JPH01223447A - Method for processing photosensitive material - Google Patents

Abstract

PURPOSE:To uniformly develop the photosensitive material for a long period by incorporating aromatic dicarboxylic acids and a surfactant in a developer. CONSTITUTION:The image-likely exposed photosensitive material is processed by supplying the photosensitive material in the developer which has not substantially been used, transferring the photosensitive material to an automatic processing machine. And the developer contg. at least aromatic dicarboxylic acids (A) and the surfactant (B) is used. The component (A) is composed of benzoic acid, naphthoic acid or its substituent. And, the component (B) is composed of an anionic surfactant such as alkyl naphthalene sulfonic acid salts, etc., or a nonionic surfactant such as a polyethylenic glycol compd., etc. Thus, the photosensitive material such as a PS plate, etc., is uniformly developed without generating partially a faulty development.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for processing photosensitive 44 materials,
For more details, see IIl-! for a method of processing photosensitive materials that allows stable development. Ill.

[Behind the scenes of invention! A] An automatic developing machine is generally used to develop a large number of imagewise exposed photosensitive lithographic printing plates (hereinafter referred to as 128 plates). In such an automatic developing machine,
Conventionally, Inuyama's developer solution was stored in a storage tank and supplied to the PS plate through a nozzle using a pump for further circulation. However, the above method has the drawback that the activity of the stored developer decreases due to aging fatigue, processing fatigue, etc., and the development level tends to fluctuate.

As a method to prevent such fluctuations, a method of supplying an unused developer for each development process was proposed in Japanese Patent Application Laid-Open No. 1983-1999.
It is disclosed in Publication No. 243455@, Publication No. 61-246750, etc.

However, since this method uses a small amount of developer for processing, it is difficult to uniformly supply the developer onto the plate, which often results in partial development defects and uniform development. It had the disadvantage of not having

[Object of the Invention] An object of the present invention is to improve the drawbacks of the prior art as described above, and to provide a method for developing a photosensitive material that can stably perform uniform development over a long period of time.

[Structure of the Invention] As a result of intensive research, the present inventors have found that the above object is to use an automatic developing machine to automatically transport a photosensitive material that has been exposed to light in an imagewise manner, and to use a substantially unused developing solution. It has been found that this can be achieved by a method of processing a photosensitive material in which the developing solution contains at least an aromatic dicarboxylic acid and a surfactant.

[Specific Structure of the Invention] In the photosensitive material targeted by the present invention, irradiation with actinic rays causes a change in solubility between the imprinted area and the non-image area, and this physical property change causes the non-image area to be developed. There is a so-called wash-off type photosensitive material that is washed during the process. Examples of such photosensitive materials include PS plates, color proof films, photomask films, printed wiring resists, contact lithium films, etc., and the present invention is particularly effective in PS plates.

In the present invention, the developer to be supplied may be a substantially unused developer.

The term "substantially unused developer" as used herein means a developer that has the same developing ability as an unused developer, and includes a completely unused developer. It is also possible to mix and use a used developer within a range that does not cause deterioration. For example, during development, a used developer can be supplied from a part of the developer supply means to the plate surface along with an unused developer. It is also possible to develop the image using a method such as
It is most preferable to use the entire unused solution.

Since the present invention employs a new solution supply method in which a developer is supplied onto the photosensitive material only as needed for each processing, a stable development finish can always be obtained.

Examples of methods for supplying the developer onto the photosensitive material include a jetting method, a dropping method, and a coating method.

Specifically, there are methods of supplying from a shower vibrator, nozzle, etc., and methods of applying with a wire bar, blade, etc. After supplying the developer, even better leveling can be achieved by rubbing the photosensitive material with a sponge, brush, or the like.

Since the developer is wasted, it is preferable to use as little as possible, but if it is too small, uneven development or poor development will occur, so the amount used is 70% per 1f of photosensitive material.
d to 1000d is preferable.

The developer used in the present invention contains aromatic carboxylic acids and a surfactant, and the aromatic carboxylic acids used in the present invention are preferably benzoic acid, naphthoic acid, or substituted products thereof. Examples of such acids include benzoic acid, salicylic acid, p-alkylbenzoic acid, phthalic acid, aminobenzoic acid, 1-naphthoic acid, 2-naphthoic acid, 2-human Oxy-3-naphthoic acid, and the like.

As the surfactant used in the present invention, anionic, nonionic, cationic, and amphoteric surfactants may be used, and anionic and nonionic surfactants are particularly preferably used.

Examples of anionic surfactants include highly handled alcohol (
Ca-C22) Sulfuric ester salts [e.g., sodium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, "T-ball B-8"
1J (product name: Shell Chemical Co., Ltd.), sodium chloride alkyl sulfate, etc.], aliphatic alcohol phosphoric acid
ster salts (e.g., sodium salt of cetyl alcohol phosphate ester, etc.), alkylarylsulfonate salts (e.g., sodium salt of dodecylbenzenesulfonic acid, sodium salt of isopropylnaphthalenesulfonic acid, sodium salt of sinaphthalene disulfonic acid, etc.), sodium salt of nitrobenzenesulfonic acid, etc.), sulfonate salts of alkylamides (e.g., CI?833CONC82CH2SO3Na, etc.), C
H3 There are sulfonic acid salts of dibasic fatty acid esters (eg, sodium sulfosuccinate dioctyl ester, sodium sulfosuccinate dihexyl ester, etc.). Among these, alkylnaphthalene sulfonates are particularly preferably used.

The amount of these anionic surfactants added is preferably 0.
．． It is in the range of 1 to 20% by weight, more preferably 1.0 to 10% by weight.

In addition, various compounds can be used as the nonionic surfactant ζ, but they can be roughly divided into polyethylene glycol compounds and polyhydric alcohol compounds, with polyethylene glycol compounds being more preferably used. Ru. Among them, the oxyethylene unit has a repeating structure of 3 or more, and the HLB value (HYdrophile-
L 1pophile13 arance) is 5 or more,
More preferably, 10 to 20 nonionic surfactants are suitable. That is, the above-mentioned preferred nonionic surfactants are expressed in the following general formula.

)IQ-(CH*CHiO)n)I (where n, a+, a, b, c, x, y are all 1 to 4
Represents an integer of 0. ) Specific examples of the compounds represented by the above-mentioned holes include polyethylene glycol (polyoxyethylene lauryl ether, polyoxyethylene nonyl ether, polyoxyethylene cetyl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, Oxyethylene behenyl ether, polyoxyethylene polyoxypropylene cetyl ether, polyoxyethylene polyoxypropylene cetyl ether, polyoxyethylene phenyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene stearylamine, polyoxyethylene oleylamine, polyoxyethylene Stearic acid amide, polyoxyethylene oleic acid amide, polyoxyethylene castor oil,
Polyoxyethylene abiethyl ether, polyoxyethylene cetyl ether, polyoxyethylene monolaurate, polyoxyethylene monostearate, polyoxyethylene glyceryl monooleate, polyoxyethylene glyceryl monostearate, polyoxyethylene propylene glycol monostearate , oxyethylene oxypropylene block polymer, distyrenated phenol polyethylene oxide adduct, tribenzylphenol polyethylene oxide adduct, off-build phenol polyoxyethylene polyoxypropylene adduct,
Examples include glycerol monostearate, sorbitan monolaurate, and polyoxyethylene rubitan monolaurate.

The addition of these nonionic surfactants is preferably 0
．． 001 to 5% by weight, more preferably 0.01% by weight
-1.0% by weight.

The weight average molecular weight of these nonionic surfactants is preferably 300 to so, ooo, particularly preferably S
It ranges from OO to s, ooo.

In the present invention, the above-mentioned nonionic surfactants are used alone, but two or more types may be used in combination. On the other hand, as the cationic surfactant used in the present invention,
There are various types of compounds, including organic amine compounds and quaternary ammonium salt compounds.

Examples of organic amine compounds include °, polyoxyethylene alkylamine, N-alkylpropylene diamine,
N-alkyl polyethylene polyamine, N-alkyl polyethylene polyamine dimethyl sulfate, alkyl biguanide, long chain amine oxide, alkylimidacillin, 1
-Hydroxyethyl-2-alkylimidacillin, 1-
Acetylaminoethyl-2-alkylimidacillin, 2
-alkyl-4-methyl-4- and droxymethyloxazoline. Examples of quaternary ammonium salt compounds include long chain primary amine salts, alkyltrimethylammonium salts, dialkyldimethylammonium salts,
Alkylmethylammonium salt, alkyldimethylbenzylammonium salt, alkylpyridinium salt, alkylquinolinium salt, alkylisoquinolinium salt, alkylpyridinium sulfate, stearamidomethylpyridinylam salt, acylaminoethyldiethylamine salt, acylaminoethyl Methyldiethylammonium salt, alkylamidopropyldimethylbenzylammonium salt, fatty acid polyethylene polyamide acylaminoethylpyridinium salt, acylcolaminoformylmethylpyridinium salt, stearoxymethylpyridinium salt, fatty acid triethanolamine, fatty acid triethanolamine formate,
Examples include trioxyethylene fatty acid triethanolamine, fatty acid dibutylaminoethanol, cetyloxymethylpyridinium salt, p-isooctylphenoxyethoxyethyldimethylbenzylammonium salt, and the like. Among these compounds, cationic surfactants such as water-soluble quaternary ammonium salts are particularly effective, and include alkyl trimedelammonium salts, alkyldimethylbenzylammonium salts, ethylene oxide-added ammonium salts, and the like. Polymers having cationic components as repeating units are also generally cationic surfactants and are effective. In particular, a polymer containing a quaternary ammonium salt obtained by copolymerizing with a lipophilic monomer can be suitably used.

The amount of the cationic surfactant added is the same as that of the nonionic surfactant (preferably in the range of 1 to 5% by weight, more preferably in the range of 0.01 to 1.0% by weight).

In addition, the weight average molecular weight is preferably 300 to so, oo
The range of o is particularly preferably 500 to s, ooo.

These cationic surfactants can also be used alone, but 2
You may use more than one species in combination.

Furthermore, according to the present invention, the effects of the present invention can be obtained even when a nonionic surfactant and a cationic surfactant are used in combination.

By containing various additives in addition to the above-mentioned aromatic carboxylic acids and surfactants, the developer of the present invention can obtain even better developability.

Useful examples of such additives include alkaline agents, organic solvents, and water-soluble reducing agents.

As the alkali agent mentioned above, silicon! I! ±Thorium, potassium silicate, sodium hydroxide, lithium hydroxide, trisodium phosphate, mono-lithium diphosphate, potassium triphosphate, potassium diphosphate, ammonium diphosphate, ammonium diphosphate, Inorganic alkaline agents such as sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc., organic alkaline agents such as mono-, di- or triethanolamine and tetraalkylammonium hydroxide, and organic ammonium silicates, etc. Useful. Among these, alkali silicates are most preferred. The content of the alkaline agent in the developing solution is preferably 0.05 to 20% by weight, more preferably 0.1 to 10% by weight.

Further, as the organic solvent, an organic solvent having a solubility in water at 20''C of 10% by weight or less is preferable.

Examples of organic solvents having a water solubility of 10% by weight or less at 20°C include, for example, carboxylic acids such as ethyl acetate, propyl acetate, butyl acetate, amyl acetate, benzyl acetate, ethylene glycol monobutyl acetate, butyl lactate, and butyl levulinate. Acid esters; ketones such as ethyl butyl ketone, methyl isobutyl ketone, and cyclohexanone; such as ethylene glycol motubutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl alcohol, methylphenyl carbinol alcohol, and methyl amyl alcohol alcohols; alkyl-substituted aromatic hydrocarbons such as xylene; halogenated hydrocarbons such as methylene dichloride, ethylene dichloride, and monochlorobenzene. Two or more of these organic solvents may be used in combination.

Among these organic solvents, ethylene glycol monophenyl ether, ethylene glycol benzyl ether and benzyl alcohol are particularly preferred.

Further, the developer according to the present invention contains a water-soluble reducing agent, and the water-soluble reducing agent includes organic and inorganic reducing agents.

Examples of organic reducing agents include phenolic compounds such as hydroquinone, methol, and methoxyquinone, and amine compounds such as phenylenediamine and phenylhydrazine. Examples of reducing agents used by Akebono include sodium sulfite, potassium sulfite, ammonium sulfite, and Lm N Sulfites such as sodium hydrogen sulfite and potassium hydrogen sulfite; phosphates such as sodium phosphite, potassium phosphite, sodium hydrogen phosphite, potassium hydrogen phosphite, sodium dihydrogen phosphite, potassium hydrogen sulfite, etc. , hydrazine, thio IiH! Examples include sodium, sodium dithionite, etc., but the reducing agent that is particularly effective in the present invention is sulfite.

In the present invention, the water-soluble reducing agent includes alkali-soluble, and these water-soluble reducing agents preferably have a content of 0.1 to 10% by weight, more preferably 0.5% by weight. It is contained in a range of 5% to 5%.

The following additives can be added to the developer according to the present invention in order to further improve development performance.

Example Eva, Na described in patent Ill 58-75152
Neutral salts such as C1KCffi and KBr, JP-A-58-19
Chelating agents such as EDTA and NTA described in No. 0952, [CO(NH3)s described in JP-A-59-121336
] Complexes such as Cj23, sodium alkylnaphthalenesulfonate described in JP-A-50-51324, anionic or amphoteric surfactants such as N-"tetradecyl-N, N-dihydroxyethyl betaine, JP-A-55-9594
Cationic polymers such as the methylurium quaternary product of p-dimethylaminomethylpolystyrene described in No. 6, and copolymers of vinylbenzyltrimethylammonium chloride and acrylic acid sodium chloride described in JP-A-56-142528. Amphoteric polymer electrolyte, JP-A-57-192
Reducing inorganic salt described in No. 952, JP-A-58-59444
Inorganic lithium compounds such as lithium chloride described in Japanese Patent Publication No. 50-34442, organic lithium compounds such as lithium benzoate described in Japanese Patent Publication No. 59-75255, Class 3i of JP-A-59-75255
, Organometallic surfactant containing Ti etc., JP-A-59-8
Examples include organic boron compounds described in No. 4241.

The image forming layer of the 88th plate according to the present invention contains a photosensitive substance as an essential component, and the physical and chemical properties of the photosensitive substance change upon exposure or subsequent development treatment. Items that have a difference in solubility in developing solutions due to exposure, items that have a difference in intermolecular adhesive strength before and after exposure, items that have a difference in affinity for water and oil due to exposure or subsequent development processing, and electrophotography. An image area can be formed by a method, and Japanese Patent Application Laid-Open No. 55-166
A multilayer structure as described in No. 645 can be used.

Typical photosensitive substances include, for example, photosensitive diazo compounds, photosensitive azide compounds, compounds with ethylenically unsaturated double bonds, epoxy compounds that polymerize with acid catalysts, and C-0- that decomposes with acids. Examples include compounds having a C-group.

Typical positive-type compounds that become alkali-soluble upon exposure include O-quinonediazide compounds, acid-decomposable ether compounds, and ester compounds. Aromatic diazonium salts are examples of negative-type compounds whose solubility decreases upon exposure to light.

Specific examples of O-quinonediazide compounds include JP-A-47-5303, JP-A-47-63802, and JP-A-48.
-63803, 49-38701, 56-1
No. 044, No. 56-1045, Special Publication No. 41-112
No. 22, No. 43-28403, No. 45-9610,
U.S. Patent No. 49-17481, U.S. Patent No. 2,797,213, U.S. Patent No. 3.046.120, U.S. Patent No. 3.188.210
No. 3,454.400, No. 3,544,32
No. 3, No. 3,573,917, No. 3.674.495
No. 3,785,825, British Patent No. 1,227,6
No. 02, No. 1,251,345, No. 1,267.00
No. 5, No. 1,329,888, No. 1,330,932
and German Patent No. 854,890, and examples of acid-decomposable compounds include Japanese Patent Application Laid-Open No. 60-375.
49, No. 60-10247, No. 60-3625, etc., and these compounds may be used alone or in combination as photosensitive components.
The present invention can be preferably applied to at least the 8th edition.

These photosensitive components include 0-quinonediazidecarboxylic esters of aromatic hydroxy compounds or 0-quinonediazidecarboxylic esters of aromatic hydroxy compounds and 0-quinonediazidecarboxylic esters of aromatic amino compounds.
-Includes quinonediazide sulfonic acid or O-quinonediazidecarboxylic acid amide, and also includes those in which these O-quinonediazide compounds are used alone, and those in which they are mixed with an alkali-soluble resin and this mixture is provided as a photosensitive layer. .

Alkali-soluble resins include novolak-type phenolic resins, and specifically include phenol formaldehyde resins, cresol formaldehyde resins, phenol-cresol mixed formaldehyde resins, cresol xylenol mixed formaldehyde resins, and the like. Furthermore, as described in JP-A-50-125806, in addition to the above-mentioned phenol resin, phenol or cresol substituted with an alkyl group having 3 to 8 carbon atoms such as [-butylphenol formaldehyde resin] and formaldehyde are used. It is also possible to use a condensate of the same.

If necessary, additives such as dyes, plasticizers, and components imparting printout performance can be added to the photosensitive layer containing an 0-quinonediazide compound as a photosensitive component.

The present invention can be applied to an amount per unit area of a photosensitive layer containing an O-quinonediazide compound as a photosensitive component, preferably in the range of about 0.5 to 7 Q/l''.

There is no particular need to change the image exposure of the positive PS plate to which the method of the present invention is applied, and a conventional method may be used.

Typical photosensitive components of the negative photosensitive layer are diazo compounds, such as diazonium salts and/or diazo resins which are condensates of p-diazophenylamine and formaldehyde, as described in Japanese Patent Publication No. 7364/1983. Copolymerization of 3-methoxydiphenylamine-4-diazonium chloride, 4-di-O diphenylamine and formaldehyde described in Japanese Patent Publication No. 49-48001, etc. Diazo resin consisting of an organic solvent soluble salt of a condensate, 2-methoxy-4-hydroxy- of a condensate of p-diazodiphenylamine and formaldehyde
Examples thereof include 5-benzoylbenzenesulfonate, tetrafluoroborate of a condensate of p-diazophenylamine and formaldehyde, and hequikefluorophosphate. The present invention can be preferably applied at least to negative type 83 plates containing these as photosensitive components.

In addition to those in which these diazo compounds are used alone, the present invention can also be applied to those in which they are used in combination with various resins in order to improve the physical properties of the photosensitive layer. Examples of such resins include shellac, polyvinyl alcohol derivatives, copolymers having alcoholic hydroxyl groups in the side chains described in JP-A-5O-118802%, and JP-A-5O-118802%.
A copolymer having a phenolic aqueous group in a side chain as described in No. 5-155355 can be mentioned.

These resins include a copolymer containing at least 50% by weight of the structural unit represented by the following symbol: -Momona R1 (CH2-C) 〇〇〇 (CH2CHO)n H (wherein, R1 is represents a hydrogen atom or a methyl group, R2 represents a hydrogen atom, a methyl group, an ethyl group, or a chloromethyl group, and n is an integer of 1 to 10) and a monomer unit having an aromatic hydroxyl group of 1 to 80 Included are polymer compounds having 5 to 90 mol % of acrylic ester and/or methacrylic ester monomer units and an acid value of 10 to 20 G.

Additives such as dyes, plasticizers, and components imparting printout performance can be added to the photosensitive layer of the negative 83 plate to which the developer and development method of the present invention are applied.

The coating amount per unit area of the photosensitive layer is at least 0.1
The present invention can be applied in the range of ~7 o/v.

Supports used for the 88th edition include paper, plastic (e.g. polyethylene, polypropylene, polystyrene, etc.) laminated paper, aluminum (including aluminum alloys), metal plates such as zinc, copper, etc., and cellulose diacetate. , cellulose triacetate, cellulose propionate O
Examples include plastic films such as carbon steel, polyethylene terephthalate, polyethylene, polypropylene, polycarbonate, polyvinyl acetal, etc., paper laminated or vapor-deposited with the above-mentioned excess pressure, or chrome-plated steel sheets. Preference is given to aluminum and aluminum-coated composite supports.

Further, the surface of the aluminum material is preferably roughened for the purpose of increasing water retention and improving adhesion to the photosensitive layer.

Examples of surface roughening methods include generally known methods such as brush polishing, ball polishing, electrolytic etching, chemical etching, liquid honing, and sandblasting, and combinations thereof. Preferably, brush polishing, electrolytic etching, and chemical Target etching and liquid honing may be mentioned, among which roughening methods especially involving the use of electrolytic etching are particularly preferred. In addition, as the electrolytic bath used in electrolytic etching, an aqueous solution containing an acid, an alkali, or a salt thereof, or an aqueous solution containing a titanium-containing solvent is used. Electrolytes are preferred. The roughly roughened aluminum plate is desmutted with an acid or alkali aqueous solution, if necessary.

It is desirable that the aluminum plate thus obtained is anodized, and particularly preferred is a method in which the aluminum plate is treated in a bath containing RTAM or phosphoric acid. Furthermore, if necessary, a sealing treatment and other surface treatments such as immersion in a potassium fluorozirconate aqueous solution can be performed.

In addition to the development process, the visual image processing method using the Kaga Q solution according to the present invention also includes, if necessary, a development stop process (the stop process solution includes a disposable method and a cyclic use method), after the development process, if necessary. Each individual desensitization process, a development stop process and a subsequent desensitization process, a combined development process and desensitization process, or a development stop process and a desensitization process For example, the treatment process described in Japanese Patent Application Laid-Open No. 54-8001@ may be included.

In addition, when developing the negative type and positive type 88 plates in the present invention with the same developer, conditions other than the developer composition (e.g., development temperature, development time, etc.) may be changed arbitrarily between the negative type and positive type. It is.

[Examples] Hereinafter, the present invention will be explained in more detail with reference to specific examples.

Example 1 A JIS 1050 aluminum plate with a thickness of 0.240111 was immersed in a 2% aqueous sodium chloride solution, degreased, electrochemically roughened in a dilute hydrochloric acid solution, thoroughly washed, and then immersed in a diluted hydrochloric acid solution. An oxide film of 2.5 Q/f was formed on the surface of the aluminum plate by anodizing in a solution.

After washing the obtained aluminum plate with water and drying, a photosensitive solution having the following composition was applied so as to give a dry weight of ff1l 2.5 Q/f, and the plate was dried to obtain a positive type 28 plate. The size of the plate is 1003
x 800mm.

(Photosensitive liquid) Naphthoquinone-1,2-diazide(2)-5-sulfonic acid ester of resorcinol-benzaldehyde resin (described in Example 1 of JP-A-55-1044)...1 part Cresol-phenol-formaldehyde resin...3 parts ter
Naphthoquinone-1,2-diazide(2)-5-sulfonic acid ester of t-butylphenol-benzaldehyde resin (described in Example 1 of JP-A-60-31138)...0.1 part Crystal violet (dye made by B, A, S, F, etc.)...
0.05 part ethylene glycol monomethyl ether...
・Put a transparent positive film on the positive 28 plate obtained and burn it to 70CI using a 2kW metal halide lamp.
Exposure was performed for 60 seconds from a distance of m.

Next, a developer solution was prepared as follows.

Developer engineering/AI! Potassium acid (Potassium silicate manufactured by Nippon Kagaku Kogyo (Kikusha) 100 parts by weight, 1000 parts by weight of water, 20 parts by weight of benzoin, Emulgen 147 (nonionic surfactant manufactured by Kao (■)) 1 part by weight, 50 parts by weight % Potassium hydroxide 20 double edges;
Each ff was adjusted to I) l-113,00 at 225°C.

Next, the positive mold 1 is processed by an automatic developing machine shown in FIG.
100 sheets of the 8th edition were processed as follows.

In FIG. 1, when the PS plate 1 is conveyed to the developing area by the conveyor row 52, the developer composition (2) is pumped from the tank 3 onto the 88 plate 1 from between the two plate supply ports 5 by the pump 4. Supplied. The supply amount was 100-1/f of 88 plates. Preferably, the temperature is controlled at this time. Thereafter, the PS plate is immersed in a developer, rubbed with a brush 7, and then squeezed.

The developer is stored in a waste liquid tank 8 and discarded. Next, it is washed with water and gummed, but at this time, rinsing may be performed instead of gum. Alternatively, it may be gummed or rinsed immediately after development without washing with water.

In the plate obtained after the treatment, uniform development was performed without repelling the developer on the plate. Moreover, no matter how many sheets were processed, the finish was the same.

Example 2 Two JIS105G aluminum plates with a thickness of 0.24 mm
The surface was degreased by immersion in a 0% sodium phosphate aqueous solution, electrochemically roughened in a dilute nitric acid solution, thoroughly washed, and then anodized in a dilute sulfuric acid solution to give a roughness of 1.5 (J/f). An oxide film was formed on the surface of the aluminum plate.

The obtained aluminum plate was roughly immersed in an aqueous solution of sodium metasilicate for pore sealing treatment, washed with water, dried, and then coated with the following photosensitive liquid so that the drying ratio was [12,0!1/l'] It was then dried to obtain a negative type 88 plate.

(Photosensitive liquid) Hexafluorophosphate of a condensate of p-diazodiphenylamine and paraformaldehyde...1 part N-(
4-Hydroxyphenylmethacrylamide copolymer (described in Example 1 of Japanese Patent Publication No. 57-43890)...
・10 parts Victoria Pure Blue BOH (manufactured by Hodogaya Chemical [1, dye) ... 0.2 parts ethylene glycol monomethyl ether ... 100 parts Place a transparent negative film on this negative type 88 plate and apply 2 Exposure was performed for 3G seconds from a distance of 70cm using Kilowatt's metal halide drive knob.

The above exposed negative type 88 plate was developed in the same manner as in Example 1 using the automatic developing machine shown in FIG. 1 with the following developer (3).

Developer solution ■ - Jetanolamine 1.5 parts by weight - Phenyl cellosolve 3.5 parts by weight - p -t
ert-butylbenzoic acid 2.0 parts by weight, 50% potassium hydroxide 1.0 parts by weight, Perex NBL (Kao anionic surfactant) 1.0 parts by weight, sodium sulfite 0.3 parts by weight, water
When 100 PS plates of 7 parts by weight were processed at 9G, there was no repelling of the developer on the plates, and uniform development was achieved.

Moreover, no matter how many sheets were processed, the finish was the same.

Comparative Example 1 Benzoic acid was removed from the developer composition of Example 1, and the pH
50% sodium hydroxide was added to give a weight of 13.0G, and the rest was developed in the same manner as in Example 1. As a result, the wettability to the PS plate was poor, and if there were foreign substances on the plate, it would repel, resulting in poor development. Furthermore, when the developer was stored for a long period of time, a nonionic surfactant precipitated.

[Effects of the Invention] As explained above in detail, uniform development could be stably performed for a long period of time by the development processing method of the present invention.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of an automatic developing machine used in Examples and Comparative Examples. Main reference numbers> 1...Photosensitive material 2...Conveyance roller 3...
Storage tank 4...Pump 5...Developer supply port 6...Press skewer roller 7...Brush roller 8
... Waste liquid tank 9 ... Nozzle

Claims (1)

[Claims] A method in which an imagewise exposed photosensitive material is automatically conveyed using an automatic developing machine, and a substantially unused developer is supplied onto the photosensitive material at the time of development. A method for processing a photosensitive material, comprising at least an aromatic dicarboxylic acid and a surfactant.