etc., and is held for >=5 minutes in the vapor atmosphere kept at the temp. ranging 100 to 250 deg.C by using an oven, etc., by which the stamper having the good peelability from the resin disk substrates to be reproduced is obtd.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は光ディスク用スタンパに関する。[Detailed description of the invention] [Purpose of the invention] (Industrial application field) The present invention relates to a stamper for optical discs.

(従来の技術) 従来、光ディスク用のスタンパは次のように製造されて
いた。即ち、ガラス基板上に塗布されたフォトレジスト
膜にレーザービームを照射してパターンを形成し、次い
でこれを母型として、ニッケル電鋳法を通常、数回繰り
返すことによりパターンの転写されたニッケル製スタン
パが製造され用いられてきた。しかし、このニッケル製
スタンパは電鋳法で作製するため応力の発生が起こり易
く厚みが約0.3 ミリと非常に薄いものであった為、
成形転写時に不均一に撓んでディスクの平担性が損なわ
れるという問題があった。
(Prior Art) Conventionally, a stamper for an optical disc has been manufactured as follows. That is, a pattern is formed by irradiating a photoresist film coated on a glass substrate with a laser beam, and then using this as a matrix, the nickel electroforming process is usually repeated several times to create a nickel product with the pattern transferred. Stampers have been manufactured and used. However, since this nickel stamper was manufactured using an electroforming method, stress was likely to occur, and the thickness was very thin at approximately 0.3 mm.
There was a problem in that the flatness of the disk was impaired due to non-uniform bending during molding and transfer.

これに対して例えば特公昭62−41852号公報に示
されている様に、はがね製の金型に直接溝をエツチング
により刻み込んで形成し平担なディスク基板を得るとい
う方法がある。しかしながら、この方法は溝深さの制御
が非常に難しいという問題がある。また、スタパック鋼
などのはがねを使用するため精密研磨が必要であり、し
かも微小な凹凸は最終的にも残るため厳密な平坦面は得
られないという欠点がある。さらに、はがね製の金型上
にエツチング可能な薄膜を形成し凹凸パターンを得ると
いう方法は溝深さの制御の問題は解決するかはかね面上
の微小な凹凸はなお残る。また、はがね面と薄膜層との
密着が悪く凹凸パターンが欠落しやすいという新たな問
題が発生する。
On the other hand, as shown in Japanese Patent Publication No. 62-41852, for example, there is a method in which a flat disk substrate is obtained by directly etching grooves into a metal mold. However, this method has a problem in that it is very difficult to control the groove depth. In addition, precision polishing is required because steel such as Starpack steel is used, and furthermore, minute irregularities remain in the final stage, making it impossible to obtain a strictly flat surface. Furthermore, although the method of forming an etched thin film on a steel mold to obtain a concavo-convex pattern does not solve the problem of controlling the groove depth, minute concavities and convexities on the surface still remain. In addition, a new problem arises in that the adhesiveness between the steel surface and the thin film layer is poor and the concavo-convex pattern is likely to be missing.

スタンパ自体を作製する方法は上記以外にも各種の方法
が知られているが基本的には何回かのメツキ、剥離工程
を経るのが一般的である。しかし。
Various methods other than those described above are known for producing the stamper itself, but basically it is common to go through several plating and peeling steps. but.

この様なメツキ、剥離工程は、熟練を要する複雑でやっ
かいな作業であり、これを繰り返すことは工程の増加を
招き作製時間が長くなるというコスト上の問題および精
度上の問題が生じていた。
Such plating and peeling processes are complicated and troublesome operations that require skill, and repeating them increases the number of steps and prolongs the manufacturing time, resulting in cost problems and accuracy problems.

また、金属メツキ薄板をスタンパとして光ディスクを成
形すると成形中に不均一な撓みを生じ易く、複製盤の肉
厚が不均一となる精度上の別の問題があった。
Furthermore, when an optical disc is molded using a metal plated thin plate as a stamper, non-uniform bending tends to occur during molding, resulting in another problem in terms of accuracy in that the wall thickness of the duplicate disc becomes non-uniform.

さらに、こうしたスタンパを用いた光ディスク基板の成
形には、熱可塑性樹脂(ポリカーボネイト、アクリル、
ポリオレフィン等)を用いた場合、射出成形または射出
圧縮成形を主な方法としている。そして、成形時におけ
るスタンパと樹脂ディスク基板との剥離手段としては、
樹脂原料中に内部離型剤をいれることでこれを解決して
いた。このため、量産性には優れていたが欠点として、
複屈折の影響が出やすく光学的な均一性が悪くなる、記
録膜等との密着性が悪いことなどが問題点としてあった
Furthermore, thermoplastic resins (polycarbonate, acrylic,
When using polyolefin (such as polyolefin), injection molding or injection compression molding is the main method. The means for separating the stamper and the resin disk substrate during molding is as follows:
This problem was solved by incorporating an internal mold release agent into the resin raw material. For this reason, it was excellent in mass production, but the drawback was that
Problems include being susceptible to birefringence, resulting in poor optical uniformity, and poor adhesion to recording films and the like.

また、特開昭51−35308号公報に開示されたビデ
オ周波信号記録の複製用型の製造方法では、いわゆるリ
フトオフ法によりスタンパの作製を行い、これを用いて
熱可塑性樹脂にホットプレス加工を行うことにより複製
盤を製造する方法が記載されている。リフトオフ法で作
製したスタンパは、性質的には柔軟性に乏しく脆いため
、射出成形または射出圧縮成形時に破損する恐れがある
ことがら、熱可塑性樹脂を用いてホットプレス加工で静
かに成形する事によりスタンパの破損防止を行っている
。また、熱可塑性樹脂を用いるため加熱冷却を繰り返さ
ねばならないこともあり、複製盤の成形速度は従来より
遅くなり生産性が低い。
In addition, in a method for manufacturing a reproduction mold for video frequency signal recording disclosed in Japanese Patent Application Laid-open No. 51-35308, a stamper is manufactured by a so-called lift-off method, and the stamper is used to hot-press a thermoplastic resin. A method for manufacturing a reproduction disc is described. Stampers made by the lift-off method are inflexible and brittle, so there is a risk of breakage during injection molding or injection compression molding. The stamper is prevented from being damaged. Furthermore, since thermoplastic resin is used, heating and cooling may have to be repeated, and the molding speed of the duplicator is slower than in the past, resulting in low productivity.

一方、いわゆる2P成形法をもちいる場合では、熱また
は光硬化性樹脂(エポキシ、アクリル、シリコーン等)
を光ディスク用基板として用いており複屈折上の問題は
なかったが、同様に樹脂中に内部離型剤をいれる或いは
樹脂中の極性基を減少させるように組成を変えるなどし
てスタンパと樹脂ディスク基板との剥離離型性の向上を
計っている。
On the other hand, when using the so-called 2P molding method, heat or photocurable resin (epoxy, acrylic, silicone, etc.)
was used as a substrate for optical discs, and there were no problems with birefringence, but the stamper and resin discs were similarly made by adding an internal mold release agent to the resin or changing the composition to reduce the polar groups in the resin. The aim is to improve releasability from the substrate.

この様な離型対策をしない場合にはスタンパと樹脂ディ
スク基板とが互いに成形時に貼り付き合い両方共回収が
困難になったり、無理して剥離させるとスタンパや基板
に傷が付く或いは割れるという厄介な問題があった。更
に樹脂自体に離型剤をいれ離型効果を持たせると前記の
如く後の工程でディスク基板上に設ける反射膜や記録膜
が剥離しやすくなり、これらとの密着性が低下する或い
は記録膜等にしわやクラックが入り劣化するという問題
があった。
If such mold release measures are not taken, the stamper and the resin disk substrate will stick to each other during molding, making it difficult to recover both, or forcing the stamper and the resin disk substrate to separate may cause damage or cracking, which is a troublesome problem. There was a problem. Furthermore, if a mold release agent is added to the resin itself to give it a mold release effect, the reflective film and recording film provided on the disk substrate in a later process will easily peel off, resulting in a decrease in adhesion to these films, or the recording film will be removed. There was a problem that wrinkles and cracks appeared on the paper, resulting in deterioration.

(発明が解決しようとする課題) 上述したようにこれまでのスタンパは、容易に作製でき
ず、またそれを用いて光ディスク基板を成形した際の樹
脂ディスク基板との剥離の問題が顕著であった。
(Problems to be Solved by the Invention) As mentioned above, conventional stampers cannot be easily manufactured, and when an optical disk substrate is molded using the stamper, there is a noticeable problem of peeling from the resin disk substrate. .

本発明はこうした問題を解決するために成されたもので
あり、安価に作製でき、かつ高精度の光ディスク基板を
複製・製造することができる光ディスク用スタンパを提
供することを目的とする。
The present invention has been made to solve these problems, and an object of the present invention is to provide an optical disc stamper that can be manufactured at low cost and that can reproduce and manufacture optical disc substrates with high precision.

〔発明の構成〕[Structure of the invention]

(課題を解決するための手段と作用) 本発明は、信号に応じた凹凸パターンを有して基板上に
形成された金属薄膜を備えた光ディスク用スタンパにお
いて、 前記金属薄膜には、シラザン化合物による蒸気処理が施
されていることを特徴とする光ディスク用スタンパであ
る。
(Means and Effects for Solving the Problems) The present invention provides a stamper for an optical disc including a metal thin film formed on a substrate with a concavo-convex pattern according to a signal, wherein the metal thin film is made of a silazane compound. This is an optical disc stamper characterized by being subjected to steam treatment.

本発明の光ディスク用スタンパは、表面を高精度で平担
に加工維持できる材料、例えばガラス、石英、セラミッ
クなどを基板として、この上に記録すべき情報に対応す
る凹凸状のピットまたは、グループを金属クロム或いは
金属チタン等でリフトオフ法により形成される。この時
の基板の厚さは取扱い上の良さ及び強度の観点から少な
くとも1ミリ以上が好ましい。
The stamper for optical disks of the present invention uses a material whose surface can be processed and maintained flat with high precision, such as glass, quartz, or ceramic, as a substrate, and has uneven pits or groups corresponding to the information to be recorded on the substrate. It is formed of metallic chromium, metallic titanium, or the like by a lift-off method. The thickness of the substrate at this time is preferably at least 1 mm from the viewpoint of ease of handling and strength.

次に本発明の光ディスク用スタンノ(の製造工程例を説
明する。まず前記基板上にフォトレジスト層を均一にス
ピンナー等で塗布して設ける。このフォトレジストの膜
厚はピンボールやコメント等の欠陥の発生を減らし化学
的耐性があがる値として1000 A以上が望ましい。
Next, we will explain an example of the manufacturing process of the stuncoat for optical discs of the present invention. First, a photoresist layer is uniformly applied onto the substrate using a spinner or the like. The film thickness of this photoresist is determined by defects such as pinballs and comments. A value of 1000 A or more is desirable as it reduces the generation of heat and increases chemical resistance.

次にレーザー光によりレジストを露光し、現像処理をす
る。
Next, the resist is exposed to laser light and developed.

さらに現像後のレジスト・パターン上に金属クロムまた
は金属チタンを用いて金属薄膜を形成する。この金属薄
膜の膜厚は読みだし時のレーザー光の波長との関係から
λ/4程度が良v1ことからおよそ100OA〜150
0Aが適当となる、この事を考慮するとレジストの膜厚
は1000 A〜3000 A程度の範囲が妥当である
。また、金属クロム及び金属チタンは真空蒸着法或いは
スパッタリング法で薄膜形成でき上記基板材料と密着性
の良い材料である。
Furthermore, a metal thin film is formed using metallic chromium or metallic titanium on the developed resist pattern. The thickness of this metal thin film is approximately 100OA to 150OA, since a good v1 of about λ/4 is determined by the relationship with the wavelength of the laser beam during reading.
0A is appropriate. Taking this into consideration, it is appropriate for the resist film thickness to be in the range of about 1000A to 3000A. Furthermore, metallic chromium and metallic titanium are materials that can be formed into thin films by vacuum evaporation or sputtering and have good adhesion to the substrate material.

その後、余剰となるレジスト及び金属膜を剥離除去する
ことで基板上に凹凸状の金属クロム或いは金属チタンの
情報(ピット或いはグループ・パターン)が残り最終的
にスタンパが作製できる。
Thereafter, by peeling off the excess resist and metal film, uneven information (pits or group patterns) of metal chromium or metal titanium remains on the substrate, and finally a stamper can be manufactured.

レジストの剥離除去法としてはアセトン等の有機溶剤を
用いて、これらの中に浸漬することで容易に可能となる
。この時レジスト上に成膜堆積した余剰の金属クロムま
たはチタンも同時に取り除くことが可能となる。
The resist can be easily removed by immersing the resist in an organic solvent such as acetone. At this time, excess metal chromium or titanium deposited on the resist can also be removed at the same time.

本発明では成形時に於けるスタンパと複製する樹脂ディ
スク基板との剥離離型を円滑にするため予めスタンパに
、ヘキサメチルジシラザン、N−トリメチルシリルアセ
トアミド、ジメチルトリメチルシリルアミン、ジエチル
トリメチルシリルアミン、トリメチルシリルイミダゾー
ルの中から選ばれる少なくとも一様のシラザン化合物に
よる蒸気処理が特に有効であることを見い出し、従来の
ように成形樹脂材料中に離型剤を入れなくとも済むよう
にした。
In the present invention, the stamper is preliminarily coated with hexamethyldisilazane, N-trimethylsilylacetamide, dimethyltrimethylsilylamine, diethyltrimethylsilylamine, or trimethylsilylimidazole in order to facilitate the separation between the stamper and the resin disk substrate to be replicated during molding. It has been found that steam treatment with at least one silazane compound selected from the following is particularly effective, and it is no longer necessary to incorporate a mold release agent into the molding resin material as in the past.

シラザン化合物による具体的な蒸気処理方法としては、
ガラスまたはステンレス製等の容器内に上記シラザン化
合物を少々と上記の如く作製したスタンパ−を−緒に共
存させ、オーブン等を用いて温度を100〜250℃の
範囲にし、この蒸気雰囲気中で5分以上保持することに
より達成出来る。
A specific steam treatment method using a silazane compound is as follows:
A small amount of the above-mentioned silazane compound and the stamper prepared as above are placed in a container made of glass or stainless steel, etc., and the temperature is set in the range of 100 to 250°C using an oven or the like. This can be achieved by holding it for more than a minute.

尚温度は常温以上なら処理出来るが低温では処理時間が
数十分以上と長くなる。また250℃以上の高温になる
と取扱いの上で作業に支障を生じやすいので生産コスト
の面から効率が下がる。またシラザン化合物の蒸気処理
能力は、通常の場合300〜400i/gであることか
ら、−回の使用量としては0.1g/l−程度と非常に
少ない量で済むため経済面からも優れた処理といえる。
It should be noted that processing can be performed at temperatures above room temperature, but at low temperatures the processing time becomes longer than several tens of minutes. In addition, when the temperature reaches 250° C. or higher, it tends to cause problems in handling, which lowers efficiency in terms of production costs. In addition, since the steam processing capacity of silazane compounds is usually 300 to 400 i/g, the amount used each time is as small as 0.1 g/l, which is excellent from an economic standpoint. It can be called processing.

この剥離処理は該スタンバ作製後、成型に用いる前に一
回のみ行えば良く、成型ごとに毎回処理する必要は無い
This peeling treatment only needs to be performed once after the standbar is produced and before it is used for molding, and there is no need to perform the peeling treatment every time it is molded.

以下本発明を実施例に基すき詳細に説明する。The present invention will be explained in detail below based on examples.

(実施例) 実施例1 直径130mm+厚さ5+amのガラス基板上にポジ型
のフォトレジスト(東京応化層TSMR−8800)を
まず均一にスピンナーで膜厚2000 Aに塗布した。
(Examples) Example 1 First, a positive photoresist (Tokyo Ohka Layer TSMR-8800) was uniformly coated to a film thickness of 2000 Å using a spinner on a glass substrate with a diameter of 130 mm and a thickness of 5+ am.

次いで、露光機に用いて所定のピット・パターンを記録
露光した後、アルカリ現像液で現像処理をして所望の凹
凸状をしたレジストパターンを得た。
Next, a predetermined pit pattern was recorded and exposed using an exposure machine, and then developed with an alkaline developer to obtain a resist pattern having a desired uneven shape.

さらに、このレジスト・パターン上に金属クロムの薄膜
を真空蒸着法で膜厚1200A形成した。
Furthermore, a thin film of metallic chromium having a thickness of 1200 Å was formed on this resist pattern by vacuum evaporation.

その後、アセトンを使用しパターン位置以外の余剰とな
るレジスト及び金属クロム薄膜を剥離除去し、最終的に
該基板上に金属クロム薄膜よりなるパターンを形成し、
これをスタンパとし同様のスタンパをさらに6枚作製し
た。
After that, using acetone, the excess resist and metal chromium thin film other than the pattern position are peeled off and finally a pattern made of the metal chromium thin film is formed on the substrate,
Using this as a stamper, six more similar stampers were produced.

次いで、このスタンパの蒸気処理を以下のように行った
Next, this stamper was subjected to steam treatment as follows.

シラザン化合物として、ヘキサメチルジシラザン、N−
トリメチルシリルアセトアミド、ジメチルトリメチルシ
リルアミン、ジエチルトリメチルシリルアミン、トリメ
チルシリルイミダゾールの5種類を選び、各々別々にス
テンレス製の容器内に上記シラザン化合物を約0.5 
gを入れ、上記の如く作製したスタンパ−枚ずつを各々
の容器に入れ、オーブンを用いて、これらの容器を暖め
温度を120℃にし、この状態を約15分間保持させた
後、自然冷却してそれぞれ蒸気処理を施したスタンパと
した。
As a silazane compound, hexamethyldisilazane, N-
Select five types: trimethylsilylacetamide, dimethyltrimethylsilylamine, diethyltrimethylsilylamine, and trimethylsilylimidazole, and add about 0.5 of the above silazane compound to each separately in a stainless steel container.
g, and put the stamper sheets prepared as above into each container. Use an oven to warm these containers to a temperature of 120°C, maintain this state for about 15 minutes, and then let it cool naturally. Each stamper was then subjected to steam treatment.

一方、比較例として、上記スタンパに於けるシラザン化
合物の蒸気処理を行わないものを用意した。
On the other hand, as a comparative example, a stamper was prepared in which the silazane compound was not subjected to steam treatment.

これらのスタンパを用いて光ディスク基板(複製盤)の
作製を試みた。
An attempt was made to produce an optical disc substrate (duplicate disc) using these stampers.

まず、直径90m1n、厚さ1 、2mmの強化ガラス
基板上に、スピンナーでビニル基含有シリコーン樹脂(
東芝シリコーン製Y R−3224)を塗布した後。
First, a vinyl group-containing silicone resin (
After applying Toshiba Silicone YR-3224).

110℃で10分間乾燥した。It was dried at 110°C for 10 minutes.

次に、ガラス基板上のビニル基含有シリコーン樹脂に該
スタンパを圧着して、180℃で1分間加熱してシリコ
ーン樹脂を硬化させた後、スタンパを剥離して光ディス
ク基板を得る様にした。その結果、上記5種類のシラザ
ン化合物の蒸気処理を施したスタンパは、成型時に光デ
ィスク基板と容易に剥離離型ができた。その後、引き続
き同様にして50回行ったが何ら支障がなく50枚の光
ディスク基板(複製盤)が得られた。
Next, the stamper was pressed onto a vinyl group-containing silicone resin on a glass substrate, heated at 180° C. for 1 minute to cure the silicone resin, and then the stamper was peeled off to obtain an optical disk substrate. As a result, the stamper treated with the five types of silazane compounds described above could be easily separated from the optical disk substrate during molding. Thereafter, the same process was repeated 50 times, and 50 optical disc substrates (duplicates) were obtained without any problems.

一方、比較例のシラザン化合物の蒸気処理を施さないス
タンパでの成型は、光ディスク基板とスタンパが成型時
に張り付き剥離することが出来なかった。そこで無理に
この両者が剥がそうとした所、シリコーン樹脂を塗布し
たガラス基板が割れてしまった・ 実施例2 スタンパ基板材料として表面研磨したアルミナ板(直径
130+am、厚さ10■)を用意し、通常のRFスパ
ッタリング法で金属チタン薄膜によるピット・パターン
を形成した以外は実施例1と同様にしてスタンパを作製
した。
On the other hand, in the comparative example of molding using a stamper that was not subjected to vapor treatment of the silazane compound, the optical disc substrate and the stamper stuck to each other during molding and could not be separated. When both of them tried to forcefully peel it off, the glass substrate coated with silicone resin broke.Example 2 A surface-polished alumina plate (diameter 130+am, thickness 10cm) was prepared as a stamper substrate material. A stamper was produced in the same manner as in Example 1, except that a pit pattern of a metallic titanium thin film was formed by the usual RF sputtering method.

次いでシラザン化合物としてヘキサメチルジシラザンを
選び温度を100℃にし、 この蒸気雰囲気中で15分
間保持した以外は、実施例1と同様にしてスタンパの蒸
気処理を行った。次に、このスタンパを用いて実施例1
と同様のシリコーン樹脂基板の成形を行い複製盤の作製
を試みた6その結果、実施例1と同様何ら問題なく成形
及び剥離をすることが8来た。
Next, the stamper was steam-treated in the same manner as in Example 1, except that hexamethyldisilazane was selected as the silazane compound, the temperature was raised to 100° C., and the stamper was held in this steam atmosphere for 15 minutes. Next, using this stamper, Example 1
An attempt was made to fabricate a replica disk by molding a silicone resin substrate in the same manner as in Example 1. As a result, molding and peeling were possible without any problems as in Example 1.

尚、成形した複製盤を顕微鏡で観察したところ、実施例
1,2共にピット・パターンの転写性にも全く問題は無
いことが判明した。
Furthermore, when the molded duplication disks were observed under a microscope, it was found that there was no problem in the transferability of pit patterns in both Examples 1 and 2.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、高精度の光ディスク基板を複製・製造
することが出来る剥離性の良いスタンパが得られる。
According to the present invention, it is possible to obtain a stamper with good releasability and which can reproduce and manufacture optical disc substrates with high precision.

Claims (2)

【特許請求の範囲】[Claims] (1)信号に応じた凹凸パターンを有して基板上に形成
された金属薄膜を備えた光ディスク用スタンパにおいて
、 前記金属薄膜には、シラザン化合物による蒸気処理が施
されていることを特徴とする光ディスク用スタンパ。
(1) An optical disk stamper comprising a metal thin film formed on a substrate with a concavo-convex pattern according to a signal, characterized in that the metal thin film is subjected to a vapor treatment using a silazane compound. Stamper for optical discs.
(2)ヘキサメチルジシラザン、N−トリメチルシリル
アセトアミド、ジメチルトリメチルシリルアミン、ジエ
チルトリメチルシリルアミン、トリメチルシリルイミダ
ゾールの中から選ばれる少なくとも一種類のシラザン化
合物による蒸気処理であることを特徴とする請求項(1
)記載の光ディスク用スタンパ。
(2) Steam treatment with at least one silazane compound selected from hexamethyldisilazane, N-trimethylsilylacetamide, dimethyltrimethylsilylamine, diethyltrimethylsilylamine, and trimethylsilylimidazole (1)
) stamper for optical discs.
JP7881590A 1990-03-29 1990-03-29 Stamper for optical disk Pending JPH03280230A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP7881590A JPH03280230A (en) 1990-03-29 1990-03-29 Stamper for optical disk
EP19910104892 EP0449261A3 (en) 1990-03-29 1991-03-27 Resin composition for an optical disc and an optical disc using it
US07/676,544 US5242731A (en) 1990-03-29 1991-03-28 Resin composition for an optical disc and an optical disc using it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7881590A JPH03280230A (en) 1990-03-29 1990-03-29 Stamper for optical disk

Publications (1)

Publication Number Publication Date
JPH03280230A true JPH03280230A (en) 1991-12-11

Family

ID=13672340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7881590A Pending JPH03280230A (en) 1990-03-29 1990-03-29 Stamper for optical disk

Country Status (1)

Country Link
JP (1) JPH03280230A (en)

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