JPH03271746A - Processing method for photosensitive planographic printing plate - Google Patents

Abstract

PURPOSE:To eliminate the need for the respective automatic developing machines to be exclusively used and to reduce the cost of the device in the case of simultaneous processing of a waterless planographic printing plate and a PS plate by adopting developing solns. different from each other for the developing solns. to be used in the 1st developing zone and 2nd developing zone of two continuous developing zones. CONSTITUTION:The two developing zones 1, 2 are provided. The developing soln. for the waterless planographic printing plate is used for the one developing zone 1, etc., and the developing soln. for the PS plate is used for the remaining one developing zone. The waterless planographic printing plate and the PS plate are processed in both of the two developing zones 1, 2 and are subjected to the development processing by changing the developing time with the waterless planographic printing plate and the PS plate. Namely, the plates are processed by two kinds of the developing solns. changed in the compsn. The development processing is executed by the different processing time by changing the transporting speed according to the kinds of the photosensitive planographic printing plates. The development processing of the waterless planographic printing plate and the PS plate with one unit of the automatic developing machine is, therefore, possible. The cost of the device is reduced in this way.

Description

[Detailed Description of the Invention] [Field of Industrial Application] The present invention provides a common method for processing photosensitive planographic printing plates that do not require dampening water and photosensitive planographic printing plates that require dampening water in one automatic processor. The present invention relates to a processing method for developing.

[Conventional technology]

Photosensitive lithographic printing plate that does not require dampening water (hereinafter referred to as "waterless lithographic plate")
There is a known structure in which a silicone rubber layer is laminated on a substrate as a photosensitive layer and an ink repellent layer. As a processing method for creating a printing plate from such a waterless lithographic plate, Japanese Patent Application Laid-Open No. 55-156947
According to No. 1, etc., a part or all of the photosensitive layer in the image area is eluted using a processing liquid that can dissolve at least a part of the photosensitive layer in the image area, and the process is carried out in contact with water or in the presence of a solvent mainly composed of water. A method is known in which the surface of the printing plate is rubbed under the surface.

On the other hand, as a photosensitive lithographic printing plate (hereinafter referred to as "rPS plate") for creating a lithographic printing plate that requires dampening water, a photosensitive diazo compound, etc. Negative types have a photosensitive layer containing a photosensitive component, and positive types have a photosensitive layer containing an O-quinonediazide compound that becomes alkali-soluble upon exposure.
Then, as a processing method for creating a printing plate from these 23 plates, an aqueous solution (developer) containing an alkali agent, a surfactant, an organic solvent, etc. is applied to the photosensitive layer, and the photosensitive layer in the non-image area is A processing method is known in which the photosensitive layer in the non-image area is removed by dissolving or swelling the photosensitive layer and adding development acceleration operations such as rubbing with a brush. A developer is known that can commonly process negative type 93 plates and positive type 25 plates with one type of developer.

[Problem that the invention seeks to solve]

By the way, when such a waterless lithographic plate and a PS plate are processed simultaneously with an automatic developing machine, a dedicated automatic developing machine is required for each, which poses problems of equipment cost and installation space.

An object of the present invention is to provide a processing method that can simultaneously process waterless planographic plates and PS plates with one automatic developing machine.

[Means for solving problems]

The above object is to automatically transport a photosensitive lithographic printing plate that does not require dampening water and a photosensitive lithographic printing plate that requires dampening water using an automatic processor having at least two continuous development zones; A photosensitive processing method for carrying out a development process, characterized in that the developers used in the first development zone and the second development zone of the at least two consecutive development zones are different from each other. This is achieved by a method of processing lithographic printing plates. The development zone mentioned above is
A unit of development processing that cannot be divided in practical terms.

The present invention will be explained in detail below.

At least one of the different developing solutions used in the first developing section and the second developing section in the present invention has water as a main solvent (specifically, 50% or more of the solvent is water). ) Alkaline (pH is 10 or higher, preferably 12)
(above)) It is preferable to use a developer.

In addition, a developer containing an organic solvent and a surfactant that swells the ink repellent layer of a waterless lithographic plate or swells or dissolves the image area of the photosensitive layer or a developer containing water as a main component is used in the first development zone. However, it is preferable to use an alkaline developer containing water as the main solvent (specifically, 50% or more of the solvent is water) that dissolves the non-image area of the photosensitive layer of the PS plate in the second development zone. .

As the alkaline developer, a positive type 25 plate and a negative type 9 are used.
Examples include a dedicated developer for each of the 3rd edition, and a common developer for the positive 25th edition and the negative 93rd edition. The alkaline developer is preferably a negative type 93 plate and a positive type 25 plate.
This is a common developer with the plate (hereinafter referred to as "negative/positive common developer").

As the negative/positive common developer, use a developer having a composition known as a common developer for the negative type 93 plate containing a diazo compound as a photosensitive component and the positive type 25 plate containing an O-quinonediazide compound as a photosensitive component. I can do it.

Examples of the alkaline agents in the developer include alkali silicates (potassium silicate, sodium silicate, etc.), potassium hydroxide, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, dibasic myphosphate, etc. Potassium, potassium diphosphate, ammonium tertiary phosphate, ammonium tertiary phosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc. Any inorganic alkali agent, mono-, di- or triethanolamine and organic alkali agents such as tetraalkyl hydroxide and organic ammonium silicate. The content of alkaline agent in the developer is 0.0
The range is preferably 5 to 20% by weight, more preferably 0.
It is in the range of 1-10% by weight.

The developer preferably contains an organic solvent, a nonionic surfactant, and an organic or inorganic reducing agent in addition to the alkaline agent, and po is preferably 12.5 to 13.5.

As an organic solvent, the solubility in water at 20°C is 10.
% by weight or less, such as carboxylic acid esters such as ethyl acetate, propyl acetate, butyl acetate, benzyl acetate, ethylene glycol monobutyl ethyl ethyl, and butyl levulinate; such as ethyl butyl ketone, methyl isobutyl ketone, and cyclohexanone. Ketones;
Alcohols such as ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl alcohol, methylphenyl carbinol, n-amyl alcohol, methyl amyl alcohol; alkyl-substituted aromatic hydrocarbons such as quinolene: methylene These include halogenated hydrocarbons such as dichloride, ethylene dichloride, and monochlorobenzene. These organic solvents can be used alone or in combination of two or more.

Nonionic surfactants can be broadly classified into polyethylene glycol type and polyhydric alcohol type, both of which can be used, but polyethylene glycol type nonionic surfactants are preferred from the viewpoint of developing performance, and among them, ethylene glycol type nonionic surfactants are preferred. Has 3 or more (-co!co, o-),
and HLB value (HLB is Hydrophile-Lip
A nonionic surfactant having an abbreviation of ophile balance) of 5 or more (more preferably 8 to 20) is more preferable.

Among nonionic surfactants, those having both an ethyleneoxy group and a propyleneoxy group are particularly preferred, and among these, those having an HLB value of 8 or more are more preferred.

Preferred examples of nonionic surfactants include the following formula [l
] to [8] are mentioned.

(1) R-0-(CHICH!0)dCB.

C3) RO(CHxCHO)m (CHsCHx
O)nH(6]80(C,H,O)a (C5H,O
)b (C,H,0)cH(7) u(oc*oa
)y (OCsHs)x\/(CJsO)! (C
JaO)YHH(QC,)! , )y (OC2H5)
x/\(C,H,O)x (czoao)yn(8)
80 (In the formulas [1] to [8] of CHsCHz, R represents a hydrogen atom or a monovalent organic group. As the organic group, for example, a linear or branched C1-C30 substituent ( For example, an alkyl group that may have an aryl group (such as phenyl), an alkylcarbonyl group whose alkyl moiety is the above-mentioned alkyl group, or an alkyl group that has a substituent (for example, a hydroquinyl group, the above-mentioned alkyl group, etc.). Examples include phenyl groups, etc. alb, c%m, n, x
and y each represent an integer of 1-40.

Specific examples of nonionic surfactants are shown below.

Polyethylene glycol, polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene behenyl ether, polyoxyethylene polyoxypropylene cetyl ether, polyoxy Ethylene polyoxypropylene behenyl ether, polyoxyethylene nonylphenyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene stearamide, polyoxyethylene oleate amide, polyoxyethylene castor oil, polyoxyethylene abiethyl ether, polyoxyethylene lanolin ether, phoroxyethylene monolaurate, polyoxyethylene monostearate,
Polyoxyethylene glyceryl monooleate, polyoxyethylene glycer monostearate, polyoxyethylene propylene glycol monostearate, oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct, octylphenol polyoxyethylene Polyoxypropylene adducts, glycerol monostearate, nrubitan monolaurate, polyoxydiethylene dilbicune monolaurate, etc.

The weight average molecular weight of the nonionic surfactant is 300 to 100
A range of 0G is preferred, and a range of 500 to 5000 is particularly preferred. The concentration of the nonionic surfactant is preferably in the range of 0.5 to 10% by weight.

Examples of organic reducing agents include phenolic compounds such as hydroquinone, methol, and methoxyquinone, and amine compounds such as phenylenediamine and phenylhydrazine. Examples of inorganic reducing agents include sodium sulfite, potassium sulfite, ammonium sulfite, and hydrogen sulfite. Sulfites such as sodium and potassium hydrogen sulfite, sodium phosphite, potassium phosphite, sodium hydrogen phosphite,
Examples include phosphates such as potassium hydrogen phosphite, sodium dihydrogen phosphite, and potassium hydrogen sulfite, hydrazine, sodium thiosulfate, and sodium dithionite, but the most effective reducing agent is sulfite. It's salt. These reducing agents are contained in an amount of 0.1-10% by weight, more preferably 0.5-5% by weight.

The developer may also contain other carboxylic acids, anions, cations, amphoteric surfactants, and the like.

Organic carboxylic acids include aliphatic carboxylic acids having 6 to 20 carbon atoms and aromatic carboxylic acids in which a benzene ring or a 7-talene ring is substituted with a carboxyl group.

The aliphatic carboxylic acid is preferably an alkanoic acid having 6 to 20 carbon atoms, and specific examples include caproic acid, enaethyl acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mystylic acid, palmitic acid, and stearic acid. etc., and particularly preferred are alkanoic acids having 6 to 12 carbon atoms. Also, fatty acids with double bonds in their carbon chains,
It may also have a branched carbon chain. The above aliphatic carboxylic acids may be used as sodium or potassium salts or ammonium salts.

Specific compounds of aromatic carboxylic acids include benzoic acid, 0-chlorobenzoic acid, p-chlorobenzoic acid, 0-hydroxybenzoic acid, p-hydroxybenzoic acid, p-jer
t-Butylbenzoic acid, 0-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydroxybenzoic acid [[,2,5-
Dihydroxybenzoic acid, 2.3-dihydroxybenzoic acid, 2.3-dihydroxybenzoic acid, 3.5-dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid , 2-hydroxy-1-naphthoic acid, 1-7-naphthoic acid, 2-naphthoic acid, and the like.

The above aromatic carboxylic acid may be used as a sodium or potassium salt or an ammonium salt.

There is no particular restriction on the content of aliphatic carboxylic acid and aromatic carboxylic acid, but if it is less than 0.1% by weight, the effect will not be sufficient, and if it is more than 30% by weight, no further improvement in the effect can be measured. Or, when used in combination with other additives, dissolution may be hindered. Therefore, the amount added is preferably 0.1-10% by weight, more preferably 0.5-4% by weight.

As anionic surfactants, higher alcohols (cm
~Cz*) ilf acid ester salts [e.g., sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, r Teepol
81J (trade name: Shell Chemistry Department), disodium alkyl sal 7ade], aliphatic alcohol phosphate ester salts (e.g., sodium salt of cetyl alcohol phosphate, etc.), alkylaryl sulfonates (e.g., sodium salt of dodecylbenzenesulfonic acid, sodium salt of isopropylnaphthalenesulfonic acid, sotrim salt of sinapthaline disulfonic acid, sodium salt of metanitrobenzenesulfonic acid, etc.), sulfonic acid salts of alkylamides (for example, c17HssCON)
(CHs) CH25o, Na, etc.), sulfonic acid salts of dibasic fatty acid esters (eg, sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.).

Among these, sulfonate salts are particularly preferably used.

Cationic surfactants are broadly classified into amine type and quaternary ammonium salt type, and any of these can be used.

Examples of amine types include polyoxyethylene alkylamine alkyl polyethylene polyamine, N-alkyl polyethylene polyamine dimethyl sulfate, alkyl biguanide, long chain amine oxide, alkylimidacilline, l-hydroxyethyl-2-alkylimidacilline, Examples include l-acetylaminoethyl-2-alkylimidacilline and 2-alkyl-dimethyloxazoline.

Examples of quaternary ammonium salts include long chain primary amine salts, alkyltrimethylammonium salts, dialkyldimethylethylammonium salts, alkyldimethylammonium rubenzylammonium salts, alkylquinolinium salts, and alkylisoquinolinium salts. salt, alkylpyridinium sulfate, stearamidomethylpyridinium salt, acylaminoethyldiethylamine salt, acylaminoethylmethyldiethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide, acylaminoethylpyridinium salt, acylcolaminoformylmethyl Pyridinium salt, stearoxymethylpyridinium salt, fatty acid triethanolamine, fatty acid triethanolamine formate, trioxyethylene fatty acid triethanolamine, fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p-inoctylphenoxyethoxyethyldimethyl There are benzylammonium salts, etc. (In the above compound examples, "alkyl" refers to straight-chain or partially substituted alkyl having 6 to 20 carbon atoms, and specifically, straight-chain alkyl such as hexyl, octyl, cetyl, stearyl, etc.) (Preferably used.) Among these, water-soluble quaternary ammonium salt type cationic surfactants are particularly effective, and among these, alkyltrimethylammonium salts, alkyldimethylbenzylammonium salts, ethylene oxide addition ammonium salts, etc. are preferable. be. In addition, polymers having cationic components as repeating units are also cationic surfactants in a broad sense.
The cationic surfactant of the present invention has a golden color. In particular, a polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic polymer can be suitably used.

The weight average molecular weight of the polymer is in the range of 300 to 50,000, particularly preferably in the range of 500 to 5,000.

As the amphoteric surfactant, for example, a compound such as sodium N-methyl-N pentadecyl aminoacetate can be used.

These surfactants can be contained in a range of 0.5 to 10% by weight.

Further, the following additives can be added to the developer in the present invention in order to improve the development performance. For example, NaCQ described in JP-A-58-75152.

Neutral salts such as KCQ, KBr, etc., JP-A-59-1909
Chelating agents such as EDTA and NTA described in No. 52, (Co(
Complexes such as NHs) ) acts, JP-A-56-142
Ampholytic polymer electrolytes such as a copolymer of vinylbenzyltrimethylammonium chloride and sodium acrylate described in JP-A No. 528, inorganic lithium compounds such as lithium chloride described in JP-A-5859444, JP-B-1987-
Organic lithium compounds such as lithium benzoate described in JP-A No. 34442, Si described in JP-A-5975255,
Organometallic surfactant containing Ti etc., JP-A-59-8
Examples include organic boron compounds described in Japanese Patent No. 4241.

Furthermore, the negative/positive developer used in the method of the present invention includes Japanese Patent Application Laid-open Nos. 62-24263 and 62-2426.
No. 4, No. 62-25761, No. 62-35351
No. 62-75535, No. 62-89060, No. 62-125357, No. 62-133460
No. 62-159148, No. 62-16816
No. 0, No. 62-175758, No. 63-2001
54, No. 63-205658, and the developer described in each publication.

As the exclusive developer for the positive-working 13th plate, a known developer can be used as a special developer for the positive-working 13th plate, which has a photosensitive layer containing an 0-quinonediazide compound as a photosensitive component. The exclusive developer for the positive 13th plate is a solution with a pH of 12 to 13.5 containing a silicate as an alkaline agent, preferably an anionic surfactant, a nonionic surfactant, and a cationic surfactant in addition to the alkaline agent. at least one surfactant selected from the group consisting of organic carboxylic acids,
It is a solution containing an organic solvent and a reducing agent. Specific compounds of the above-mentioned surfactant, organic carboxylic acid, organic solvent, and reducing agent include the compounds described in the above-mentioned negative/positive common developer, and their preferred concentration ranges are as follows: The same as in .

In addition, as a special developer for positive type 23 plates, JP-A-59
-75255, 59-84241, 60-12
Examples include the developer described in Japanese Patent No. 9750 and the like.

As the exclusive developer for the negative type 43 plate, a known developer can be used as a special developer for the negative type 43 plate having a photosensitive layer containing a diazo compound as a photosensitive component. The developer is preferably a solution containing a surfactant (preferably an anionic surfactant), an organic solvent, and a reducing agent, and has a pH preferably in the range of 1000 to 13.5. Specific compounds of the nuclear surfactant, organic solvent, and reducing agent include the compounds described in the negative/positive common developer, and their concentrations are 0.5 to 0.5 for the surfactant and organic solvent, respectively. 1O wt%, reducing agent 0.1 to 10 wt% (more preferably 0.5 to 5 wt%)
) is preferred. The special developer for the negative 43 plate includes:
In addition to the above, the organic carboxylic acid and other additives in the negative/positive common developer can be added. In addition, as a special developer for the negative type 43 plate, there are Japanese Patent Application Publications No. 53-44202, No. 60-192951, No. 60
Examples thereof include developers disclosed in Japanese Patent Publications No. 213943 and No. 60-225152.

Examples of the developer for waterless lithography include those known as those for waterless lithography having a silicone rubber layer and a photosensitive layer laminated on a substrate.

For example, aliphatic hydrocarbons (hexane, heptane, "Isopar E, H, G" (trade name of aliphatic hydrocarbons made by Etsuo Chemical), gasoline, kerosene, etc.), aromatic hydrocarbons (toluene, xylene, etc.) Alternatively, a halogenated hydrocarbon (such as trichlene) to which the following polar solvent is added can be used.

Alcohols (methanol, ethanol, water, etc.), ethers (methyl cellosolve, ethyl selon, butyl selon, methyl calpitol, ethyl calpitol, butyl calpitol, dioxane, etc.), ketones (acetone, methyl ethyl ketone, etc.) esters (ethyl acetate, methyl cellosolve acetate, cellosolve acetate, carpitol acetate, etc.) Furthermore, a developing solution consisting of an alkaline aqueous solution containing an organic amine but not an organic solvent as described in JP-A-1-149043 can be used.

It is also possible to dye the image area simultaneously with development by adding a dye such as crystal violet or acedrazine red to the developer.

In the present invention, it is preferable to perform a development acceleration operation, preferably a rubbing operation, in at least one of the at least two development zones, and it is particularly preferable to perform a development acceleration tIk operation in two development zones. The above-mentioned rubbing operation includes, for example, a method of rubbing using a rotating roller-shaped rubbing member, a method of rubbing by rotating a flat-plate-shaped rubbing member, a method of rubbing by rotating a flat-plate-shaped rubbing member, and a method of rubbing by swinging a flat-plate-shaped rubbing member back and forth and/or left and right. Examples include a rubbing method, and a method of rubbing by rotating a roller-shaped rubbing member or a flat plate-shaped rubbing member and swinging it back and forth and/or left and right.

These rubbing members can be made of, for example, bran, sponge, cloth, or the like. A plurality of these rubbing members may be used in combination.

Other methods for accelerating development include, for example, methods of blowing high-pressure air, methods of irradiating ultrasonic waves, methods of applying vibration to a waterless lithographic plate, and electrochemistry as described in JP-A-58-42042. Examples include a method in which the plate is developed manually, a method in which a developing solution on a waterless planographic plate is instantaneously heated by irradiation with microwaves, and a method in which the plate surface is honed using a processing solution containing abrasive powder.

Next, the developing zone of the automatic developing machine used in the present invention will be explained with reference to the drawings.

FIG. 1 is a sectional view showing a schematic configuration of an example of a developing zone according to the present invention. In FIG. 1, 1 and 2 are development zones where the development process is carried out, la and 2a are development tanks in which the developer is placed, and 3
．． 4.5.6 is a conveyance roller, 7 is a brush roller, 8.9
10.11 is a shower pipe that supplies the developer onto the photosensitive planographic printing plate, 10.11 is a pump that sends the developer in the developer tanks 1a and 2a to the shower pipe 8.9, and 12.13 is for controlling the temperature of the developer. A heater, 14 a transition roller, and P a conveyance path for the photosensitive planographic printing plate.

FIG. 2 is a sectional view showing a schematic configuration diagram of another embodiment of the development zone according to the present invention. In Fig. 2, 21 and 22 are developing zones, 21a and 22a are developing tanks, and 23.24°2
5.26 is a conveyance roller, 27 is a brush roller, 28.2
9 is the shower pipe, 30.31 is the pump, 32.33
34 is a transition roller, and P is a conveyance path for the photosensitive planographic printing plate.

FIG. 3 is a sectional view showing a schematic configuration of another embodiment of the development zone according to the present invention. In Figure 1g3, 41 and 42 are development zones, 41a and 42b are developer tanks, 43.44° and 45.46 are conveyance rollers, 47 is a brush roller, 48.
49 is the shower pipe, 50.51 is the pump, 52.5
3 is a heater for controlling the temperature of the developer, 54 is a transition roller, 55
56 is a developer tank, 56 is a liquid supply slit, 57 is a waste liquid tank, and P is a transport path for the photosensitive planographic printing plate. The liquid supply slit 56 has a structure in which the liquid is uniformly applied across the transport width from a slit formed by two plate materials,
For details, refer to JP-A-62-238564.

According to the automatic developing machine having two development zones as described above, it is possible to process with two types of developers with different compositions, and the conveyance speed can be switched depending on the type of photosensitive planographic printing plate. This allows development processing to be performed at different processing times. As a result, it is possible to develop a waterless lithographic plate and a PS plate using one automatic developing machine.

As a more specific embodiment, two development zones are provided, one development zone uses a developer for waterless lithography, and the remaining development zone uses a developer for PS plate, so that two development zones are used for waterless lithography and PS plate. Examples include a mode in which the image is processed in both of the above two development zones, and the development time is changed between the waterless lithographic plate and the PS plate.

In the present invention, the number of development zones is usually about two, which is sufficient from the viewpoint of economical efficiency and workability.

In addition to the development zone, the automatic processor of the present invention may have a processing zone that has functions such as washing with water, dyeing, processing with a rinsing liquid (aqueous surfactant solution) for protecting the plate surface, desensitizing liquid, and drying. Optional.

The waterless lithographic plate and its developer to which the method of the present invention is applied include:
For example, JP-A-1-149043, JP-A-1-1501
No. 42, JP-A-1-154157, JP-A-1-154
158, etc., which has a structure in which a silicone layer is laminated as a photosensitive layer and an ink repellent layer on a substrate, and its developer, and the PS plate and its developer include:
Those having a negative photosensitive layer using a diazo compound as a photosensitive component, those having a positive photosensitive layer using an 0-quinonediazide compound as a photosensitive component, for example, JP-A No. 6
A PS plate as described in Japanese Patent No. 2-175757 and a developer are included.

〔Example〕

Hereinafter, the present invention will be specifically explained with reference to Examples.

Creating a positive PS plate A JIS-1050 aluminum plate with a thickness of 0.241111 was immersed in a 2% sodium hydroxide aqueous solution, degreased, and then electrochemically roughened in a dilute nitric solution. After being thoroughly washed and anodized in a dilute sulfuric acid solution, an oxide film of 2.5 g/m'' was formed on the surface of the aluminum plate.The aluminum plate treated in this way was washed with water and dried. , dry weight of photosensitive liquid with the following composition: 2.5 g
/s'' and dried to obtain a positive PS plate.

Composition of photosensitive coating liquid: ester compound of 7-toquinone-(1,2)-diazide-(2)-5-sulfonic acid chloride and pyrogallol acetone resin (JP-A-60-14334514334)
Compounds listed in Publication No. 5) Copolycondensation resin of 2 parts by weight of phenol, If-, p-mixed cresol, and formaldehyde (molar ratio of each of phenol, ■-cresol, and p-cresol during synthesis) is 2
0:48:32, weight average molecular weight My-7400, number average molecular weight Mn-1400)...6.5 parts by weight P-tart-octylphenol and a novolac resin synthesized from formaldehyde and 7 toquinone (1,
2) Ester compound with -diazide-(2)-5-sulfonic acid chloride (condensation rate: 50 mol%, Mv = 1700)...0-1
Parts by weight Victoria Pure Blue BOH (manufactured by Hodogaya Chemical Co., Ltd.) 0.08 parts by weight Ethyl cellosolve 80 parts by weight Methyl cellosolve 20 parts by weight Negative P
Preparation of S plate A JIS-1050 aluminum plate with a thickness of 0.240 mm was degreased by immersing it in a 20% aqueous sodium hydroxide solution, electrochemically roughened in a dilute hydrochloric acid solution, thoroughly washed, and then immersed in a dilute sulfuric acid solution. An anodizing treatment was performed to form an oxide film of 1.5 g/l on the surface of the aluminum plate. The aluminum plate treated in this way was further immersed in an aqueous solution of sodium metasilicate for pore sealing, washed with water, dried, and then coated with a photosensitive solution having the following composition to a dry weight of 2.0 g/m. It was then dried to obtain a negative PS plate.

Photosensitive liquid composition p-diazodiphenylamine and paraformaldehyde...1 part by weight N-(4-hydroxyphenylmethacrylamide) copolymer (described in Example 1 of Japanese Patent Publication No. 57-43890)...10 parts by weight Victoria Pure Blue BOH (Hodogaya Chemical Industry)
Co., Ltd., dye)...0.2 parts by weight Ethylene glycol monomethyl ether...100 parts by weight Preparation of waterless lithographic plate Synthesis of diazo resin 14.5 g of p-diazodiphenylamine sulfate was cooled with 4.09 g of p-diazodiphenylamine sulfate. Dissolved in concentrated sulfuric acid. 1.0 in this reaction solution
g of paraformaldehyde was slowly added dropwise so that the reaction temperature did not exceed 10°C. Thereafter, stirring was continued for 2 hours under water cooling. This reaction mixture was cooled with ice at 500 mf.
f was added dropwise to ethanol, and the resulting precipitate was filtered. After washing with ethanol, this precipitate was dissolved in 100a+11 pure water, and a cold concentrated aqueous solution in which 6.8 g of zinc chloride was dissolved was added to this solution. The resulting precipitate was filtered, washed with ethanol, and dissolved in 150 mff of pure water. To this liquid was added a cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved. The resulting precipitate was collected by filtration, washed with water, and then dried at 30°C all day and night to obtain diazo resin-1.

The weight average molecular weight (My
) was 1500, and the number average molecular weight was 500.

Polymer synthesis 2-hydroxyethyl methacrylate 150 g, acrylonitrile 60 g 1 Methyl methacrylate 79.5 g
.

10.5g of methacrylic acid (the molar ratio of each is 37:
35+24:4) was dissolved in 700 g of distilled dioxane (total monomer concentration: 4.6 mol/ff), 15 g (2 mol %) of benzoyl peroxide was gradually added, and the polymerization reaction was carried out under reflux in a nitrogen stream for 8 hours. went.

After the reaction was completed, 0.5 g of hydroquinone was added and the mixture was heated under reduced pressure.
The solvent was distilled off, and when the viscosity increased, it was poured onto a stainless steel plate and vacuum dried to obtain 270 g of plate-shaped membrane i.
(Polymer I) was obtained. The measured Gpc values of the polymer are shown below.

Mw: 4.80X lO'. Dispersion ratio: 2.2 A degreased and washed aluminum plate was placed in a 40% by weight sulfuric acid aqueous solution at a temperature of 3.
Anodic oxidation was performed for 2 minutes at 0°C and a current density of 1.5A/d2, washed with water, and then treated with sodium silicate in a 1% by weight sodium silicate aqueous solution at 85°C for 25 seconds.
Next, a substrate was obtained by washing with water.

A primer layer composition having the following composition was applied to this substrate at 5.5°C using a whirler and dried at 85°C for 3 minutes to form a primer layer. The dry film thickness was 10 mg/da''.

/Limer layer composition Polymer 100 parts by weight (alcoholic hydroxyl group-containing polymer) Diazo resin 20 parts by weight (p-diazodiphenylamine formaldehyde resin) Methyl cellolube 2400 parts by weight Next, the plate coated with the above composition was coated with a 3 kW long high-pressure mercury lamp. te1
00a+J/cg+'' was applied to the entire surface.The aluminum plate coated with the thus obtained primer layer did not dissolve even when immersed in a photosensitive layer coating solvent (methyl seronerb) or developer. .

In addition, when the Uv integrating sphere was measured using a Hitachi spectrometer 3200 and the decomposition rate of diazo was measured, it was found that 378
It was found that the nm diazo absorption part was completely decomposed.

On the aluminum plate coated with the primer layer, the following photosensitive composition was coated with a polymer at 55°C to a dry weight of 3 mg/da'' and dried to form a photosensitive layer.

Photosensitive composition polymer 60 parts by weight (alcoholic hydroxyl group-containing polymer) Diazo resin 60 parts by weight (p-diazodiphenylamine formaldehyde resin) Victoria Blue BOH 2 parts by weight Methyl cellosolve 2000 parts Ethyl cellosolve 1000 parts by weight Next, the above photosensitive layer 15 m of the following silicone rubber composition on dry weight
A silicone rubber layer was formed by coating the polymer at 55° C. and drying it to give a ratio of g/d@”.

Silicone rubber composition: YF-3057, manufactured by Toshiba Silicone, 100 parts by weight, T S L-81801O, manufactured by Toshiba Silicone, parts by weight Aerosil R-972 (manufactured by Nippon Aerosil Co., Ltd.) 3 parts by weight Di-n-butyltin dilaurate 0.8 parts by weight 1400 parts by weight of hexane A single-sided matted polypropylene film having a thickness of 5 μm was laminated on the surface of the obtained silicone rubber layer to obtain a waterless planographic plate.

Preparation of developer Developer solutions A, B, and C having the following compositions were prepared.

Developer A 0 parts by weight of Isopar H3O (manufactured by Esso Chemical Co., Ltd.) Tulfit 200 parts by weight (manufactured by Clareisoprene Chemical Co., Ltd.) 500 parts by weight of diethylene glycol dimethyl ether Developer solution B β-anilinoethanol globylene glycol p-tert-butylbenzoic acid emulgen 147 (Nonionic activator manufactured by Kao Corporation) Potassium sulfite potassium silicate aqueous solution 1 part by weight 5 parts by weight 15 parts by weight 1 part by weight 27 parts by weight 33 parts by weight (5if2: 26% by weight, Ni!O: 14% by weight) Potassium hydroxide 18 parts by weight water
900 parts by weight Developer C Isopar 8350 parts by weight (manufactured by Esso Chemical Co., Ltd.) Diethyl succinate 5 parts by weight Polypropylene glycol 5 parts by weight Phenyl cellosolve 5 ffi amount ff1S diethanolamine 2 parts by weight Pionin A-44B
(Manufactured by Takemoto Yushi Co., Ltd.) 3 parts by weight Water 450 parts by weight Example 1 A positive film was layered on the positive PS plate and waterless planar plate, and exposed for 50 seconds from a distance of 70 cm using a 3kll metal halide lamp. In addition, for the waterless planographic plate, the laminate film was peeled off after exposure.

Next, 20M of developer A and developer B are added to developer tank 1a of the development zone shown in FIG. Up to 6 is a waterless lithographic plate in 80 seconds, positive type 15
I adjusted it so that it was 40 seconds in the version.

For development processing, both the waterless lithographic plate and the PS plate are developed in development zone 1.
and development zone 2. When the printing plate thus obtained was printed on a printing machine, good printed matter was obtained without any stains.

Example 2 A negative film was overlaid on the negative type 15 plate and 3kl
Exposure was performed for 30 seconds using a metal halide lamp from a distance of 70cm. Further, the positive type 15 plate and the waterless planographic plate were exposed under the same conditions as in Example 1, and the laminate film of the waterless planographic plate was peeled off.

Next, water was put into the developing tank 21a of the developing zone shown in FIG. 2, 20ffi of developer B was put into 22a, and the temperature was adjusted to 30°C. Further, the developing speed was adjusted so that the passing time from the conveying rollers 23 to 26 was 60 seconds.

In the development process, both the negative PS plate, the positive PS plate, and the waterless lithographic plate were processed in the development zone 21 and the development zone 22.

When the printing plate thus obtained was printed on a printing machine, good printed matter was obtained without any stains.

Example 3 The positive 15th plate, the negative 15th plate, and the waterless planographic plate were exposed in the same manner as in Examples 1 and 2, and the laminate film of the waterless planographic plate was peeled off after exposure.

Next, put developer B into the developer tank 55 of the development zone shown in FIG.
Adjust the temperature to 30°C, and set the development speed using the conveyance roller 43.
The passage time from to 46 was adjusted to 60 seconds.

In the development process, waterless lithographic plate, positive type 15 plate, and negative type 15 plate were processed in development zone 41 and development zone 42.

When the printing plate thus obtained was printed on a printing machine, good printed matter was obtained without any stains.

〔Effect of the invention〕

According to the present invention, it is possible to continuously develop a PS plate and a waterless lithographic plate using one low-cost automatic developing machine with a relatively simple mechanism.

[Brief explanation of drawings]

FIG. 1, FIG. 2, and FIG. 3 are schematic configuration diagrams showing an example of a developing section according to the present invention. 1.2.21.22.41.421...Development sheet 1
3.4.5.6.3.24.25.26.43.44
．． 45.46...Conveyance roller 7.27.47...Brush roller 8.9.28.29.48.49...Shower pipe 1O111,30,3L 50.51...Pump 12
．． 13.32.33.52.53...Temperature control heater 1
4.34... Transfer roller 15... Intermediate insertion stand 55... Developer tank 56... Liquid supply slit 57... Waste liquid tank

Claims (1)

[Claims] A process in which photosensitive planographic printing plates that do not require dampening water and photosensitive planographic printing plates that require dampening water are automatically conveyed and developed using an automatic developing machine having at least two continuous development zones. A photosensitive lithographic printing plate, characterized in that the developers used in the first development zone and the second development zone of the at least two consecutive development zones are different from each other. processing method.